| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 01/01/2014 | CN203377195U Reaction chamber for dry plasma etching machine |
| 01/01/2014 | CN103493172A Apparatus and method for maskless patterned implantation |
| 01/01/2014 | CN103493171A Sample holding apparatus for electron microscope, and electron microscope apparatus |
| 01/01/2014 | CN103492851A Automated sample preparation |
| 01/01/2014 | CN103492608A Diffusion-bonded sputtering target assembly and method of manufacturing |
| 01/01/2014 | CN103489744A Gas modulation to control edge exclusion in a bevel edge etching plasma chamber |
| 01/01/2014 | CN103489743A Focused charged particle column for operation at different beam energies at a target |
| 01/01/2014 | CN103489742A Device for generating super-wide ribbon ion beam and ion implanter |
| 01/01/2014 | CN102521445B Simulation computation method for etching morphology of copper target in magnetron sputtering equipment |
| 01/01/2014 | CN102383108B Furnace for carrying out plasma chemical vapour deposition |
| 01/01/2014 | CN102262999B Plasma processing apparatus |
| 12/31/2013 | US8618520 Method and apparatus for processing a micro sample |
| 12/31/2013 | US8618517 Pattern measuring apparatus |
| 12/31/2013 | US8618516 Charged-particle beam exposure apparatus and method of manufacturing article |
| 12/31/2013 | US8618515 Lithography apparatus and device manufacturing method |
| 12/31/2013 | US8618500 Multi channel detector, optics therefor and method of operating thereof |
| 12/31/2013 | US8618499 Electron beam irradiation apparatus |
| 12/31/2013 | US8618498 Backscatter reduction in thin electron detectors |
| 12/31/2013 | US8618480 Charged particle beam apparatus |
| 12/31/2013 | US8618478 Drift control in a charged particle beam system |
| 12/31/2013 | US8617352 Electrode assembly for the removal of surface oxides by electron attachment |
| 12/31/2013 | US8617351 Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction |
| 12/27/2013 | WO2013191539A1 Apparatus and method for inspecting a surface of a sample |
| 12/27/2013 | WO2013190994A1 Sample holder for electron microscope |
| 12/27/2013 | WO2013190356A1 Lens offset |
| 12/27/2013 | WO2013190349A1 Rf feed line |
| 12/27/2013 | WO2013190269A1 Method and device for manufacturing a barrier layer on a flexible substrate |
| 12/27/2013 | WO2013190141A1 Method and device for pretreating a coated or uncoated substrate |
| 12/27/2013 | WO2013139878A3 Arrangement and method for transporting radicals |
| 12/26/2013 | US20130345490 Particle beam irradiation apparatus and particle beam therapy system |
| 12/26/2013 | US20130344700 Electrostatic deflector, lithography apparatus, and method of manufacturing device |
| 12/26/2013 | US20130344443 Lithography apparatus, and method of manufacture of product |
| 12/26/2013 | US20130344339 Ion radiation damage prediction method, ion radiation damage simulator, ion radiation apparatus and ion radiation method |
| 12/26/2013 | US20130344292 Three Dimensional Fiducial |
| 12/26/2013 | US20130342105 Laser Sustained Plasma Light Source With Electrically Induced Gas Flow |
| 12/26/2013 | US20130341506 Method and Apparatus for Electron Pattern Imaging |
| 12/26/2013 | US20130341505 Method for s/tem sample analysis |
| 12/26/2013 | US20130340941 Lens offset |
| 12/26/2013 | US20130340939 System for substrate handling and processing |
| 12/26/2013 | US20130340938 Adjustable gap capacitively coupled rf plasma reactor including lateral bellows and non-contact particle seal |
| 12/26/2013 | US20130340937 Plasma processing apparatus |
| 12/26/2013 | US20130340936 Method for ex-situ lift-out specimen preparation |
| 12/25/2013 | EP2676285A2 Focusing a charged particle imaging system |
| 12/25/2013 | EP2676168A2 System for magnetic shielding |
| 12/25/2013 | EP2675936A1 Device for synthesising a nanostructured composite material, and associated method |
| 12/25/2013 | CN1868028B Ion implanter electrodes |
| 12/25/2013 | CN103477416A Improved uniformity of a scanned ion beam |
| 12/25/2013 | CN103477415A Charged particle beam apparatus |
| 12/25/2013 | CN103477285A System for magnetic shielding |
| 12/25/2013 | CN103474328A Plasma treatment method |
| 12/25/2013 | CN103474322A Dry etching equipment and etching method |
| 12/25/2013 | CN103474321A Method and apparatus for detecting arc in plasma chamber |
| 12/25/2013 | CN103474320A Plasma etching device |
| 12/25/2013 | CN103474319A Ion implanter reducing grape-shaped defects of wafers |
| 12/25/2013 | CN103474318A Sputtering ion gun |
| 12/25/2013 | CN102376520B Ion implantation dose detection control apparatus of plasma immersion ion implanter |
| 12/25/2013 | CN102376519B Ion implantation dosage detection control method |
| 12/25/2013 | CN102332385B Mesh plate structure for ion neutralization |
| 12/25/2013 | CN102290314B Device for producing neutral particle beam and method thereof |
| 12/25/2013 | CN102160141B Device and method for producing dielectric layers in microwave plasma |
| 12/24/2013 | US8614426 Light disinfection device |
| 12/24/2013 | US8614416 Nonoparticulate assisted nanoscale molecular imaging by mass spectrometery |
| 12/24/2013 | US8614052 Method for controlling the electronic beam exposure of wafers and masks using proximity correction |
| 12/24/2013 | US8613828 Procedure and device for the production of a plasma |
| 12/24/2013 | US8613827 Plasma treatment system |
| 12/24/2013 | DE19842477B4 Verfahren zum Bestrahlen von strangförmigem Bestrahlgut sowie Bestrahlungsvorrichtung zur Durchführung des Verfahrens A method of irradiating strand-Bestrahlgut and irradiation apparatus for carrying out the method |
| 12/24/2013 | DE112012000116T5 Elektronenstrahl-Interferenzvorrichtung und Elektronenstrahl-Interferometrie Electron beam interference device and electron beam interferometry |
| 12/24/2013 | DE112006003188B4 Verfahren und Anordnung zum Redundanten Anoden-Sputtern Method and apparatus for redundant anode sputtering |
| 12/24/2013 | DE102012012275A1 Laserstrahleinkopplung für ein bearbeitungssystem zur mikro-materialbearbeitung Laserstrahleinkopplung for a processing system for micro-material processing |
| 12/24/2013 | DE102011083139B4 Substratbehandlungsverfahren und Substratbehandlungsanlage The substrate processing method and substrate processing system |
| 12/24/2013 | DE102009002684B4 Verfahren zur Leistungsversorgung einer Plasmalast und Plasmaversorgungseinrichtung zu seiner Durchführung Method for power supply of a plasma load and plasma power supply for its implementation |
| 12/24/2013 | DE102005000813B4 Verfahren zur Strahlkalibrierung und Verwendungen eines Kalibrierungskörpers Method for beam calibration and uses a calibration body |
| 12/19/2013 | WO2013187511A1 Optical signal detecting circuit, light volume detecting device, and charged particle beam device |
| 12/19/2013 | WO2013187267A1 Microstructure and method of manufacturing the same |
| 12/19/2013 | WO2013187155A1 Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus |
| 12/19/2013 | WO2013187115A1 Charged particle beam device |
| 12/19/2013 | WO2013186697A2 Device for generating plasma and directing an electron beam towards a target |
| 12/19/2013 | WO2013186523A1 Plasma source apparatus and methods for generating charged particle beams |
| 12/19/2013 | WO2013186381A1 Electrical circuit to impedance match a source and a load at multiple frequencies, method to design such a circuit |
| 12/19/2013 | WO2013132081A3 Lithography system and method for processing a target, such as a wafer |
| 12/19/2013 | US20130334964 Microwave power delivery system for plasma reactors |
| 12/19/2013 | US20130334955 Plasma generator and cleaning/purification apparatus using same |
| 12/19/2013 | US20130334442 Drift correction method and pattern writing data generation method |
| 12/19/2013 | US20130334034 Ion beam device and machining method |
| 12/19/2013 | DE102013211257A1 Driftkorrekturverfahren und Muster-Schreibdaten-Erzeugungsverfahren Drift correction method and pattern-writing data producing method |
| 12/19/2013 | DE102009057357B4 Elektronenstrahleinheit zum Aufprägen eines Intensitätsprofils Electron beam unit for impressing an intensity profile |
| 12/19/2013 | CA2876552A1 Plasma source apparatus and methods for generating charged particle beams |
| 12/18/2013 | EP2675064A1 Electrical circuit to impedance match a source and a load at multiple frequencies, method to design such a circuit |
| 12/18/2013 | EP2674961A2 Electron microscope and method of operating the same |
| 12/18/2013 | EP2674960A2 Electron microscope and method of adjusting the same |
| 12/18/2013 | EP2674959A1 Charged-particle apparatus equipped with improved Wien-type Cc corrector |
| 12/18/2013 | EP2673795A1 A plasma based surface augmentation method |
| 12/18/2013 | CN203351548U Wireless electronic microscope |
| 12/18/2013 | CN103460350A Method and apparatus for plasma dicing a semi-conductor wafer |
| 12/18/2013 | CN103460329A A plasma based surface augmentation method |
| 12/18/2013 | CN103459652A Apparatus and method for surface processing |
| 12/18/2013 | CN103456593A Hydride vapor deposition device and method for improving thickness distribution uniformity of multiple-piece epitaxial materials |
| 12/18/2013 | CN103456592A Plasma processing device and inductive coupling coil thereof |
| 12/18/2013 | CN103456591A Inductance coupling plasma processing chamber of automatic frequency tuning source and bias radio frequency power source |
| 12/18/2013 | CN103456590A Alignment device with multiple stages of mechanical alignment mechanisms in scanning electron microscope and method thereof |