Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/1995
11/22/1995EP0683506A1 Water transfer apparatus and method
11/21/1995US5468969 Method and apparatus for electron beam lithography
11/21/1995US5468967 Double reflection cathodoluminescence detector with extremely high discrimination against backscattered electrons
11/21/1995US5468966 System for tomographic determination of the power distribution in electron beams
11/21/1995US5468965 Magnetic optics
11/21/1995US5468959 Scanning probe microscope and method for measuring surfaces by using this microscope
11/21/1995US5468363 Magnetic-cusp, cathodic-arc source
11/21/1995US5468362 Apparatus for treating substrates in a vacuum chamber
11/21/1995US5468341 Plasma-etching method and apparatus therefor
11/21/1995US5468296 Apparatus for igniting low pressure inductively coupled plasma
11/21/1995US5467883 Active neural network control of wafer attributes in a plasma etch process
11/16/1995WO1995031000A1 Process for operating a time-of-flight secondary ion mass spectrometer
11/16/1995WO1995027994A3 Particle-optical apparatus comprising a detector for secondary electrons
11/15/1995EP0682125A1 Controlling material sputtered from a target
11/15/1995EP0681852A1 Detector for a radiation therapy transport apparatus
11/15/1995EP0681616A1 Cylindrical magnetron shield structure
11/15/1995CN1111897A Plasma beam generating method and apparatus which can generate a high-power plasma beam
11/14/1995US5467013 Radio frequency monitor for semiconductor process control
11/14/1995US5466991 Optimized ECR plasma apparatus with varied microwave window thickness
11/14/1995US5466942 Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus
11/14/1995US5466940 Electron detector with high backscattered electron acceptance for particle beam apparatus
11/14/1995US5466937 Additive composition of defocusing images in an electron microscope
11/14/1995US5466936 Charged particle microscope
11/14/1995US5466935 Programmable, scanned-probe microscope system and method
11/14/1995US5466929 Apparatus and method for suppressing electrification of sample in charged beam irradiation apparatus
11/14/1995US5466904 Electron beam lithography system
11/14/1995US5466549 Method of detecting and adjusting exposure conditions of charged particle exposure system
11/14/1995US5466548 Method for producing nanometer order dot pattern by electron holography and drawing apparatus for the same
11/14/1995US5466295 ECR plasma generation apparatus and methods
11/14/1995US5465611 Sensor head for use in atomic force microscopy and method for its production
11/14/1995CA1337559C Method and apparatus for forming coherent clusters
11/09/1995WO1995030168A1 Transparent heating plate and transparent heating device
11/08/1995EP0681313A1 A cover assembly for reactive gas processing apparatus
11/08/1995EP0680384A1 Microwave energized process for the preparation of high quality semiconductor material
11/07/1995US5464667 Jet plasma process and apparatus
11/07/1995US5464518 Cylindrical magnetron shield structure
11/07/1995US5464499 Multi-electrode plasma processing apparatus
11/07/1995US5464476 Plasma processing device comprising plural RF inductive coils
11/02/1995WO1995029505A1 Method and device for ion implantation
11/02/1995WO1995029273A1 Multi-frequency inductive method and apparatus for the processing of material
11/02/1995WO1995029272A1 Rectangular vacuum-arc plasma source
11/02/1995EP0680075A1 Electrode for generating plasma, element for burying electrode, and method for manufacturing the electrode and the element
11/02/1995EP0680072A2 A method of operating a high density plasma CVD reactor with combined inductive and capacitive coupling
11/02/1995EP0680071A2 Protective collar for a vacuum seal in a plasma etch reactor
11/02/1995EP0680070A1 Apparatus and method for treating substrates
11/02/1995EP0679730A1 Shield configuration for vacuum chamber
11/02/1995DE4440521C1 Vorrichtung zum Beschichten von Substraten mit einem Materialdampf im Unterdruck oder Vakuum Apparatus for coating substrates with a material vapor in the vacuum or vacuum
11/02/1995DE19515574A1 X=ray analysis method e.g. for one Gigabyte DRAM mfr.
11/02/1995CA2188799A1 Rectangular vacuum-arc plasma source
10/1995
10/31/1995US5463459 Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process
10/31/1995US5463268 Magnetically shielded high voltage electron accelerator
10/31/1995US5462635 Surface processing method and an apparatus for carrying out the same
10/31/1995US5462629 Surface processing apparatus using neutral beam
10/26/1995WO1995028508A1 Process and device for ion-supported vacuum coating
10/26/1995DE4441117C1 Verfahren zur Beschichtung von Substraten und Vorrichtung zur Durchführung des Verfahrens A process for coating substrates and apparatus for carrying out the method
10/26/1995DE4432983C1 Cathode holding and centering device for low energy electron beam generator
10/26/1995DE4414083A1 Low pressure plasma appts. for applying coatings onto or etching on plastic substrates
10/26/1995DE3490595C2 Surface diagnostic analysis
10/25/1995EP0678903A1 Plasma treatment method and apparatus
10/25/1995EP0678895A1 Plasma processing apparatus
10/25/1995EP0678894A1 Plasma processing apparatus
10/25/1995CN1110832A Vacuum plasma processing apparatus
10/24/1995US5460708 Semiconductor processing system
10/24/1995US5460707 Etching or coating method and a plant therefor
10/24/1995US5460034 Method for measuring and analyzing surface roughness on semiconductor laser etched facets
10/19/1995WO1995027998A1 Plasma-generating device
10/19/1995WO1995027996A1 Method for high energy implantation using a low or medium current implanter, and devices therefor
10/19/1995WO1995027994A2 Particle-optical apparatus comprising a detector for secondary electrons
10/19/1995DE4412383A1 Scanning atomic force microscope
10/18/1995EP0677866A1 Apparatus for forming film
10/18/1995EP0677595A1 Device for the vacuum-plasma treatment of articles
10/17/1995US5458759 Magnetron sputtering cathode apparatus
10/17/1995US5458754 Coating, electric arc
10/17/1995US5458732 Method and system for identifying process conditions
10/17/1995US5458724 Etch chamber with gas dispersing membrane
10/17/1995US5458687 Method of and apparatus for securing and cooling/heating a wafer
10/12/1995DE4431785A1 Plasmagerät Plasma device
10/11/1995EP0676791A1 Magnetron sputter source and the use thereof
10/11/1995EP0676790A1 Focus ring for semiconductor wafer processing in a plasma reactor
10/11/1995CN1029994C Microwave plasma chemical vapour deposition apparatus
10/11/1995CN1029993C Process for continuously forming large area functional deposited film by microwave PCVD method and apparatus suitable for practicing same
10/11/1995CN1029992C Microwave plasma treating apparatus
10/10/1995US5457324 Spectrum analyzer in an ion implanter
10/10/1995US5457317 Electron microscope, a camera for such an electron microscope, and a method of operating such an electron microscope
10/10/1995US5457298 Coldwall hollow-cathode plasma device for support of gas discharges
10/10/1995US5456972 Increasing the film wettability by drawing the web between a pair of energized electrodes, low pressure gas discharging
10/10/1995US5456796 Control of particle generation within a reaction chamber
10/05/1995WO1995026566A1 Sputtering target erosion profile control for collimated deposition
10/05/1995WO1995026426A1 Method and apparatus for coating inside surface of nuclear fuel rod cladding tubes
10/05/1995DE19510267A1 Real time monitoring of electron beam properties
10/05/1995CA2186505A1 Sputtering target erosion profile control for collimated deposition
10/04/1995EP0674805A1 Process for carrying out stable low pressure discharge processes.
10/04/1995CN1109512A Vacuum sputtering apparatus
10/03/1995US5455427 Lithographic electron-beam exposure apparatus and methods
10/03/1995US5455426 for removal of contaminating particles from a target chamber
10/03/1995US5455420 Scanning probe microscope apparatus for use in a scanning electron
10/03/1995US5455419 Micromechanical sensor and sensor fabrication process
10/03/1995US5454903 Using an etching gas; applying radio frequency
09/1995
09/28/1995WO1995026041A1 Particle-optical instrument comprising a deflection unit for secondary electrons
09/28/1995WO1995026037A1 Selectively shaped field emission electron beam source, and phosphor array for use therewith
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