| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/05/1994 | US5300891 Ion accelerator |
| 04/05/1994 | US5300785 Apparatus for and method of producing ion beams |
| 04/05/1994 | US5300776 Autoadjusting electron microscope |
| 04/05/1994 | US5300775 Method of selecting a spatial energy spread within an electron beam, and an electron beam apparatus suitable for carrying out such a method |
| 04/05/1994 | US5300460 UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers |
| 04/05/1994 | US5300205 Sputtering multiple coating, regulating voltage at cathode |
| 03/31/1994 | WO1994007110A1 Optical endpoint determination during the processing of material layers |
| 03/31/1994 | DE4232007A1 Sputtering cathode for use in vacuum coating installations - mfd. using explosive welding process to produce vacuum-tight seams of cavity for coolant flow |
| 03/30/1994 | EP0589699A1 Device and method for depositing metal oxide films |
| 03/30/1994 | EP0589475A1 Spin-polarized electron emitter having semiconductor opto-electronic layer with split valence band |
| 03/30/1994 | EP0589237A2 Vacuum etch chamber and method for treating parts thereof |
| 03/30/1994 | EP0588992A1 Device for processing substrates within a plasma. |
| 03/29/1994 | US5298760 Performance of location-selective catalytic reactions with or on the surfaces of solids in the nanometer or subnanometer range |
| 03/29/1994 | US5298757 Lens for charged particle beam |
| 03/29/1994 | US5298747 Scanning interference electron microscopy |
| 03/29/1994 | US5298720 Method and apparatus for contamination control in processing apparatus containing voltage driven electrode |
| 03/29/1994 | US5298465 Plasma etching system |
| 03/29/1994 | US5298137 Used for producing a thin film on surface of an object |
| 03/29/1994 | US5298136 Steered arc coating with thick targets |
| 03/29/1994 | US5298103 Electrode assembly useful in confined plasma assisted chemical etching |
| 03/29/1994 | CA2008926C Plasma reactor apparatus and method for treating a substrate |
| 03/23/1994 | EP0588572A1 Electron microscope with camera and method of operating the same |
| 03/23/1994 | EP0581902A4 Method and apparatus for linear magnetron sputtering. |
| 03/22/1994 | US5296917 Method of monitoring accuracy with which patterns are written |
| 03/22/1994 | US5296713 Ion source device |
| 03/22/1994 | US5296704 For investigating a surface of a sample |
| 03/22/1994 | US5296669 Specimen heating device for use with an electron microscope |
| 03/22/1994 | US5296272 Method of implanting ions from a plasma into an object |
| 03/22/1994 | US5296037 Plasma CVD system comprising plural upper electrodes |
| 03/22/1994 | US5296036 Apparatus for continuously forming a large area functional deposit film including microwave transmissive member transfer mean |
| 03/17/1994 | WO1994006160A1 Electromechanical positioning device |
| 03/17/1994 | WO1994006151A1 Method of detecting end point of etching |
| 03/17/1994 | WO1994006150A1 Method for plasma processing at high pressures |
| 03/17/1994 | WO1994006149A1 Toxic remediation system and method |
| 03/17/1994 | WO1994005825A1 Igniter for microwave energized plasma processing apparatus |
| 03/17/1994 | DE4230779A1 Arc extinction device for vacuum substrate coating device - uses capacitor across anode and cathode DC supply leads providing diversion path |
| 03/17/1994 | DE4230291A1 Microwave-assisted sputtering appts. - comprises vacuum chamber, target, magnetic appts., microwave, and electromagnet |
| 03/17/1994 | DE4230290A1 Appts. for producing plasma using cathode sputtering - comprises plasma chamber, target connected to electrode, magnetron, and microwave emitter |
| 03/16/1994 | EP0587276A1 Device manufacture involving lithographic processing |
| 03/16/1994 | EP0587165A2 Information processing apparatus having multiprobe control circuit |
| 03/16/1994 | EP0586809A1 Sputter cathode and method for the manufacture of this cathode |
| 03/16/1994 | EP0586702A1 Electric arc evaporator of metals |
| 03/16/1994 | EP0586579A1 Window for microwave plasma processing device |
| 03/16/1994 | CN1083870A Unidirectional field generator |
| 03/15/1994 | US5294804 Cantilever displacement detection apparatus |
| 03/15/1994 | US5294800 E-beam control data compaction system and method |
| 03/15/1994 | US5294465 Desorbing passivating atoms on a substrate by applying voltage from a probe; absorbing gas molecules on activated surface; bonding |
| 03/15/1994 | US5294322 Electric arc coating device having an additional ionization anode |
| 03/09/1994 | EP0585840A1 Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens |
| 03/09/1994 | EP0585445A1 Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile |
| 03/09/1994 | EP0585229A1 Cluster tool soft etch module and ecr plasma generator therefor. |
| 03/09/1994 | EP0306491B1 Arc coating of refractory metal compounds |
| 03/08/1994 | US5293508 Ion implanter and controlling method therefor |
| 03/08/1994 | US5293045 Electrostatic lens |
| 03/08/1994 | US5293042 Servo circuit of scanning probe microscope |
| 03/08/1994 | US5292417 Sputtered particle layer has lower conductivity than target |
| 03/08/1994 | US5292401 Magnetic field to maintain gap, plasma etching |
| 03/08/1994 | US5292400 Method and apparatus for producing variable spatial frequency control in plasma assisted chemical etching |
| 03/08/1994 | US5292396 Plasma processing chamber |
| 03/08/1994 | US5292395 ECR plasma reaction apparatus having uniform magnetic field gradient |
| 03/08/1994 | US5292394 Apparatus for large-area ionic etching |
| 03/08/1994 | US5292371 Chemical vapor deposition |
| 03/08/1994 | US5292370 Coupled microwave ECR and radio-frequency plasma source for plasma processing |
| 03/08/1994 | US5291775 Scanning force microscope with integrated optics and cantilever mount |
| 03/08/1994 | CA2004551C Detection system for cathodoluminescence analysis |
| 03/03/1994 | WO1994005035A1 Hollow-anode glow discharge apparatus |
| 03/03/1994 | WO1994005033A1 Ion-optical system for gas discharge ion source |
| 03/03/1994 | WO1994005032A1 Ion-optical system for gas-discharge ion source |
| 03/02/1994 | EP0584923A1 An analytical electron microscope and a method of operating such an electron microscope |
| 03/02/1994 | EP0584869A1 Specimen holder for a particle-optical apparatus |
| 03/02/1994 | EP0584790A1 Zero-power control type vibration eliminating apparatus |
| 03/02/1994 | EP0584676A1 Closed loop semiconductor fabrication method and system |
| 03/02/1994 | EP0584440A1 Atomic force microscope |
| 03/02/1994 | EP0584233A1 Methods of fabricating integrated, aligned tunneling tip pairs |
| 03/02/1994 | EP0395679B1 Process and arrangement for measuring the variation of a signal at a measuring point of a specimen |
| 03/01/1994 | US5291095 Cathode ray tube comprising an electron gun having a plane-parallel optical system |
| 03/01/1994 | US5291016 Electrostatic lens arrangement of multi-stages of multi-pole electrodes and mass spectrometer using the same |
| 03/01/1994 | US5290993 Microwave plasma processing device |
| 03/01/1994 | US5290610 Forming a diamond material layer on an electron emitter using hydrocarbon reactant gases ionized by emitted electrons |
| 03/01/1994 | US5290416 Unidirectional field generator |
| 03/01/1994 | US5290383 Plasma-process system with improved end-point detecting scheme |
| 03/01/1994 | US5290382 Methods and apparatus for generating a plasma for "downstream" rapid shaping of surfaces of substrates and films |
| 03/01/1994 | US5290381 Plasma etching apparatus |
| 02/23/1994 | EP0583736A1 Plasma-enhanced magnetron-sputtered deposition of materials |
| 02/23/1994 | EP0583473A1 Method and device for treatment of articles in gas-discharge plasma |
| 02/22/1994 | US5289010 Ion purification for plasma ion implantation |
| 02/22/1994 | US5289009 Charged particle beam system and cooling device, a coil comprising a cooling member and a cooling member for use in such a charged particle beam system |
| 02/22/1994 | US5289005 Electron microscope |
| 02/22/1994 | US5288971 System for igniting a plasma for thin film processing |
| 02/22/1994 | US5288567 Stencil mask and charged particle beam exposure method and apparatus using the stencil mask |
| 02/22/1994 | US5288386 Sputtering apparatus and an ion source |
| 02/22/1994 | US5288367 Monitoring wavelength of light emitted during etching |
| 02/17/1994 | DE4308203A1 Plasma etching appts. e.g. for semiconductor wafers - provides high etching selectivity and anisotropy even at wafer edges. |
| 02/16/1994 | EP0583162A1 Observation of phase information and interference device therefor |
| 02/16/1994 | EP0439561B1 Process and device for coating substrates |
| 02/16/1994 | EP0276229B1 Dose measurement and uniformity monitoring system for ion implantation |
| 02/15/1994 | US5286978 Method of removing electric charge accumulated on a semiconductor substrate in ion implantation |
| 02/15/1994 | US5286977 Positioning device |
| 02/15/1994 | US5286974 Charged particle energy analyzers |
| 02/15/1994 | US5286361 Magnetically attached sputter targets |