| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/26/1993 | US5256881 Mask and charged particle beam exposure method using the mask |
| 10/26/1993 | US5256877 Method and apparatus for imaging dislocations in materials using a scanning electron microscope |
| 10/26/1993 | US5256876 Scanning tunnel microscope equipped with scanning electron microscope |
| 10/26/1993 | US5256483 Glow discharges |
| 10/26/1993 | US5256454 Method for suppression of electrification |
| 10/20/1993 | EP0566220A2 Magnetic field enhanced plasma etch reactor |
| 10/20/1993 | EP0566143A1 Apparatus and method for generating plasma |
| 10/20/1993 | EP0565960A1 Plasma source and method of manufacturing |
| 10/19/1993 | US5254911 Parallel filament electron gun |
| 10/19/1993 | US5254857 Fast scanning electron microscope (FSEM) |
| 10/19/1993 | US5254856 Charged particle beam apparatus having particular electrostatic objective lens and vacuum pump systems |
| 10/19/1993 | US5254830 System for removing material from semiconductor wafers using a contained plasma |
| 10/19/1993 | US5254438 Single pass compensation for electron beam proximity effect |
| 10/19/1993 | US5254417 Reflection mask and electrically charged beam exposing apparatus using the reflection mask |
| 10/19/1993 | US5254237 Plasma arc apparatus for producing diamond semiconductor devices |
| 10/19/1993 | US5254236 Sputtering apparatus |
| 10/19/1993 | US5254216 Oxygen scavenging in a plasma reactor |
| 10/19/1993 | US5254171 Bias ECR plasma CVD apparatus comprising susceptor, clamp, and chamber wall heating and cooling means |
| 10/19/1993 | US5253515 Atomic probe microscope and cantilever unit for use in the microscope |
| 10/14/1993 | DE4312084A1 HV power supply with voltage peak limiting network - coacts with two input lines, with capacitor coupled to one input line, and line between resistor and diode |
| 10/14/1993 | DE4227296C1 Anode for HF supported DC glow discharge - forms anode from coil and capacitor plate series resonant circuit, with plate consisting of electrically conducting container wall and insulation layer. |
| 10/14/1993 | DE4211798A1 Vacuum vapour deposition equipment for coating substrates - with several magnetron cathode sets, each comprising a magnet pair, a screened target and aperture for a substrate |
| 10/13/1993 | EP0565259A1 Method and apparatus for producing variable spatial frequency control in plasma assisted chemical etching |
| 10/13/1993 | EP0565227A1 Scanning force microscope |
| 10/13/1993 | EP0565089A1 Ion implanting apparatus |
| 10/13/1993 | EP0565069A1 Adjustable diaphragm and manufacturing process |
| 10/13/1993 | EP0564789A1 Process for treatment of workpieces in a vacuum processing apparatus |
| 10/12/1993 | US5252892 Plasma processing apparatus |
| 10/12/1993 | US5252884 Translation device |
| 10/12/1993 | US5252194 Rotating sputtering apparatus for selected erosion |
| 10/12/1993 | US5252178 Multi-zone plasma processing method and apparatus |
| 10/07/1993 | DE4310286A1 Plasma chemical vapour deposition - by passing reactive gas through plasma in form of thin strip to react with working gas |
| 10/07/1993 | DE4228499C1 Plasma-aided coating of substrates - with a low-voltage arc discharge between a cathode and an anodic electrode |
| 10/06/1993 | EP0564438A1 Particle imaging system, in particular ion optical imaging system |
| 10/06/1993 | EP0564359A1 Microwave applicator and plasma reactor using the same |
| 10/06/1993 | EP0564088A1 Scanning force microscope with integrated optics and cantilever mount |
| 10/06/1993 | EP0564082A1 Plasma processing apparatus for generating uniform strip-shaped plasma |
| 10/06/1993 | EP0564008A2 Improvements in and relating to charged particle beam scanning apparatus |
| 10/06/1993 | EP0563899A1 Plasma generating method and plasma generating apparatus using said method |
| 10/06/1993 | EP0563736A1 Process and apparatus for the continuous surface treatment of wire rods with metallic surface |
| 10/06/1993 | EP0563735A1 Corrosion resistant composite wire and process for its manufacture |
| 10/06/1993 | EP0563609A1 Device for producing plasma using cathodic sputtering and microwave radiation |
| 10/06/1993 | EP0563500A1 Source for intense coherent electron pulses |
| 10/05/1993 | US5251140 E-beam control data compaction system and method |
| 10/05/1993 | US5250983 Photo reticle for fabricating a semiconductor device |
| 10/05/1993 | US5250897 Solenoid/slug gap measurement tool for semiconductor equipment and method of measurement |
| 10/05/1993 | US5250812 Electron beam lithography using an aperture having an array of repeated unit patterns |
| 10/05/1993 | US5250808 Integrated electron optical/differential pumping/imaging signal system for an environmental scanning electron microscope |
| 10/05/1993 | US5250780 Apparatus for treating the surface of workpieces by means of a plasma torch |
| 10/05/1993 | US5250779 Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field |
| 10/05/1993 | US5250328 Process and apparatus for plasma CVD coating or plasma treating substrates |
| 10/05/1993 | US5250165 Controlled isotropy reactive ion etcher for multi-stepped sloped contact etch process |
| 10/01/1993 | CA2093036A1 Corrosion-resistant composite wire and method for manufacturing same |
| 10/01/1993 | CA2093035A1 Method and device for continuous surface treatment of bar-shaped elongated materials having a metal surface |
| 09/30/1993 | WO1993019573A1 Method and apparatus for producing high density plasma using whistler mode excitation |
| 09/30/1993 | WO1993019572A1 Process for accelerting electrically charged particles |
| 09/30/1993 | WO1993019571A1 System for characterizing ac properties of a processing plasma |
| 09/30/1993 | WO1993019221A1 Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile |
| 09/30/1993 | DE4208764A1 Verfahren zum Erzeugen eines Teilchenstrahls sowie ein Teilchenbeschleuniger zur Durchführung des Verfahrens A method for generating a particle beam, and a particle accelerator for performing the method |
| 09/30/1993 | CA2109588A1 Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile |
| 09/29/1993 | EP0562035A1 Minimization of particle generation in cvd reactors and methods |
| 09/29/1993 | CA2092599A1 Arrangement for generating a plasma by means of cathode sputtering and microwave irradiation |
| 09/28/1993 | US5249094 Pulsed-DC ionizer |
| 09/28/1993 | US5248912 Integrated scanning tunneling microscope |
| 09/28/1993 | US5248886 Processing system |
| 09/28/1993 | US5248402 Apple-shaped magnetron for sputtering system |
| 09/28/1993 | US5248371 Hollow-anode glow discharge apparatus |
| 09/28/1993 | US5248370 Apparatus for heating and cooling semiconductor wafers in semiconductor wafer processing equipment |
| 09/22/1993 | EP0561584A1 A scanning electron microscope and method for controlling a scanning electron microscope |
| 09/22/1993 | EP0561402A1 Method and apparatus for dry etching |
| 09/22/1993 | EP0423154B1 Method and apparatus for the examination of structures on membrane surfaces |
| 09/21/1993 | US5247588 Method of image restoration |
| 09/21/1993 | US5247181 Ion beam processing apparatus and specimen replacing method for the same |
| 09/21/1993 | US5246532 Plasma processing apparatus |
| 09/21/1993 | US5246529 Etching workpiece; evacuation, flowing hydrogen bromide, radiating light, applying high frequency power across electrodes |
| 09/21/1993 | CA2002187C Probe unit, driving method thereof, and scanning device for detecting tunnel current having said probe unit |
| 09/16/1993 | WO1993018539A1 A circularly symmetric, large-area, high-deposition-rate sputtering apparatus for the coating of disk substrates |
| 09/16/1993 | WO1993018538A1 Electron beam gun with grounded shield to prevent arc down |
| 09/16/1993 | WO1993018537A1 Laser desorption ionization mass monitor (ldim) |
| 09/16/1993 | WO1993018525A1 Scanning probe microscope |
| 09/16/1993 | WO1993018201A1 Plasma implantation process and equipment |
| 09/16/1993 | DE4208484A1 Magnetic deflection system for high-power electron beam - incorporates rotationally symmetric diverging yoke |
| 09/16/1993 | DE4208102A1 Object investigation structure for scanning-probe microscopy - is mfd. by lithographic lift-off process and comprises substrate with surface relief for orientating by naked eye |
| 09/15/1993 | EP0560742A1 Plasma generator and associated ionization method |
| 09/15/1993 | EP0560526A1 Method and apparatus for carrying out surface treatment |
| 09/14/1993 | US5245250 Method for controlling a charged particle beam |
| 09/14/1993 | US5245194 Electron beam exposure system having an electrostatic deflector wherein an electrostatic charge-up is eliminated |
| 09/14/1993 | US5245157 Microwave plasma processing or semiconductor devices |
| 09/14/1993 | US5244556 Method for depositing thin film on substrate by sputtering process |
| 09/14/1993 | CA1322228C High capacity electron beam cold hearth furnace |
| 09/08/1993 | EP0559360A1 End station for a parallel beam ion implanter |
| 09/08/1993 | EP0559359A1 Ion beam implanter for providing cross plane focusing |
| 09/08/1993 | EP0559233A1 Apparatus and method for etching semiconductor wafer |
| 09/08/1993 | EP0558797A1 Cathodic sputtering device |
| 09/08/1993 | EP0558604A1 Anode structures for magnetron sputtering apparatus |
| 09/08/1993 | EP0543931A4 Shielding for arc suppression in rotating magnetron sputtering systems |
| 09/07/1993 | US5243259 Microwave plasma processing apparatus |
| 09/07/1993 | US5243191 Electron microscope |
| 09/07/1993 | US5243189 Ion neutralizer |
| 09/07/1993 | US5242566 Planar magnetron sputtering source enabling a controlled sputtering profile out to the target perimeter |