Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/1995
08/16/1995EP0667535A2 Electron beam tester and testing method using the same
08/16/1995EP0667034A1 Magnetic field cathode
08/16/1995EP0666933A1 Device for plasma-supported electron beam high-rate vapour deposiition.
08/16/1995EP0514384B1 Device for treating substrates in a gas-based plasma produced by microwaves
08/15/1995US5442185 Large area ion implantation process and apparatus
08/15/1995US5442183 Charged particle beam apparatus including means for maintaining a vacuum seal
08/15/1995US5442182 Electron lens
08/15/1995US5441624 Triggered vacuum anodic arc
08/15/1995US5441617 Recovery system to minimize waste of depositing material
08/15/1995US5441615 Sputtering apparatus and method
08/15/1995US5441614 Method and apparatus for planar magnetron sputtering
08/15/1995US5441596 Applying radio frequency power; stabilization without tuning; reduction in pressure; tuning; increasing power
08/15/1995US5441595 Dry etching apparatus and method of forming a via hole in an interlayer insulator using same
08/10/1995WO1995021516A1 Plasma-generating device
08/10/1995WO1995021457A1 Sputter deposition with mobile collimator
08/10/1995WO1995021276A1 Method and apparatus for coating a substrate
08/10/1995DE4404077A1 Plasma workpiece processing
08/09/1995EP0666339A1 Method and apparatus for cleaning a throttle valve
08/09/1995EP0666335A1 Method for operation of a vacuum arc evaporator and current supply therefor
08/08/1995US5440206 Plasma processing apparatus comprising means for generating rotating magnetic field
08/08/1995US5440124 High mass resolution local-electrode atom probe
08/08/1995US5440123 Method for preparation of transmission electron microscope sample material utilizing sheet mesh
08/08/1995US5440122 Surface analyzing and processing apparatus
08/08/1995US5439574 Method for successive formation of thin films
08/08/1995US5439524 Plasma processing apparatus
08/03/1995DE4403125A1 Vorrichtung zur Plasmaerzeugung Plasma generation device
08/03/1995DE19502865A1 Sealed reactor used to produce silicon@ of semiconductor quality
08/02/1995EP0665577A1 Method and apparatus for monitoring the deposition rate of films during physical vapour deposition
08/02/1995EP0665575A1 Plasma processing systems
08/02/1995EP0665573A1 Apparatus and method for compensating electron emission in a field emission device
08/02/1995EP0665417A2 Atomic force microscope combined with optical microscope
08/02/1995EP0665306A1 Apparatus and method for igniting plasma in a process module
08/02/1995EP0665304A1 Method of manufacturing a tube having a film on its inner peripheral surface and apparatus for manufacturing the same
08/02/1995EP0632929A4 Producing magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions.
08/02/1995EP0487656B1 Charge neutralization apparatus for ion implantation system
08/02/1995EP0479968B1 X-ray imaging system
08/01/1995US5438207 Electron beam direct writing system for ULSI lithography with facilitated rotation and gain corrections of shot patterns and electron beam direct writing method for same
08/01/1995US5438206 Positioning device
08/01/1995US5438203 System and method for unipolar magnetic scanning of heavy ion beams
08/01/1995US5438197 Focused ion beam apparatus
08/01/1995US5438196 Scanning tunneling microscope
08/01/1995US5437893 Method for suppression of electrification
08/01/1995US5437778 Slotted cylindrical hollow cathode/magnetron sputtering device
07/1995
07/27/1995WO1995020242A1 Electron microscope with raman spectroscopy
07/26/1995EP0664448A2 Tunnel unit and scanning head for scanning tunneling microscope
07/26/1995EP0664347A2 Apparatus for depositing a uniform layer of material on a substrate
07/26/1995EP0664072A1 A radiofrequency gas discharge
07/25/1995US5436528 Plasma source employing spiral RF coil and method for using same
07/25/1995US5436460 Ion-optical imaging system
07/25/1995US5436449 Transmission electron microscope and method of observing magnetic phenomena using its apparatus
07/25/1995US5436424 Plasma generating method and apparatus for generating rotating electrons in the plasma
07/25/1995US5435965 Inserting a cylinder backing into a mold, filling a target and isostatic pressing
07/25/1995US5435900 Apparatus for application of coatings in vacuum
07/25/1995US5435886 Electron cyclotron resonance plasma etching
07/25/1995US5435881 Apparatus for producing planar plasma using varying magnetic poles
07/25/1995US5435880 Plasma processing apparatus
07/25/1995US5435850 Gas injection system
07/25/1995US5435379 Method and apparatus for low-temperature semiconductor processing
07/20/1995WO1995019640A1 Charged particle projector system
07/20/1995WO1995019637A1 Particle beam, in particular ionic optic reproduction system
07/19/1995EP0663683A2 Magnetron plasma processing apparatus and processing method
07/19/1995EP0663682A1 Method and apparatus for tuning field for plasma processing using corrected electrode
07/19/1995EP0663019A1 Topographically precise thin film coating system
07/19/1995EP0527859B1 Apparatus for-plasma treatment of continuous material
07/19/1995CN2203803Y Direct-heating lineur electron gun
07/18/1995US5434842 Reading and writing stored information by means of electrochemistry
07/18/1995US5434795 Method of forming pattern having optical angle in charged particle exposure system
07/18/1995US5434469 Plasma generation, ion extraction and acceleration in glass chamber
07/18/1995US5434424 Spinning reticle scanning projection lithography exposure system and method
07/18/1995US5434423 System and method for optimizing placement of dopant upon semiconductor surface
07/18/1995US5434422 Sample position controller in focused ion beam system
07/18/1995US5434421 Process and device for treating particulate material with electron beams
07/18/1995US5434409 Critical dimension measuring method
07/18/1995US5434353 Self-supporting insulated conductor arrangement suitable for arrangement in a vacuum container
07/18/1995US5433836 Arc source macroparticle filter
07/18/1995US5433835 Sputtering device and target with cover to hold cooling fluid
07/18/1995US5433813 Semiconductor device manufacturing apparatus
07/18/1995US5433812 Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination
07/18/1995US5433790 Chemical vapor deposition with discharge plasma from microwave source
07/18/1995US5433789 Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves
07/18/1995US5433788 Apparatus for plasma treatment using electron cyclotron resonance
07/18/1995US5433786 Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
07/18/1995US5433258 Gettering of particles during plasma processing
07/18/1995US5433238 Pumping system for evacuating reactor chambers
07/13/1995WO1995019040A1 Electron microscope having a goniometer controlled from the image frame of reference
07/13/1995DE4412906C1 Ion-assisted vacuum coating
07/12/1995EP0662241A1 Method and apparatus for etchback endpoint detection
07/12/1995EP0640244A4 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window.
07/12/1995EP0607415A4 Hollow-anode glow discharge apparatus.
07/11/1995US5432714 System and method for preparing shape data for proximity correction
07/11/1995US5432379 MIM-type electric device production thereof, and electronic apparatus employing the device
07/11/1995US5432352 Ion beam scan control
07/11/1995US5432347 Method for image reconstruction in a high-resolution electron microscope, and electron microscope suitable for use of such a method
07/11/1995US5432345 Method and apparatus for control of surface potential
07/11/1995US5432315 Plasma process apparatus including ground electrode with protection film
07/11/1995US5432314 Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate
07/11/1995US5431799 Collimation hardware with RF bias rings to enhance sputter and/or substrate cavity ion generation efficiency
07/11/1995US5431769 Method and system for plasma treatment
07/11/1995US5431055 Surface measuring apparatus using a probe microscope
07/06/1995WO1995018458A1 Rotating floating magnetron dark-space shield