| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/16/1995 | US5416331 For fabricaing the surface of a specimen at an atomic scale |
| 05/16/1995 | US5416327 Ultrafast scanning probe microscopy |
| 05/16/1995 | US5415757 Apparatus for coating a substrate with electrically nonconductive coatings |
| 05/16/1995 | US5415754 Method and apparatus for sputtering magnetic target materials |
| 05/16/1995 | US5415753 Stationary aperture plate for reactive sputter deposition |
| 05/16/1995 | US5415728 Method of performing plain etching treatment and apparatus therefor |
| 05/16/1995 | US5415719 Two parallel plate electrode type dry etching apparatus |
| 05/16/1995 | US5415718 Reactive ion etching device |
| 05/11/1995 | DE4338323A1 Screen for openings in screened areas (rooms), in particular a monitor screen |
| 05/10/1995 | EP0652585A1 Process and device for etching thin layers, preferably Indium-Tin-Oxide layers |
| 05/09/1995 | US5414514 On-axis interferometric alignment of plates using the spatial phase of interference patterns |
| 05/09/1995 | US5414504 Interference removal |
| 05/09/1995 | US5414324 One atmosphere, uniform glow discharge plasma |
| 05/09/1995 | US5414267 Electron beam array for surface treatment |
| 05/09/1995 | US5414265 Line-width measurements of metallization coated with insulator on microelectronic circuits using energy dispersive x-ray analysis |
| 05/09/1995 | US5414261 Enhanced imaging mode for transmission electron microscopy |
| 05/09/1995 | US5414260 Scanning probe microscope and method of observing samples by using the same |
| 05/09/1995 | US5413820 Vacuum vapor deposition with ionization for films |
| 05/09/1995 | US5413673 Plasma processing apparatus |
| 05/09/1995 | US5413663 Plasma processing apparatus |
| 05/04/1995 | WO1995012210A1 Detection system for measuring high aspect ratio |
| 05/04/1995 | WO1995012008A1 Process for electron beam vapour deposition with a multi-component deposition material |
| 05/04/1995 | WO1995012006A1 Process and device for electron beam vapour deposition |
| 05/04/1995 | WO1995012005A1 Process and system for plasma-activated electron-beam vaporisation |
| 05/04/1995 | WO1995012003A2 Method and apparatus for sputtering magnetic target materials |
| 05/04/1995 | DE4438303A1 Verfahren und Vorrichtung zum Elektronenstrahlschweißen Method and apparatus for electron beam welding, |
| 05/04/1995 | DE4336830A1 Plasma sputtering installation with microwave assistance |
| 05/04/1995 | DE4091603C1 Device for transferring a mechanical movement into a vacuum chamber |
| 05/03/1995 | EP0651434A2 Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography |
| 05/03/1995 | EP0651427A1 Plasma processing |
| 05/03/1995 | EP0651426A1 Methods for reducing contaminants in plasma etch chambers |
| 05/03/1995 | EP0651425A1 Plasma reactor with magnet for protecting an electrostatic chuck from the plasma and a method for using same |
| 05/03/1995 | EP0651243A1 Method of making specimens for an electron microscope |
| 05/03/1995 | EP0651070A1 Methods for removing contaminants from vacuum chamber surfaces |
| 05/03/1995 | EP0650629A1 Reading and writing stored information by means of electrochemistry |
| 05/03/1995 | EP0650593A1 System for detecting atomic or molecular spectra of a substance, and/or threshold phenomena associated with the same |
| 05/03/1995 | EP0650536A1 Deposition apparatus and methods |
| 05/02/1995 | US5412503 Specimen holder for a particle beam optical apparatus |
| 05/02/1995 | US5412218 Differential virtual ground beam blanker |
| 05/02/1995 | US5412211 Environmental scanning electron microscope |
| 05/02/1995 | US5412210 Scanning electron microscope and method for production of semiconductor device by using the same |
| 05/02/1995 | US5412209 For observing a specimen having a recess in its surface |
| 05/02/1995 | US5412180 Ultra high vacuum heating and rotating specimen stage |
| 05/02/1995 | US5411624 Magnetron plasma processing apparatus |
| 05/02/1995 | US5411591 Apparatus for the simultaneous microwave deposition of thin films in multiple discrete zones |
| 05/02/1995 | US5410910 Cryogenic atomic force microscope |
| 04/27/1995 | WO1995011322A1 A method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode |
| 04/27/1995 | DE4336082A1 Process for plasma coating solid substrates by means of a gas capable of deposition |
| 04/26/1995 | EP0650183A1 Methods and apparatus for treating workpieces with plasmas |
| 04/26/1995 | EP0650182A1 Plasma etch reactors and methods of operating thereof |
| 04/26/1995 | EP0650029A2 Atomic force microscope with optional replaceable fluid cell |
| 04/26/1995 | CN1102034A Microwave enhanced CVD system under magnetic field |
| 04/26/1995 | CN1101991A Apparatus and process for glow discharge |
| 04/25/1995 | US5410411 Method of and apparatus for forming multi-layer film |
| 04/25/1995 | US5410122 Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers |
| 04/25/1995 | US5409590 Target cooling and support for magnetron sputter coating apparatus |
| 04/20/1995 | DE4436176A1 Sputtering source with a target arrangement and holder |
| 04/20/1995 | DE4334889A1 Method for controlling the particle removal from a target object |
| 04/19/1995 | EP0649165A1 Method for reducing particulate contamination during plasma processing of semiconductor devices |
| 04/19/1995 | EP0648861A1 Semiconductor processing apparatus |
| 04/19/1995 | EP0648858A1 Methods of coating plasma etch chambers and apparatus for plasma etching workpieces |
| 04/19/1995 | EP0648857A1 Confinement of secondary electrons in plasma ion processing |
| 04/18/1995 | US5408098 Method and apparatus for detecting low loss electrons in a scanning electron microscope |
| 04/18/1995 | US5408094 Atomic force microscope with light beam emission at predetermined angle |
| 04/18/1995 | US5407551 Planar magnetron sputtering apparatus |
| 04/18/1995 | US5407548 Sputtering target of non-amorphous material with a nickel, iron, chromium, phosphorus, boron alloy, supplying reactive gases to coating chamber to produce amorphous layer |
| 04/18/1995 | US5407524 End-point detection in plasma etching by monitoring radio frequency matching network |
| 04/18/1995 | US5406833 Atomic force microscope |
| 04/13/1995 | WO1995010169A1 Device and method for forming a microwave plasma |
| 04/13/1995 | WO1995010119A1 Ion implantation target charge control system |
| 04/12/1995 | EP0648069A1 RF induction plasma source for plasma processing |
| 04/12/1995 | EP0647962A1 Physical vapor deposition employing ion extraction from a plasma |
| 04/12/1995 | EP0647961A1 Device for coating elongated bendable products |
| 04/12/1995 | EP0647960A1 Energy filter with correction of a second-order chromatic aberration |
| 04/11/1995 | US5406178 Pulse beam forming method and apparatus |
| 04/11/1995 | US5406088 Scan and tilt apparatus for an ion implanter |
| 04/11/1995 | US5406087 Specimen-holding device for electron microscope |
| 04/11/1995 | US5406080 Process for monitoring ion-assisted processing procedures on wafers and an apparatus for carrying out the same |
| 04/11/1995 | US5405810 Alignment method and apparatus |
| 04/11/1995 | US5405517 Magnetron sputtering method and apparatus for compound thin films |
| 04/11/1995 | US5405492 Independently and selectively generating plasma or activated species using plurity of remote plasma generating energy sources associated with semiconductor wafer fabrication reactor without gas cycling |
| 04/11/1995 | US5405491 Plasma etching process |
| 04/11/1995 | US5405488 System and method for plasma etching endpoint detection |
| 04/11/1995 | US5405480 Induction plasma source |
| 04/11/1995 | US5405447 Plasma CVD apparatus |
| 04/06/1995 | WO1995009256A1 Treatment of surfaces by corona discharge |
| 04/05/1995 | EP0646787A1 Cantilever for use with atomic force microscope and process for the production thereof |
| 04/05/1995 | EP0502068B1 Method for coating substrates with silicon based compounds |
| 04/05/1995 | CN1101082A Anode structure for magnetron sputtering systems |
| 04/04/1995 | US5404079 Plasma generating apparatus |
| 04/04/1995 | US5404019 Charged particle exposure system having a capability of checking the shape of a charged particle beam used for exposure |
| 04/04/1995 | US5404018 Method of and an apparatus for charged particle beam exposure |
| 04/04/1995 | US5404017 Ion implantation apparatus |
| 04/04/1995 | US5404012 Scanning electron microscope |
| 04/04/1995 | US5403991 Reactor and method for the treatment of particulate matter by electrical discharge |
| 04/04/1995 | US5403453 Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure |
| 03/30/1995 | DE4332866A1 Surface treatment with barrier discharge |
| 03/30/1995 | DE4331468A1 Fourier microstructuring |
| 03/29/1995 | EP0645946A1 Burner head for plasma spray guns |
| 03/29/1995 | EP0645798A1 Magnetron sputtering apparatus |