| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/06/1994 | CA1331866C Method and apparatus for ion etching and deposition |
| 09/01/1994 | WO1994019675A1 Method of measuring the composition of a melt vapour under vacuum |
| 09/01/1994 | WO1994019509A1 Film forming method and film forming apparatus |
| 09/01/1994 | WO1994019508A1 System for sputtering compositions onto a substrate |
| 09/01/1994 | WO1994019507A1 Method of stabilizing plasma generation by an electron-beam evaporator |
| 08/31/1994 | EP0613170A1 Method and apparatus for fabrication of thin film semiconductor devices using non-planar, exposure beam lithography |
| 08/31/1994 | EP0613169A1 Differential virtual ground beam blanker |
| 08/31/1994 | EP0612861A1 Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition |
| 08/31/1994 | EP0612860A1 Reactive ionized cluster beam deposition method and apparatus thereof |
| 08/31/1994 | EP0612859A1 Low voltage arc evaporator with feed device and process for its use |
| 08/31/1994 | EP0612358A1 Method and apparatus for sputter coating employing machine readable indicia carried by target assembly. |
| 08/31/1994 | EP0397799B1 A piezoelectric motion transducer and an integrated scanning tunneling microscope using the same |
| 08/30/1994 | US5343412 Method and apparatus for displaying process endpoint signal based on emission concentration within a processing chamber |
| 08/30/1994 | US5343112 Cathode arrangement |
| 08/30/1994 | US5343047 Ion implantation system |
| 08/30/1994 | US5343042 Selective modification of individual nanometer and subnamometer structures in the surface of a solid |
| 08/30/1994 | US5342472 Plasma processing apparatus |
| 08/30/1994 | US5342471 Plasma processing apparatus including condensation preventing means |
| 08/30/1994 | US5342448 Apparatus for processing a sample using a charged beam and reactive gases |
| 08/30/1994 | CA1331792C Halogen monitoring apparatus |
| 08/25/1994 | DE4305473A1 Charge carrier source |
| 08/24/1994 | EP0612097A1 Substrate coating device |
| 08/24/1994 | EP0611945A1 Force microscope and method for measuring atomic forces in several directions |
| 08/24/1994 | EP0611485A1 Electromechanical positioning device. |
| 08/23/1994 | US5340983 Method and apparatus for mass analysis using slow monochromatic electrons |
| 08/23/1994 | US5340621 Plasma CVD method |
| 08/23/1994 | US5340553 Deoxygenation and dehydration by the heated silicon |
| 08/17/1994 | EP0610193A1 Electron beam exposure method |
| 08/17/1994 | EP0594706A4 Method of producing flat ecr layer in microwave plasma device and apparatus therefor |
| 08/17/1994 | EP0538363A4 Slotted cylindrical hollow cathode/magnetron sputtering device |
| 08/16/1994 | US5339039 Langmuir probe system for radio frequency excited plasma processing system |
| 08/16/1994 | US5338997 Micromanipulator for moving objects |
| 08/16/1994 | US5338940 Apparatus for ion implantation including contactless cooling and beam current measurement means |
| 08/16/1994 | US5338939 Charged particle beam exposure including a heat blocking partition positioned near deflecting coils |
| 08/16/1994 | US5338932 Method and apparatus for measuring the topography of a semiconductor device |
| 08/16/1994 | US5338913 Electron beam gun with liquid cooled rotatable crucible |
| 08/16/1994 | US5338422 Triple magnetron array in vacuum chamber: one planar situated above dual rotatable unbalanced cylindrical units; oxygen gas flow to planar magnetron restricted |
| 08/11/1994 | DE4403553A1 Electron cyclotron resonance apparatus |
| 08/11/1994 | DE4303567A1 Production of synthetic diamonds |
| 08/10/1994 | EP0609237A1 Harmonic and subharmonic isolator for plasma discharge |
| 08/09/1994 | US5337247 Exposure data forming method, pattern forming method, pattern exposure method and pattern exposure apparatus |
| 08/09/1994 | US5336961 Source of ions with electronic cyclotronic resonance |
| 08/09/1994 | US5336895 Impurity free reference grid for use charged partiole beam spectroscopes |
| 08/09/1994 | US5336891 Aberration free lens system for electron microscope |
| 08/09/1994 | US5336887 Scanning probe microscope |
| 08/09/1994 | US5336886 Apparatus for measuring a diffraction pattern of electron beams having only elastic scattering electrons |
| 08/09/1994 | US5336885 Electron beam apparatus |
| 08/09/1994 | US5336533 Generating plasma under resonant conditions in a reaction chamber, stabilizing the plasma, injecting working gas to intersect the confined plasma |
| 08/09/1994 | US5336386 Target for cathode sputtering |
| 08/09/1994 | US5336385 Sputtering apparatus |
| 08/09/1994 | US5336369 Forming film on surface of substrate, forming resist thin film, and isotropically etching |
| 08/09/1994 | US5336366 New dry etch technique |
| 08/09/1994 | US5336355 Methods and apparatus for confinement of a plasma etch region for precision shaping of surfaces of substances and films |
| 08/04/1994 | WO1994016825A1 Microwave energized process for the preparation of high quality semiconductor material |
| 08/03/1994 | EP0608657A1 Apparatus and method for preparing shape data for proximity correction |
| 08/03/1994 | EP0608639A1 Ion implant devices |
| 08/03/1994 | EP0608478A2 Device for cathodic sputtering |
| 08/02/1994 | US5334846 Correction of charged particle beam exposure deflection by detecting stage position and a position detection mark |
| 08/02/1994 | US5334845 Charged beam exposure method and apparatus as well as aperture stop and production method thereof |
| 08/02/1994 | US5334423 Controlled glow discharge deposition |
| 08/02/1994 | US5334302 Magnetron sputtering apparatus and sputtering gun for use in the same |
| 08/02/1994 | US5334298 Operates on magnetron principle; utilizes electrically floating dark space shield |
| 08/02/1994 | US5334282 Forming plurality of unit patterns by shaping electron beam by means of an aperture; varying transmittance with second aperture to selectively control exposure intensity |
| 08/02/1994 | US5333726 Magnetron sputtering source |
| 08/02/1994 | US5333495 Method and apparatus for processing a minute portion of a specimen |
| 08/02/1994 | CA1331163C Multiple-processing and contamination-free plasma etching system |
| 07/27/1994 | EP0608082A1 Detector for diffracted electrons |
| 07/27/1994 | EP0607797A1 An apparatus and method for enhanced inductive coupling to plasmas with reduced sputter contamination |
| 07/27/1994 | EP0607787A2 Device for coating or etching of substrates |
| 07/27/1994 | EP0607786A2 Apparatus for coating substrates |
| 07/27/1994 | EP0607415A1 Hollow-anode glow discharge apparatus |
| 07/26/1994 | US5332880 Method and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric field |
| 07/26/1994 | US5332555 Ozone beam generation apparatus and method for generating an ozone beam |
| 07/26/1994 | US5332468 Anisotropic plasma etching, sputtering |
| 07/26/1994 | US5332441 Apparatus for gettering of particles during plasma processing |
| 07/21/1994 | WO1994016458A1 Enhanced thin film dc plasma processing system |
| 07/21/1994 | WO1994016118A1 Cylindrical magnetron shield structure |
| 07/21/1994 | WO1994016117A1 Device for the vacuum-plasma treatment of articles |
| 07/21/1994 | CA2153795A1 Cylindrical magnetron shield structure |
| 07/20/1994 | EP0606745A1 Collimated deposition apparatus |
| 07/20/1994 | EP0513080B1 Process and device for electron beam treatment of particulates |
| 07/19/1994 | US5331161 Ion irradiation system and method |
| 07/19/1994 | US5330800 Providing a target within a plasma chamber, introducing an ionizable gas and applying a series of time-spaced negative voltage pulses to the target |
| 07/19/1994 | US5330632 Apparatus for cathode sputtering |
| 07/19/1994 | US5330628 Collimated deposition apparatus and method |
| 07/19/1994 | US5330615 Symmetric double water plasma etching system |
| 07/19/1994 | US5330606 Plasma source for etching |
| 07/19/1994 | US5330578 Plasma treatment apparatus |
| 07/14/1994 | DE4300223A1 Reducing erosion on plasma vessel walls |
| 07/13/1994 | EP0606097A1 A permanent magnet arrangement for use in magnetron plasma processing |
| 07/13/1994 | EP0605964A2 Electron lithography using a photocathode |
| 07/13/1994 | EP0605534A1 Apparatus for rapid plasma treatments and method. |
| 07/12/1994 | US5329514 Information processing apparatus, and electrode substrate and information recording medium used in the apparatus |
| 07/12/1994 | US5329130 Charged particle beam exposure method and apparatus |
| 07/12/1994 | US5329129 Electron shower apparatus including filament current control |
| 07/12/1994 | US5329125 Device for corpuscular-optical examination and/or processing of material samples |
| 07/12/1994 | US5328585 Linear planar-magnetron sputtering apparatus with reciprocating magnet-array |
| 07/12/1994 | US5328583 Consisting of sputtering targets arranged in counterposition and second one on concentric circle having same center axis |
| 07/12/1994 | US5328582 Off-axis magnetron sputter deposition of mirrors |
| 07/12/1994 | US5328515 Chemical treatment plasma apparatus for forming a ribbon-like plasma |