| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/07/1993 | US5242561 Semiconductors |
| 09/07/1993 | US5242541 Method of producing ultrafine silicon tips for the afm/stm profilometry |
| 09/07/1993 | US5242539 Plasma treatment method and apparatus |
| 09/02/1993 | WO1993017445A1 Producing magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions |
| 09/01/1993 | EP0558327A1 Method and apparatus for non-contact plasma polishing and smoothing of uniformly thinned substrates |
| 09/01/1993 | EP0558296A1 Linear accelerator with improved input cavity structure |
| 09/01/1993 | EP0558238A1 Method and apparatus for removal of subsurface damage in semiconductor materials by plasma etching |
| 09/01/1993 | CN1075827A Device for coupling microwave energy |
| 08/31/1993 | US5241245 Optimized helical resonator for plasma processing |
| 08/31/1993 | US5241185 Proximity correction method for e-beam lithography |
| 08/31/1993 | US5241182 Precision electrostatic lens system and method of manufacture |
| 08/31/1993 | US5241176 Scanning electron beam microscope with high resolution at low accelerating voltage |
| 08/31/1993 | US5241152 Circuit for detecting and diverting an electrical arc in a glow discharge apparatus |
| 08/31/1993 | US5240584 Apparatus for the reactive coating of a substrate |
| 08/31/1993 | US5240583 Apparatus to deposit multilayer films |
| 08/31/1993 | US5240046 Fluid flow control method and apparatus for minimizing particle contamination |
| 08/31/1993 | US5239863 Cantilever stylus for use in an atomic force microscope and method of making same |
| 08/31/1993 | CA1321772C Apparatus for the application of thin layers to a substrate by means of cathode sputtering |
| 08/26/1993 | DE4204900A1 Electron beam machine - with the transformer located in the high-vacuum space behind the beam generator |
| 08/25/1993 | EP0557067A1 Broad beam flux density control |
| 08/25/1993 | CN1021886C Method and system for vapor extraction from gases |
| 08/24/1993 | US5238858 Ion implantation method |
| 08/24/1993 | US5238532 Method and apparatus for removal of subsurface damage in semiconductor materials by plasma etching |
| 08/19/1993 | WO1993016213A1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions |
| 08/19/1993 | DE4204512A1 Electron optical correction system for lenses of electron microscope - has series of electric or magnetic and electromagnetic quadrupole elements located in optical path in astigmatic intermediate images. |
| 08/18/1993 | EP0556043A1 Apparatus for programmed plasma etching tool motion to modify solid layer thickness profiles |
| 08/18/1993 | EP0555911A1 Method of reducing a spatial spread within an electron beam, and an electron beam apparatus suitable for carrying out such a method |
| 08/18/1993 | EP0555519A1 Vacuum-coating apparatus |
| 08/18/1993 | EP0555492A1 Magnetic electron lens and electron microscope using same |
| 08/18/1993 | EP0555339A1 Magnetron sputter coating method and apparatus with rotating magnet cathode |
| 08/18/1993 | CN1075341A Vertical metal industrial ion implantation machine of strong current |
| 08/17/1993 | US5237493 Current-to-voltage converter with low noise, wide bandwidth and high dynamic range |
| 08/17/1993 | US5237238 Adjusting device for microscopic movements |
| 08/17/1993 | US5237152 Apparatus for thin-coating processes for treating substrates of great surface area |
| 08/17/1993 | US5236556 Plasma apparatus |
| 08/17/1993 | US5236512 Waste oxidation with reactive gas and removal; handles |
| 08/17/1993 | US5236159 Filament clip support |
| 08/11/1993 | EP0554552A1 Process and device for evaporating materials in a vacuum vessel |
| 08/11/1993 | EP0554360A1 Rotating magnetron incorporating a removable cathode |
| 08/11/1993 | EP0368945B1 Viewing optics for external-mount electron beam welders |
| 08/10/1993 | US5235188 Charged particle beam device |
| 08/10/1993 | US5235187 Methods of fabricating integrated, aligned tunneling tip pairs |
| 08/10/1993 | US5234565 Microwave plasma source |
| 08/10/1993 | US5234560 Substrate-holding space bounded by a multipolar magnetic fields lines of force where interaction of the glow discharge form a homogeneous plasma; vacculum deposition; protective titanium nitride metal coatings |
| 08/10/1993 | US5234529 Plasma generating apparatus employing capacitive shielding and process for using such apparatus |
| 08/10/1993 | US5234526 Window for microwave plasma processing device |
| 08/10/1993 | CA1321229C Electron cyclotron resonance ion source |
| 08/05/1993 | DE4202734A1 Radiation source esp. for radiation-induced etching and CVD installations - comprises adjustable spectrum obtd. by system parameter variation |
| 08/04/1993 | EP0554039A1 Method and apparatus for generating plasma, and semiconductor processing methods |
| 08/04/1993 | EP0553704A1 Radio frequency induction plasma processing system utilizing a uniform field coil |
| 08/04/1993 | EP0553410A1 Apparatus for coating a substrate, especially with nonconductive layers |
| 08/03/1993 | USRE34331 Feedback control for scanning tunnel microscopes |
| 08/03/1993 | US5233196 Electron beam apparatus and method for driving the same |
| 08/03/1993 | US5233192 Method for autotuning of an electron microscope, and an electron microscope suitable for carrying out such a method |
| 08/03/1993 | US5233191 Method and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production process |
| 08/03/1993 | US5232572 Device for the releasable fastening of a target or target base on a cathode mounting |
| 08/03/1993 | US5232569 Circularly symmetric, large-area, high-deposition-rate sputtering apparatus for the coating of disk substrates |
| 08/03/1993 | US5232537 Dry etching apparatus |
| 08/03/1993 | US5232507 Apparatus for forming deposited films with microwave plasma CVD method |
| 07/29/1993 | DE4202211A1 Sputter installation - has at least one magnetron cathode and an electrically insulated screen limiting plasma propagation |
| 07/29/1993 | DE4201551A1 Sputtering cathode - includes electrically floating dark-space screen to prevent target contamination |
| 07/29/1993 | DE4143135A1 Cathode for vapour deposition coating of a substrate |
| 07/28/1993 | EP0552700A1 Mechanically stable field emission gun |
| 07/28/1993 | EP0552648A1 Method of and apparatus for forming a multi-layer film |
| 07/28/1993 | EP0552547A1 Diamond films |
| 07/28/1993 | EP0552535A1 Improved method of and apparatus for shielding electron and other particle beam accelerators |
| 07/28/1993 | EP0552491A1 Plasma etch process |
| 07/28/1993 | EP0552490A1 Process for etching an oxide layer over a nitride |
| 07/28/1993 | CN1074715A Arc-sowrce-multi-ion beam material surface modification tecbnique |
| 07/27/1993 | US5231334 Plasma source and method of manufacturing |
| 07/27/1993 | US5231287 Method and apparatus for obtaining two-dimensional energy image, using charged-particle beam |
| 07/27/1993 | US5230784 Microwave plasma source |
| 07/27/1993 | US5230740 Apparatus for controlling plasma size and position in plasma-activated chemical vapor deposition processes comprising rotating dielectric |
| 07/27/1993 | CA1320741C Apparatus for retaining wafers |
| 07/25/1993 | CA2086976A1 Mechanically stable field emission gun |
| 07/22/1993 | WO1993014513A1 Radio-frequency ion source |
| 07/22/1993 | WO1993014250A2 Process for surface treatment with ions |
| 07/22/1993 | WO1993014240A1 Process for ionising thermally generated material vapours and device for implementing it |
| 07/22/1993 | WO1993014239A1 Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating |
| 07/22/1993 | DE3844821C2 Micromanipulator for raster tunnel microscope |
| 07/22/1993 | CA2080976A1 Method of and apparatus for shielding electron and other particle beam accelerators |
| 07/21/1993 | EP0551856A1 Probe for a scanning tunneling microscope and method of manufacturing a probe |
| 07/20/1993 | US5229615 End station for a parallel beam ion implanter |
| 07/20/1993 | US5229607 Combination apparatus having a scanning electron microscope therein |
| 07/20/1993 | US5229570 Method of an apparatus for a centering of an electron beam |
| 07/20/1993 | US5229358 Sputtering, reacting superconductive materials |
| 07/20/1993 | US5228968 Cathode sputtering system with axial gas distribution |
| 07/20/1993 | US5228963 Localized plasma within hollow cylindrical target uniformly sputters material onto filament |
| 07/20/1993 | US5228940 Fine pattern forming apparatus |
| 07/20/1993 | US5228939 Single wafer plasma etching system |
| 07/20/1993 | US5228501 Physical vapor deposition clamping mechanism and heater/cooler |
| 07/20/1993 | CA2010414C Electron beam direct printing apparatus |
| 07/15/1993 | DE4200429A1 Verfahren zur ionisation thermisch erzeugter materialdaempfe und vorrichtung zur durchfuehrung des verfahrens A method for ionization of thermally generated materialdaempfe and apparatus for performing the method |
| 07/13/1993 | US5228052 Plasma ashing apparatus |
| 07/13/1993 | US5227700 Electron accelerator |
| 07/13/1993 | US5227695 Device for coupling microwave energy with an exciter and for distributing it therealong for the purpose of producing a plasma |
| 07/13/1993 | US5227630 Method and apparatus for imaging of an atomic environment |
| 07/13/1993 | US5227626 Lithography apparatus using scanning tunneling microscopy |
| 07/13/1993 | US5226967 Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber |
| 07/08/1993 | WO1993013542A1 Extended lifetime collimator |