| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 04/30/1996 | US5512150 Deposition of multilayer by orienting the polarity of magnetic means, sputtering from inner target onto substrate, reversing the polarity, sputtering from outer target |
| 04/30/1996 | US5512102 Microwave enhanced CVD system under magnetic field |
| 04/30/1996 | US5511931 Micromotion stage |
| 04/30/1996 | CA2070457C Electron beam gun for use in an electron beam evaporation source |
| 04/25/1996 | DE19515278C1 Pulsed HV constant current source |
| 04/25/1996 | DE19507077C1 Plasma reactor for diamond layer deposition |
| 04/24/1996 | EP0708478A1 Plasma guard for use in a vacuum process chamber |
| 04/24/1996 | EP0707663A1 Sputtering device |
| 04/24/1996 | EP0707662A1 Ultrasonic enhancement of aluminum step coverage and apparatus |
| 04/23/1996 | US5510624 Simultaneous specimen and stage cleaning device for analytical electron microscope |
| 04/23/1996 | US5510617 Particle-optical instrument comprising a deflection unit for secondary electrons |
| 04/23/1996 | US5510615 Scanning probe microscope apparatus for use in a scanning electron microscope |
| 04/23/1996 | US5510151 Establishing enclosed film-forming chamber by curving and projecting moving substrate web to form cylindrical wall, feeding raw material gas into resulting space to deposit film on inner face of wall |
| 04/23/1996 | US5510088 Low temperature plasma film deposition using dielectric chamber as source material |
| 04/23/1996 | US5510011 Method for forming a functional deposited film by bias sputtering process at a relatively low substrate temperature |
| 04/18/1996 | DE4437010A1 Reducing or eliminating stick slip effects and lateral force between probe movable relative to surface esp. in raster force microscopy |
| 04/18/1996 | DE19538253A1 Surface analysis of solid particles for establishing atom and electron concentrations |
| 04/17/1996 | EP0707337A1 Solid annular gas discharge electrode |
| 04/17/1996 | CN1120601A Magnetic controlled tube sputtering apparatus |
| 04/16/1996 | US5508519 Mainshaft shield |
| 04/16/1996 | US5508518 Lithography tool with vibration isolation |
| 04/16/1996 | US5507931 Electrodepositing a melted metal or alloy on magnetron cathode, forming an inactive coatings with a reactive gas; reducing the potential for arcing |
| 04/16/1996 | US5507874 Performing in situ electrical or mechanical removal of contaminant particles in closed chamber while maintaining under controlled subatmospheric environment |
| 04/11/1996 | WO1996010836A1 Particle-optical apparatus comprising an electron source with a needle and a membrane-like extraction electrode |
| 04/11/1996 | DE4430534A1 Elektronenstrahl-Erzeuger Electron gun |
| 04/11/1996 | DE19537212A1 Apparatus for sputter coating substrates which is self-stabilising even at high power |
| 04/10/1996 | EP0705350A1 Apparatus and method for depositing diamond and refractory materials |
| 04/10/1996 | EP0705149A1 Method for producing a polymer coating inside hollow plastic articles |
| 04/10/1996 | CN1120238A Electron gun |
| 04/09/1996 | USRE35203 Electron beam array for surface treatment |
| 04/09/1996 | US5506829 Cantilever probe and apparatus using the same |
| 04/09/1996 | US5506414 For investigating a selected area of the surface region of a specimen |
| 04/09/1996 | US5506400 Scanning type probe microscope |
| 04/09/1996 | US5505833 Using collimator having cylindrical holes to reduce lateral component of particle flux |
| 04/04/1996 | WO1996010324A1 Laser target for use in an apparatus for generating radiation and atomic particles |
| 04/04/1996 | DE4435043A1 Electrostatic miniature lens with electrostatic shutters |
| 04/03/1996 | EP0704878A1 Uniform film thickness deposition of sputtered materials |
| 04/03/1996 | EP0704552A1 Plasma processing method and plasma generator |
| 04/03/1996 | EP0704102A1 Electron beam array for surface treatment |
| 04/03/1996 | EP0611485B1 Electromechanical positioning device |
| 04/03/1996 | EP0594706B1 Method of producing flat ecr layer in microwave plasma device and apparatus therefor |
| 04/03/1996 | CN1119552A Sputtering apparatus |
| 04/02/1996 | US5504366 System for analyzing surfaces of samples |
| 04/02/1996 | US5504341 Producing RF electric fields suitable for accelerating atomic and molecular ions in an ion implantation system |
| 04/02/1996 | US5504340 Process method and apparatus using focused ion beam generating means |
| 04/02/1996 | US5504339 Method of repairing a pattern using a photomask pattern repair device |
| 04/02/1996 | US5503881 Method of processing a semiconductor wafer |
| 04/02/1996 | US5503725 Method and device for treatment of products in gas-discharge plasma |
| 04/02/1996 | US5503676 Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber |
| 04/02/1996 | US5503010 Directional atomic force microscope and method of observing a sample with the microscope |
| 03/28/1996 | WO1996009641A1 Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber |
| 03/28/1996 | WO1996009622A2 Apparatus and method for sputtering carbon |
| 03/28/1996 | DE4432982A1 Appts. for subjecting surfaces to electron radiation |
| 03/27/1996 | EP0703599A1 Rotating cathodic sputtering cathode with plural targets |
| 03/27/1996 | EP0703598A1 Electrode between sputtering target and workpiece |
| 03/27/1996 | EP0703597A1 Microwave energized ion source for ion implantation |
| 03/27/1996 | EP0703596A2 Method and apparatus for energy beam machining |
| 03/27/1996 | EP0703429A2 Probe with torsion lever structure, and scanning probe microscope and record/reproducing apparatus utilizing the same |
| 03/27/1996 | EP0702843A1 Method for high energy implantation using a low or medium current implanter, and devices therefor |
| 03/27/1996 | CN1119338A Structure for alignment of an ion source aperture with a predetermind ion beam path |
| 03/27/1996 | CA2159028A1 Microwave energized ion source for ion implantation |
| 03/26/1996 | US5502355 Plasma processing apparatus for producing high density plasma |
| 03/26/1996 | US5502306 Electron beam inspection system and method |
| 03/26/1996 | US5502303 Electronic phantom source for gamma-ray cameras |
| 03/26/1996 | US5501740 Microwave plasma reactor |
| 03/21/1996 | WO1996008836A1 An apparatus for generating a glow discharge |
| 03/21/1996 | WO1996008835A1 Particle beam detector providing z-axis and topographic contrast |
| 03/21/1996 | DE4443608C1 Plasma reactor for integrated circuit fabrication |
| 03/21/1996 | DE4433531A1 High voltage d.c. current generator for generating voltage for accelerating charged particles, e.g. in electron microscope, |
| 03/21/1996 | DE4433524A1 High voltage direct current generator for generating voltage for accelerating charged particles, e.g. in electron microscope, |
| 03/20/1996 | EP0702393A2 Plasma processing apparatus for radiating microwave from rectangular waveguide through long slot to plasma chamber |
| 03/20/1996 | EP0702392A2 Plasma reactor |
| 03/20/1996 | EP0702391A2 Etch processing and plasma reactor for performing same |
| 03/20/1996 | EP0702098A1 Corrosion-resistant aluminum article for semiconductor processing equipment |
| 03/20/1996 | EP0701684A1 Apparatus and method of film thickness measurement |
| 03/20/1996 | EP0620867B1 Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating |
| 03/20/1996 | EP0619916B1 Extended lifetime collimator |
| 03/20/1996 | EP0540514B1 High accuracy, high flexibility energy beam machining system |
| 03/19/1996 | US5500535 Stress cell for a scanning probe microscope |
| 03/19/1996 | US5500528 Scanning electron microscope |
| 03/19/1996 | US5500527 Electron/ion microscope with improved resolution |
| 03/19/1996 | US5500076 Semiconductors |
| 03/19/1996 | US5499733 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 03/14/1996 | WO1996008033A1 Electron radiation dose tailoring by variable beam pulse generation |
| 03/14/1996 | WO1996007769A1 Apparatus for a thin film manufacturing |
| 03/14/1996 | DE4432156A1 Applying and/or implanting metal atoms and/or ions on and/or in substrate |
| 03/14/1996 | DE4432155A1 Prodn of catalytically active substrate |
| 03/14/1996 | CA2170982A1 Electron radiation dose tailoring by variable beam pulse generation |
| 03/13/1996 | EP0701270A1 Methods and apparatus for vacuum sputtering |
| 03/13/1996 | EP0701269A1 Ion implantation apparatus |
| 03/13/1996 | EP0701268A1 Ion implantation apparatus |
| 03/13/1996 | EP0701102A1 Scanning near-field optic/atomic-force microscope with observing function in liquid |
| 03/13/1996 | EP0700578A1 Intraoperative electron beam therapy system and facility |
| 03/13/1996 | EP0700577A1 Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure |
| 03/12/1996 | US5498877 Method of manufacturing semiconductor device using measurement mark pattern |
| 03/12/1996 | US5498874 Defect detecting apparatus and method |
| 03/12/1996 | US5498313 Symmetrical etching ring with gas control |
| 03/12/1996 | US5498308 Plasma asher with microwave trap |
| 03/12/1996 | US5498291 Arrangement for coating or etching substrates |
| 03/12/1996 | US5498290 Confinement of secondary electrons in plasma ion processing |