Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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05/25/1993 | US5214290 Electron beam lithography and workpiece supporting apparatus having supporting means for workpiece stage and moving means detachably mounted to cover opening in vacuum chamber |
05/25/1993 | US5214289 Charged particle beam deflector |
05/25/1993 | US5214282 Method and apparatus for processing a minute portion of a specimen |
05/25/1993 | US5213983 Method for the preparation of electronic and electro-optical components and circuits using conductive polymers |
05/25/1993 | US5213672 Magnets in a tubular target, dark space shields and tubular insulators |
05/25/1993 | US5213658 Plasma processing method |
05/25/1993 | US5213301 Suspension system for isolating vibrations |
05/23/1993 | CA2083450A1 Parallel filament electron gun |
05/19/1993 | EP0542560A1 Scanning control system for an ion-implantation apparatus |
05/19/1993 | EP0542094A1 Corpuscular beam test method using voltage control |
05/19/1993 | EP0541919A1 Cathodic sputtering apparatus for coating substrates |
05/19/1993 | EP0541903A1 Cathode for coating a substrate |
05/18/1993 | US5212580 Low cost stage for raster scanning of semiconductor wafers |
05/18/1993 | US5212425 Ion implantation and surface processing method and apparatus |
05/18/1993 | US5212383 Color synthesizing scanning electron microscope |
05/18/1993 | US5211825 Plasma processing apparatus and the method of the same |
05/18/1993 | US5211824 Method and apparatus for sputtering of a liquid |
05/13/1993 | WO1993009561A1 Electron beam exposure method |
05/13/1993 | DE4136655A1 Appts. for coating substrate with electroconductive material - comprises current source connected to cathode in evacuated chamber with target for sputtering |
05/11/1993 | US5210696 Electron beam exposure data processing method, electron beam exposure method and apparatus |
05/11/1993 | US5210466 Plasma processing reactor |
05/11/1993 | US5210426 Electron beam irradiation device and method of manufacturing an electron beam permeable window |
05/11/1993 | US5210424 Cooling means for components in a vacuum chamber |
05/11/1993 | US5210055 Method for the plasma treatment of semiconductor devices |
05/11/1993 | US5209944 Process for coating a substrate using a pulsed laser beam |
05/11/1993 | US5209813 Lithographic apparatus and method |
05/11/1993 | CA2010245C Coaxial cavity type, radiofrequency wave, plasma generating apparatus |
05/11/1993 | CA1317644C Large area microwave plasma apparatus |
05/06/1993 | DE4136297A1 Localised plasma prodn. in treatment chamber - using microwave generator connected to coupling device which passes through the wall of the chamber without using a coupling window |
05/05/1993 | EP0539954A1 Method and apparatus for sputtering of a liquid |
05/05/1993 | EP0539948A2 Apparatus for forming metal film and process for forming metal film |
05/05/1993 | EP0539650A1 Sputtering cathode |
05/04/1993 | US5208644 Interference removal |
05/04/1993 | US5208560 Signal transmission circuit |
05/04/1993 | US5208512 Scanned electron cyclotron resonance plasma source |
05/04/1993 | US5208457 Cesium oxide ion as primary beam |
04/28/1993 | EP0538938A1 Electron beam apparatus |
04/28/1993 | EP0538861A1 Electron microscope specimen holder |
04/28/1993 | EP0538726A2 Process for forming a pattern in a polysilicon layer |
04/28/1993 | EP0538675A1 Electron beam lithography method |
04/28/1993 | EP0538363A1 Slotted cylindrical hollow cathode/magnetron sputtering device. |
04/27/1993 | US5206517 Electron beam lithographic method |
04/27/1993 | US5206516 Low energy, steered ion beam deposition system having high current at low pressure |
04/27/1993 | CA1317035C Method for examining a specimen in a particle beam instrument |
04/27/1993 | CA1316993C Viewing optics for external-mount electron beam welders |
04/22/1993 | DE4132068A1 Optimised lithography for integrated optics - uses rotationally symmetrical write=beam with variable diameter and outwardly increasing intensity |
04/21/1993 | EP0537961A1 Charged particle energy analysers |
04/21/1993 | EP0537950A1 Plasma reactors |
04/20/1993 | US5204272 Disposing bias wire in microwave energized plasma, applying positive voltage during only part of intrinsic layer deposition |
04/20/1993 | US5203981 Vacuum-treatment apparatus |
04/20/1993 | US5203980 Large surface cathode arrangement of uniform consumption |
04/20/1993 | US5203960 Method of operation of electron cyclotron resonance plasma source |
04/20/1993 | US5203959 Microwave plasma etching and deposition method employing first and second magnetic fields |
04/20/1993 | US5203945 Plasma processing apparatus having driving control section |
04/20/1993 | US5203924 Two vacuum vessels, plasma generating means, mesh type electrode, voltage applying means |
04/15/1993 | WO1993007639A1 Process for generating excited neutral particles for etching and separation processes in semiconductor technology |
04/14/1993 | EP0537123A1 Ion generator with ionization chamber constructed from or coated with material with a high coefficient of secondary emission |
04/14/1993 | EP0537012A1 Sputtering processes and apparatus |
04/14/1993 | EP0537011A1 Sputtering apparatus |
04/14/1993 | EP0536150A1 Selective radiation of pathological material |
04/13/1993 | US5202562 High sensitive element analyzing method and apparatus of the same |
04/13/1993 | US5202095 Microwave plasma processor |
04/13/1993 | CA1315920C Method and apparatus for cleaning a long metal substrate, such as a wire, a band, a cord, etc., as well as substrates cleaned according to that method and objects of polymer material reinforced with such substrates |
04/08/1993 | DE4133121A1 Precision focused ion probe for treatment of micro surfaces - has liquid phase emitter located in housing and accurately positioned relative to surface of specimen |
04/07/1993 | EP0535568A1 Metal strip surface cleaning apparatus |
04/07/1993 | EP0535054A1 Metallizing apparatus |
04/07/1993 | EP0534935A1 Method and apparatus for generating particle beams |
04/06/1993 | USRE34214 Method and apparatus for microphotometering microscope specimens |
04/06/1993 | US5200618 The atomic environment of the surface of a sample |
04/06/1993 | US5200616 Environment controllable scanning probe microscope |
04/06/1993 | US5200232 Maintaining the line of sight surface of plasma shield and surrounding area at a constant temperature |
04/06/1993 | US5200049 Cantilever mount for rotating cylindrical magnetrons |
04/06/1993 | US5200023 In situ etching of multilayer |
04/06/1993 | US5200017 Sample processing method and apparatus |
04/06/1993 | CA1315898C Scanning tunneling microscope and surface topographic observation method |
04/01/1993 | WO1993006258A1 Apparatus for rapid plasma treatments and method |
03/31/1993 | EP0534737A1 Ion beam profiling method and apparatus |
03/31/1993 | EP0534404A1 Electron beam lithography apparatus |
03/31/1993 | EP0534066A1 Arc discharge coating apparatus with auxiliary ionization anode |
03/31/1993 | CN1070535A Process and apparatus for ignition of CVD plasmas |
03/30/1993 | US5198725 Method of producing flat ecr layer in microwave plasma device and apparatus therefor |
03/30/1993 | US5198724 Plasma processing method and plasma generating device |
03/30/1993 | US5198718 Filamentless ion source for thin film processing and surface modification |
03/30/1993 | US5198676 Ion beam profiling method and apparatus |
03/30/1993 | US5198675 Backscattered electron detector for an electron beam apparatus |
03/30/1993 | US5198668 Automatic focusing apparatus for scanning electron microscope |
03/30/1993 | US5198090 Sputtering apparatus for producing thin films of material |
03/30/1993 | US5198072 Comparing a change in the impedance of the substrate |
03/24/1993 | EP0533330A1 A scanning microscope and a method of operating such a scanning microscope |
03/23/1993 | US5196707 Low aberration field emission electron gun |
03/23/1993 | US5196706 Extractor and deceleration lens for ion beam deposition apparatus |
03/23/1993 | US5196670 Magnetic plasma producing device with adjustable resonance plane |
03/23/1993 | US5196273 Tantalum carbide composite materials |
03/23/1993 | US5196105 System for coating substrates with magnetron cathodes |
03/18/1993 | WO1993005630A1 Harmonic and subharmonic isolator for plasma discharge |
03/18/1993 | WO1993005530A1 Production of fine points on a substrate |
03/18/1993 | WO1993005529A1 Magnetic electron lens and electron microscope using same |
03/17/1993 | EP0532411A1 Electron cyclotron resonance ion source with coaxial injection of electromagnetic waves |
03/17/1993 | EP0532283A1 An ion implantation apparatus |
03/17/1993 | EP0531779A1 X-ray mask containing a cantilevered tip for gap control and alignment |