| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/05/1995 | EP0661728A1 Dipole ring magnet for use in magnetron sputtering or magnetron etching |
| 07/05/1995 | EP0661727A2 Scanning electron microscope |
| 07/05/1995 | EP0311696B1 Method and apparatus for processing with plasma |
| 07/04/1995 | US5430355 RF induction plasma source for plasma processing |
| 07/04/1995 | US5430304 Blanking aperture array type charged particle beam exposure |
| 07/04/1995 | US5430292 Pattern inspection apparatus and electron beam apparatus |
| 07/04/1995 | US5429732 High rate ion beam sputtering process |
| 07/04/1995 | US5429070 High density plasma deposition and etching apparatus |
| 07/04/1995 | CA1336180C Substrate-treating apparatus and method |
| 06/29/1995 | WO1995017666A1 Device for identifying deformed areas in the surfaces of electrically conducting bodies |
| 06/29/1995 | DE4344778A1 Charged particle microscope esp. electron or ion microscope |
| 06/29/1995 | DE4342827A1 Plasma reaction apparatus |
| 06/28/1995 | EP0660372A1 Plasma beam generating method and apparatus which can generate a high-power plasma beam |
| 06/28/1995 | EP0660371A2 Reticle having a number of subfields |
| 06/28/1995 | EP0660370A2 Electron beam lithography system |
| 06/28/1995 | EP0660369A1 Scan and tilt apparatus for an ion implanter |
| 06/28/1995 | EP0659910A2 Semiconductor device and method of fabricating the same |
| 06/28/1995 | EP0659297A1 Toxic remediation system and method |
| 06/28/1995 | EP0620868B1 Process for ionising thermally generated material vapours and device for implementing it |
| 06/27/1995 | US5428203 Electron beam exposing apparatus with a stencil mask kept at a constant temperature |
| 06/27/1995 | US5427826 Method for forming a superhard carbonaceous protective film on articles |
| 06/27/1995 | US5427669 Thin film DC plasma processing system |
| 06/27/1995 | US5427668 Thin film deposition system |
| 06/27/1995 | US5427665 Process and apparatus for reactive coating of a substrate |
| 06/27/1995 | US5427621 Cleaning the interior surface of vapor depositing chemical reactor by sudden change in magnetic flux density of magnetic field |
| 06/22/1995 | WO1995017003A1 Method and apparatus for electron beam focusing adjustment in a scanning electron beam computed tomography scanner |
| 06/22/1995 | WO1995012003A3 Method and apparatus for sputtering magnetic target materials |
| 06/22/1995 | WO1995008181A3 A system for analyzing surfaces of samples |
| 06/22/1995 | DE4405292C1 Raster scanning microscope adjusting device |
| 06/22/1995 | DE4345261A1 Plasma reactor with table for alignment of semiconductor wafer |
| 06/22/1995 | DE4342766A1 Magnetron sputtering unit giving improved removal of target material |
| 06/21/1995 | EP0658918A2 Plasma processing apparatus |
| 06/21/1995 | EP0658917A2 Fine-processing apparatus using low-energy neutral particle beam |
| 06/21/1995 | EP0658634A1 Vacuum arc deposition apparatus |
| 06/21/1995 | EP0414859B1 Improved etch chamber with gas dispersing membrane |
| 06/20/1995 | US5426631 Information recording and reproducing apparatus for recording and reproducing information by using a probe electrode |
| 06/20/1995 | US5425616 Micromotion stage |
| 06/20/1995 | US5425611 Substrate handling and processing system |
| 06/15/1995 | WO1995016274A1 Method of writing a pattern by an electron beam |
| 06/15/1995 | WO1995016058A1 Magnetron sputtering apparatus for compound thin films |
| 06/14/1995 | EP0658073A1 Plasma generating apparatus and method |
| 06/14/1995 | EP0657916A1 Electron beam direct writing system for ULSI lithography with easy rotation and gain corrections of shot patterns and electron beam direct writing method for the same |
| 06/14/1995 | DE4406887C1 Electron beam curing assembly |
| 06/13/1995 | US5424905 Plasma generating method and apparatus |
| 06/13/1995 | US5424550 Charged particle beam exposure apparatus |
| 06/13/1995 | US5424548 Pattern specific calibration for E-beam lithography |
| 06/13/1995 | US5424541 Scanning electron microscope and method for controlling a scanning electron microscope |
| 06/13/1995 | US5424173 Electron beam lithography system and method |
| 06/13/1995 | US5423971 Arrangement for coating substrates |
| 06/13/1995 | US5423970 Apparatus for reactive sputter coating at least one article |
| 06/13/1995 | US5423945 Using a fluorocarbon gas as etchant, and scavenger |
| 06/13/1995 | US5423942 Method and apparatus for reducing etching erosion in a plasma containment tube |
| 06/13/1995 | US5423936 Plasma etching system |
| 06/13/1995 | US5423918 Method for reducing particulate contamination during plasma processing of semiconductor devices |
| 06/13/1995 | US5423915 Plasma CVD apparatus including rotating magnetic field generation means |
| 06/13/1995 | US5423514 Alignment assembly for aligning a spring element with a laser beam in a probe microscope |
| 06/08/1995 | WO1995015576A1 Gas plasma apparatus with movable film liners |
| 06/08/1995 | DE4340956A1 Working integrated circuits with high energy beam |
| 06/06/1995 | US5422724 Multiple-scan method for wafer particle analysis |
| 06/06/1995 | US5422491 Mask and charged particle beam exposure method using the mask |
| 06/06/1995 | US5422490 Focused ion beam implantation apparatus |
| 06/06/1995 | US5422486 Scanning electron beam device |
| 06/06/1995 | US5422139 Vapor deposition with one in-feed opening and one draw-off opening |
| 06/06/1995 | US5421978 Target cooling system with trough |
| 06/06/1995 | US5421891 High density plasma deposition and etching apparatus |
| 05/31/1995 | EP0655424A1 Method of bonding two optical surfaces together, optical assembly thus formed, and particle-optical apparatus comprising such an assembly |
| 05/31/1995 | EP0566606B1 Device and process for the vaporisation of material |
| 05/31/1995 | CN1103232A Reactor and method for the treatment of particulate matter by electrical discharge |
| 05/30/1995 | US5420435 Ion implantation machine with photonic pressure particle filter |
| 05/30/1995 | US5420433 Charged particle beam exposure apparatus |
| 05/30/1995 | US5420415 Structure for alignment of an ion source aperture with a predetermined ion beam path |
| 05/30/1995 | US5419029 Temperature clamping method for anti-contamination and collimating devices for thin film processes |
| 05/26/1995 | WO1995014308A1 Electrode for generating plasma, element for burying electrode, and method for manufacturing the electrode and the element |
| 05/26/1995 | WO1995014307A1 Methods and apparatus for altering material using ion beams |
| 05/26/1995 | WO1995014306A1 Pulsed ion beam source |
| 05/26/1995 | WO1995013927A1 Topology induced plasma enhancement for etched uniformity improvement |
| 05/26/1995 | CA2176339A1 Methods and apparatus for altering material using ion beams |
| 05/24/1995 | EP0654813A1 Electron beam drawing apparatus and method of drawing with such apparatus |
| 05/24/1995 | EP0654543A2 Integrated sputtering target assembly |
| 05/24/1995 | EP0462165B1 Ion gun |
| 05/24/1995 | EP0336979B1 Apparatus for thin film formation by plasma cvd |
| 05/23/1995 | US5418707 High voltage dc-dc converter with dynamic voltage regulation and decoupling during load-generated arcs |
| 05/23/1995 | US5418430 Plasma generator with field-enhancing electrodes |
| 05/23/1995 | US5418378 Ion implant device with modulated scan output |
| 05/23/1995 | US5418372 Intraoperative electron beam therapy system and facility |
| 05/23/1995 | US5418363 In an atomic force microscope |
| 05/23/1995 | US5418348 Electron beam source assembly |
| 05/23/1995 | US5417834 Arrangement for generating a plasma by means of cathode sputtering |
| 05/23/1995 | US5417833 Sputtering apparatus having a rotating magnet array and fixed electromagnets |
| 05/23/1995 | US5417798 Etching method |
| 05/18/1995 | WO1995013518A1 Mounting for a probe tip in a scanning force or scanning tunneling microscope |
| 05/17/1995 | EP0653776A1 Plasma deposition systems for sputter deposition |
| 05/17/1995 | EP0653775A1 Microwave plasma processing apparatus and method |
| 05/17/1995 | EP0653774A1 Scanning electron microscope and image forming method therewith |
| 05/17/1995 | EP0653628A1 Sample stage for scanning probe microscope head |
| 05/17/1995 | EP0653621A1 A process for fabricating a device using an ellipsometric technique |
| 05/17/1995 | EP0653607A2 Nanodisplacement producing apparatus |
| 05/17/1995 | EP0653103A1 Dose modulation and pixel deflection for raster scan lithography |
| 05/17/1995 | EP0652920A1 Antistatic agent and method for suppressing electrification |
| 05/16/1995 | US5416381 Self aligning electron beam gun having enhanced thermal and mechanical stability |