Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/1994
12/20/1994US5374827 Bias for a conversion dynode in an electron multiplier
12/20/1994US5374826 Hybrid photomultiplier tube with high sensitivity
12/20/1994US5374456 Surface potential control in plasma processing of materials
12/20/1994US5374343 Magnetron cathode assembly
12/14/1994EP0628986A1 Self cleaning collimator
12/14/1994EP0628985A1 Control of particle generation within a reaction chamber
12/14/1994EP0628984A1 Method for examining object structures in an electron beam apparatus
12/14/1994EP0628809A1 Calibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing it
12/14/1994EP0628212A1 Enhanced thin film dc plasma processing system
12/13/1994US5373164 For controllably treating a workpiece
12/13/1994US5373158 Field-emission transmission electron microscope and operation method thereof
12/13/1994US5372686 Direct current sputtering of boron from boron/coron mixtures
12/13/1994US5372674 Electrode for use in a plasma assisted chemical etching process
12/08/1994WO1994028578A1 Plasma processing method
12/08/1994WO1994028574A1 Dose modulation and pixel deflection for raster scan lithography
12/08/1994WO1994028573A1 Electron beam array for surface treatment
12/08/1994WO1994028568A1 Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure
12/08/1994WO1994028376A1 Apparatus and method of film thickness measurement
12/08/1994WO1994028374A1 On-axis interferometric alignment
12/08/1994WO1994028190A1 Method and apparatus for protecting a substrate surface from contamination using the photophoretic effect
12/08/1994WO1994028083A1 Antistatic agent and method for suppressing electrification
12/08/1994WO1994027745A1 Method and device for producing a polymer coating inside hollow plastic articles
12/08/1994DE4318086A1 Process and device for producing a polymeric outer layer in plastic blow mouldings
12/08/1994DE4318084A1 Process and device for producing a polymeric outer layer in plastic blow mouldings
12/08/1994CA2164223A1 A procedure and a device for producing a plastic coating on hollow plastic articles
12/07/1994EP0627121A1 Charged particle generation
12/06/1994US5371373 Electron beam lithography method and apparatus separating repetitive and non-repetitive pattern data
12/06/1994US5371371 Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens
12/06/1994US5371366 Ion scattering spectroscope
12/06/1994US5371365 Scanning probe microscopy
12/06/1994US5370779 Electron cyclotron resonance etching or coating
12/06/1994US5370765 For use in vapor deposition, etching
12/01/1994DE4418439A1 Scanning electron microscope
12/01/1994DE4317964A1 Method and device for plasma-chemical processing of hazardous materials and materials
11/1994
11/30/1994EP0626721A1 Process of forming a surface profile in the surface of a substrate
11/30/1994EP0616729A4 Semiconductor device and microwave process for its manufacture.
11/30/1994EP0331718B1 Multiple electrode plasma reactor power distribution system
11/29/1994US5369359 Particle beam testing method with countervoltage or retarding voltage follow-up or feedback
11/29/1994US5369337 DC or HF ion source
11/29/1994US5369336 Plasma generating device
11/29/1994US5369282 Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput
11/29/1994US5369279 Chromatically compensated particle-beam column
11/29/1994US5369274 Method and an apparatus for the examination of structures on membrane surfaces
11/29/1994US5368710 Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window
11/29/1994US5368685 Dry etching apparatus and method
11/29/1994US5368676 Plasma processing apparatus comprising electron supply chamber and high frequency electric field generation means
11/29/1994US5368646 Reaction chamber design to minimize particle generation in chemical vapor deposition reactors
11/29/1994US5368613 Electron beam exposure apparatus
11/24/1994WO1994026952A1 Apparatus and method for depositing diamond and refractory materials
11/23/1994EP0625792A1 Apparatus and process for increasing uniformity of sputtering rate in sputtering apparatus
11/23/1994EP0625218A1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions.
11/23/1994CN1095427A Multifunction ion bombarding furnace with double-deck glow
11/22/1994US5367171 Electron microscope specimen holder
11/22/1994US5367165 Cantilever chip for scanning probe microscope
11/22/1994US5367139 Methods and apparatus for contamination control in plasma processing
11/22/1994US5366847 Photoresists pattern on a substrate with sliver parallelograms
11/22/1994US5366607 Ferromagnetic inner, outer pole producing magnetic flux extended across and inner, outer alloy rings joined to pole and a shunts; magnetrons; magnetic recording media
11/22/1994US5366586 Oscillating microwave frequencies; applying perpendicular magnetic field
11/22/1994US5366585 Method and apparatus for protection of conductive surfaces in a plasma processing reactor
11/22/1994US5366569 Method for producing a corrosion-resistant composite wire
11/22/1994US5366559 Processing the surface of a substrate in a chamber then projecting a laser beam along a trajectory such that contaminant particles are captured by the laser beam
11/17/1994EP0624897A1 Electrode for use in a plasma assisted chemical etching process
11/17/1994EP0624896A1 Contamination control in plasma contouring the plasma sheath using materials of differing rf impedances
11/17/1994DE4316349A1 Method for internal coating of hollow bodies with organic top coats by plasma polymerisation and device for carrying out the method
11/15/1994US5365073 Nanofabricated structures
11/15/1994US5365072 Repositionable substrate for microscopes
11/15/1994US5364718 Method of exposing patttern of semiconductor devices and stencil mask for carrying out same
11/15/1994US5364665 Coating substrates with thin films as vapor barriers, glow discharge plasma from organosilicon, oxygen and inert gases
11/15/1994US5364519 Microwave plasma processing process and apparatus
11/15/1994US5364518 Magnetron cathode for a rotating target
11/15/1994US5364488 Coaxial plasma processing apparatus
11/10/1994WO1994025977A1 Method and apparatus for etchback endpoint detection
11/10/1994WO1994025846A2 In situ tensile testing machine and specimen for a scanning electron microscope
11/10/1994DE4412915A1 Plasma treatment plant and method of its operation
11/10/1994DE4405747A1 Sputtering arrangement, supported by a magnetic field, and vacuum treatment plant equipped therewith
11/10/1994DE4315023A1 Cathodic sputtering device
11/09/1994CN1094879A Multi-azimuth monitor with mini optical fibre rod
11/09/1994CN1094759A Cylindrical magnetron shield structure
11/08/1994US5362969 Processing endpoint detecting technique and detector structure using multiple radiation sources or discrete detectors
11/08/1994US5362968 Optic column having particular major/minor axis magnification ratio
11/08/1994US5362964 Environmental scanning electron microscope
11/08/1994US5362372 Self cleaning collimator
11/08/1994US5362358 Dry etching apparatus and method of forming a via hole in an interlayer insulator using same
11/08/1994US5362353 Faraday cage for barrel-style plasma etchers
11/02/1994EP0622979A2 An electron accelerator for sterilizing packaging material in an anticeptic packaging machine
11/02/1994EP0622823A1 Sputtering targets having life alarm function
11/02/1994EP0622652A1 Scanning near-field optic/atomic-force microscope, probe for use in same, and method of fabricating said probe
11/02/1994EP0622608A1 Scanning apparatus for investigating surface structures with a resolution of microns and method of its manufacture
11/02/1994EP0434797B1 Device for coating substrates by cathode sputtering
11/02/1994EP0357699B1 Scanning electron microscope
11/01/1994US5361016 High density plasma formation using whistler mode excitation in a reduced cross-sectional area formation tube
11/01/1994US5360977 Compound type microscope
11/01/1994US5360485 Apparatus for diamond deposition by microwave plasma-assisted CVPD
11/01/1994US5360484 Forming an amorphous semiconductor film on a substrate
10/1994
10/27/1994WO1994024692A1 Plasma shaping plug for control of sputter etching
10/27/1994DE4338478C1 Method for electron-induced material depositing
10/27/1994DE4336682C1 Method for electron-beam vapour coating (vapour depositing, vacuum depositing) with multi-component evaporation material
10/27/1994DE4313284A1 Slot lock for introducing or discharging substrates from one treatment chamber into an adjacent one
10/27/1994CA2159494A1 Plasma shaping plug for control of sputter etching
10/26/1994EP0621628A1 Ion implanter