Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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08/16/1995 | EP0667535A2 Electron beam tester and testing method using the same |
08/16/1995 | EP0667034A1 Magnetic field cathode |
08/16/1995 | EP0666933A1 Device for plasma-supported electron beam high-rate vapour deposiition. |
08/16/1995 | EP0514384B1 Device for treating substrates in a gas-based plasma produced by microwaves |
08/15/1995 | US5442185 Large area ion implantation process and apparatus |
08/15/1995 | US5442183 Charged particle beam apparatus including means for maintaining a vacuum seal |
08/15/1995 | US5442182 Electron lens |
08/15/1995 | US5441624 Triggered vacuum anodic arc |
08/15/1995 | US5441617 Recovery system to minimize waste of depositing material |
08/15/1995 | US5441615 Sputtering apparatus and method |
08/15/1995 | US5441614 Method and apparatus for planar magnetron sputtering |
08/15/1995 | US5441596 Applying radio frequency power; stabilization without tuning; reduction in pressure; tuning; increasing power |
08/15/1995 | US5441595 Dry etching apparatus and method of forming a via hole in an interlayer insulator using same |
08/10/1995 | WO1995021516A1 Plasma-generating device |
08/10/1995 | WO1995021457A1 Sputter deposition with mobile collimator |
08/10/1995 | WO1995021276A1 Method and apparatus for coating a substrate |
08/10/1995 | DE4404077A1 Plasma workpiece processing |
08/09/1995 | EP0666339A1 Method and apparatus for cleaning a throttle valve |
08/09/1995 | EP0666335A1 Method for operation of a vacuum arc evaporator and current supply therefor |
08/08/1995 | US5440206 Plasma processing apparatus comprising means for generating rotating magnetic field |
08/08/1995 | US5440124 High mass resolution local-electrode atom probe |
08/08/1995 | US5440123 Method for preparation of transmission electron microscope sample material utilizing sheet mesh |
08/08/1995 | US5440122 Surface analyzing and processing apparatus |
08/08/1995 | US5439574 Method for successive formation of thin films |
08/08/1995 | US5439524 Plasma processing apparatus |
08/03/1995 | DE4403125A1 Vorrichtung zur Plasmaerzeugung Plasma generation device |
08/03/1995 | DE19502865A1 Sealed reactor used to produce silicon@ of semiconductor quality |
08/02/1995 | EP0665577A1 Method and apparatus for monitoring the deposition rate of films during physical vapour deposition |
08/02/1995 | EP0665575A1 Plasma processing systems |
08/02/1995 | EP0665573A1 Apparatus and method for compensating electron emission in a field emission device |
08/02/1995 | EP0665417A2 Atomic force microscope combined with optical microscope |
08/02/1995 | EP0665306A1 Apparatus and method for igniting plasma in a process module |
08/02/1995 | EP0665304A1 Method of manufacturing a tube having a film on its inner peripheral surface and apparatus for manufacturing the same |
08/02/1995 | EP0632929A4 Producing magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions. |
08/02/1995 | EP0487656B1 Charge neutralization apparatus for ion implantation system |
08/02/1995 | EP0479968B1 X-ray imaging system |
08/01/1995 | US5438207 Electron beam direct writing system for ULSI lithography with facilitated rotation and gain corrections of shot patterns and electron beam direct writing method for same |
08/01/1995 | US5438206 Positioning device |
08/01/1995 | US5438203 System and method for unipolar magnetic scanning of heavy ion beams |
08/01/1995 | US5438197 Focused ion beam apparatus |
08/01/1995 | US5438196 Scanning tunneling microscope |
08/01/1995 | US5437893 Method for suppression of electrification |
08/01/1995 | US5437778 Slotted cylindrical hollow cathode/magnetron sputtering device |
07/27/1995 | WO1995020242A1 Electron microscope with raman spectroscopy |
07/26/1995 | EP0664448A2 Tunnel unit and scanning head for scanning tunneling microscope |
07/26/1995 | EP0664347A2 Apparatus for depositing a uniform layer of material on a substrate |
07/26/1995 | EP0664072A1 A radiofrequency gas discharge |
07/25/1995 | US5436528 Plasma source employing spiral RF coil and method for using same |
07/25/1995 | US5436460 Ion-optical imaging system |
07/25/1995 | US5436449 Transmission electron microscope and method of observing magnetic phenomena using its apparatus |
07/25/1995 | US5436424 Plasma generating method and apparatus for generating rotating electrons in the plasma |
07/25/1995 | US5435965 Inserting a cylinder backing into a mold, filling a target and isostatic pressing |
07/25/1995 | US5435900 Apparatus for application of coatings in vacuum |
07/25/1995 | US5435886 Electron cyclotron resonance plasma etching |
07/25/1995 | US5435881 Apparatus for producing planar plasma using varying magnetic poles |
07/25/1995 | US5435880 Plasma processing apparatus |
07/25/1995 | US5435850 Gas injection system |
07/25/1995 | US5435379 Method and apparatus for low-temperature semiconductor processing |
07/20/1995 | WO1995019640A1 Charged particle projector system |
07/20/1995 | WO1995019637A1 Particle beam, in particular ionic optic reproduction system |
07/19/1995 | EP0663683A2 Magnetron plasma processing apparatus and processing method |
07/19/1995 | EP0663682A1 Method and apparatus for tuning field for plasma processing using corrected electrode |
07/19/1995 | EP0663019A1 Topographically precise thin film coating system |
07/19/1995 | EP0527859B1 Apparatus for-plasma treatment of continuous material |
07/19/1995 | CN2203803Y Direct-heating lineur electron gun |
07/18/1995 | US5434842 Reading and writing stored information by means of electrochemistry |
07/18/1995 | US5434795 Method of forming pattern having optical angle in charged particle exposure system |
07/18/1995 | US5434469 Plasma generation, ion extraction and acceleration in glass chamber |
07/18/1995 | US5434424 Spinning reticle scanning projection lithography exposure system and method |
07/18/1995 | US5434423 System and method for optimizing placement of dopant upon semiconductor surface |
07/18/1995 | US5434422 Sample position controller in focused ion beam system |
07/18/1995 | US5434421 Process and device for treating particulate material with electron beams |
07/18/1995 | US5434409 Critical dimension measuring method |
07/18/1995 | US5434353 Self-supporting insulated conductor arrangement suitable for arrangement in a vacuum container |
07/18/1995 | US5433836 Arc source macroparticle filter |
07/18/1995 | US5433835 Sputtering device and target with cover to hold cooling fluid |
07/18/1995 | US5433813 Semiconductor device manufacturing apparatus |
07/18/1995 | US5433812 Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination |
07/18/1995 | US5433790 Chemical vapor deposition with discharge plasma from microwave source |
07/18/1995 | US5433789 Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves |
07/18/1995 | US5433788 Apparatus for plasma treatment using electron cyclotron resonance |
07/18/1995 | US5433786 Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein |
07/18/1995 | US5433258 Gettering of particles during plasma processing |
07/18/1995 | US5433238 Pumping system for evacuating reactor chambers |
07/13/1995 | WO1995019040A1 Electron microscope having a goniometer controlled from the image frame of reference |
07/13/1995 | DE4412906C1 Ion-assisted vacuum coating |
07/12/1995 | EP0662241A1 Method and apparatus for etchback endpoint detection |
07/12/1995 | EP0640244A4 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window. |
07/12/1995 | EP0607415A4 Hollow-anode glow discharge apparatus. |
07/11/1995 | US5432714 System and method for preparing shape data for proximity correction |
07/11/1995 | US5432379 MIM-type electric device production thereof, and electronic apparatus employing the device |
07/11/1995 | US5432352 Ion beam scan control |
07/11/1995 | US5432347 Method for image reconstruction in a high-resolution electron microscope, and electron microscope suitable for use of such a method |
07/11/1995 | US5432345 Method and apparatus for control of surface potential |
07/11/1995 | US5432315 Plasma process apparatus including ground electrode with protection film |
07/11/1995 | US5432314 Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate |
07/11/1995 | US5431799 Collimation hardware with RF bias rings to enhance sputter and/or substrate cavity ion generation efficiency |
07/11/1995 | US5431769 Method and system for plasma treatment |
07/11/1995 | US5431055 Surface measuring apparatus using a probe microscope |
07/06/1995 | WO1995018458A1 Rotating floating magnetron dark-space shield |