| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/07/1995 | US5387893 Permanent magnet magnetic circuit and magnetron plasma processing apparatus |
| 02/07/1995 | US5387843 Ion source having plasma chamber, an electron source, and a plasma power supply |
| 02/07/1995 | US5387842 Steady-state, glow discharge plasma |
| 02/07/1995 | US5387799 Electron beam writing system |
| 02/07/1995 | US5387797 Detector having selective photon and neutral particle absorbent coating |
| 02/07/1995 | US5387794 Detector for diffracted electrons |
| 02/07/1995 | US5387793 Scanning electron microscope |
| 02/07/1995 | US5387777 Methods and apparatus for contamination control in plasma processing |
| 02/07/1995 | US5387326 Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices |
| 02/07/1995 | US5387288 Apparatus for depositing diamond and refractory materials comprising rotating antenna |
| 02/02/1995 | WO1995003682A1 Method for matching the generator in dipolar low-pressure glow processes |
| 02/02/1995 | WO1995003622A1 Methods and apparatus for water desorption of vacuum chambers |
| 02/02/1995 | WO1995003436A1 Stationary aperture plate for reactive sputter deposition |
| 02/02/1995 | DE4325724A1 Device and method for examining an object and for affecting the object |
| 02/02/1995 | CA2164975A1 Stationary aperture plate for reactive sputter deposition |
| 02/01/1995 | EP0637055A1 Plasma processing apparatus |
| 02/01/1995 | EP0637054A1 Discharge plasma processing device |
| 02/01/1995 | EP0637052A1 Method for producing a stream of ionic aluminum |
| 02/01/1995 | EP0636703A1 Method for deposition of a layer on a substrate-disk using sputtering procedure |
| 02/01/1995 | EP0636285A1 Stabilizer for switch-mode powered rf plasma processing. |
| 02/01/1995 | CN1098243A Microwave enhanced cvd system under magnetic field |
| 02/01/1995 | CN1027549C Microwave enhanced CVD system under magnetic field |
| 01/31/1995 | US5386445 Method and apparatus for electron beam focusing adjustment by electrostatic control of the distribution of beam-generated positive ions in a scanning electron beam computed tomography scanner |
| 01/31/1995 | US5386110 Method of making cantilever chip for scanning probe microscope |
| 01/31/1995 | US5385624 Apparatus and method for treating substrates |
| 01/31/1995 | CA1334155C Process for restoring locally damaged parts, particularly anticathodes |
| 01/26/1995 | WO1995002894A1 Superhard tips for micro-probe microscopy and field emission |
| 01/24/1995 | US5384466 Electron beam lithography apparatus and a method thereof |
| 01/24/1995 | US5384465 Spectrum analyzer in an ion implanter |
| 01/24/1995 | US5384464 Process and apparatus for optical near field microlithography |
| 01/24/1995 | US5384463 Pattern inspection apparatus and electron beam apparatus |
| 01/24/1995 | US5384021 Sputtering apparatus |
| 01/24/1995 | US5384018 Process and apparatus for generating and igniting a low-voltage |
| 01/24/1995 | US5383984 Plasma processing apparatus etching tunnel-type |
| 01/19/1995 | WO1995001843A1 Method for the improved microwave deposition of thin films |
| 01/19/1995 | DE4423407A1 Device for scanning with a focused ion beam, an observation method which uses focused ion beams, and a treatment method which uses focused ion beams |
| 01/18/1995 | EP0634779A1 Collimation chamber with rotatable pedestal |
| 01/18/1995 | EP0634778A1 Hollow cathode array |
| 01/18/1995 | EP0634777A1 Electrode assembly useful in confined plasma assisted chemical etching |
| 01/18/1995 | EP0634575A2 Device for distributing a gaseous component in ionization chambers, for space thrusters |
| 01/18/1995 | EP0634500A1 Planar magnetron sputtering apparatus |
| 01/17/1995 | US5382911 Reaction chamber interelectrode gap monitoring by capacitance measurement |
| 01/17/1995 | US5382895 System for tomographic determination of the power distribution in electron beams |
| 01/17/1995 | US5382800 Charged particle beam exposure method and apparatus |
| 01/17/1995 | US5382796 Apparatus for morphological observation of a sample |
| 01/17/1995 | US5382795 Ultrafine silicon tips for AFM/STM profilometry |
| 01/17/1995 | US5382793 Laser desorption ionization mass monitor (LDIM) |
| 01/17/1995 | US5382498 Processes for electron lithography |
| 01/17/1995 | US5382344 Sputtering apparatus |
| 01/17/1995 | US5382339 Shield and collimator pasting deposition chamber with a side pocket for pasting the bottom of the collimator |
| 01/14/1995 | CA2125532A1 Planar magnetron sputtering apparatus |
| 01/13/1995 | CA2126731A1 Hollow cathode array and method of cleaning sheet stock therewith |
| 01/12/1995 | WO1995001647A1 Enhanced imaging mode for transmission electron microscopy |
| 01/12/1995 | WO1995001646A1 Method for imaging an atomic-level of semiconductor |
| 01/12/1995 | WO1994025846A3 In situ tensile testing machine and specimen for a scanning electron microscope |
| 01/12/1995 | DE4321639A1 Plasma-supported, chemical vacuum-coating installation |
| 01/11/1995 | EP0633713A1 Plasma reactor for a deposition and etching method |
| 01/11/1995 | EP0633600A1 Method and apparatus for forming thin films |
| 01/11/1995 | EP0633599A1 Thin-film forming apparatus |
| 01/11/1995 | EP0633593A1 Electrom beam source and electron beam application apparatus and electronic apparatus using the same |
| 01/11/1995 | EP0632929A1 Producing magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions |
| 01/11/1995 | EP0576559A4 Interfacial plasma bars for photovoltaic deposition apparatus. |
| 01/11/1995 | CN1097223A Surface-treatment method for material by use of impulse high energy-density plasma |
| 01/10/1995 | US5381072 Linear accelerator with improved input cavity structure and including tapered drift tubes |
| 01/10/1995 | US5381004 Particle analysis of notched wafers |
| 01/10/1995 | US5381003 Auger electron spectroscopy |
| 01/10/1995 | US5380421 Vacuum-arc plasma source |
| 01/10/1995 | US5380420 Arc ion plating system |
| 01/10/1995 | US5380419 Cathode-sputtering apparatus comprising a device for measuring critical target consumption |
| 01/10/1995 | US5380414 Noncracking |
| 01/05/1995 | WO1995000835A1 Method and apparatus for adjusting electron-beam device |
| 01/05/1995 | WO1995000677A1 Sputtering device |
| 01/05/1995 | WO1995000676A1 Ultrasonic enhancement of aluminum step coverage and apparatus |
| 01/05/1995 | DE4421517A1 Method for removing or depositing material by means of a particle beam and device for carrying out the method |
| 01/05/1995 | CA2165440A1 Method and apparatus for adjusting electron beam apparatus |
| 01/05/1995 | CA2162596A1 Ultrasonic enhancement of aluminum step coverage and apparatus |
| 01/04/1995 | EP0632142A1 Magnetron sputtering apparatus and systems |
| 01/04/1995 | EP0631712A1 Process for accelerting electrically charged particles |
| 01/04/1995 | EP0631711A1 System for characterizing ac properties of a processing plasma |
| 01/03/1995 | US5378917 Particle-beam imaging system |
| 01/03/1995 | US5378899 Ion implantation target charge control system |
| 01/03/1995 | US5378507 Smoothness |
| 01/03/1995 | US5378498 Antistatic solution for microlithic measurement |
| 01/03/1995 | US5378341 Conical magnetron sputter source |
| 01/03/1995 | US5378311 Method of producing semiconductor device |
| 01/03/1995 | CA2050857C Apparatus for treating the surface of workpieces by means of a plasma torch |
| 12/28/1994 | EP0631358A2 Device for producing magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions |
| 12/28/1994 | EP0473574B1 Process for molding target electrode used in the application of electrostatic charge to a fibrous structure |
| 12/28/1994 | EP0451247B1 Method and apparatus relating to ion implantation |
| 12/27/1994 | US5376883 Analysis of integrated circuit operability using a focused ion beam |
| 12/27/1994 | US5376802 Stencil mask and charge particle beam exposure method and apparatus using the stencil mask |
| 12/27/1994 | US5376799 Turbo-pumped scanning electron microscope |
| 12/27/1994 | US5376792 Scanning electron microscope |
| 12/27/1994 | US5376505 Device fabrication entailing submicron imaging |
| 12/27/1994 | US5376224 Method and apparatus for non-contact plasma polishing and smoothing of uniformly thinned substrates |
| 12/27/1994 | US5376211 Magnetron plasma processing apparatus and processing method |
| 12/22/1994 | WO1994029894A1 Piezoresistive cantilever with integral tip |
| 12/22/1994 | WO1994029494A1 Microwave plasma reactor |
| 12/21/1994 | EP0630040A1 Electron microscope for specimen composition and strain analysis and observation method thereof |
| 12/21/1994 | EP0629313A1 Laser desorption ionization mass monitor (ldim) |