| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/28/1995 | DE4409898A1 Additional plasma cathode sputtering method for production of thin films |
| 09/28/1995 | DE19509440A1 Sputter coating appts. |
| 09/28/1995 | DE19500262C1 Plasma treatment of workpieces |
| 09/27/1995 | EP0674471A1 Plasma apparatus |
| 09/27/1995 | EP0674337A1 Magnetron sputtering methods and apparatus |
| 09/27/1995 | EP0674336A1 Gas distribution plate for semiconductor wafer processing apparatus |
| 09/27/1995 | EP0674335A1 Plasma processing method and plasma processing apparatus |
| 09/27/1995 | EP0674334A1 Plasma processing method and apparatus |
| 09/27/1995 | EP0674170A1 Inter-atomic measurement techniques |
| 09/27/1995 | EP0629313A4 Laser desorption ionization mass monitor (ldim). |
| 09/27/1995 | CN2208742Y 电子回旋共振等离子体刻蚀机 Electron cyclotron resonance plasma etcher |
| 09/27/1995 | CN2208741Y Modulation type ion power source for ion chemistry and surface heat treatment |
| 09/26/1995 | US5453617 Electron microscope for specimen composition and strain analysis and observation method thereof |
| 09/26/1995 | US5453305 High density plasmas for etching and for chemical vapor deposition |
| 09/26/1995 | US5453125 ECR plasma source for gas abatement |
| 09/24/1995 | CA2143777A1 Use of multiple anodes in a magnetron for improving the uniformity of its plasma |
| 09/22/1995 | CA2142230A1 Data reduction system for real time monitoring of radiation machinery |
| 09/20/1995 | EP0673056A1 Plasma processing chamber and method of treating substrates in a plasma processing chamber |
| 09/20/1995 | EP0673055A1 Method for forming a superhard carbonaceous protective film on articles |
| 09/20/1995 | EP0673054A1 Ion implanter and method for implanting an ion beam |
| 09/20/1995 | EP0672296A1 Scanning techniques in particle beam devices for reducing the effects of surface charge accumulation |
| 09/20/1995 | EP0672295A1 Ion implantation target charge control system. |
| 09/20/1995 | EP0671974A1 Apparatus and process for the treatment of powder particles for modifying the surface properties of the individual particles |
| 09/20/1995 | EP0612358B1 Method and apparatus for sputter coating employing machine readable indicia carried by target assembly |
| 09/20/1995 | CN2208271Y Vertical probe for scanning microscope |
| 09/20/1995 | CN1108768A Drycorrosion apparatus |
| 09/19/1995 | US5451784 Composite diagnostic wafer for semiconductor wafer processing systems |
| 09/19/1995 | US5451783 Charged-particle analyser |
| 09/19/1995 | US5451487 Electron beam lithographic method and apparatus |
| 09/19/1995 | US5451308 Electric arc metal evaporator |
| 09/19/1995 | US5451290 Gas distribution system |
| 09/19/1995 | US5451259 ECR plasma source for remote processing |
| 09/19/1995 | US5450746 Constant force stylus profiling apparatus and method |
| 09/14/1995 | DE4410466C1 Target holder, target and use thereof, |
| 09/14/1995 | DE19506745A1 Plasma current etching apparatus |
| 09/13/1995 | EP0671756A1 Plasma processing apparatus employing a textured focus ring |
| 09/12/1995 | US5450501 Apparatus for the point-by-point scanning of an object |
| 09/12/1995 | US5450205 Apparatus and method for real-time measurement of thin film layer thickness and changes thereof |
| 09/12/1995 | US5449985 Zero-power control type vibration eliminating apparatus |
| 09/12/1995 | US5449977 Apparatus and method for generating plasma of uniform flux density |
| 09/12/1995 | US5449920 Large area ion implantation process and apparatus |
| 09/12/1995 | US5449917 Method and apparatus for forming a plurality of tracks in a flexible workpiece with a high energy particle |
| 09/12/1995 | US5449916 Electron radiation dose tailoring by variable beam pulse generation |
| 09/12/1995 | US5449915 Electron beam exposure system capable of detecting failure of exposure |
| 09/12/1995 | US5449914 Imaging electron energy filter |
| 09/12/1995 | US5449903 Methods of fabricating integrated, aligned tunneling tip pairs |
| 09/12/1995 | US5449880 Process and apparatus for forming a deposited film using microwave-plasma CVD |
| 09/12/1995 | US5449445 Sputtering target with machine readable indicia |
| 09/12/1995 | US5449444 Method and apparatus for forming a film by sputtering process |
| 09/12/1995 | US5449434 Method for plasma processing at high pressure |
| 09/12/1995 | US5449433 Use of a high density plasma source having an electrostatic shield for anisotropic polysilicon etching over topography |
| 09/12/1995 | US5449432 Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semiconductor fabrication |
| 09/12/1995 | US5449412 Apparatus and method for controlling plasma size and position in plasma-activated chemical vapor deposition processes |
| 09/12/1995 | US5449411 Microwave plasma processing apparatus |
| 09/12/1995 | US5449410 Plasma processing apparatus |
| 09/12/1995 | CA2104072C Method and apparatus for optical emission end point detection in plasma etching process |
| 09/07/1995 | DE4407029A1 Vacuum evaporation system for coating substrate |
| 09/06/1995 | EP0670666A1 Plasma generating apparatus and plasma processing apparatus |
| 09/06/1995 | EP0670587A1 Plasma asher with microwave trap |
| 09/06/1995 | EP0585229B1 Cluster tool soft etch module and ecr plasma generator therefor |
| 09/06/1995 | EP0521017B1 Arc diverter |
| 09/05/1995 | US5448075 Electron-beam exposure system having an improved rate of exposure throughput |
| 09/05/1995 | US5448064 Scanning electron microscope |
| 09/05/1995 | US5448063 Particle-optical instrument |
| 09/05/1995 | US5447799 Polymerization process |
| 09/05/1995 | US5447614 Method of processing a sample using a charged beam and reactive gases and system employing the same |
| 09/05/1995 | US5447595 Electrodes for plasma etching apparatus and plasma etching apparatus using the same |
| 08/30/1995 | EP0669637A1 Plasma process apparatus |
| 08/30/1995 | EP0669636A1 Manufacturing system error detection |
| 08/30/1995 | EP0669635A2 Scanning imaging high resolution electron spectroscopy |
| 08/30/1995 | EP0669538A2 Method of measuring magnetic field and charged particle beam apparatus using the same method |
| 08/30/1995 | EP0669461A1 Three grid ion-optical device |
| 08/30/1995 | CN1107523A Integrated sputter target assembly |
| 08/29/1995 | US5446722 Information recording apparatus having magnetic shield means |
| 08/29/1995 | US5446649 Data-hiding and skew scan for unioning of shapes in electron beam lithography post-processing |
| 08/29/1995 | US5446589 Interference device and method for observing phase informalities |
| 08/29/1995 | US5446282 Scanning photoelectron microscope |
| 08/29/1995 | US5445721 Rotatable magnetron including a replacement target structure |
| 08/29/1995 | US5445709 Anisotropic etching method and apparatus |
| 08/24/1995 | WO1995022638A1 Sputtering method and apparatus for depositing a coating onto substrate |
| 08/24/1995 | WO1995022637A1 Reduced stress sputtering target and method of manufacturing thereof |
| 08/24/1995 | DE4425221C1 Plasma-aided coating of substrates in reactive atmos. |
| 08/24/1995 | DE4405500A1 Appts. for carrying out electron beam processes under vacuum |
| 08/24/1995 | DE4405254A1 Material vaporisation in a vacuum or low gas pressure |
| 08/23/1995 | EP0667921A1 Microwave apparatus for depositing thin films |
| 08/22/1995 | USRE35024 Electron beam gun with grounded shield to prevent arc down |
| 08/22/1995 | US5444384 Method and device of contactless measurement of electric voltages in a unit under measurement with an insulating surface |
| 08/22/1995 | US5444260 Atomic-level imaging, processing and characterization of semiconductor surfaces |
| 08/22/1995 | US5444259 Plasma processing apparatus |
| 08/22/1995 | US5444257 Electron-beam exposure system for reduced distortion of electron beam spot |
| 08/22/1995 | US5444256 Electrostatic lens and method for producing the same |
| 08/22/1995 | US5444245 Method of automatically setting coordinate conversion factor |
| 08/22/1995 | US5444244 Piezoresistive cantilever with integral tip for scanning probe microscope |
| 08/22/1995 | US5444243 Wien filter apparatus with hyperbolic surfaces |
| 08/22/1995 | US5444242 Scanning and high resolution electron spectroscopy and imaging |
| 08/22/1995 | US5444207 Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field |
| 08/22/1995 | US5444191 Information processing apparatus and device for use in same |
| 08/22/1995 | US5443997 Method for transferring heat to or from a semiconductor wafer using a portion of a process gas |
| 08/22/1995 | US5443689 Dry etching process utilizing a recessed electrode |
| 08/17/1995 | DE19502439A1 Charged particle beam in vacuum current measurement |