| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/07/1994 | WO1994014565A1 Electron beam gun with liquid cooled rotatable crucible |
| 07/06/1994 | EP0605029A1 Data-hiding and skew scan for unioning of shapes in electron beam lithography post-processing |
| 07/05/1994 | US5326981 Electron beam excited ion irradiation apparatus |
| 07/05/1994 | US5326980 Ion implanter with plural surface potential sensors |
| 07/05/1994 | US5326979 Electron beam lithography system |
| 07/05/1994 | US5326978 Charged particle detector |
| 07/05/1994 | US5326971 Transmission electron microscope environmental specimen holder |
| 07/05/1994 | EP0619872A4 Piezoresistive cantilever for atomic force microscopy. |
| 06/29/1994 | EP0604393A2 Diluted anhydrous hydrogen fluoride gas generator for use in dry etching apparatus |
| 06/29/1994 | EP0604344A1 Method and apparatus for optical emission end point detection in plasma etching processes |
| 06/29/1994 | EP0604066A1 Fluid flow control method and apparatus for an ion implanter |
| 06/29/1994 | EP0604011A1 Ion implantation apparatus and method |
| 06/29/1994 | EP0603864A2 Surface potential control in plasma processing of materials |
| 06/29/1994 | EP0603784A1 Atmospheric pressure glow discharge plasma treatment method |
| 06/29/1994 | EP0603770A2 Information recording and reproducing apparatus for recording and reproducing information by using a probe electrode |
| 06/29/1994 | EP0603587A1 Plasma generating apparatus |
| 06/29/1994 | EP0603555A1 Method of illumination by focussed electron beam and electron optical illumination system |
| 06/28/1994 | US5325020 Circular waveguide plasma microwave sterilizer apparatus |
| 06/28/1994 | US5325019 Control of plasma process by use of harmonic frequency components of voltage and current |
| 06/28/1994 | US5325010 For imparting microscopic/macroscopic movements to an object |
| 06/28/1994 | US5324950 Charged particle beam apparatus |
| 06/28/1994 | US5324947 Energy-dispersive X-ray detector and method of evacuating same |
| 06/28/1994 | US5324935 Scanning probe microscope having a directional coupler and a Z-direction distance adjusting piezoelectric element |
| 06/28/1994 | US5324593 Magnetic |
| 06/28/1994 | US5324553 Increasing surface mobility of species in plasma by coupling a low frequency alternating electrical field and magnetic energy; no intentional addition of thermal energy |
| 06/28/1994 | US5324414 Ion selective electrode |
| 06/28/1994 | US5324411 Carbon electrode plate containing holes |
| 06/28/1994 | US5324388 Applying magnetic field to plasma generation chamber, generating microwave to cause electron cyclotron resonance, supplying the microwave to generate plasma |
| 06/28/1994 | US5324362 Apparatus for treating substrates in a microwave-generated gas-supported plasma |
| 06/28/1994 | CA1330452C Oscillating quartz atomic force microscope |
| 06/24/1994 | CA2112178A1 Surface potential control in plasma processing of materials |
| 06/23/1994 | WO1994014183A1 Process for carrying out stable low pressure discharge processes |
| 06/23/1994 | DE4242894A1 Multiple HF line to cathode feeding device |
| 06/23/1994 | DE4241763A1 Releasable means of attachment between target and support |
| 06/22/1994 | EP0602983A1 Hybrid photomultiplier tube with high sensitivity |
| 06/22/1994 | EP0602982A1 Focused electron-bombarded detector |
| 06/22/1994 | EP0602855A1 Active neural network control of wafer attributes in a plasma etch process |
| 06/22/1994 | EP0602833A1 Processes for electron lithography |
| 06/22/1994 | EP0602506A1 Plasma pressure control assembly |
| 06/22/1994 | EP0602058A1 Color synthesizing scanning electron microscope |
| 06/21/1994 | US5323375 Information storage apparatus |
| 06/21/1994 | US5323003 Scanning probe microscope and method of observing sample by using such a microscope |
| 06/21/1994 | US5322606 Use of rotary solenoid as a shutter actuator on a rotating arm |
| 06/21/1994 | US5322605 Used to form thin film on substrate which is formed by reaction of reactive gas and particles sputtered from the material of a target |
| 06/21/1994 | US5322590 Plasma-process system with improved end-point detecting scheme |
| 06/17/1994 | CA2111536A1 Collimated deposition apparatus |
| 06/15/1994 | EP0601595A1 Insulated self-supporting conductor arrangement suitable for installation in a vacuum chamber, in particular antenna coil for a high-frequency plasme generator |
| 06/15/1994 | EP0601468A1 Process and electromagnetically coupled planar plasma apparatus for etching oxides |
| 06/15/1994 | EP0601151A1 Process for regulating a hot cathode glow discharge. |
| 06/14/1994 | US5321685 Cantilever type probe, scanning tunnel microscope and information processing apparatus using the same |
| 06/14/1994 | US5321271 Intraoperative electron beam therapy system and facility |
| 06/14/1994 | US5321262 Electron imaging band pass analyser for a photoelectron spectromicroscope |
| 06/14/1994 | US5320728 Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity |
| 06/14/1994 | US5320707 Dry etching method |
| 06/14/1994 | US5320704 Plasma etching apparatus |
| 06/14/1994 | US5319960 For examining surface contours of a specimen |
| 06/09/1994 | WO1994013007A1 Scanning techniques in particle beam devices for reducing the effects of surface charge accumulation |
| 06/09/1994 | WO1994013006A1 Charged particle generation |
| 06/09/1994 | WO1994012273A1 Apparatus and process for the treatment of powder particles for modifying the surface properties of the individual particles |
| 06/08/1994 | EP0600452A1 Scanning probe instrument using stored topographical data |
| 06/08/1994 | EP0600429A1 Magnetron sputtering device and method for thin film coating |
| 06/08/1994 | EP0600365A1 Electrode for use in plasma etching |
| 06/08/1994 | EP0600070A1 Improved planar magnetron sputtering magnet assembly |
| 06/07/1994 | US5319212 Method of monitoring ion beam current in ion implantation apparatus for use in manufacturing semiconductors |
| 06/07/1994 | US5319211 Vapor treatment system |
| 06/07/1994 | US5319207 Imaging system for charged particles |
| 06/07/1994 | US5319198 Electron beam projection apparatus |
| 06/07/1994 | US5319197 Process for monitoring ion-assisted processing procedures on wafers and an apparatus for carrying out the same |
| 06/07/1994 | US5318667 Method and apparatus for dry etching |
| 06/07/1994 | US5318654 Apparatus for cleaning a substrate with metastable helium |
| 06/07/1994 | CA2020237C Device manufacture involving lithographic processing |
| 06/03/1994 | CA2110414A1 Electrode for use in plasma etching |
| 06/01/1994 | EP0599582A2 Scanning apparatus linearization and calibration system |
| 06/01/1994 | EP0586702A4 Electric arc evaporator of metals |
| 06/01/1994 | DE4239843A1 Appts for sputter coating substrates - using microwave resonator to improve coating |
| 05/31/1994 | US5317533 Integrated mass storage device |
| 05/31/1994 | US5317235 Magnetically-filtered cathodic arc plasma apparatus |
| 05/31/1994 | US5317161 Ion source |
| 05/31/1994 | US5317154 Electron microscope equipped with x-ray analyzer |
| 05/31/1994 | US5317153 Scanning probe microscope |
| 05/31/1994 | US5317141 Apparatus and method for high-accuracy alignment |
| 05/31/1994 | US5317006 Cylindrical magnetron sputtering system |
| 05/31/1994 | US5316879 Sub-micron device fabrication using multiple aperture filter |
| 05/31/1994 | US5316739 Method and apparatus for surface treatment |
| 05/31/1994 | US5316645 Plasma processing apparatus |
| 05/31/1994 | CA2000571C Electron detector for use in a gaseous environment |
| 05/26/1994 | WO1994011544A1 Microwave apparatus for depositing thin films |
| 05/26/1994 | DE4337881A1 Metal-sealed bellows for feeding coolant to UHV electron beam evaporator source - has several bellows members coupled to rotary drive and rolling with it in rotary drive axis |
| 05/26/1994 | DE4304613C1 Stabilisation of plasma generation using electron beam evaporator for metals - focusing electron beam on evaporator material within housing and monitoring intensity of light emission above surface, to control power supply to electron gun |
| 05/26/1994 | DE4239218A1 Cathodic sputtering method - with intermittent reverse polarity of electrodes to suppress overloading of plasma with reactive products |
| 05/25/1994 | EP0598569A1 Cathodoluminescence detector |
| 05/25/1994 | EP0598128A1 Plasma processing apparatus |
| 05/25/1994 | EP0289577B1 Dynamic electron emitter |
| 05/25/1994 | EP0285668B1 Thin film formation apparatus |
| 05/24/1994 | US5315212 Plasma processing apparatus for generating uniform strip-shaped plasma by propagating microwave through rectangular slit |
| 05/24/1994 | US5315123 Electron beam lithography apparatus |
| 05/24/1994 | US5315121 Metal ion source and a method of producing metal ions |
| 05/24/1994 | US5315119 Electron beam irradiating apparatus and electric signal detecting apparatus |
| 05/24/1994 | US5315113 Scanning and high resolution x-ray photoelectron spectroscopy and imaging |
| 05/24/1994 | US5314603 Plasma processing apparatus capable of detecting and regulating actual RF power at electrode within chamber |