| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/05/1992 | DE4128780A1 Fine structure formation appts. - for plasma etching of substrates or layers comprising vacuum chamber, gas supply, plasma generator, holder, etc. |
| 03/05/1992 | DE4128779A1 Fine structure prodn. appts. for plasma etching of substrates - comprises vacuum chamber, reaction gas supply, plasma generator andsample holder for polyimide etching |
| 03/04/1992 | EP0473216A2 Charged particle beam device |
| 03/04/1992 | EP0473097A2 System for irradiating a surface with atomic and molecular ions using two dimensional magnetic scanning |
| 03/04/1992 | EP0472941A2 VHF/UHF plasma process for use in forming integrated circuit structures on semiconductor wafers |
| 03/03/1992 | US5093616 Voltage measurement method using electron beam |
| 03/03/1992 | US5093578 Valve device for a particle beam apparatus |
| 03/03/1992 | US5093577 Contamination monitor for measuring a degree of contamination in an evacuatable charged particle beam system |
| 03/03/1992 | US5093573 Reflection electron diffractometer and method for observing microscopic surface structure |
| 03/03/1992 | US5093572 Scanning electron microscope for observation of cross section and method of observing cross section employing the same |
| 03/03/1992 | US5093571 Method and device for analyzing gas in process chamber |
| 03/03/1992 | US5092729 Apparatus for transporting a wafer and a carrier used for the same |
| 03/01/1992 | WO1992004483A1 Method of enhancing the performance of a magnetron sputtering target |
| 02/27/1992 | DE4026494A1 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren Apparatus for material by vacuum evaporation arc discharge and procedural |
| 02/26/1992 | EP0472342A2 Micro-displacement type information detection probe device and microscope and information processing device by use thereof |
| 02/26/1992 | EP0472235A1 Method for directly deriving amplitude and phase information of an object from images produced by a high-resolution electron microscope |
| 02/26/1992 | EP0472045A1 Method and apparatus for controlling plasma processing |
| 02/26/1992 | EP0471819A1 Apparatus for ion implantation |
| 02/25/1992 | WO1992003589A1 Method of improving ion flux distribution uniformity on a substrate |
| 02/25/1992 | US5091655 Reduced path ion beam implanter |
| 02/25/1992 | US5091651 Object holder for supporting an object in a charged particle beam system |
| 02/25/1992 | US5091049 Radio frequency power sources; magnetic field |
| 02/25/1992 | CA2089644A1 Method of improving ion flux distribution uniformity on a substrate |
| 02/20/1992 | WO1992002660A1 Cantilever mount for rotating cylindrical magnetrons |
| 02/20/1992 | WO1992002659A1 Shielding for arc suppression in rotating magnetron sputtering systems |
| 02/20/1992 | DE4026229A1 Single connection Langmuir probe measuring assembly - with wire probe connected alternately to measuring circuit and heat source by switching device |
| 02/20/1992 | DE4025077A1 Magnetron cathode for cathodic sputtering - with non-sputtered sides coated with protective layer to prevent slow build=up of dielectric layer |
| 02/19/1992 | CN1058860A Pinpoint type cathode |
| 02/18/1992 | WO1992003838A1 Particle beam generator |
| 02/18/1992 | US5089747 Electron beam excitation ion source |
| 02/18/1992 | US5089746 Production of ion beams by chemically enhanced sputtering of solids |
| 02/18/1992 | US5089710 Ion implantation equipment |
| 02/18/1992 | US5089708 Vacuum system comprising an evacuatable housing, an object holder and an object carrier which is detachably coupled thereto |
| 02/18/1992 | US5089707 Ion beam generating apparatus with electronic switching between multiple cathodes |
| 02/18/1992 | US5089699 Secondary charged particle analyzing apparatus and secondary charged particle extracting section |
| 02/18/1992 | US5089686 Electron beam generator for an electron beam gun |
| 02/18/1992 | US5088290 Transfer vessel apparatus and method of storing samples |
| 02/18/1992 | CA2089659A1 Particle beam generator |
| 02/17/1992 | CA2049197C Micro-displacement type information detection probe device and scanning tunneling microscope, atomic force microscope, information processing device by use thereof |
| 02/12/1992 | EP0470580A2 Plasma processing apparatus |
| 02/12/1992 | EP0470478A2 Multichannel charged-particle analyzer |
| 02/12/1992 | EP0470379A1 Improvement in film-forming on substrate by sputtering |
| 02/12/1992 | EP0470300A1 Electron beam apparatus with a monopole magnetic lens field |
| 02/12/1992 | EP0470299A1 Energy filter for charged particle beam apparatus |
| 02/12/1992 | EP0470274A1 Method of depositing directly activated species onto a remotely located substrate |
| 02/11/1992 | US5087857 Plasma generating apparatus and method using modulation system |
| 02/11/1992 | US5087537 Depositing photoresist on a substrate, preferential exposure of photoresist and analyzing for accuracy |
| 02/11/1992 | US5087341 Dry etching apparatus and method |
| 02/06/1992 | WO1992002034A1 High accuracy, high flexibility energy beam machining system |
| 02/06/1992 | DE4041029C1 Component cooler for vacuum chamber - has stamper-like heat sink inserted in sealed opening and directly contacting base of component |
| 02/05/1992 | EP0469679A1 Charged particle beam system, a cooling member, a coil comprising such cooling member and a cooling device incorporating such cooling member |
| 02/05/1992 | EP0469597A2 Plasma processing reactor |
| 02/05/1992 | EP0469314A2 Method and apparatus for neutralizing electric charges built up on a specimen in a vacuum chamber |
| 02/05/1992 | EP0469236A2 Apparatus for ion-plasma machining workpiece surfaces |
| 02/05/1992 | CN1058348A Modulation of x-ray beam for selective absorption of radiant energy in pathological material |
| 02/04/1992 | US5086398 Electron beam exposure method |
| 02/04/1992 | US5086256 External resonance circuit type radio frequency quadrupole accelerator |
| 02/04/1992 | US5086230 Apparatus for forming, correcting pattern |
| 02/04/1992 | US5086227 Secondary ion mass analyzing apparatus |
| 02/04/1992 | US5085755 Sputtering apparatus for forming thin films |
| 02/04/1992 | US5085727 Plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion |
| 02/04/1992 | US5085410 Modular processing system |
| 01/29/1992 | EP0468897A1 Process for the determination of the complete removal of a thin film on a non-planar substrate |
| 01/29/1992 | EP0468886A2 Plasma production device |
| 01/29/1992 | EP0468817A2 Infra-red scanning microscopy |
| 01/29/1992 | EP0468521A2 Method and apparatus for irradiating low-energy electrons |
| 01/29/1992 | EP0468509A2 Matching network |
| 01/29/1992 | EP0468071A1 Method of producing micromechanical sensors for the AFM/STM/MFM profilometry and micromechanical AFM/STM/MFM sensor head |
| 01/28/1992 | US5084624 Apparatus for making homogeneous the implantation of ions on the surface of planar samples |
| 01/28/1992 | US5084622 Correction system for a charged-particle beam apparatus |
| 01/28/1992 | US5084618 Autofocus method and apparatus for electron microscope |
| 01/28/1992 | US5084300 Apparatus for the ablation of material from a target and coating method and apparatus |
| 01/28/1992 | US5084126 Over the surface of a semiconductor wafer |
| 01/28/1992 | US5084125 Continuous processing, cleaning, removing deposits |
| 01/28/1992 | CA1295056C Scanning electron microscope for visualization of wet samples |
| 01/23/1992 | WO1992001308A1 Imminent endpoint detection for plasma etch system |
| 01/23/1992 | WO1992001306A1 A composite multipurpose multipole electrostatic optical structure and a synthesis method for minimizing aberrations |
| 01/23/1992 | WO1992001082A1 Slotted cylindrical hollow cathode/magnetron sputtering device |
| 01/23/1992 | WO1992001081A1 Method and apparatus for co-sputtering and cross-sputtering homogeneous films |
| 01/22/1992 | EP0467391A2 Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency-wave is applied |
| 01/22/1992 | EP0467390A1 Support table for plate-like body and processing apparatus using the table |
| 01/22/1992 | EP0467356A2 Treatment system having gate device for decompression chamber |
| 01/22/1992 | EP0467046A2 Device for etching or crating |
| 01/22/1992 | EP0467012A1 Cathode for sputtering |
| 01/21/1992 | US5083061 Electron beam excited ion source |
| 01/21/1992 | US5083033 Reacting silicon compound with gas in vacuum |
| 01/21/1992 | US5083032 Electron beam exposure apparatus |
| 01/21/1992 | US5083022 Scanning tunneling microscope |
| 01/21/1992 | US5083020 Mass spectrometer |
| 01/21/1992 | US5082762 Charged particle beam exposure method |
| 01/21/1992 | US5082685 Method of conducting plasma treatment |
| 01/21/1992 | US5082547 Vacuum chamber; shield with dielectric and conductive layers; printed circuits |
| 01/21/1992 | US5082546 Apparatus for the reactive coating of a substrate |
| 01/21/1992 | US5082545 Sputtering apparatus |
| 01/21/1992 | US5082542 Distributed-array magnetron-plasma processing module and method |
| 01/21/1992 | US5082517 Plasma density controller for semiconductor device processing equipment |
| 01/16/1992 | DE4025231A1 Reactive sputtering using multi-part target - with part sputtered in oxidic mode and part sputtered in metallic mode |
| 01/15/1992 | EP0466380A2 Integrated circuit structure analysis |
| 01/15/1992 | EP0465597A1 Raster scan control system for a charged-particle beam. |
| 01/15/1992 | EP0465515A1 Process and device for monitoring assisted ion machining processes on wafers. |