| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/29/1995 | EP0645797A1 Electron beam lithography with background exposure in a neighbouring region |
| 03/29/1995 | EP0644954A1 Semiconductor wafer processing cvd reactor cleaning method and apparatus. |
| 03/29/1995 | CN1028064C Device for coupling microwave energy |
| 03/28/1995 | US5401974 Charged particle beam exposure apparatus and method of cleaning the same |
| 03/28/1995 | US5401972 Layout overlay for FIB operations |
| 03/28/1995 | US5401964 Reduced electron scattering phosphor screen for high resolution transmission electron microscope imaging |
| 03/28/1995 | US5401356 Method and equipment for plasma processing |
| 03/28/1995 | US5401351 Radio frequency electron cyclotron resonance plasma etching apparatus |
| 03/28/1995 | US5401350 Coil configurations for improved uniformity in inductively coupled plasma systems |
| 03/28/1995 | US5401319 Cleaning |
| 03/28/1995 | US5401318 Plasma reactor for performing an etching or deposition method |
| 03/23/1995 | WO1995008186A1 System and method for plasma etching endpoint detection |
| 03/23/1995 | WO1995008182A1 Rf plasma reactor |
| 03/23/1995 | WO1995008181A2 A system for analyzing surfaces of samples |
| 03/23/1995 | DE4331492A1 Fourier electron microscope |
| 03/22/1995 | EP0644575A1 Plasma generating method and apparatus and plasma processing method and apparatus |
| 03/22/1995 | EP0644574A1 Semiconductor device manufacturing apparatus and semiconductor device menufacturing method |
| 03/22/1995 | EP0644573A1 Scan control for ion beam apparatus |
| 03/22/1995 | EP0644273A1 Magnetron plasma sputter deposition apparatus and method of sputter coating onto a substrate |
| 03/21/1995 | US5399872 Charged-particle beam exposure method |
| 03/21/1995 | US5399871 Plasma flood system for the reduction of charging of wafers during ion implantation |
| 03/21/1995 | US5399865 Liquid metal ion source with high temperature cleaning apparatus for cleaning the emitter and reservoir |
| 03/21/1995 | US5399860 Electron optic column and scanning electron microscope |
| 03/21/1995 | US5399830 Plasma treatment apparatus |
| 03/21/1995 | US5399254 Apparatus for plasma treatment |
| 03/21/1995 | US5399253 Plasma generating device |
| 03/21/1995 | US5399252 Apparatus for coating a substrate by magnetron sputtering |
| 03/16/1995 | WO1995007544A1 Soft plasma ignition in plasma processing chambers |
| 03/16/1995 | CA2166549A1 Soft plasma ignition in plasma processing chambers |
| 03/15/1995 | EP0643151A1 Apparatus and system for arc ion plating |
| 03/15/1995 | EP0642600A1 Device for producing a plasma polymer protection layer on workpieces, in particular headlamp reflectors. |
| 03/15/1995 | CN1100151A Sputtering pole |
| 03/14/1995 | US5397956 Electron beam excited plasma system |
| 03/14/1995 | US5397896 Multiple source and detection frequencies in detecting threshold phenomena associated with and/or atomic or molecular spectra |
| 03/14/1995 | US5397448 Device for generating a plasma by means of cathode sputtering and microwave-irradiation |
| 03/09/1995 | WO1995006954A1 Magnetic field cathode |
| 03/09/1995 | WO1995006953A1 Ion implanter |
| 03/09/1995 | DE4424544A1 Target for cathode-sputtering installations |
| 03/09/1995 | DE4338688C1 Holder for a sampling tip of a scanning probe microscope |
| 03/08/1995 | EP0642152A1 Additive composition of defocusing images in an electron microscope |
| 03/08/1995 | EP0530236B1 Process and device for monitoring and controlling etching operations |
| 03/07/1995 | US5396077 Electron beam lithography apparatus having electron optics correction system |
| 03/07/1995 | US5396076 Ion implantation system with protective plates of silicon in mass analyzing region |
| 03/07/1995 | US5396067 Scan type electron microscope |
| 03/07/1995 | US5396066 Displacement element, cantilever probe and information processing apparatus using cantilever probe |
| 03/07/1995 | US5395738 Electron lithography using a photocathode |
| 03/07/1995 | US5395474 Apparatus and method for etching semiconductor wafer |
| 03/07/1995 | US5395453 Apparatus and method for controlling oscillation output of magnetron |
| 03/03/1995 | CA2105423A1 Method and apparatus for carrying out surface processes |
| 03/02/1995 | DE4430017A1 Wien's filter |
| 03/02/1995 | DE4337309A1 Method and device for etching thin films, preferably indium tin oxide films |
| 03/01/1995 | EP0641150A1 Process apparatus |
| 03/01/1995 | EP0641021A2 Particle analysis of notched wafers |
| 03/01/1995 | EP0641020A2 Multiple-scan method for wafer particle analysis |
| 03/01/1995 | EP0641014A1 Plasma reactor for deposition or etching process |
| 03/01/1995 | EP0641013A2 High density plasma CVD and etching reactor |
| 03/01/1995 | EP0641012A1 Electron-optical imaging system with controllable elements |
| 03/01/1995 | EP0641011A2 An electron beam apparatus |
| 03/01/1995 | EP0640963A1 Recording/reproducing method and apparatus using probe |
| 03/01/1995 | EP0640244A1 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window. |
| 03/01/1995 | EP0490958B1 Method and apparatus for imaging dislocations in materials using a scanning electron microscope |
| 03/01/1995 | EP0407460B1 An integrated mass storage device |
| 02/28/1995 | US5394388 Multiple microprobe arrays for recording and reproducing encoded information |
| 02/28/1995 | US5393987 Dose modulation and pixel deflection for raster scan lithography |
| 02/28/1995 | US5393986 Ion implantation apparatus |
| 02/28/1995 | US5393985 Apparatus for focusing an ion beam |
| 02/28/1995 | US5393984 Magnetic deflection system for ion beam implanters |
| 02/28/1995 | US5393983 Magnetic electron lens and elctron microscope using the same |
| 02/28/1995 | US5393977 Charged particle beam apparatus and it's operating method |
| 02/28/1995 | US5393976 Apparatus for displaying a sample image |
| 02/28/1995 | US5393647 Etching, carbiding or nitriding with organic or ammonia vapor |
| 02/28/1995 | US5393634 Continuous phase and amplitude holographic elements |
| 02/28/1995 | US5393575 Method for carrying out surface processes |
| 02/28/1995 | US5393398 Magnetron sputtering apparatus |
| 02/28/1995 | CA2130309A1 Confinement of secondary electrons in plasma ion processing |
| 02/23/1995 | WO1995005263A1 Treatment of particulate matter by electrical discharge |
| 02/23/1995 | DE4333825C1 Apparatus for coating elongated flexible products |
| 02/22/1995 | EP0639850A1 Symmetrical etching ring |
| 02/21/1995 | US5392018 Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits |
| 02/21/1995 | US5391909 Detection of electron-beam scanning of a substrate |
| 02/21/1995 | US5391886 Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system |
| 02/21/1995 | US5391874 Flexible lead assembly for microchannel plate-based detector |
| 02/21/1995 | US5391281 Plasma shaping plug for control of sputter etching |
| 02/21/1995 | US5391252 Plasma pressure control assembly |
| 02/21/1995 | CA1334522C Method and apparatus for cold rolling clad sheet |
| 02/16/1995 | WO1995005060A1 A radiofrequency gas discharge |
| 02/16/1995 | WO1995005000A1 Probe microscopy |
| 02/14/1995 | US5389858 Variable axis stigmator |
| 02/14/1995 | US5389793 Apparatus and methods for ion implantation |
| 02/14/1995 | US5389787 Scanning electron microscope |
| 02/14/1995 | US5389197 Method of and apparatus for plasma processing of wafer |
| 02/14/1995 | US5389154 Plasma processing apparatus |
| 02/14/1995 | US5389153 Plasma processing system using surface wave plasma generating apparatus and method |
| 02/09/1995 | WO1995004368A1 Method and device for magnetron sputtering |
| 02/09/1995 | WO1995004367A1 Improved environmental scanning electron microscope |
| 02/09/1995 | DE4326100A1 Verfahren und Vorrichtung zum Beschichten von Substraten in einer Vakuumkammer, mit einer Einrichtung zur Erkennung und Unterdrückung von unerwünschten Lichtbögen Method and device for coating substrates in a vacuum chamber, with a device for detection and suppression of unwanted arcs |
| 02/09/1995 | DE4317899A1 Method for imaging by means of electron-beam lithography |
| 02/08/1995 | EP0637901A1 Processing method using fast atom beam |
| 02/08/1995 | EP0637834A1 Ion implanting apparatus and ion implanting method |
| 02/08/1995 | EP0637832A1 Electron beam devices |