Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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12/20/1994 | US5374827 Bias for a conversion dynode in an electron multiplier |
12/20/1994 | US5374826 Hybrid photomultiplier tube with high sensitivity |
12/20/1994 | US5374456 Surface potential control in plasma processing of materials |
12/20/1994 | US5374343 Magnetron cathode assembly |
12/14/1994 | EP0628986A1 Self cleaning collimator |
12/14/1994 | EP0628985A1 Control of particle generation within a reaction chamber |
12/14/1994 | EP0628984A1 Method for examining object structures in an electron beam apparatus |
12/14/1994 | EP0628809A1 Calibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing it |
12/14/1994 | EP0628212A1 Enhanced thin film dc plasma processing system |
12/13/1994 | US5373164 For controllably treating a workpiece |
12/13/1994 | US5373158 Field-emission transmission electron microscope and operation method thereof |
12/13/1994 | US5372686 Direct current sputtering of boron from boron/coron mixtures |
12/13/1994 | US5372674 Electrode for use in a plasma assisted chemical etching process |
12/08/1994 | WO1994028578A1 Plasma processing method |
12/08/1994 | WO1994028574A1 Dose modulation and pixel deflection for raster scan lithography |
12/08/1994 | WO1994028573A1 Electron beam array for surface treatment |
12/08/1994 | WO1994028568A1 Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure |
12/08/1994 | WO1994028376A1 Apparatus and method of film thickness measurement |
12/08/1994 | WO1994028374A1 On-axis interferometric alignment |
12/08/1994 | WO1994028190A1 Method and apparatus for protecting a substrate surface from contamination using the photophoretic effect |
12/08/1994 | WO1994028083A1 Antistatic agent and method for suppressing electrification |
12/08/1994 | WO1994027745A1 Method and device for producing a polymer coating inside hollow plastic articles |
12/08/1994 | DE4318086A1 Process and device for producing a polymeric outer layer in plastic blow mouldings |
12/08/1994 | DE4318084A1 Process and device for producing a polymeric outer layer in plastic blow mouldings |
12/08/1994 | CA2164223A1 A procedure and a device for producing a plastic coating on hollow plastic articles |
12/07/1994 | EP0627121A1 Charged particle generation |
12/06/1994 | US5371373 Electron beam lithography method and apparatus separating repetitive and non-repetitive pattern data |
12/06/1994 | US5371371 Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens |
12/06/1994 | US5371366 Ion scattering spectroscope |
12/06/1994 | US5371365 Scanning probe microscopy |
12/06/1994 | US5370779 Electron cyclotron resonance etching or coating |
12/06/1994 | US5370765 For use in vapor deposition, etching |
12/01/1994 | DE4418439A1 Scanning electron microscope |
12/01/1994 | DE4317964A1 Method and device for plasma-chemical processing of hazardous materials and materials |
11/30/1994 | EP0626721A1 Process of forming a surface profile in the surface of a substrate |
11/30/1994 | EP0616729A4 Semiconductor device and microwave process for its manufacture. |
11/30/1994 | EP0331718B1 Multiple electrode plasma reactor power distribution system |
11/29/1994 | US5369359 Particle beam testing method with countervoltage or retarding voltage follow-up or feedback |
11/29/1994 | US5369337 DC or HF ion source |
11/29/1994 | US5369336 Plasma generating device |
11/29/1994 | US5369282 Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput |
11/29/1994 | US5369279 Chromatically compensated particle-beam column |
11/29/1994 | US5369274 Method and an apparatus for the examination of structures on membrane surfaces |
11/29/1994 | US5368710 Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window |
11/29/1994 | US5368685 Dry etching apparatus and method |
11/29/1994 | US5368676 Plasma processing apparatus comprising electron supply chamber and high frequency electric field generation means |
11/29/1994 | US5368646 Reaction chamber design to minimize particle generation in chemical vapor deposition reactors |
11/29/1994 | US5368613 Electron beam exposure apparatus |
11/24/1994 | WO1994026952A1 Apparatus and method for depositing diamond and refractory materials |
11/23/1994 | EP0625792A1 Apparatus and process for increasing uniformity of sputtering rate in sputtering apparatus |
11/23/1994 | EP0625218A1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions. |
11/23/1994 | CN1095427A Multifunction ion bombarding furnace with double-deck glow |
11/22/1994 | US5367171 Electron microscope specimen holder |
11/22/1994 | US5367165 Cantilever chip for scanning probe microscope |
11/22/1994 | US5367139 Methods and apparatus for contamination control in plasma processing |
11/22/1994 | US5366847 Photoresists pattern on a substrate with sliver parallelograms |
11/22/1994 | US5366607 Ferromagnetic inner, outer pole producing magnetic flux extended across and inner, outer alloy rings joined to pole and a shunts; magnetrons; magnetic recording media |
11/22/1994 | US5366586 Oscillating microwave frequencies; applying perpendicular magnetic field |
11/22/1994 | US5366585 Method and apparatus for protection of conductive surfaces in a plasma processing reactor |
11/22/1994 | US5366569 Method for producing a corrosion-resistant composite wire |
11/22/1994 | US5366559 Processing the surface of a substrate in a chamber then projecting a laser beam along a trajectory such that contaminant particles are captured by the laser beam |
11/17/1994 | EP0624897A1 Electrode for use in a plasma assisted chemical etching process |
11/17/1994 | EP0624896A1 Contamination control in plasma contouring the plasma sheath using materials of differing rf impedances |
11/17/1994 | DE4316349A1 Method for internal coating of hollow bodies with organic top coats by plasma polymerisation and device for carrying out the method |
11/15/1994 | US5365073 Nanofabricated structures |
11/15/1994 | US5365072 Repositionable substrate for microscopes |
11/15/1994 | US5364718 Method of exposing patttern of semiconductor devices and stencil mask for carrying out same |
11/15/1994 | US5364665 Coating substrates with thin films as vapor barriers, glow discharge plasma from organosilicon, oxygen and inert gases |
11/15/1994 | US5364519 Microwave plasma processing process and apparatus |
11/15/1994 | US5364518 Magnetron cathode for a rotating target |
11/15/1994 | US5364488 Coaxial plasma processing apparatus |
11/10/1994 | WO1994025977A1 Method and apparatus for etchback endpoint detection |
11/10/1994 | WO1994025846A2 In situ tensile testing machine and specimen for a scanning electron microscope |
11/10/1994 | DE4412915A1 Plasma treatment plant and method of its operation |
11/10/1994 | DE4405747A1 Sputtering arrangement, supported by a magnetic field, and vacuum treatment plant equipped therewith |
11/10/1994 | DE4315023A1 Cathodic sputtering device |
11/09/1994 | CN1094879A Multi-azimuth monitor with mini optical fibre rod |
11/09/1994 | CN1094759A Cylindrical magnetron shield structure |
11/08/1994 | US5362969 Processing endpoint detecting technique and detector structure using multiple radiation sources or discrete detectors |
11/08/1994 | US5362968 Optic column having particular major/minor axis magnification ratio |
11/08/1994 | US5362964 Environmental scanning electron microscope |
11/08/1994 | US5362372 Self cleaning collimator |
11/08/1994 | US5362358 Dry etching apparatus and method of forming a via hole in an interlayer insulator using same |
11/08/1994 | US5362353 Faraday cage for barrel-style plasma etchers |
11/02/1994 | EP0622979A2 An electron accelerator for sterilizing packaging material in an anticeptic packaging machine |
11/02/1994 | EP0622823A1 Sputtering targets having life alarm function |
11/02/1994 | EP0622652A1 Scanning near-field optic/atomic-force microscope, probe for use in same, and method of fabricating said probe |
11/02/1994 | EP0622608A1 Scanning apparatus for investigating surface structures with a resolution of microns and method of its manufacture |
11/02/1994 | EP0434797B1 Device for coating substrates by cathode sputtering |
11/02/1994 | EP0357699B1 Scanning electron microscope |
11/01/1994 | US5361016 High density plasma formation using whistler mode excitation in a reduced cross-sectional area formation tube |
11/01/1994 | US5360977 Compound type microscope |
11/01/1994 | US5360485 Apparatus for diamond deposition by microwave plasma-assisted CVPD |
11/01/1994 | US5360484 Forming an amorphous semiconductor film on a substrate |
10/27/1994 | WO1994024692A1 Plasma shaping plug for control of sputter etching |
10/27/1994 | DE4338478C1 Method for electron-induced material depositing |
10/27/1994 | DE4336682C1 Method for electron-beam vapour coating (vapour depositing, vacuum depositing) with multi-component evaporation material |
10/27/1994 | DE4313284A1 Slot lock for introducing or discharging substrates from one treatment chamber into an adjacent one |
10/27/1994 | CA2159494A1 Plasma shaping plug for control of sputter etching |
10/26/1994 | EP0621628A1 Ion implanter |