Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2013
11/28/2013US20130316289 Electron Beam Data Storage System and Method for High Volume Manufacturing
11/28/2013US20130316273 Method For Fracturing And Forming A Pattern Using Shaped Beam Charged Particle Beam Lithography
11/28/2013US20130313432 Interference electron microscope
11/28/2013US20130313431 Electron microscope
11/28/2013US20130313430 Charged particle beam device
11/28/2013US20130313429 Method and apparatus for inspecting sample surface
11/28/2013US20130313428 Phase Plate for a TEM
11/28/2013DE102013209313A1 Geladener Teilschenstrahl-Lithographie-Vorrichtung und geladener Teilschenstrahl-Musterschreibverfahren Invited part's beam lithography apparatus and charged part's beam pattern writing process
11/28/2013DE102012110334B3 Planar magnetron, used in vacuum coating system for coating glass plate or planar substrate, comprises magnet assembly comprising backing plate including holders for mounting fixtures and grooves for fixing target, and cooling channel
11/27/2013EP2667400A2 Interference electron microscope
11/27/2013EP2667399A1 Improved phase plate for a TEM
11/27/2013EP2666544A1 Process for deposition and characterization of a coating
11/27/2013EP2666181A1 Plasma treatment device for producing coatings
11/27/2013CN203312251U Sample holder device used in observing ultrathin wafer under scanning electron microscope
11/27/2013CN203312250U Multi-angle tightening type SEM sample bench
11/27/2013CN203312249U Clamping type section and surface sample SEM sample bench
11/27/2013CN103415647A Microwave power delivery system for plasma reactors
11/27/2013CN103413747A Space plasma measuring device
11/27/2013CN103413746A Germanium implanting method for improving service cycle of ion implanter
11/27/2013CN102412108B High-absorption assembled carbon fiber U-shaped groove
11/27/2013CN102368466B Electrode of plasma etcher for carrying out dry etching on hard inorganic material substrate
11/26/2013US8592786 Platen clamping surface monitoring
11/26/2013US8592785 Multi-ion beam implantation apparatus and method
11/26/2013US8592784 Method for modifying a material layer using gas cluster ion beam processing
11/26/2013US8592777 Integrable magnetic field compensation for use in scanning and transmission electron microscopes
11/26/2013US8592764 X-ray detector for electron microscope
11/26/2013US8592762 Method of using a direct electron detector for a TEM
11/26/2013US8592761 Monochromator for charged particle beam apparatus
11/21/2013WO2013172417A1 Microchannel plate
11/21/2013WO2013172365A1 Electron beam application device and electron beam adjustment method
11/21/2013WO2013171229A1 Charged particle lithography system and beam generator
11/21/2013WO2013171216A1 Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method
11/21/2013WO2013171214A1 Charged particle lithography system and beam generator
11/21/2013WO2013171177A1 Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
11/21/2013WO2013171117A1 Modulation device and power supply arrangement
11/21/2013US20130309608 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
11/21/2013US20130309421 Multi-source plasma focused ion beam system
11/21/2013US20130307414 Hybrid plasma reactor
11/21/2013US20130306878 Electrode of electrostatic lens and method of manufacturing the same
11/21/2013US20130306866 Scanning electron microscope
11/21/2013US20130306864 Scanning electron microscope
11/21/2013US20130306863 Element for fast magnetic beam deflection
11/21/2013US20130306862 Automated slice milling for viewing a feature
11/21/2013US20130306240 System and Method for Controlling Plasma With an Adjustable Coupling to Ground Circuit
11/21/2013DE112012000544T5 Elektronenmikroskop Electron microscope
11/21/2013DE102012104224A1 Device for e.g. cleaning high-speed wire, has dielectric small tube portion surrounding channel and arranged in plasma nozzle such that channel is partially electrically insulated against discharge space that is formed within plasma nozzle
11/20/2013EP2665083A2 Scanning microscope having an adaptive scan
11/20/2013EP2665082A1 Element for fast magnetic beam deflection
11/20/2013EP2664962A1 Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method
11/20/2013EP2664690A1 A magnetron sputtering coating device, a nano-multilayer film and the preparation method thereof
11/20/2013EP2415899B1 Lanthanum target for sputtering
11/20/2013EP1885059B1 Electron beam facility for processing material and current adding device for rapid actuation of inductivity and image creation device for an electron beam facility for processing material
11/20/2013EP1728263B1 Method of detecting arc discharges and arc discharge detection device
11/20/2013CN203300611U Dry etching device lower electrode and dry etching device
11/20/2013CN203300592U Novel high density linear plasma experiment device
11/20/2013CN103403837A Microwave plasma reactors and substrates for synthetic diamond manufacture
11/20/2013CN103403836A Semiconductor structure made using improved multiple ion implantation process
11/20/2013CN103403835A Microtome utilizing a movable knife in a retardation field scanning electron microscope and a retardation field scanning electron microscope including the same
11/20/2013CN103403520A Tem sample preparation
11/20/2013CN103400741A Equipment and method applied to ion beam injection doping of solar battery piece
11/20/2013CN103400740A Transmission electron microscope sample rod with testable photoelectric properties and method for building solar battery
11/20/2013CN103397311A PECVD (Plasma Enhanced Chemical Vapor Deposition) flexible solar battery manufacturing equipment
11/20/2013CN102262998B Ion implantation device
11/20/2013CN102194623B Preparation method of transmission electron microscope microgrid
11/20/2013CN102017056B Plasma processing apparatus and method for the plasma processing of substrates
11/20/2013CN101384747B Dual mode ion source for ion implantation
11/19/2013US8586951 Multi charged particle beam writing apparatus and multi charged particle beam writing method
11/19/2013US8586949 Charged particle lithography system with intermediate chamber
11/19/2013US8586944 Electron beam emitter for sterilizing containers
11/19/2013US8586922 Transmission electron microscope and sample observation method
11/19/2013US8586921 Charged-particle microscope providing depth-resolved imagery
11/19/2013US8586920 Charged particle beam apparatus
11/14/2013WO2013169825A1 Non-planar extractor structure for electron source
11/14/2013WO2013169109A1 Adjustable chemical vapour deposition process and reactor
11/14/2013WO2013168488A1 Charged particle beam microscope
11/14/2013WO2013167391A2 Method and apparatus for generating electron beams
11/14/2013US20130302918 Plasma processing apparatus and plasma processing method
11/14/2013US20130299722 Ion implantation method and ion implanter
11/14/2013US20130299715 Charged particle beam device
11/14/2013US20130299714 Charged-particle beam lens
11/14/2013US20130299699 Standard member for calibration and method of manufacturing the same and scanning electron microscope using the same
11/14/2013US20130299698 Electron Microscope with Integrated Detector(s)
11/14/2013US20130299697 Charged particle beam applied apparatus, and irradiation method
11/14/2013US20130299696 Transmission Electron Microscope and Method of Observing TEM Images
11/14/2013US20130299090 Plasma generator, and cleaning and purifying apparatus and small-sized electrical appliance using plasma generator
11/14/2013DE112011103373T5 Szintillations-Detektionseinheit zur Detektion rückgestreuter Elektronen für Elektronen- oder Ionenmikroskope Scintillation detection unit for detecting backscattered electrons for electron or ion microscopes
11/14/2013DE102012110284B3 Sputtering coating device, useful in vacuum coating system, comprises support unit having mounting flange and support section, sputtering magnetrons, and vacuum pump, where support section opens into suction port of mounting flange
11/14/2013DE102012104013A1 Hochvakuumanlage und Verfahren zum Evakuieren High-vacuum system and method for evacuating
11/13/2013EP2662880A2 Electron beam device
11/13/2013EP2662728A1 Lithography system, method of clamping and wafer table
11/13/2013EP2661767A1 Spark detection in coating installations
11/13/2013CN103392218A A microwave plasma reactor for manufacturing synthetic diamond material
11/13/2013CN103392217A A microwave plasma reactor for manufacturing synthetic diamond material
11/13/2013CN103392216A Electron gun and electron beam device
11/13/2013CN101494151B Magnetic control cathode assembly for cleaning one-dimensional linear plasma with high efficiency
11/12/2013US8581219 Composite charged-particle-beam apparatus
11/12/2013US8581216 Manufacturing method of semiconductor device, method for controlling ion beam, and ion implantation apparatus
11/12/2013US8581207 Specimen holder with 3-axis movement for TEM 3D analysis
11/12/2013US8581205 Transmission electron microscope micro-grid
11/12/2013US8581189 Charged particle microscopy imaging method
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