Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2013
10/01/2013US8546756 System and method for material analysis of a microscopic element
10/01/2013US8545669 Sensor array for measuring plasma characteristics in plasma processing environments
10/01/2013US8544411 Batch-type remote plasma processing apparatus
09/2013
09/26/2013WO2013142690A1 Platen clamping surface monitoring
09/26/2013WO2013142068A1 Pillar-supported array of micro electron lenses
09/26/2013US20130254948 Scanning Method for Scanning a Sample with a Probe
09/26/2013US20130252172 Multi charged particle beam writing apparatus and multi charged particle beam writing method
09/26/2013US20130252145 Multi charged particle beam writing apparatus and multi charged particle beam writing method
09/26/2013US20130250282 Charged Particle Beam Writing Apparatus and Charged Particle Beam Writing Method
09/26/2013US20130248738 Platen clamping surface monitoring
09/26/2013US20130248735 Composite charged particle beam apparatus
09/26/2013US20130248732 Ion beam apparatus
09/26/2013US20130248731 Electron beam apparatus and lens array
09/26/2013US20130248710 Cross-section processing and observation apparatus
09/26/2013US20130248709 Defect inspecting apparatus
09/26/2013US20130248708 Cross-section processing and observation method and cross-section processing and observation apparatus
09/26/2013US20130248707 Sample observation method, sample preparation method, and charged particle beam apparatus
09/26/2013US20130248705 Defect inspection apparatus and defect inspection method
09/26/2013US20130248699 Method of Adjusting Transmission Electron Microscope
09/26/2013US20130248357 Glow discharge milling apparatus and glow discharge milling method
09/26/2013US20130248356 Low Energy Ion Beam Etch
09/26/2013US20130248354 High Throughput TEM Preparation Processes and Hardware for Backside Thinning of Cross-Sectional View Lamella
09/26/2013DE102013102776A1 Querschnitts-verarbeitungs- und beobachtungs-verfahren und querschnitts-verarbeitungs- und beobachtungs-einrichtung Cross-section processing and observation procedures and cross-section-processing and observation device
09/26/2013DE102013102774A1 Ionenstrahl-einrichtung Ion beam facility
09/26/2013DE102013102669A1 Proben-Überwachungsverfahren, Proben-Vorbereitungsverfahren und Ladungspartikelstrahl-Vorrichtung Sample monitoring method, sample preparation method and charged particle beam apparatus
09/26/2013DE102013102666A1 Querschnitts-verarbeitungs- und beobachtungs-einrichtung Cross-section processing and observation device
09/26/2013DE102013102535A1 Verbund-ladungspartikelstrahl-vorrichtung Composite charge particle jet device
09/26/2013DE102013004768A1 Verfahren zum Justieren eines Transmissionselektronenmikroskops A method of adjusting a transmission electron microscope
09/26/2013DE102012204425A1 Sputtering coating material on outer surface of tubular target, by passing partial stream of coolant into space between coolant line and target through wall opening, and impressing stream in passage of opening along discharge direction
09/26/2013DE102012102489A1 Sight glass for vacuum treatment apparatus, for optically controlling processes in plant chamber, comprises a glass sheet and an enclosure, and an optical line, where glass sheet is prism, such that optical line is angled at least one time
09/26/2013DE102012102465A1 Telescopic arm for transporting bi-directional translational substrate within vacuum treatment equipment for aircraft engine, has clutches provided inside main tube to move telescopic pipes parallel to thrust units relative to tube
09/25/2013EP2642661A2 System and methods of bimodal automatic power and frequency tuning of RF generators
09/25/2013EP2642513A2 Techniques for processing a substrate
09/25/2013EP2642512A2 Techniques for processing a substrate
09/25/2013EP2642507A2 Method and apparatus for actively monitoring an inductively-coupled plasma ion source using an optical spectrometer
09/25/2013EP2642506A1 Multiple gas injection system
09/25/2013EP2641995A1 Purge valve in a plasma deposition apparatus
09/25/2013EP2641455A1 Microwave icp resonator
09/25/2013EP2641259A1 Improved simultaneous multiple ion implantation process and apparatus semiconductor structure made using same
09/25/2013EP2641258A1 Semiconductor structure made using improved multiple ion implantation process
09/25/2013EP2641257A1 Semiconductor structure made using improved pseudo-simultaneous multiple ion implantation process
09/25/2013EP2641256A1 Sub-nanosecond ion beam pulse radio frequency quadrupole (rfq) linear accelerator system
09/25/2013EP2640865A1 Soft sputtering magnetron system
09/25/2013CN203218218U Ion beam generation chamber and ion implanter
09/25/2013CN103329252A Ion implanter system including remote dopant source, and method comprising same
09/25/2013CN103329240A Charged particle beam apparatus
09/25/2013CN103325652A Substrate processing equipment
09/25/2013CN103325651A Multiple gas injection system
09/25/2013CN103325650A Method and apparatus for actively monitoring inductively-coupled plasma ion source using an optical spectrometer
09/25/2013CN103325649A Bottom-arranged optical fiber coupling transmission electron microscope digital imaging method and device thereof
09/25/2013CN103325648A Ion source device and ion beam generating method
09/25/2013CN103325647A Electronic pulse compression system
09/24/2013US8541755 Electron microscope
09/24/2013CA2496099C Mass spectrometer
09/24/2013CA2496013C Mass spectrometer
09/19/2013WO2013138434A1 Sputtering targets and associated sputtering methods for forming hermetic barrier layers
09/19/2013WO2013137466A1 Charged-particle-beam device, specimen-observation system, and operation program
09/19/2013WO2013137465A1 Charged-particle-beam device, specimen-observation system, and operation program
09/19/2013WO2013136909A1 Soundproof cover for charged-particle beam device, and charged-particle beam device
09/19/2013WO2013136260A1 Universal sample holder
09/19/2013WO2013135265A1 Mini rotatable sputter devices for sputter deposition
09/19/2013WO2013107675A4 Device and method for the plasma treatment of surfaces
09/19/2013US20130245989 Signal processing method and signal processing apparatus
09/19/2013US20130241091 Sample preparation apparatus and sample preparation method
09/19/2013US20130240751 Charged Particle Extraction Device and Method of Design There for
09/19/2013US20130240750 Multi charged particle beam writing apparatus and multi charged particle beam writing method
09/19/2013US20130240731 X-ray detector for electron microscope
09/19/2013US20130240730 Charged particle beam apparatus and sample transporting apparatus
09/19/2013US20130240353 Ion milling device and ion milling processing method
09/19/2013US20130239892 Beam control assembly for ribbon beam of ions for ion implantation
09/19/2013DE112011104347T5 Vorrichtung mit einem geladenen Teilchenstrahl A charged particle beam device with
09/19/2013DE102013102659A1 Proben-Vorbereitungseinrichtung und Proben-Vorbereitungsverfahren Sample preparation device and sample preparation procedures
09/19/2013DE102013102658A1 Ladungspartikelstrahl-Vorrichtung und Proben-Transporteinrichtung Charged particle beam device and sample transport means
09/19/2013DE102013102657A1 Vorrichtung eines fokussierten Ionenstrahls und Verfahren zum Einstellen einer Ionenstrahl-Optik A focused ion beam apparatus and method for adjusting an ion beam optics
09/18/2013EP2639814A1 Charged particle optical equipment and method for measuring lens aberration
09/18/2013EP2639330A1 Method and device for transporting vacuum arc plasma
09/18/2013EP2638562A1 Method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
09/18/2013EP2638561A1 Data path for lithography apparatus
09/18/2013EP2638560A1 Charged particle lithography system with aperture array cooling
09/18/2013EP2638559A1 Charged particle beam modulator
09/18/2013EP2638182A1 Apparatus and method for surface processing
09/18/2013CN203205377U Loading system of plasma etching machine
09/18/2013CN203205376U Disc transmitting system of plasma etching machine
09/18/2013CN203205375U Upper electrode used for etching equipment
09/18/2013CN103314427A Technique and apparatus for monitoring ion mass, energy, and angle in processing systems
09/18/2013CN103314130A Multidirectional racetrack rotary cathode for pvd array applications
09/18/2013CN103313950A Method of treating the surface of a soda lime silica glass substrate, surface-treated glass substrate, and device incorporating the same
09/18/2013CN103311084A Power supplying system for adjusting distribution of electric field of plasma processing cavity
09/18/2013CN103311083A Ion implantation apparatus
09/18/2013CN103311082A Radio frequency matching network and plasma processing chamber applying same
09/18/2013CN103311081A Charged particle beam apparatus and sample transporting apparatus
09/18/2013CN103311080A Focused ion beam apparatus and method of adjusting ion beam optics
09/18/2013CN103308356A Sample preparation apparatus and sample preparation method
09/18/2013CN102386047B Objective lens coil for transmission electron microscope
09/17/2013US8536540 Charged particle beam apparatus and method for stably obtaining charged particle beam image
09/17/2013US8536538 Multiple-pole electrostatic deflector for improving throughput of focused electron beam instruments
09/12/2013WO2013134680A1 System and process for measuring strain in materials at high spatial resolution
09/12/2013WO2013134392A1 Electrical breakdown limiter for a high voltage power supply
09/12/2013WO2013133739A1 Analyser arrangement for particle spectrometer
09/12/2013WO2013133021A1 Scanning-electron-microscope image processing device and scanning method
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