Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
05/1993
05/25/1993US5214290 Electron beam lithography and workpiece supporting apparatus having supporting means for workpiece stage and moving means detachably mounted to cover opening in vacuum chamber
05/25/1993US5214289 Charged particle beam deflector
05/25/1993US5214282 Method and apparatus for processing a minute portion of a specimen
05/25/1993US5213983 Method for the preparation of electronic and electro-optical components and circuits using conductive polymers
05/25/1993US5213672 Magnets in a tubular target, dark space shields and tubular insulators
05/25/1993US5213658 Plasma processing method
05/25/1993US5213301 Suspension system for isolating vibrations
05/23/1993CA2083450A1 Parallel filament electron gun
05/19/1993EP0542560A1 Scanning control system for an ion-implantation apparatus
05/19/1993EP0542094A1 Corpuscular beam test method using voltage control
05/19/1993EP0541919A1 Cathodic sputtering apparatus for coating substrates
05/19/1993EP0541903A1 Cathode for coating a substrate
05/18/1993US5212580 Low cost stage for raster scanning of semiconductor wafers
05/18/1993US5212425 Ion implantation and surface processing method and apparatus
05/18/1993US5212383 Color synthesizing scanning electron microscope
05/18/1993US5211825 Plasma processing apparatus and the method of the same
05/18/1993US5211824 Method and apparatus for sputtering of a liquid
05/13/1993WO1993009561A1 Electron beam exposure method
05/13/1993DE4136655A1 Appts. for coating substrate with electroconductive material - comprises current source connected to cathode in evacuated chamber with target for sputtering
05/11/1993US5210696 Electron beam exposure data processing method, electron beam exposure method and apparatus
05/11/1993US5210466 Plasma processing reactor
05/11/1993US5210426 Electron beam irradiation device and method of manufacturing an electron beam permeable window
05/11/1993US5210424 Cooling means for components in a vacuum chamber
05/11/1993US5210055 Method for the plasma treatment of semiconductor devices
05/11/1993US5209944 Process for coating a substrate using a pulsed laser beam
05/11/1993US5209813 Lithographic apparatus and method
05/11/1993CA2010245C Coaxial cavity type, radiofrequency wave, plasma generating apparatus
05/11/1993CA1317644C Large area microwave plasma apparatus
05/06/1993DE4136297A1 Localised plasma prodn. in treatment chamber - using microwave generator connected to coupling device which passes through the wall of the chamber without using a coupling window
05/05/1993EP0539954A1 Method and apparatus for sputtering of a liquid
05/05/1993EP0539948A2 Apparatus for forming metal film and process for forming metal film
05/05/1993EP0539650A1 Sputtering cathode
05/04/1993US5208644 Interference removal
05/04/1993US5208560 Signal transmission circuit
05/04/1993US5208512 Scanned electron cyclotron resonance plasma source
05/04/1993US5208457 Cesium oxide ion as primary beam
04/1993
04/28/1993EP0538938A1 Electron beam apparatus
04/28/1993EP0538861A1 Electron microscope specimen holder
04/28/1993EP0538726A2 Process for forming a pattern in a polysilicon layer
04/28/1993EP0538675A1 Electron beam lithography method
04/28/1993EP0538363A1 Slotted cylindrical hollow cathode/magnetron sputtering device.
04/27/1993US5206517 Electron beam lithographic method
04/27/1993US5206516 Low energy, steered ion beam deposition system having high current at low pressure
04/27/1993CA1317035C Method for examining a specimen in a particle beam instrument
04/27/1993CA1316993C Viewing optics for external-mount electron beam welders
04/22/1993DE4132068A1 Optimised lithography for integrated optics - uses rotationally symmetrical write=beam with variable diameter and outwardly increasing intensity
04/21/1993EP0537961A1 Charged particle energy analysers
04/21/1993EP0537950A1 Plasma reactors
04/20/1993US5204272 Disposing bias wire in microwave energized plasma, applying positive voltage during only part of intrinsic layer deposition
04/20/1993US5203981 Vacuum-treatment apparatus
04/20/1993US5203980 Large surface cathode arrangement of uniform consumption
04/20/1993US5203960 Method of operation of electron cyclotron resonance plasma source
04/20/1993US5203959 Microwave plasma etching and deposition method employing first and second magnetic fields
04/20/1993US5203945 Plasma processing apparatus having driving control section
04/20/1993US5203924 Two vacuum vessels, plasma generating means, mesh type electrode, voltage applying means
04/15/1993WO1993007639A1 Process for generating excited neutral particles for etching and separation processes in semiconductor technology
04/14/1993EP0537123A1 Ion generator with ionization chamber constructed from or coated with material with a high coefficient of secondary emission
04/14/1993EP0537012A1 Sputtering processes and apparatus
04/14/1993EP0537011A1 Sputtering apparatus
04/14/1993EP0536150A1 Selective radiation of pathological material
04/13/1993US5202562 High sensitive element analyzing method and apparatus of the same
04/13/1993US5202095 Microwave plasma processor
04/13/1993CA1315920C Method and apparatus for cleaning a long metal substrate, such as a wire, a band, a cord, etc., as well as substrates cleaned according to that method and objects of polymer material reinforced with such substrates
04/08/1993DE4133121A1 Precision focused ion probe for treatment of micro surfaces - has liquid phase emitter located in housing and accurately positioned relative to surface of specimen
04/07/1993EP0535568A1 Metal strip surface cleaning apparatus
04/07/1993EP0535054A1 Metallizing apparatus
04/07/1993EP0534935A1 Method and apparatus for generating particle beams
04/06/1993USRE34214 Method and apparatus for microphotometering microscope specimens
04/06/1993US5200618 The atomic environment of the surface of a sample
04/06/1993US5200616 Environment controllable scanning probe microscope
04/06/1993US5200232 Maintaining the line of sight surface of plasma shield and surrounding area at a constant temperature
04/06/1993US5200049 Cantilever mount for rotating cylindrical magnetrons
04/06/1993US5200023 In situ etching of multilayer
04/06/1993US5200017 Sample processing method and apparatus
04/06/1993CA1315898C Scanning tunneling microscope and surface topographic observation method
04/01/1993WO1993006258A1 Apparatus for rapid plasma treatments and method
03/1993
03/31/1993EP0534737A1 Ion beam profiling method and apparatus
03/31/1993EP0534404A1 Electron beam lithography apparatus
03/31/1993EP0534066A1 Arc discharge coating apparatus with auxiliary ionization anode
03/31/1993CN1070535A Process and apparatus for ignition of CVD plasmas
03/30/1993US5198725 Method of producing flat ecr layer in microwave plasma device and apparatus therefor
03/30/1993US5198724 Plasma processing method and plasma generating device
03/30/1993US5198718 Filamentless ion source for thin film processing and surface modification
03/30/1993US5198676 Ion beam profiling method and apparatus
03/30/1993US5198675 Backscattered electron detector for an electron beam apparatus
03/30/1993US5198668 Automatic focusing apparatus for scanning electron microscope
03/30/1993US5198090 Sputtering apparatus for producing thin films of material
03/30/1993US5198072 Comparing a change in the impedance of the substrate
03/24/1993EP0533330A1 A scanning microscope and a method of operating such a scanning microscope
03/23/1993US5196707 Low aberration field emission electron gun
03/23/1993US5196706 Extractor and deceleration lens for ion beam deposition apparatus
03/23/1993US5196670 Magnetic plasma producing device with adjustable resonance plane
03/23/1993US5196273 Tantalum carbide composite materials
03/23/1993US5196105 System for coating substrates with magnetron cathodes
03/18/1993WO1993005630A1 Harmonic and subharmonic isolator for plasma discharge
03/18/1993WO1993005530A1 Production of fine points on a substrate
03/18/1993WO1993005529A1 Magnetic electron lens and electron microscope using same
03/17/1993EP0532411A1 Electron cyclotron resonance ion source with coaxial injection of electromagnetic waves
03/17/1993EP0532283A1 An ion implantation apparatus
03/17/1993EP0531779A1 X-ray mask containing a cantilevered tip for gap control and alignment