Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/1993
12/21/1993US5272735 Sputtering process burnable poison coating
12/21/1993US5272417 Device for plasma process
12/21/1993US5272412 Method for the production of extraction grids for ion generation and grids produced according to said method
12/21/1993US5272347 Apparatus for adjusting a focal position of an electron beam and electron beam projection apparatus including the same
12/21/1993US5272338 For analysis/imaging of specific chemical species on a surface of a sample
12/21/1993US5271817 Design for sputter targets to reduce defects in refractory metal films
12/21/1993US5271788 Plasma processing apparatus
12/15/1993EP0574178A2 Dry process coating method and apparatus therefor
12/15/1993EP0574100A2 Plasma CVD method and apparatus therefor
12/15/1993EP0573915A1 Electrode plate and jig for use in plasma etching
12/15/1993EP0573891A1 Charged particle beam apparatus and method of operating it
12/15/1993EP0573421A1 Installation for the study or transformation of sample surfaces in a vacuum or controlled atmosphere.
12/14/1993US5270611 Electric discharge element
12/14/1993US5270552 Method for separating specimen and method for analyzing the specimen separated by the specimen separating method
12/14/1993US5270544 Energy-dispersive X-ray detector
12/14/1993US5269899 Cathode assembly for cathodic sputtering apparatus
12/14/1993US5269896 Cathodic arc deposition system
12/14/1993US5269894 Method of mounting a target plate to be cooled into a vacuum process chamber, an arrangement of a target plate, a target plate and a vacuum chamber
12/14/1993US5269881 Plasma processing apparatus and plasma cleaning method
12/14/1993US5269403 Sputtering target assembly for a sputter coating apparatus
12/13/1993CA2098162A1 Electrode plate and jig for use in plasma etching
12/09/1993WO1993024674A1 Improved planar magnetron sputtering magnet assembly
12/09/1993DE4218196A1 Installation for surface treatment of components by low-pressure plasma - with the low-pressure container sealed by the component undergoing treatment
12/08/1993EP0573101A1 Ion selective electrode and method of manufacture
12/08/1993EP0572972A1 Probe for scanning tunneling microscope and manufacturing method thereof
12/07/1993US5268579 Electron beam apparatus for examining an object
12/07/1993US5268573 System for detecting threshold phenomena associated with and/or atomic or molecular spectra of a substance
12/07/1993US5268258 Sensitization to electron beam; placing in vacuum; scanning with electron beams; forming pattern
12/07/1993US5268200 Carbon coating
12/07/1993US5268056 Plasma surface treating method and apparatus
12/07/1993US5267607 Substrate processing apparatus
12/07/1993US5267471 Double cantilever sensor for atomic force microscope
12/02/1993DE4310941A1 Vacuum treatment chamber - with a low voltage discharge with arcing on treatment chamber walls prevented
12/02/1993DE4221360C1 Verfahren zur Regelung einer Glühkatodenglimmentladung Method for controlling a Glühkatodenglimmentladung
12/02/1993DE4217900A1 Arrangement of microwave-transparent pane in hollow waveguide - the pane being glued to part attached to the vacuum chamber
12/02/1993DE4217684A1 Specific movement path influencing of charged particles within plasma - using potential distribution of plasma and with plasma chamber having facilities for producing plasma, and setting shape of equipotential surface by corresp. chamber shape
12/01/1993EP0571727A1 Apparatus and method for focussed ion beam deposition by controlling beam parameters
11/1993
11/30/1993US5266809 Imaging electron-optical apparatus
11/30/1993US5266802 Electron microscope
11/30/1993US5266364 Method and apparatus for controlling plasma processing
11/30/1993US5266363 Plasma processing method utilizing a microwave and a magnetic field at high pressure
11/30/1993US5266178 Sputtering cathode
11/30/1993US5266154 Improving gate insulation film selectivity
11/30/1993US5266153 Gas distribution head for plasma deposition and etch systems
11/30/1993US5266146 Microwave-powered plasma-generating apparatus and method
11/25/1993WO1993023978A1 Process apparatus
11/25/1993WO1993023874A1 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window
11/25/1993WO1993023872A1 Method and apparatus for mass analysis using slow monochromatic electrons
11/25/1993WO1993023871A1 Resolving slit assembly and method of ion implantation
11/25/1993WO1993023870A1 Apparatus and methods for use in producing ions by gaseous discharge
11/25/1993WO1993023869A1 Apparatus for and method of producing ions
11/25/1993WO1993023868A1 Apparatus for and method of generating a plasma
11/25/1993WO1993023587A1 Process and device for applying pulses on the surface of a solid body
11/25/1993DE4216730A1 Scanning electron beam appts. esp. electron beam test device or scanning electron microscope - has deflector for secondary electron beam in form of electrostatic mirror and detects secondary beam using spectrometer
11/24/1993EP0570726A1 Opto-mechanical automatic focusing system and method
11/24/1993EP0380637B1 High capacity electron beam cold hearth furnace
11/23/1993US5265046 Chemical labeling of the surfaces of solids on an atomic scale, and the storage of information units in the atomic range
11/23/1993US5264919 Apparatus for positioning a semiconductor wafer
11/23/1993US5264707 Ion implantation method
11/23/1993US5264706 Electron beam exposure system having an electromagnetic deflector configured for efficient cooling
11/23/1993US5264705 Specimen-driving apparatus for electron microscope which tilts and translates while preventing contact damage
11/23/1993US5264704 High efficiency cathodoluminescence detector with high discrimination against backscattered electrons
11/23/1993US5264703 Electron beam instrument
11/23/1993US5264696 Cantilever chip for scanning probe microscope having first and second probes formed with different aspect ratios
11/23/1993US5264256 Allows controlled amount of glow plasma for each substrate
11/18/1993EP0569467A1 Target for cathode sputtering.
11/18/1993EP0349556B1 Process and device for the surface treatment of semiconductors by particle bombardment
11/18/1993DE4225352C1 Installation and method for reactive deposition of metal cpd. coatings - with cathode heated to temp. of plasma ignition, allowing high-strength corrosion- resistant coatings to be produced
11/16/1993US5262646 Infra-red scanning microscopy
11/16/1993US5262611 Apparatus for ion-plasma machining workpiece surfaces including improved decelerating system
11/16/1993US5262610 Low particulate reliability enhanced remote microwave plasma discharge device
11/16/1993US5262341 Blanking aperture array and charged particle beam exposure method
11/16/1993US5262032 Sputtering apparatus with rotating target and target cooling
11/16/1993US5262030 Magnetron sputtering cathode with electrically variable source size and location for coating multiple substrates
11/16/1993US5262028 Glow discharge sputtering and magnetism
11/16/1993US5261998 Method for detecting an end point of etching in semiconductor manufacture using the emission spectrum of helium
11/16/1993US5261962 Plasma-chemical vapor-phase epitaxy system comprising a planar antenna
11/11/1993WO1993022764A1 Device for the optical scanning of a recording medium, especially a phosphor storage plate
11/10/1993EP0569296A1 Device for chemical treatment by plasma and method using the same
11/10/1993EP0569076A1 Emitter gun assembly
11/09/1993US5260580 Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device
11/09/1993US5260579 Charged particle beam exposure system and charged particle beam exposure method
11/09/1993US5260577 Sample carriage for scanning probe microscope
11/09/1993US5260572 Scanning probe microscope including height plus deflection method and apparatus to achieve both high resolution and high speed scanning
11/09/1993US5260151 Lithography, miniaturization
11/04/1993DE4223505C1 Reactive magnetron sputtering device for application of insulating or low conductivity layer - uses anode potential for relative isolation of all parts in contact with plasma on outside of cathode target
11/04/1993DE4214220A1 Piezoelectrical actuation system for X=Y positioning table - has two orthogonal spring four corner linkages, with fixed part of one coupled to machine and moving part to fixed part of other, and has path sensor on respective fixed and moving parts of two links for output to position control
11/03/1993EP0568351A1 X-ray analysis apparatus
11/03/1993EP0568049A1 Apparatus and method for coating the inside of a hollow object by microwave-assisted plasma CVD
11/02/1993US5258617 Method and apparatus for correcting axial coma in electron microscopy
11/02/1993US5258246 Integrated circuits
11/02/1993CA1323856C Magnetron sputtering targets
10/1993
10/28/1993WO1993021685A1 Stabilizer for switch-mode powered rf plasma processing
10/28/1993DE4213556A1 Einrichtung zur optischen Abtastung eines Aufzeichnungsträgers, insbesondere einer Phosphorspeicherplatte Means for optically scanning a record carrier, in particular a phosphor storage disc
10/28/1993DE4210125A1 Installation for reactive gas flow sputtering - with the inner surfaces of the cathode parallel to a divergent gas stream
10/27/1993EP0567139A1 Electron beam diffraction measuring apparatus
10/27/1993EP0566963A2 A specimen image producing apparatus
10/27/1993EP0566912A1 Apparatus for retaining an electrode by a magnetically shielded magnet
10/27/1993EP0566606A1 Device and process for the vaporisation of material.
10/26/1993US5256931 Electron source having a material-retaining device