| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/09/1996 | US5482610 Sputtering, housing |
| 01/04/1996 | WO1996000451A1 Mechanical shutter for protecting an x-ray detector against high-energy electron or x-ray damage |
| 01/04/1996 | DE4446414A1 Sputtering appts. |
| 01/04/1996 | DE4415694A1 Electron beam installation for workpiece processing |
| 01/03/1996 | EP0690666A1 Structure and method for semiconductor processing |
| 01/03/1996 | EP0690475A1 Structure for alignment of an ion source aperture with a predetermined ion beam path |
| 01/03/1996 | EP0690474A1 Bi-axial-tilting specimen fine motion device and method of correcting image shifting |
| 01/03/1996 | EP0690473A2 Ion beam electron neutralizer |
| 01/03/1996 | EP0450061B1 Improved resonant radio frequency wave coupler apparatus using higher modes |
| 01/02/1996 | US5481529 Scanning probe microscope for observing a sample surface while applying an AC bias voltage between the sample and a probe |
| 01/02/1996 | US5481528 Information processor and method using the information processor |
| 01/02/1996 | US5481522 Recording/reproducing method and apparatus using probe |
| 01/02/1996 | US5481472 Method and apparatus for automatically recognizing repeated shapes for data compaction |
| 01/02/1996 | US5481164 Variable axis stigmator |
| 01/02/1996 | US5481116 Magnetic system and method for uniformly scanning heavy ion beams |
| 01/02/1996 | US5481111 Electron microscope having a goniometer controlled from the image frame of reference |
| 01/02/1996 | US5481109 Surface analysis method and apparatus for carrying out the same |
| 01/02/1996 | US5480533 Microwave plasma source |
| 01/02/1996 | US5480527 Ionized vapors, uniform coating or doping |
| 01/02/1996 | US5480052 Domed extension for process chamber electrode |
| 12/27/1995 | EP0689227A2 Microwave plasma processing method |
| 12/27/1995 | EP0689226A1 Multiple electrode plasma reactor |
| 12/27/1995 | EP0689225A1 Charged particle beam device |
| 12/27/1995 | EP0689224A1 Charged particle beam device |
| 12/27/1995 | EP0689063A2 Electron detector with high back-scattered electron acceptance for particle beam apparatus |
| 12/27/1995 | EP0688469A1 Method of triggering gas discharges |
| 12/27/1995 | EP0621979B1 Radio-frequency ion source |
| 12/27/1995 | EP0527133B1 Plasma reaction chamber having conductive diamond-coated surfaces |
| 12/26/1995 | US5479340 Of a semiconductor manufacturing process |
| 12/26/1995 | US5479013 For examining a surface of a sample |
| 12/26/1995 | US5478698 Direct-write afocal electron-beam semiconductor lithography |
| 12/26/1995 | US5478608 Plasma assisted chemical vapor deposition in tube having substrate holders with walls which act as liners to confine arc between anode and cathode |
| 12/26/1995 | US5478459 Plasma sputtering installation with microwave enhancement |
| 12/26/1995 | US5478429 Plasma process apparatus |
| 12/26/1995 | US5478403 Applying plasma generated by activating gas containing oxygen through plate for capturing charged particles and transmitting neutral species, positioning material where high energy particles impinge thereon with neutral species |
| 12/26/1995 | US5478195 Process and apparatus for transferring an object and for processing semiconductor wafers |
| 12/26/1995 | US5477975 Plasma etch apparatus with heated scavenging surfaces |
| 12/21/1995 | WO1995034908A1 Magnetic scanning of heavy ion beams |
| 12/21/1995 | WO1995034907A1 Fast magnetic scanning of heavy ion beams |
| 12/21/1995 | DE4421103A1 Potential guiding electrode for plasma supported thin layer deposition for mfg. electric-electronic thin film components |
| 12/21/1995 | DE4421045A1 Plasma-assisted coating appts. |
| 12/21/1995 | DE4420951A1 Appts. for detecting micro-arcs in sputtering units |
| 12/20/1995 | EP0688038A2 Microwave plasma processing system |
| 12/20/1995 | EP0688037A1 Microwave plasma processing system |
| 12/20/1995 | EP0688036A2 Method for transferring patterns with charged particle beam |
| 12/20/1995 | EP0687897A1 Method for making specimen and apparatus thereof |
| 12/20/1995 | EP0687889A2 Method for detecting displacement of atoms on material surface and method for local supply of heteroatoms |
| 12/20/1995 | EP0687380A1 Electron microscope having a goniometer controlled from the image frame of reference |
| 12/19/1995 | US5477049 Particle analysis method |
| 12/19/1995 | US5476520 Shield assembly for semiconductor wafer supports |
| 12/19/1995 | US5476182 Etching apparatus and method therefor |
| 12/19/1995 | US5476006 Crystal evaluation apparatus and crystal evaluation method |
| 12/13/1995 | EP0686995A1 An ion implantation device |
| 12/13/1995 | EP0686994A1 Defect observing electron microscope |
| 12/13/1995 | EP0686708A1 Film forming method and film forming apparatus |
| 12/13/1995 | EP0686211A1 System for sputtering compositions onto a substrate |
| 12/13/1995 | EP0562035A4 Minimization of particle generation in cvd reactors and methods |
| 12/12/1995 | US5475618 Apparatus and method for monitoring and controlling an ion implant device |
| 12/12/1995 | US5475231 Apparatus for monitoring ion beams with an electrically isolated aperture |
| 12/12/1995 | US5475218 Instrument and method for 3-dimensional atomic arrangement observation |
| 12/12/1995 | US5474667 Reduced stress sputtering target and method of manufacturing therefor |
| 12/12/1995 | US5474650 Method and apparatus for dry etching |
| 12/12/1995 | US5474649 Plasma processing apparatus employing a textured focus ring |
| 12/12/1995 | US5474648 Monitoring power of radio frequency energy, dynamically controlling with computer |
| 12/12/1995 | US5474643 Plasma processing apparatus |
| 12/12/1995 | US5474640 Apparatus for marking a substrate using ionized gas |
| 12/07/1995 | DE4419167A1 Appts. for coating a substrate |
| 12/07/1995 | DE4418930A1 Particle beam lithography system for microcircuit mfr. |
| 12/07/1995 | DE4418906A1 Coating a substrate |
| 12/06/1995 | EP0685873A1 Inductively coupled plasma reactor with an electrode for enhancing plasma ignition |
| 12/06/1995 | EP0685872A1 Ion implanter |
| 12/06/1995 | EP0685003A1 Method of stabilizing plasma generation by an electron-beam evaporator. |
| 12/05/1995 | US5473627 UHV rotating fluid delivery system |
| 12/05/1995 | US5473291 For adjusting voltage standing wave ratio of plasma processing system |
| 12/05/1995 | US5473165 Method and apparatus for altering material |
| 12/05/1995 | US5472916 Method for manufacturing tunnel-effect sensors |
| 12/05/1995 | US5472566 High speed milling, quality; for electron microscope |
| 12/05/1995 | US5472565 Topology induced plasma enhancement for etched uniformity improvement |
| 12/05/1995 | US5472561 Radio frequency monitor for semiconductor process control |
| 12/05/1995 | US5472550 Method and apparatus for protecting a substrate surface from contamination using the photophoretic effect |
| 11/30/1995 | WO1995032517A1 Method of producing an electrical discharge and a device for carrying out said method |
| 11/30/1995 | WO1995032315A1 Magnetically enhanced multiple capacitive plasma generation apparatus and related method |
| 11/30/1995 | DE4418162A1 Appts. for performing processes of electron beam technology in vacuum |
| 11/30/1995 | DE4418161A1 Appts. for performing processes of electron beam technology in vacuum |
| 11/30/1995 | DE4409761A1 Appts. for plasma-supported evaporation in arc discharge plasma |
| 11/29/1995 | EP0583473A4 Method and device for treatment of articles in gas-discharge plasma |
| 11/29/1995 | EP0426861B1 Method of cooling charged particle beam |
| 11/28/1995 | US5471458 Multi-probe information recording/reproducing apparatus including a probe displacement control circuit |
| 11/28/1995 | US5471115 Method and apparatus for measuring electron density of plasma |
| 11/28/1995 | US5471064 Precision machining method, precision machining apparatus and data storage apparatus using the same |
| 11/28/1995 | US5470784 Method of forming semiconducting materials and barriers using a multiple chamber arrangement |
| 11/28/1995 | US5470452 Shielding for arc suppression in rotating magnetron sputtering systems |
| 11/28/1995 | US5470451 Sputtering apparatus |
| 11/28/1995 | US5470426 Plasma processing apparatus |
| 11/28/1995 | US5469734 Scanning apparatus linearization and calibration system |
| 11/28/1995 | US5469733 Cantilever for atomic force microscope and method of manufacturing the cantilever |
| 11/23/1995 | WO1995031822A1 Device and method for plasma treatment |
| 11/23/1995 | WO1995031270A1 Device for detoxifying exhaust fumes from mobile equipments |
| 11/23/1995 | DE4417114A1 Appts. for particle-selective deposition of thin films |
| 11/23/1995 | DE4416413A1 Verfahren zum Betreiben eines Flugzeit-Sekundärionen-Massenspektrometers A method of operating a Time of Flight Secondary Ion Mass Spectrometer |