| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/15/1994 | US5286360 Apparatus for coating a substrate, especially with electrically nonconductive coatings |
| 02/15/1994 | US5286297 Multi-electrode plasma processing apparatus |
| 02/09/1994 | EP0582376A1 Displacement element, cantilever probe and information processing apparatus using cantilever probe |
| 02/09/1994 | EP0581905A1 Forming charges in a fluid and generation of a charged beam |
| 02/09/1994 | EP0581902A1 Method and apparatus for linear magnetron sputtering |
| 02/08/1994 | US5285075 Electron beam lithography method |
| 02/08/1994 | US5285074 Dynamic compensation of non-linear electron beam landing angle in variable axis lenses |
| 02/08/1994 | US5285066 Imaging XPS system |
| 02/08/1994 | US5284564 Magnetron sputtering cathode for vacuum coating apparatus |
| 02/08/1994 | US5284561 Method and apparatus for sputter coating employing machine readable indicia carried by target assembly |
| 02/08/1994 | US5284547 Etching semiconductor wafer surfaces, detecting end point by monitoring concentration of gases generated |
| 02/08/1994 | US5284544 Neutral beam etching apparatus to improve etching rate |
| 02/03/1994 | WO1994002959A1 Optimized ecr plasma apparatus |
| 02/03/1994 | WO1994002939A1 Reading and writing stored information by means of electrochemistry |
| 02/03/1994 | WO1994002841A1 Multiple source and detection frequencies in detecting atomic or molecular spectra and/or threshold phenomena associated with the same |
| 02/03/1994 | WO1994002840A1 System for detecting atomic or molecular spectra of a substance, and/or threshold phenomena associated with the same |
| 02/03/1994 | WO1993014250A3 Process for surface treatment with ions |
| 02/03/1994 | DE4325041A1 Adjustment of the processing rate distribution in an etching or plasma CVD installation - with an adjustment body located opposite to the surface undergoing processing |
| 02/03/1994 | DE4225531A1 Lever device for easy replacement of cathodic sputtering device target - tightens the target unit to the cathode body and releases it to enable rapid target change |
| 02/02/1994 | EP0581440A1 Ion beam scanning system |
| 02/01/1994 | US5283746 Manufacturing adjustment during article fabrication |
| 02/01/1994 | US5283440 Electron beam writing system used in a cell projection method |
| 02/01/1994 | US5283437 Pneumatically and electrostatically driven scanning tunneling microscope |
| 02/01/1994 | US5283414 Plasma treatment apparatus |
| 02/01/1994 | US5283087 Placing substrate between electrodes, supplying etchant gas, applying electricity to excite gas to plasma, etching film while supplying bias voltage to substrate |
| 02/01/1994 | US5282947 Magnet assembly for enhanced sputter target erosion |
| 02/01/1994 | US5282924 Containing cantilever beam |
| 02/01/1994 | US5282921 Apparatus and method for optimally scanning a two-dimensional surface of one or more objects |
| 02/01/1994 | US5282899 Apparatus for the production of a dissociated atomic particle flow |
| 01/26/1994 | EP0580318A1 Sub-micron device fabrication using multiple aperture filter |
| 01/26/1994 | EP0580212A1 Variable axis stigmator |
| 01/26/1994 | EP0580158A1 Method of treating active material |
| 01/25/1994 | US5281909 Process and system for measuring the course of a signal at a point of measurement on a sample |
| 01/25/1994 | US5281827 Charged particle beam exposure apparatus |
| 01/25/1994 | US5281814 System for imaging and detecting threshold phenomena associated with and/or atomic or molecular spectra of a substance by reflection of an AC electrical signal |
| 01/19/1994 | EP0579524A1 Focused ion beam implantation apparatus |
| 01/19/1994 | EP0579380A1 Apparatus and method for scanning a two-dimensional surface of one or more objects |
| 01/19/1994 | EP0579114A1 Sputtering apparatus |
| 01/18/1994 | US5280219 Cluster tool soft etch module and ECR plasma generator therefor |
| 01/18/1994 | US5280178 Specimen holder for use in a charged particle beam device |
| 01/18/1994 | US5280154 Radio frequency induction plasma processing system utilizing a uniform field coil |
| 01/18/1994 | US5279724 Dual sputtering source |
| 01/18/1994 | US5279669 Plasma reactor for processing substrates comprising means for inducing electron cyclotron resonance (ECR) and ion cyclotron resonance (ICR) conditions |
| 01/13/1994 | DE4220588A1 Arc evaporation device for target - has shield round the periphery of the target to prevent edge contact by the arc |
| 01/12/1994 | EP0578580A1 Device for coating polymer with a microwave excited plasma |
| 01/12/1994 | EP0578047A1 Plasma processing apparatus |
| 01/12/1994 | EP0578011A1 Multi-electrode plasma processing apparatus |
| 01/12/1994 | EP0578010A1 Multi-zone plasma processing method |
| 01/12/1994 | EP0577667A1 Arc source macroparticle filter |
| 01/12/1994 | EP0577654A1 Device for generating short particle-beam pulses |
| 01/11/1994 | US5278421 Pattern fabrication method using a charged particle beam and apparatus for realizing same |
| 01/11/1994 | US5278420 Scanning control system involved in an ion-implantation apparatus |
| 01/11/1994 | US5278419 Electron beam exposure process for writing a pattern on an object by an electron beam with a compensation of the proximity effect |
| 01/11/1994 | US5278408 Instrument and method for 3-dimensional atomic arrangement observation |
| 01/11/1994 | US5278407 Secondary-ion mass spectrometry apparatus using field limiting method |
| 01/11/1994 | US5278406 Apparatus for detecting information contained in electrons emitted from sample surface |
| 01/11/1994 | US5278384 Apparatus and process for the treatment of powder particles for modifying the surface properties of the individual particles |
| 01/11/1994 | US5277939 ECR CVD method for forming BN films |
| 01/11/1994 | US5277938 Controlling the electron beam movement |
| 01/11/1994 | US5277779 Rectangular cavity magnetron sputtering vapor source |
| 01/11/1994 | US5277778 Method for coating components or shapes by cathode sputtering |
| 01/11/1994 | US5277770 Regenerating a plasma initiator using oxygen-containing gas in the presence of microwave radiation |
| 01/11/1994 | US5277752 Ionizing gases at constant pressure and temperature |
| 01/11/1994 | US5277751 Method and apparatus for producing low pressure planar plasma using a coil with its axis parallel to the surface of a coupling window |
| 01/11/1994 | US5277740 Apparatus and method for forming a fine pattern |
| 01/11/1994 | US5277714 Vacuum arc deposition device |
| 01/06/1994 | WO1994000867A1 Process for regulating a hot cathode glow discharge |
| 01/05/1994 | EP0577246A1 Method and apparatus for direct deposition of ceramic coatings |
| 01/05/1994 | EP0576972A1 Ion scattering spectroscope |
| 01/05/1994 | EP0576559A1 Interfacial plasma bars for photovoltaic deposition apparatus. |
| 01/05/1994 | DE4232669C1 Ninety-degree deflection mass separator tube for semiconductor material ion implantation - covers inside of aluminium walls with sections of electrically conductive non-magnetic graphite of uneven surface, which sections are narrow to allow disassembly through entrance. |
| 01/05/1994 | DE4223592A1 Arc vaporising apparatus - with movable magnetic coil below target to adjust magnetic field and ensure uniform target vaporisation |
| 01/05/1994 | DE4221907A1 Plasma etching device for semiconductor disc - has strip line resonator providing electromagnetic field in which semiconductor disc is positioned |
| 01/04/1994 | US5276672 Micro-displacement type information detection probe device and scanning tunneling microscope, atomic force microscope, information processing device by use thereof |
| 01/04/1994 | US5276386 Microwave plasma generating method and apparatus |
| 01/04/1994 | US5276334 Charged particle beam exposure method and apparatus |
| 01/04/1994 | US5276331 Electron beam exposure system |
| 01/04/1994 | US5276330 High accuracy beam blanker |
| 01/04/1994 | US5276325 Scanning microscope and a method of operating such a scanning microscope |
| 01/04/1994 | US5276324 Composite scanning tunneling microscope |
| 01/04/1994 | US5275665 Method and apparatus for causing plasma reaction under atmospheric pressure |
| 01/04/1994 | CA1325855C Encapsulated high brightness electron beam source and system therefor |
| 01/04/1994 | CA1325793C Plasma deposited coatings and low temperature, plasma method of making same |
| 01/04/1994 | CA1325792C Method of producing a thin film by sputtering and an opposed target type sputtering apparatus |
| 12/29/1993 | EP0576263A2 Method for fabricing nano-scale devices and nano-scale device fabricated by that method |
| 12/28/1993 | USRE34489 Atomic force microscope with optional replaceable fluid cell |
| 12/28/1993 | US5274434 Method and apparatus for inspecting foreign particles on real time basis in semiconductor mass production line |
| 12/28/1993 | US5274306 Capacitively coupled radiofrequency plasma source |
| 12/28/1993 | US5273935 Method of controlling etching with a focused charged beam by detecting electrical current or secondary electrons |
| 12/28/1993 | US5273636 Coating apparatus |
| 12/28/1993 | US5273610 Apparatus and method for determining power in plasma processing |
| 12/28/1993 | US5273609 Controlling plasma discharges on a wafer and activating to generate energy at more than two discrete levels |
| 12/28/1993 | US5273588 Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means |
| 12/28/1993 | US5273587 Body of microwave transparent material designed so the inside gas pressure body is higher than that in the processing chamber |
| 12/28/1993 | US5272913 Cantilever for a scanning probe microscope and a method of manufacturing the same |
| 12/23/1993 | WO1993025724A1 Semiconductor wafer processing cvd reactor cleaning method and apparatus |
| 12/23/1993 | CA2136861A1 Semiconductor wafer processing cvd reactor cleaning method and apparatus |
| 12/22/1993 | EP0575126A1 Plasma reactor head and electrode assembly |
| 12/22/1993 | EP0574859A1 Method of removing particles in a plasma processing chamber |
| 12/22/1993 | EP0382803B1 Process and device for supplying processing gas to a reactor located in a zone subjected to intense electric and/or electromagnetic fields |