| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/12/1996 | US5497656 Method of measuring a surface profile using an atomic force microscope |
| 03/07/1996 | WO1996007195A1 Electron beam generator |
| 03/07/1996 | DE4425090C1 Swivel mounting for electron beam gun |
| 03/07/1996 | DE19532105A1 Surface treating three=dimensional workpieces |
| 03/07/1996 | DE19506515C1 Reactive coating process using a magnetron vaporisation source |
| 03/07/1996 | CA2156350A1 Dual cylindrical target magnetron with multiple anodes |
| 03/06/1996 | EP0699341A1 Particle-optical instrument comprising a deflection unit for secondary electrons |
| 03/06/1996 | EP0395752B1 Large-area uniform electron source |
| 03/05/1996 | US5497007 Method for automatically establishing a wafer coordinate system |
| 03/05/1996 | US5497006 Ion generating source for use in an ion implanter |
| 03/05/1996 | US5497005 Method and apparatus for producing a stream of ionic aluminum |
| 03/05/1996 | US5496594 Chemical vapor deposition apparatus and method wherein a corona discharge is generated inside a perforated cage which surrounds the substrate |
| 03/05/1996 | US5496459 Apparatus for the treating of metal surfaces |
| 03/05/1996 | US5496455 Sputtering using a plasma-shaping magnet ring |
| 03/05/1996 | US5496410 Plasma processing apparatus and method of processing substrates by using same apparatus |
| 03/05/1996 | US5496199 Electron beam radiator with cold cathode integral with focusing grid member and process of fabrication thereof |
| 02/29/1996 | WO1996006205A1 Spring-loaded mount for a rotatable sputtering cathode |
| 02/29/1996 | WO1996006204A1 Magnet housing for a sputtering cathode |
| 02/29/1996 | DE4422751C1 Appts for electron-beam processing |
| 02/28/1996 | EP0698909A2 Magnetron apparatus |
| 02/28/1996 | EP0698908A2 Magnetron apparatus |
| 02/28/1996 | EP0698907A2 Electron gun |
| 02/27/1996 | US5495110 Observation method and apparatus for removing an oxidation layer and forming an image from a sample |
| 02/27/1996 | US5494713 Anodic oxidation, sealing pores, silicon-containing coating film by chemical vapor deposition |
| 02/27/1996 | US5494712 Oxidizing with excess oxygen, vapor depositing a polysilicate |
| 02/27/1996 | US5494697 Process for fabricating a device using an ellipsometric technique |
| 02/27/1996 | US5494523 Controlling plasma particulates by contouring the plasma sheath using materials of differing RF impedances |
| 02/27/1996 | US5494522 Plasma process system and method |
| 02/26/1996 | CA2155295A1 Rotatable magnetron including a replaceable target structure |
| 02/26/1996 | CA2155286A1 Seal cartridge for a rotatable magnetron |
| 02/22/1996 | WO1996005608A1 Method and apparatus for reactions in dense-medium plasmas |
| 02/22/1996 | WO1996005333A1 Jet plasma deposition process and apparatus |
| 02/22/1996 | WO1996005245A1 A process for material modification, modified products and apparatus thereof |
| 02/22/1996 | WO1996005112A1 Carbon film-coated plastic container manufacturing apparatus and method |
| 02/22/1996 | DE4429013A1 Arrangement for substrate deposition or sputtering |
| 02/22/1996 | CA2196301A1 Jet plasma deposition process and apparatus |
| 02/21/1996 | CN1031072C Large area murowave plasma apparatus |
| 02/20/1996 | US5493125 Charged beam apparatus |
| 02/20/1996 | US5493116 Detection system for precision measurements and high resolution inspection of high aspect ratio structures using particle beam devices |
| 02/20/1996 | US5493115 Methods for analyzing a sample for a compound of interest using mass analysis of ions produced by slow monochromatic electrons |
| 02/20/1996 | US5492862 Vacuum change neutralization method |
| 02/20/1996 | US5492737 Adjustable controllers of electrical resistance in connectors between electrodes and ground also control stress in films deposited from plasma in reactor |
| 02/15/1996 | DE4438463C1 Method and circuit for bipolar pulsed energy feed to low-pressure plasmas |
| 02/15/1996 | DE4428508A1 Electron gun for vaporising material |
| 02/15/1996 | DE4428136A1 In-line vacuum coating plant, |
| 02/14/1996 | EP0696351A1 In situ tensile testing machine and specimen for a scanning electron microscope |
| 02/13/1996 | US5491339 Charged particle detection device and charged particle radiation apparatus |
| 02/13/1996 | US5491112 Method and arrangement for treating silicon plates |
| 02/13/1996 | US5490915 Target for cathode sputtering apparatus |
| 02/13/1996 | US5490914 High utilization sputtering target for cathode assembly |
| 02/13/1996 | US5490913 Magnetic field enhanced sputtering arrangement with vacuum treatment apparatus |
| 02/13/1996 | US5490910 Circularly symmetric sputtering apparatus with hollow-cathode plasma devices |
| 02/08/1996 | WO1996003663A1 AN ELECTRONIC PHANTOM SOURCE FOR η-RAY CAMERAS |
| 02/08/1996 | DE4427585A1 Coating system for electrically non-conductive metal oxide(s) |
| 02/07/1996 | EP0695622A2 Method and apparatus for plasma modification of flat porous articles |
| 02/07/1996 | EP0677595A4 Device for the vacuum-plasma treatment of articles. |
| 02/06/1996 | US5489783 Comprises a vacuum chamber including a cathode and a metal foil window coated with a chemically resistant silicon oxide |
| 02/06/1996 | US5489362 Method for generating excited neutral particles for etching and deposition processes in semiconductor technology with a plasma discharge fed by microwave energy |
| 02/01/1996 | WO1996003019A1 Plasma processing device |
| 02/01/1996 | WO1996002935A1 Electronic energy filter |
| 02/01/1996 | WO1996002934A1 Method of and apparatus for microwave-plasma production |
| 02/01/1996 | DE4426751A1 Plate assembly for a large surface cathode sputter assembly |
| 02/01/1996 | DE19526999A1 Electron energy filter for transmission electron microscope |
| 01/31/1996 | EP0694949A2 Inductively coupled plasma reactors |
| 01/31/1996 | EP0694208A1 Plasma shaping plug for control of sputter etching |
| 01/30/1996 | US5487875 Slots spaced to divide microwave into two directions and intefering with each other; uniformity, efficiency; films on on semiconductors |
| 01/30/1996 | US5487823 Sputtering targets having life alarm function |
| 01/30/1996 | US5487822 Integrated sputtering target assembly |
| 01/30/1996 | US5487821 Anode structure for magnetron sputtering systems |
| 01/25/1996 | WO1996002065A1 Liquid metal ion source |
| 01/25/1996 | DE4426200A1 Cathode sputtering appts. |
| 01/25/1996 | DE4425626A1 Method and appts. for plasma coating components with metal and polymer layers |
| 01/24/1996 | EP0693769A2 Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter |
| 01/23/1996 | US5486702 Scan technique to reduce transient wafer temperatures during ion implantation |
| 01/23/1996 | US5486697 Array of micro-machined mass energy micro-filters for charged particles |
| 01/18/1996 | WO1996001490A1 Device for generating an ion beam of adjustable energy, particularly for the continuous vacuum processing of large surfaces |
| 01/18/1996 | DE19525536A1 Integrated circuit fault analysis testing method |
| 01/17/1996 | EP0692550A1 Preferential sputtering of insulators from conductive targets |
| 01/17/1996 | EP0692138A1 Reactive dc sputtering system |
| 01/17/1996 | CN1115191A Magnetic field cathode |
| 01/17/1996 | CN1030722C Process for continuously forming large area functional deposited film by microwave PCVD method and apparatus suitable for practicing same |
| 01/16/1996 | US5485008 Low magnification gas limiting aperture assembly for electron microscopy devices |
| 01/16/1996 | US5484486 Quick release process kit |
| 01/16/1996 | US5484485 Plasma reactor with magnet for protecting an electrostatic chuck from the plasma |
| 01/16/1996 | US5484011 Method of transferring heat to or from a wafer |
| 01/16/1996 | US5483822 For use in an atomic force microscope |
| 01/16/1996 | CA2013233C Electron-emitting device, and electron beam lithography machine and image display apparatus making use of it |
| 01/11/1996 | WO1996000978A1 Electron beam lithography machine |
| 01/11/1996 | DE4422472A1 Appts. for high-rate gas flow sputtering |
| 01/11/1996 | DE19522362A1 Electron beam printer esp. for high speed operation |
| 01/10/1996 | EP0691420A1 Plasma-inert cover and plasma cleaning process and apparatus employing same |
| 01/10/1996 | EP0615552B1 Process and device for coating substrate bodies with hard substances |
| 01/10/1996 | CN1114784A Collimator and manufacturing method therefor |
| 01/09/1996 | US5483077 System and method for magnetic scanning, accelerating, and implanting of an ion beam |
| 01/09/1996 | US5483074 Flood beam electron gun |
| 01/09/1996 | US5483073 Method of illuminating an object with a focused electron beam and an electron-optical illuminating system therefor |
| 01/09/1996 | US5483065 Electron beam microanalyzer |
| 01/09/1996 | US5483064 Positioning mechanism and method for providing coaxial alignment of a probe and a scanning means in scanning tunneling and scanning force microscopy |
| 01/09/1996 | US5482612 Methods and systems for shielding in sputtering chambers |
| 01/09/1996 | US5482611 Physical vapor deposition employing ion extraction from a plasma |