| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/24/1994 | US5314597 Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile |
| 05/24/1994 | US5314575 Etching method and apparatus |
| 05/24/1994 | US5314540 Apparatus for forming diamond film |
| 05/24/1994 | US5314539 Apparatus for plasma treatment of continuous material |
| 05/18/1994 | EP0597622A1 Sample carriage for scanning probe microscope |
| 05/18/1994 | EP0597538A1 Method for image reconstruction in a high-resolution electron microscope, and electon microscope suitable for use of such a method |
| 05/18/1994 | EP0597497A1 Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits |
| 05/18/1994 | EP0596924A1 Continuous vacuum arc broad beam ion source |
| 05/17/1994 | US5313451 Information recording/reproducing apparatus with STM cantilever probe having a strain gauge |
| 05/17/1994 | US5313068 Partitioning method for E-beam lithography |
| 05/17/1994 | US5313067 Ion processing apparatus including plasma ion source and mass spectrometer for ion deposition, ion implantation, or isotope separation |
| 05/17/1994 | US5313062 Automatic focusing and astigmatism correction for electron beam apparatus |
| 05/17/1994 | US5312778 Etching |
| 05/17/1994 | US5312519 Method of cleaning a charged beam apparatus |
| 05/17/1994 | US5312510 Apparatus for optimally scanning a two-dimensional surface of one or more objects |
| 05/11/1994 | EP0596551A1 Induction plasma source |
| 05/11/1994 | EP0596529A1 Electron lens |
| 05/11/1994 | EP0596496A1 High impedance plasma ion implantation method and apparatus |
| 05/11/1994 | EP0596092A1 Process and device for applying pulses on the surface of a solid body |
| 05/11/1994 | DE4336900A1 Uniform deflected electron beam source - used esp. for vacuum vapour deposition of thin films |
| 05/11/1994 | DE4237517A1 Reactive magnetron sputtering appts. - esp. for coating substrate with electrically non-conductibe layers |
| 05/10/1994 | US5311452 Plasma processing apparatus using capacitance manometer and pressure control method thereof |
| 05/10/1994 | US5311103 Apparatus for the coating of material on a substrate using a microwave or UHF plasma |
| 05/10/1994 | US5311028 System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions |
| 05/10/1994 | US5311026 Charged particle beam lithography system and method therefor |
| 05/10/1994 | US5310452 Plasma process apparatus and plasma processing method |
| 05/10/1994 | US5310426 High-speed film forming method by microwave plasma chemical vapor deposition (CVD) under high pressure and an apparatus therefor |
| 05/05/1994 | DE4314301C1 Surface scanning sensor - has a sensor point of a photo-structurable glass |
| 05/05/1994 | DE4236363A1 Micro-structuring of workpieces by cluster ions - using beam shields and apertures |
| 05/04/1994 | EP0595624A1 Film forming apparatus for filling fine pores of a substrate |
| 05/04/1994 | EP0594706A1 Method of producing flat ecr layer in microwave plasma device and apparatus therefor. |
| 05/03/1994 | US5309354 Electron beam exposure method |
| 05/03/1994 | US5309063 Inductive coil for inductively coupled plasma production apparatus |
| 05/03/1994 | US5308991 Method and apparatus for making a predistorted reticle to compensate for lens distortions |
| 05/03/1994 | US5308989 Fluid flow control method and apparatus for an ion implanter |
| 05/03/1994 | US5308974 Scanning probe microscope using stored data for vertical probe positioning |
| 05/03/1994 | US5308650 Vapor deposition and cladding with microwave pulsation |
| 05/03/1994 | US5308447 Endpoint and uniformity determinations in material layer processing through monitoring multiple surface regions across the layer |
| 05/03/1994 | US5308431 System providing multiple processing of substrates |
| 05/03/1994 | US5308417 Magnetic material embedded in pedestal where wafer is supported for etching |
| 05/03/1994 | US5308414 Method and apparatus for optical emission end point detection in plasma etching processes |
| 05/03/1994 | US5307568 Duct between piping unit and reduced-pressure vessel composed of austenitic steel contains molybdenum; eliminates microcontamination from particles of heavy metal ions |
| 04/28/1994 | WO1994009179A1 High density plasma deposition and etching apparatus |
| 04/28/1994 | WO1994009176A1 Device for plasma-supported electron beam high-rate vapour deposiition |
| 04/28/1994 | DE4336357A1 Thin-film depositing device - with a vapour jet hitting a rotating substrate diagonally |
| 04/28/1994 | DE4335082A1 Information recording appts. for CD, laser disc etc. - directs electron beam onto disc which is rotated by electric motor, and has magnetic field screening device. |
| 04/28/1994 | DE4235953A1 Sputtering source esp for large area deposition - has inexpensive linear hollow cathode formed of parallel planar targets |
| 04/27/1994 | EP0594394A1 Electron spectroscopy analyzer and a method of correcting a shift of spectral line in electron spectroscopy |
| 04/27/1994 | EP0594328A1 Method for controlling plasma processes |
| 04/27/1994 | EP0594084A1 Scanning electron microscope |
| 04/27/1994 | EP0593931A1 Microwave plasmas producing device |
| 04/27/1994 | EP0593924A1 Device for producing plasma using cathodic sputtering |
| 04/26/1994 | US5306985 ECR apparatus with magnetic coil for plasma refractive index control |
| 04/26/1994 | US5306922 Production of high beam currents at low energies for use in ion implantation systems |
| 04/26/1994 | US5306921 Ion implantation system using optimum magnetic field for concentrating ions |
| 04/26/1994 | US5306920 Ion implanter with beam resolving apparatus and method for implanting ions |
| 04/26/1994 | US5306918 Installation for the study or the transformation of the surface of samples placed in a vacuum or in a controlled atmosphere |
| 04/26/1994 | US5306663 Method of wiring semiconductor device using energy beam |
| 04/26/1994 | US5306584 Scanning grid pattern to obtain information on its location; transparent to exposing radiation |
| 04/26/1994 | US5306408 Drift tube with magnets to push plasma away from tube, maintain uniform plasma density and guide plasma towards substrate |
| 04/26/1994 | US5306407 Method and apparatus for coating substrates |
| 04/26/1994 | US5306379 Dry etching apparatus for rectangular substrate comprising plasma bar generation means |
| 04/20/1994 | EP0593387A2 Electron-beam lithography with induced currents |
| 04/20/1994 | EP0593216A2 Transmission electron microscope and its use |
| 04/20/1994 | EP0592971A2 Detection of electron-beam scanning of a substrate |
| 04/20/1994 | EP0592899A1 A scanning electron microscope |
| 04/19/1994 | US5305225 Charged particle litography method and apparatus |
| 04/19/1994 | US5304888 Mechanically stable field emission gun |
| 04/19/1994 | US5304811 Lithography system using charged-particle beam and method of using the same |
| 04/19/1994 | US5304801 Electron microscope |
| 04/19/1994 | US5304441 Lowering energy level of energy beam, patterning with repeated exposure |
| 04/19/1994 | US5304282 Processes depending on plasma discharges sustained in a helical resonator |
| 04/19/1994 | US5304279 Radio frequency induction/multipole plasma processing tool |
| 04/19/1994 | US5304277 Plasma processing apparatus using plasma produced by microwaves |
| 04/19/1994 | US5304250 Plasma system comprising hollow mesh plate electrode |
| 04/14/1994 | WO1994008232A1 Method and apparatus for surface analysis |
| 04/14/1994 | WO1994008067A1 Topographically precise thin film coating system |
| 04/14/1994 | WO1994007680A1 Method of surface treatment of plastic parts |
| 04/14/1994 | DE4233895A1 Double-sided plasma treatment of strip-form material - involves forming spatially limited hollow cathode discharge low-pressure plasma in special treatment chamber with space limited by material being treated |
| 04/13/1994 | EP0592129A1 ECR plasma process |
| 04/13/1994 | EP0591975A1 Two parallel plate electrode type dry etching apparatus |
| 04/13/1994 | EP0591675A1 Device for avoiding arcing in vacuum sputtering apparatuses |
| 04/13/1994 | EP0283519B1 Ion generation apparatus, thin film formation apparatus using the ion generation apparatus, and ion source |
| 04/12/1994 | US5302882 Low pass filter for plasma discharge |
| 04/12/1994 | US5302831 Dewar construction for cooling radiation detector cold finger |
| 04/12/1994 | US5302829 Automatic focusing method for scanning electron microscopy |
| 04/12/1994 | US5302828 Scanning techniques in particle beam devices for reducing the effects of surface charge accumulation |
| 04/12/1994 | US5302271 Anodic vacuum arc deposition system |
| 04/12/1994 | US5302266 Method and apparatus for filing high aspect patterns with metal |
| 04/12/1994 | US5302237 Localized plasma processing |
| 04/12/1994 | US5302226 Apparatus for microwave processing in a magnetic field |
| 04/12/1994 | US5302208 Vacuum coating installation |
| 04/07/1994 | DE4233686A1 Selective optical display or marking of given atoms or mols. - uses electron flow between micro point and sample for detection to give an image signal |
| 04/07/1994 | DE4232998A1 Verfahren zur Oberflächenbehandlung von Kunststoffteilen A process for the surface treatment of plastic parts |
| 04/06/1994 | EP0590904A1 Diffusion-bonded sputtering target assembly and method of manufacturing the same |
| 04/06/1994 | EP0590308A2 Scanning and hig resoloution x-ray photo electron spectroscopy and imaging |
| 04/06/1994 | EP0389506B1 Process for producing thin layers of a material composed of different chemical compounds which melts or sublimes at high temperatures on a substrate |
| 04/05/1994 | US5301211 Fuel assembly sputtering process |
| 04/05/1994 | US5301124 Registration of patterns formed of multiple fields |
| 04/05/1994 | US5300901 Arrangement for coupling in of microwave energy |