Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/1993
07/08/1993WO1993013541A1 Mass spectroscope
07/08/1993WO1993013240A1 System for depositing superconducting films
07/08/1993WO1993013238A1 Vacuum surface treatment apparatus and method
07/08/1993CA2125180A1 Extended lifetime collimator
07/07/1993EP0550173A1 Integrated circuits
07/07/1993EP0550134A1 Filament clip support
07/07/1993EP0550054A1 Arc suppressor for electron gun
07/07/1993EP0549854A1 Cathode for coating a substrate
07/06/1993US5225740 Method and apparatus for producing high density plasma using whistler mode excitation
07/06/1993US5225684 Charged particle beam exposure apparatus control system and a method of operation for providing a drawing start signal
07/06/1993US5225683 Detachable specimen holder for transmission electron microscope
07/06/1993US5225676 Electrooptical viewing apparatus capable of switching depth of focus
07/06/1993US5225659 Method and apparatus for surface treating an axially symmetric substrate at atmosphere pressure
07/06/1993US5225393 Yttrium oxide, barium oxide, copper oxide
07/06/1993US5225375 Plasma enhanced chemical vapor processing of semiconductor substrates
07/06/1993US5225024 Magnetically enhanced plasma reactor system for semiconductor processing
07/06/1993US5224441 Apparatus for rapid plasma treatments and method
07/01/1993DE4236273A1 Lens for focussing electrons for specimen inspection - has field generated by coils and cone-shaped electrode set into entry section
07/01/1993DE4223091C1 Water cooled holder for inserted exchangeable target - comprises housing, cooling plate and axially freely movable metal bellows, vacuum arc discharge vapour deposition appts.
07/01/1993DE4221361C1 Plasma-supported deposition of thin insulating layers on substrates - buy vaporising insulating material and ionising in plasma of low energetic arc discharge
07/01/1993CA2083911A1 Filament clip support
06/1993
06/30/1993EP0549545A2 Electric arc evaporator
06/30/1993EP0549113A1 Parallel filament electron gun
06/30/1993EP0548899A1 Ion beam analyzing method
06/30/1993EP0548573A2 Electron beam apparatus
06/29/1993US5223719 Mask for use in a charged particle beam apparatus including beam passing sections
06/29/1993US5223713 Scanner for scanning tunneling microscope
06/29/1993US5223457 High-frequency semiconductor wafer processing method using a negative self-bias
06/29/1993US5223112 Removable shutter apparatus for a semiconductor process chamber
06/29/1993US5223111 Device for applying thin layers onto a substrate
06/29/1993US5223109 Ion beam processing method and apparatus
06/29/1993US5223108 Multipassages tapering longitudinally; cathode sputtering
06/29/1993US5222396 Tunnelling acoustic microscope
06/24/1993WO1993012546A1 Semiconductor device and microwave process for its manufacture
06/24/1993WO1993012534A1 Energy analyser
06/24/1993DE4142145A1 Sensor arrangement for electron beam machines - includes coaxial partial current sensor preceding total current sensor
06/24/1993DE4142144A1 Determining the operating states of electron beam machines - by applying check voltages and comparing the response with given function values
06/24/1993DE4142143A1 Determining the parameters of electron beam machine - by means of partial current sensor and pre-calibrated beam deflection
06/23/1993EP0548032A2 Electric arc evaporator
06/23/1993EP0547868A1 Apparatus and method for controlling plasma size and position in plasma-activated chemical vapor deposition processes
06/23/1993EP0547303A1 Suspension system for isolating vibrations
06/23/1993EP0463167A4 Method of making electrode
06/23/1993EP0398995B1 Plasma x-ray tube, in particular for x-ray preionizing of gas lasers, and use as electron gun
06/23/1993CN1021390C Glow-discharge tube for analysis
06/22/1993US5221845 Frictionless linear actuator
06/22/1993US5221844 Charged particle beam device
06/22/1993US5221841 Fast atom beam source
06/22/1993US5221427 Plasma generating device and method of plasma processing
06/22/1993US5221425 Method for reducing foreign matter on a wafer etched in a reactive ion etching process
06/22/1993US5221416 Plasma surface treating method
06/22/1993US5221403 Support table for plate-like body and processing apparatus using the table
06/22/1993US5221349 Vaccum arc vapor deposition device
06/16/1993EP0546852A1 Methods and apparatus for generating a plasma for "downstream" rapid shaping of surfaces of substrates and films
06/16/1993EP0546842A1 Methods and apparatus for confinement of a plasma etch region for precision shaping of surfaces of substances
06/16/1993EP0546305A1 Corpuscular optical analysing and/or processing of material specimen
06/16/1993EP0546293A1 Apparatus for coating a substrate, in particular for electrical insulating layers
06/16/1993EP0546251A2 Cathodic sputtering apparatus
06/16/1993EP0546052A1 Method of enhancing the performance of a magnetron sputtering target
06/16/1993EP0349555B1 High-frequency ion source
06/10/1993WO1993011554A1 Corona discharge ionisation source
06/10/1993WO1993011276A1 Deposition apparatus and methods
06/10/1993WO1993011275A1 Process and device for coating substrate bodies with hard substances
06/10/1993CA2124215A1 Deposition apparatus and methods
06/09/1993EP0545748A1 Device for supplying a voltage to a substrate holder
06/09/1993DE4140158A1 Verfahren und vorrichtung zur hartstoffbeschichtung von substratkoerpern Method and device for hard material coating of substratkoerpern
06/08/1993US5218433 Real time scanning device signal processing circuit including color signal and blanking signal generating circuits
06/08/1993US5218262 Apparatus for retaining an electrode by a magnetically shielded magnet
06/08/1993US5218210 Broad beam flux density control
06/08/1993US5218209 Ion implanter
06/08/1993US5218179 Plasma source arrangement for ion implantation
06/08/1993US5217761 Sheet plasma CVD apparatus
06/08/1993US5217560 A reaction tube is to house semiconductor wafers with high frequency plasma generating electrode unit located outside; purity, uniformity; film forming, etching
06/08/1993CA1318980C Scanning tunnel-current-detecting device and method for detecting tunnel current and scanning tunnelling microscope and recording/reproducing device using thereof
06/02/1993EP0544107A1 Method and apparatus for coating a substrate, in particular for electrical insulating layers
06/02/1993EP0543935A1 Particle beam generator
06/02/1993EP0543931A1 Shielding for arc suppression in rotating magnetron sputtering systems
06/02/1993EP0543844A1 Cantilever mount for rotating cylindrical magnetrons
06/02/1993EP0372061B1 Selective area nucleation and growth method for metal chemical vapor deposition using focused ion beams
06/02/1993CN1072734A Apparatus for rapid plasma treatments and method
06/01/1993US5216690 Electron beam gun with grounded shield to prevent arc down
06/01/1993US5216330 Ion beam gun
06/01/1993US5216329 Device for distributing a microwave energy for exciting a plasma
06/01/1993US5216254 Circuit pattern forming apparatus using mu-stm
06/01/1993US5216253 Ion implantation apparatus with variable width slits providing an ion beam of high purity
06/01/1993US5216241 Reaction gas; platinum filament; ionization of halogen or halide; emitting holes in plate-shaped cathode
06/01/1993US5216235 Opto-mechanical automatic focusing system and method
06/01/1993US5215640 Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
06/01/1993US5215638 Rotating magnetron cathode and method for the use thereof
06/01/1993US5215623 Blanking aperture array and method of producing same
06/01/1993US5215619 Magnetic field-enhanced plasma etch reactor
06/01/1993US5215420 Substrate handling and processing system
05/1993
05/27/1993WO1993010276A1 Method and apparatus for sputter coating employing machine readable indicia carried by target assembly
05/27/1993DE4221930A1 Vacuum deposition chamber - has anode directly near cathode to coat PMMA substrate disc with aluminium@
05/27/1993DE4138794A1 Process and appts. for coating substrate - uses current source connected to cathodes in evacuated coating chamber
05/27/1993DE4138793A1 Process and appts. for coating substrate - uses current source connected to cathodes in evacuated coating chamber
05/27/1993DE4138691A1 Monitoring quality of plasma in plasma reactor or gas discharge laser - using test phase superimposed over excitation voltage to change frequency which is then used to determine electron density and temp. in plasma
05/27/1993DE4138029A1 Cooling of target material in sputtering process - mounting target on plate with formed channel through which cooling fluid is circulated
05/27/1993CA2122720A1 Method and apparatus for sputter coating employing machine readable indicia carried by target assembly
05/26/1993EP0543502A1 Subpicosecond atomic motion detection and signal transmission
05/25/1993US5214291 Pattern forming method