Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2013
11/12/2013US8581186 Charged particle beam apparatus
11/12/2013US8580076 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith
11/07/2013US20130292568 Scanning electron microscope and length measuring method using the same
11/07/2013US20130292567 Method of determining an applicable threshold for determining the critical dimension of at least one category of patterns imaged by atomic force scanning electron microscopy
11/07/2013US20130292566 Transmission Electron Microscopy System and Method of Operating a Transmission Electron Microscopy System
11/07/2013DE112007003616B4 Veraschungsvorrichtung Ashing device
11/06/2013EP2660846A1 Charged particle beam device and method of manufacture of sample
11/06/2013EP2660845A1 Charged-particle microscopy with image stitching
11/06/2013EP2660844A1 Charged particle beam microscope with diffraction aberration corrector applied thereto
11/06/2013EP2660655A1 Lithography system, method of clamping and wafer table
11/06/2013EP2660351A1 Radio frequency tuned substrate biased physical vapor deposition apparatus and method of operation
11/06/2013EP2660350A1 Reactive sputter deposition of dielectric films
11/06/2013CN203277311U Electron microscope
11/06/2013CN103383913A Ion beam dimension control for ion implantation process and apparatus, and advanced process control
11/06/2013CN102232243B Front end of line plasma mediated ashing processes and apparatus
11/06/2013CN102169789B Automatic matching unit and plasma processing apparatus
11/06/2013CN102136407B Guide rack of substrate processing device
11/06/2013CN102067268B Post-decel magnetic energy filter for ion implantation systems
11/06/2013CN101979706B Vaporizer
11/05/2013US8575579 Multi-leaf collimator for proton beam therapy
11/05/2013US8575548 Analyzing the transport of plasmonic particles through mineral formations
11/05/2013US8574448 Plasma generation method, cleaning method, and substrate processing method
11/05/2013US8574446 Apparatus and method for plasma processing
11/05/2013US8573153 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode
11/04/2013DE202013104701U1 Anordnung zum Kuppeln eines Behandlungsmodules an eine Vakuumkammer sowie eine Anschlussvorrichtung dafür Arrangement for coupling a process module to a vacuum chamber and a terminal device therefor
10/2013
10/31/2013WO2013162916A1 System and method for aligning substrates for multiple implants
10/31/2013WO2013161837A1 Charged particle microscope
10/31/2013WO2013161684A1 Charged particle beam device
10/31/2013WO2013161539A1 Charged particle beam adjustment assistance device and method
10/31/2013WO2013161473A1 Scanning electron microscope
10/31/2013WO2013159433A1 Method for improving uniformity of high-frequency discharge plasma in frequency modulation manner
10/31/2013WO2013133739A9 Analyser arrangement for particle spectrometer
10/31/2013WO2013132064A3 Charged particle lithography system with alignment sensor and beam measurement sensor
10/31/2013WO2013120097A9 Compact, filtered ion source
10/31/2013US20130288181 Drawing apparatus, and method of manufacturing article
10/31/2013US20130285008 Nanowires, method of fabrication the same and uses thereof
10/31/2013US20130284925 Electron beam device
10/31/2013US20130284923 Scanning electron microscope
10/31/2013US20130284922 Charged-Particle Beam Apparatus Having Micro Scale Management Function
10/31/2013US20130284916 Ion transfer device
10/30/2013EP2656375A2 A microwave plasma reactor for manufacturing synthetic diamond material
10/30/2013EP2656374A1 Controlling doping of synthetic diamond material
10/30/2013EP2656373A1 A microwave plasma reactor for manufacturing synthetic diamond material
10/30/2013EP2656372A1 A microwave plasma reactor for manufacturing synthetic diamond material
10/30/2013EP2656371A1 A microwave plasma reactor for manufacturing synthetic diamond material
10/30/2013EP2656370A2 Microwave plasma reactors and substrates for synthetic diamond manufacture
10/30/2013EP2655689A1 Microwave power delivery system for plasma reactors
10/30/2013CN203260551U Dry etching device
10/30/2013CN203260550U Dual-frequency ion source
10/30/2013CN103377979A Adjustment plate and apparatus for treating substrate having the same
10/30/2013CN103377870A Substrate treating apparatus
10/30/2013CN103377869A Impedance matching method, impedance matching system, and plasma processing device
10/30/2013CN103377868A Lower electrode apparatus in etching electrode machine
10/30/2013CN103377867A Top electrode in etching electrode mechanism
10/30/2013CN103377866A Ion implantation equipment
10/30/2013CN103377865A Broadband ion beam transmission method and ion implanter
10/30/2013CN103377864A System and method of high-current electron beam energy dispersion measurement for vacuum electron device
10/30/2013CN102077377B System and method to fabricate magnetic random access memory
10/30/2013CN101887836B Method and device for regulating current distribution and plasma process equipment
10/30/2013CN101630622B Hybrid phase plate
10/29/2013US8569719 Method and apparatus for specimen fabrication
10/29/2013US8569718 Charged particle beam system
10/29/2013US8569714 Double tilt transmission electron microscope sample holder for in-situ measurement of microstructures
10/29/2013US8569694 Aberration-correcting dark-field electron microscopy
10/24/2013WO2013158523A1 Double ended electrode manipulator
10/24/2013WO2013157474A1 Charged particle beam device
10/24/2013WO2013156924A1 Microwave plasma generating device and method for operating same
10/24/2013WO2013155813A1 Method for transmitting a broadband ion beam and ion implanter
10/24/2013WO2013104925A3 In-vacuum rotational device
10/24/2013US20130278142 Three-coil inductively coupled plasma source with individually controlled coil currents from a single rf power generator
10/24/2013US20130278141 Three-coil inductively coupled plasma source with individually controlled coil currents from a single rf power generator
10/24/2013US20130277573 Functionalized carbon membranes
10/24/2013US20130277572 Sample holder providing interface to semiconductor device with high density connections
10/24/2013US20130277554 Charged Particle Beam Apparatus
10/24/2013US20130277553 Method and apparatus for observing defects
10/24/2013US20130277552 Charged particle beam device and method of manufacture of sample
10/24/2013DE102012206553A1 Controlling thickness distribution in vacuum coating of substrate, comprises placing cathode and anode in vacuum chamber, where plasma discharge is generated during treating the substrate in plasma area defined between cathode and substrate
10/24/2013DE102012103425A1 Mikrowellenplasmaerzeugungsvorrichtung und Verfahren zu deren Betrieb The microwave plasma generating device and method for its operation
10/24/2013DE102012007868A1 Transmissionselektronenmikroskopiesystem Transmission electron system
10/24/2013DE102008052533B4 Ionenstrahlquelle, Ionenstrahlrastersystem, Ionenrastermikroskop sowie Ionenstrahl-Lithographievorrichtung Ion beam source, the ion beam scanning system, ion microscope and ion beam lithography apparatus
10/23/2013EP2654071A1 Capacitively coupled plasma reactor for thin film deposition
10/23/2013EP2654070A1 Capacitively coupled plasma reactor for thin film deposition
10/23/2013EP2654069A1 Multi channel detector, optics therefore and method of operating thereof
10/23/2013EP2654068A1 Switchable multi perspective detector, optics therefore and method of operating thereof
10/23/2013EP2654067A2 Transmission electron microscopy system and method of operating a transmission electron microscopy system
10/23/2013EP2652486A1 Apparatus of plural charged particle beams with multi-axis magnetic lens
10/23/2013EP2652485A1 Apparatus of plural charged particle beams with multi-axis magnetic lens
10/23/2013CN203250716U Ion implanter capable of reducing times of abnormal opening
10/23/2013CN103370765A Controlling doping of synthetic diamond material
10/23/2013CN103370655A Lithography system and method of processing substrates in such a lithography system
10/23/2013CN103367089A Plasma processing device with double shell
10/23/2013CN103367088A Ion implantation apparatus and control method thereof
10/23/2013CN103367087A Automated ion beam idle
10/23/2013CN103367086A Method for adjusting the position of a supporting element in a particle beam device
10/23/2013CN103367085A Charged-particle microscope providing depth-resolved imagery
10/23/2013CN103367084A Ion beam bending magnet for a ribbon-shaped ion beam
10/23/2013CN102564654B Laser force-measuring system used in scanning electron microscope
10/23/2013CN102347192B High-power electronic gun
10/23/2013CN102222595B Ion injection method and ion injection device
10/22/2013US8563953 Charged particle beam writing apparatus and charged particle beam writing method
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