| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/17/1992 | DE4039930A1 Plasma treating appts. - has adjustable distance between edge of hollow electrode and substrate holding electrode to maintain constant radio frequency power |
| 06/17/1992 | CN1017102B Improved ion source |
| 06/16/1992 | US5122663 Compact, integrated electron beam imaging system |
| 06/16/1992 | US5122252 Arrangement for the coating of substrates |
| 06/16/1992 | US5122251 High density plasma deposition and etching apparatus |
| 06/11/1992 | WO1992009999A1 Power-supply circuit for pulse-operated vacuum-arc devices |
| 06/11/1992 | DE4038577A1 Coating substrate with silicon di:oxide - in which multicomponent target in evacuated chamber contg. argon@ and oxygen@ is used |
| 06/10/1992 | EP0489407A2 Plasma reactor using UHF/VHF resonant antenna source, and processes |
| 06/10/1992 | EP0489396A1 Segmented cathode for arc-discharge coating |
| 06/10/1992 | EP0489239A1 Sputtering apparatus with magnetron cathodes for coating of substrates |
| 06/10/1992 | EP0444085A4 Improved electron detector for use in a gaseous environment |
| 06/09/1992 | US5120959 Apparatus for simultaneously effecting electrochemical measurement and measurement of tunneling current and tunnel probe therefor |
| 06/09/1992 | US5120925 Methods for device transplantation |
| 06/09/1992 | US5120568 Generating high temperature gas, depressurizing, pumping fluid reactants and impinging to form plasma polymerization |
| 06/09/1992 | US5120417 Magnetron sputtering apparatus and thin film depositing method |
| 06/09/1992 | CA1303258C Device for irradiating two faces of a product |
| 06/09/1992 | CA1303253C Processes depending on plasma generation |
| 06/04/1992 | DE4137462C1 Sputtering target cooling means - has target mounted on cooling plate with cooling channels contg. temp. sensor, with 2-way coolant supply line of good and poor thermally conductive media |
| 06/04/1992 | DE4127262C1 Sputtering equipment for coating large substrates with (non)ferromagnetic material - consisting of two sub-targets electrically isolated and cooling plates whose gap in between is that in region of pole units |
| 06/04/1992 | DE4127261C1 Sputtering equipment for coating large substrates with ferromagnetic and non-magnetic material - has cathode target comprising sub-targets, and cooling plates contg. magnet unit and poles shoes |
| 06/03/1992 | EP0488972A2 Device for generating an on-off modulated electron beam |
| 06/03/1992 | EP0488707A2 Charged particle beam deflector |
| 06/03/1992 | EP0488393A2 Method for treating substrates |
| 06/03/1992 | EP0488307A2 Plasma etching apparatus |
| 06/03/1992 | EP0488214A2 Electron microscope |
| 06/03/1992 | EP0488133A1 Method of making a cantilever stylus for use in an atomic force microscope |
| 06/03/1992 | EP0488067A2 Ion-scattering spectrometer |
| 06/03/1992 | EP0487656A1 Charge neutralization apparatus for ion implantation system. |
| 06/03/1992 | EP0473574A4 Process for molding target electrode used in the application of electrostatic charge to a fibrous structure |
| 06/02/1992 | US5118991 Electron beam generator for an electron gun |
| 06/02/1992 | US5118952 Layer of silver and layer of alkali(earth) metal; reducing work function |
| 06/02/1992 | US5118949 Process for the protection of a diaphragm during the generation of electron beam pulses |
| 06/02/1992 | US5118941 Apparatus and method for locating target area for electron microanalysis |
| 06/02/1992 | US5118378 Apparatus for detecting an end point of etching |
| 06/02/1992 | CA1302592C Beam generating system for electron beam measuring instruments |
| 06/02/1992 | CA1302517C Arc device with adjustable cathode |
| 05/27/1992 | EP0487300A1 Scanning probe microscopy |
| 05/27/1992 | EP0486943A1 Device for the excitation of a uniform microwave field |
| 05/27/1992 | DE4037926A1 Electron beam working arrangement e.g. for X=ray mask prodn. - uses gas which is concentrated at impact point of beam to avoid influencing beam |
| 05/27/1992 | DE4037388A1 Schaltungsanordnung zur stromversorgung fuer gepulst betriebene vakuumboegen Circuit arrangement for the power supply for pulsed-operated vakuumboegen |
| 05/26/1992 | US5117117 Electron beam exposure system having an improved seal element for interfacing electric connections |
| 05/26/1992 | US5117112 Method and apparatus for monitoring astigmatism and focus in electron microscope |
| 05/26/1992 | US5117111 Electron beam measuring apparatus |
| 05/26/1992 | US5117110 Composite scanning tunnelling microscope with a positioning function |
| 05/26/1992 | US5117085 Cathode holder for an electron beam generator |
| 05/26/1992 | US5116782 Method and apparatus for processing a fine pattern |
| 05/26/1992 | US5116482 Film forming system using high frequency power and power supply unit for the same |
| 05/26/1992 | US5116479 Process for producing transparent conductive film comprising indium oxide |
| 05/26/1992 | US5116462 Cantilever beam; coating, masking, etching |
| 05/22/1992 | WO1992009718A1 Anode structures for magnetron sputtering apparatus |
| 05/22/1992 | CA2096735A1 Anode structures for magnetron sputtering apparatus |
| 05/21/1992 | DE4134900A1 Microwave plasma producing device used in plasma etching - has microwave coupled to circular dielectric plate via its side to enable uniform production of electric field in discharge chamber leading to uniform plasma distribution |
| 05/20/1992 | EP0486149A2 Method and apparatus for reducing tilt angle variations in an ion implanter |
| 05/20/1992 | EP0486147A2 Ion beam generating apparatus with electronic switching between multiple cathodes |
| 05/20/1992 | EP0419461A4 Wafer handling system with bernoulli pick-up |
| 05/19/1992 | US5115354 High accuracy traveling table apparatus |
| 05/19/1992 | US5115167 Plasma processor |
| 05/19/1992 | US5115135 Ion source |
| 05/19/1992 | US5114770 Method for continuously forming functional deposited films with a large area by a microwave plasma cvd method |
| 05/19/1992 | US5114559 Thin film deposition system |
| 05/19/1992 | US5114556 Mobilization by collisions; sputtering |
| 05/19/1992 | US5114529 Plasma processing method and apparatus |
| 05/19/1992 | US5113790 Apparatus for the plasma treatment of substrates |
| 05/14/1992 | WO1992007970A1 Magnetron sputter coating method and apparatus with rotating magnet cathode |
| 05/14/1992 | WO1992007969A1 Apparatus for depositing material into high aspect ratio holes |
| 05/14/1992 | DE4042417A1 Etching or coating appts. with divided chamber wall |
| 05/14/1992 | DE4034034A1 Coating weakly corrosion resistant substrate - useful in making decorative layers, without applying galvanic protection and is effective and simple |
| 05/13/1992 | EP0484704A1 Low voltage arc discharge and variable magnetic field for heating a substrate |
| 05/12/1992 | US5113074 Ion beam potential detection probe |
| 05/12/1992 | US5113072 Device having superlattice structure, and method of and apparatus for manufacturing the same |
| 05/12/1992 | US5112724 Lithographic method |
| 05/12/1992 | US5112468 Target for magnetron-sputtering systems |
| 05/12/1992 | US5112467 Clamp, roller with alumina insulation |
| 05/12/1992 | US5112466 Apparatus for forming a thin film |
| 05/12/1992 | US5112458 Plasma excitation of hydrocarbon feed gas, ionization |
| 05/07/1992 | DE4126040C1 Segmented cathodes for plasma surface-coating process - comprise rectangular section frame internally divided into 3 segments of titanium@, zirconium@ and chromium@ respectively and insulating projections |
| 05/06/1992 | EP0484260A2 Compensation of mutual inductance in multi-channel deflection yokes |
| 05/06/1992 | EP0483579A2 Nanometer scale probe for an atomic force microscope, and method for making the same |
| 05/06/1992 | EP0483517A2 Gas delivery for ion beam deposition and etching |
| 05/06/1992 | EP0425528A4 A real-time signal processing circuit |
| 05/05/1992 | US5111111 Method and apparatus for coupling a microwave source in an electron cyclotron resonance system |
| 05/05/1992 | US5111054 Heat-actuated vacuum valve for a particle beam apparatus |
| 05/05/1992 | US5111053 Controlling a liquid metal ion source by analog feedback and digital CPU control |
| 05/05/1992 | US5111043 Apparatus for material surface observation |
| 05/05/1992 | US5111042 Method and apparatus for generating particle beams |
| 05/05/1992 | US5111022 Cooling system for electron beam gun and method |
| 05/05/1992 | US5110438 Reduced pressure surface treatment apparatus |
| 05/05/1992 | US5110437 Plasma processing apparatus |
| 05/05/1992 | US5109724 Micromanipulator |
| 04/30/1992 | WO1992007375A1 Device for impacting a material with an electron beam |
| 04/30/1992 | WO1992007105A1 Rotating magnetron incorporating a removable cathode |
| 04/30/1992 | WO1992007104A1 Film thickness uniformity control apparatus for in-line sputtering systems |
| 04/29/1992 | EP0483004A1 Electron cyclotron resonance ion source for highly charged ions with polarisable probe |
| 04/29/1992 | EP0482907A2 Electrode structures |
| 04/29/1992 | EP0482891A2 High vacuum magnetron sputter source |
| 04/29/1992 | EP0482541A1 Large area cathodic device with equalized consumption |
| 04/29/1992 | EP0482271A1 Current-to-voltage converter with low noise, wide bandwidth and high dynamic range |
| 04/28/1992 | US5109179 Electron gun provided with a device producing a magnetic field in the neighborhood of a cathode |
| 04/28/1992 | US5108574 Cylindrical magnetron shield structure |
| 04/28/1992 | US5108569 Process and apparatus for forming stoichiometric layer of a metal compound by closed loop voltage controlled reactive sputtering |