| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/12/2014 | CN203434124U Ion beam measurement guiding device used for ion implanter |
| 02/12/2014 | CN203434123U Sample moving platform based on piezoceramic tube |
| 02/12/2014 | CN203434122U Multi-magnetic pole beam focusing adjusting device |
| 02/12/2014 | CN103582927A Method and apparatus for improved uniformity control with dynamic beam shaping |
| 02/12/2014 | CN103578906A Apparatus for treating substrate |
| 02/12/2014 | CN103578905A Inductively coupled plasma processing device |
| 02/12/2014 | CN103578904A Particle pollution reducing method used for multi-chamber plasma processing device |
| 02/12/2014 | CN103578903A Etching cavity capable of adjusting electrode spacing distance and parallelism degree |
| 02/12/2014 | CN103578902A Methods for extending ion source life and improving ion source performance during carbon implantation |
| 02/12/2014 | CN103578901A Sequencer for combining automated and manual-assistance jobs in a charged particle beam device |
| 02/12/2014 | CN103578900A Plasma processing device and static chuck thereof |
| 02/12/2014 | CN103578899A Plasma processing device and electro static chuck thereof |
| 02/12/2014 | CN103578898A Electronic gun special for electron beam bombardment furnace |
| 02/12/2014 | CN102376515B Objective pole shoe of transmission electron microscope |
| 02/12/2014 | CN101974735B Inductively coupled plasma processing apparatus |
| 02/11/2014 | US8648318 Multiple beam charged particle optical system |
| 02/11/2014 | US8648301 Particle beam system having a hollow light guide |
| 02/11/2014 | US8648299 Isotope ion microscope methods and systems |
| 02/11/2014 | US8647992 Flowable dielectric using oxide liner |
| 02/06/2014 | WO2014022844A2 In-vacuum high speed pre-chill and post-heat stations |
| 02/06/2014 | WO2014022429A1 Environmental sem gas injection system |
| 02/06/2014 | WO2014022180A1 Anisotropic surface energy modulation by ion implantation |
| 02/06/2014 | WO2014022045A1 Hybrid electrostatic lens with increased natural frequency |
| 02/06/2014 | WO2014021019A1 Charged particle beam device |
| 02/06/2014 | US20140035458 Plasma reactor with electron beam plasma source having a uniform magnetic field |
| 02/06/2014 | US20140034845 Charged Particle Optics with Azimuthally-Varying Third-Order Aberrations for Generation of Shaped Beams |
| 02/06/2014 | US20140034831 Inspection system by charged particle beam and method of manufacturing devices using the system |
| 02/06/2014 | US20140034830 Environmental SEM Gas Injection System |
| 02/06/2014 | US20140034829 System and method for irradiating an etem-sample with light |
| 02/06/2014 | US20140034612 Method of differential counter electrode tuning in an rf plasma reactor |
| 02/06/2014 | US20140034608 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
| 02/06/2014 | US20140034243 Apparatus for plasma processing system with tunable capacitance |
| 02/06/2014 | US20140034241 Temperature enhanced electrostatic chucking in plasma processing apparatus |
| 02/05/2014 | EP2693457A2 Sequencer for combining automated and manual-assistance jobs in a charged particle beam device |
| 02/05/2014 | CN103563042A Mass analysis variable exit aperture |
| 02/05/2014 | CN103562431A Improved method of controlling lithium uniformity |
| 02/05/2014 | CN103560068A Plasma treatment device evenly changing distribution of plasmas and control method thereof |
| 02/05/2014 | CN103560067A Improved phase plate for a TEM |
| 02/05/2014 | CN101917165B Electron beam system, image generator, and amplifier of high-speed driving inductor |
| 02/04/2014 | US8642980 Composite charged particle beam apparatus |
| 02/04/2014 | US8642973 Detection apparatus for detecting charged particles, methods for detecting charged particles and mass spectrometer |
| 02/04/2014 | US8642958 Composite charged particle beam apparatus and sample processing and observing method |
| 02/04/2014 | US8642956 Transmission electron microscope and method of operating a transmission electron microscope |
| 02/04/2014 | US8642949 Efficient atmospheric pressure interface for mass spectrometers and method |
| 01/30/2014 | WO2014018707A1 Three dimensional metal deposition technique |
| 01/30/2014 | WO2014018694A2 Ion beam sample preparation apparatus and methods |
| 01/30/2014 | WO2014018693A1 Ion beam sample preparation apparatus and methods |
| 01/30/2014 | WO2014018340A1 Beamline electrode voltage modulation for ion beam glitch recovery |
| 01/30/2014 | WO2014017544A1 Element analyzing device |
| 01/30/2014 | WO2014017225A1 Electron microscope and electron microscope sample retaining device |
| 01/30/2014 | WO2014017206A1 Electron beam smelting furnace and method for operating electron beam smelting furnace using same |
| 01/30/2014 | WO2014017008A1 Sample holder and method for observing electron microscopic image |
| 01/30/2014 | WO2014016505A1 Method and apparatus for forming a nanoporous membrane |
| 01/30/2014 | WO2014016357A2 Analysing rf signals from a plasma system |
| 01/30/2014 | WO2014016335A1 Apparatus for generating and maintaining plasma for plasma processing |
| 01/30/2014 | WO2014016180A1 Multi-module photon detector and use thereof |
| 01/30/2014 | WO2014015567A1 Etching device and upper electrode thereof |
| 01/30/2014 | WO2013171177A9 Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus |
| 01/30/2014 | US20140027635 Charged particle beam apparatus |
| 01/30/2014 | US20140027059 Electrode for plasma processing apparatus, plasma processing apparatus, plasma processing method and storage medium |
| 01/30/2014 | DE112012001214T5 Ladungsteilchenstrahlvorrichtung Charged particle |
| 01/30/2014 | DE102012106379A1 Messvorrichtung und Messverfahren für Behältnissterilisation Measuring apparatus and methods of measurement for container sterilization |
| 01/29/2014 | EP2690648A1 Method of preparing and imaging a lamella in a particle-optical apparatus |
| 01/29/2014 | EP2690647A1 System and method for measuring angular luminescence in a charged particle microscope |
| 01/29/2014 | EP2689049A2 Plasma enhanced chemical vapor deposition apparatus and method for controlling the same |
| 01/29/2014 | EP2689048A2 Plasma enhanced chemical vapor deposition apparatus and method for controlling the same |
| 01/29/2014 | CN103545237A Electrostatic chuck component and plasma device provided with same |
| 01/29/2014 | CN103545234A Lifting device, semiconductor chip production metal etching equipment and method |
| 01/29/2014 | CN103545228A Endpoint detecting method, program and substrate processing apparatus |
| 01/29/2014 | CN103545164A Radio frequency plasma reaction chamber |
| 01/29/2014 | CN103545163A Method for treating semiconductor structures with residual fluorine or residual chlorine |
| 01/29/2014 | CN103545162A Plasma reaction device and quartz window heating method |
| 01/29/2014 | CN103545161A Ion implantation method and ion implantation apparatus |
| 01/29/2014 | CN102315068B Separation plate device for double-cavity structure plasma body soaking ion injection |
| 01/29/2014 | CN102257593B Simultaneous measurement of beams in lithography system |
| 01/29/2014 | CN102105960B 成像系统 Imaging Systems |
| 01/28/2014 | US8637838 System and method for ion implantation with improved productivity and uniformity |
| 01/28/2014 | US8637836 High aspect ratio sample holder |
| 01/28/2014 | US8637834 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| 01/28/2014 | US8637820 Scanning electron microscope and inspection method using same |
| 01/28/2014 | US8637819 Cross-section processing and observation apparatus |
| 01/28/2014 | US8636960 Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases |
| 01/28/2014 | CA2628586C Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering |
| 01/23/2014 | WO2014014446A1 Endpointing for focused ion beam processing |
| 01/23/2014 | WO2014013709A1 Specimen holder tip part, specimen holder having said specimen holder tip part, gonio stage, and electron microscope having said gonio stage |
| 01/23/2014 | WO2014013209A1 Device for treating an object with plasma |
| 01/23/2014 | US20140022521 Substrate processing apparatus and substrate processing method |
| 01/23/2014 | US20140021861 Symmetrical inductively coupled plasma source with side rf feeds and rf distribution plates |
| 01/23/2014 | US20140021655 Drawing apparatus, transmission apparatus, receiving apparatus, and method of manufacturing article |
| 01/23/2014 | US20140021350 Pattern measuring apparatus |
| 01/23/2014 | US20140021349 Pattern measuring apparatus |
| 01/23/2014 | US20140021348 Electron beam irradiation apparatus |
| 01/23/2014 | US20140021347 Charged particle beam apparatus |
| 01/23/2014 | US20140021343 Method and apparatus for neutral beam processing based on gas cluster ion beam technology |
| 01/23/2014 | US20140020839 Inductively coupled plasma source with symmetrical rf feed |
| 01/23/2014 | US20140020838 Symmetrical inductively coupled plasma source with coaxial rf feed and coaxial shielding |
| 01/23/2014 | US20140020832 Substrate processing apparatus and substrate processing method using same |
| 01/23/2014 | DE112011104912T5 Geladene Teilchen verwendendes Mikroskop und Verfahren zur Bildkorrektur damit Charged particles-use microscope and method for image correction so that |
| 01/23/2014 | DE102012212720A1 MeV electron source e.g. electron gun, for use in e.g. computer tomography-like machine, has linear accelerator supplying high frequency power that is selected in milli-second region and/or electron flow selected in region by drive unit |
| 01/23/2014 | DE102012106403A1 Reactive magnetron sputtering for coating substrates by target of magnetron, comprises arranging substrate opposite to magnetron, atomizing target material by sputtering and depositing sputtered target material to substrate |