Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/1996
06/12/1996CN1032021C Method and apparatus for continuously forming functional deposited films with large area by microwave plasma CVD method
06/11/1996US5525807 Ion implantation device
06/11/1996US5525806 Focused charged beam apparatus, and its processing and observation method
06/11/1996US5525805 Pulsed ion beam source
06/11/1996US5525199 Low pressure reactive magnetron sputtering apparatus and method
06/11/1996US5525158 Thin film deposition apparatus
06/05/1996EP0715336A2 Method and apparatus for planar magnetron sputtering
06/05/1996EP0715335A1 System for processing a workpiece in a plasma
06/05/1996EP0715334A2 Plasma reactors for processing semiconductor wafers
06/05/1996EP0714998A2 CVD processing chamber
06/05/1996DE4435635A1 Microfabrication of cantilever stylus for atomic force microscopy
06/05/1996DE19544753A1 Electron beam lithographic appts. for semiconductor integrated circuit mfr.
06/05/1996DE19544123A1 Process for plasma coating articles
06/04/1996US5523955 System for characterizing AC properties of a processing plasma
06/04/1996US5523652 Microwave energized ion source for ion implantation
06/04/1996US5523580 Reticle having a number of subfields
06/04/1996US5523576 Charged beam drawing apparatus
06/04/1996US5523568 Image signal processing method in scanning electron microscope and device thereof
06/04/1996US5523567 Scanning electron microscope and image forming method therewith
06/04/1996US5523261 Method of cleaning high density inductively coupled plasma chamber using capacitive coupling
06/04/1996US5522957 Method for leak detection in etching chambers
06/04/1996US5522936 Thin film deposition apparatus
06/04/1996US5522934 Plasma processing apparatus using vertical gas inlets one on top of another
06/04/1996US5522932 Corrosion-resistant apparatus
05/1996
05/30/1996WO1996016426A1 Chromatically compensated particle-beam column
05/30/1996WO1996016197A1 Process for coating substrates and a device for carrying out said process
05/30/1996WO1996009622A3 Apparatus and method for sputtering carbon
05/30/1996DE4441748A1 Continuous working appts. for workpieces, esp. in electron beam welding
05/29/1996EP0442939B1 Improved magnetron sputtering cathode
05/28/1996US5521517 Method and apparatus for detecting an IC defect using a charged particle beam
05/28/1996US5521390 Nanodisplacement producing apparatus
05/28/1996US5521388 Selective crosslink scanning system
05/28/1996US5521351 Method and apparatus for plasma surface treatment of the interior of hollow forms
05/28/1996US5520784 Ultrasonic enhancement of aluminum step coverage and apparatus
05/28/1996US5520771 Microwave plasma processing apparatus
05/28/1996US5520741 Apparatus for producing a plasma polymer protective layer on workpieces, in particular headlamp reflectors
05/28/1996US5520740 Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same
05/28/1996US5520002 High speed pump for a processing vacuum chamber
05/23/1996WO1996015545A1 Inductive plasma reactor
05/23/1996WO1996015544A1 Device for coating substrates using a vapour phase material in a reduced pressure or vacuum environment
05/23/1996WO1996015436A1 Specimen holder and apparatus for two-sided ion milling system
05/23/1996WO1996014959A1 Electromechanical positioning unit
05/23/1996DE4440758A1 Elektromechanische Positioniereinheit Electromechanical positioning
05/23/1996DE19515279C1 HV constant current power supply e.g. for ion source in accelerator equipment
05/22/1996EP0713242A2 Device for suppressing arcing in cathode sputtering installations
05/22/1996EP0713239A1 Ion generating source for use in an ion implanter
05/22/1996EP0712533A1 Probe microscopy
05/21/1996US5519373 Dipole ring magnet for use in magnetron sputtering or magnetron etching
05/21/1996US5519314 High density harp or wire scanner for particle beam diagnostics
05/21/1996US5519216 Electron-optical imaging system having controllable elements
05/21/1996US5519183 Plasma spray gun head
05/21/1996US5518596 Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating
05/21/1996US5518595 Focused ion beam etching apparatus
05/21/1996US5518593 Shield configuration for vacuum chamber
05/21/1996US5518592 Seal cartridge for a rotatable magnetron
05/21/1996US5518572 Plasma processing system and method
05/21/1996US5518547 Method and apparatus for reducing particulates in a plasma tool through steady state flows
05/17/1996WO1996014653A2 Method and apparatus for reducing arcing in plasma processing chambers
05/15/1996EP0712136A2 Nonvolatile memory producing apparatus and method
05/15/1996EP0711847A1 Arc assisted CVD method and apparatus
05/15/1996DE4447538A1 Meßwertverstärker (Strom-Spannungswandler) zur Erfassung kleiner, transienter Ströme Measuring amplifier (current-voltage converter) to detect small, transient currents
05/14/1996US5517085 Apparatus including ring-shaped resonators for producing microwave plasmas
05/14/1996US5517033 Apparatus for improved image resolution in electron microscopy
05/14/1996US5517028 Electron beam apparatus for measuring a voltage of a sample
05/14/1996US5516403 Reversing orientation of sputtering screen to avoid contamination
05/14/1996US5515986 Plasma treatment apparatus and method for operating same
05/09/1996WO1996013964A1 Process and circuit for the bipolar pulsed supply of power in low-pressure plasmas
05/09/1996WO1996013714A1 Current/voltage transformer for the detection of the electron current in a scanning tunnelling-electron microscope
05/09/1996WO1996013621A1 An ecr plasma source
05/08/1996EP0711100A1 Plasma production device, allowing a dissociation between microwave propagation and absorption zones
05/08/1996EP0710977A1 Surface treatment method and system
05/08/1996EP0710429A1 Method for matching the generator in dipolar low-pressure glow processes
05/08/1996EP0710299A1 Stationary aperture plate for reactive sputter deposition
05/07/1996US5514937 Apparatus and method for compensating electron emission in a field emission device
05/07/1996US5514847 Electron beam radiator with cold cathode integral with focusing grid member and process of fabrication thereof
05/07/1996US5514259 Sputtering apparatus
05/07/1996US5514257 Method for forming Ti-tin laminates
05/07/1996US5514246 Plasma reactors and method of cleaning a plasma reactor
05/07/1996US5514243 Dry etching apparatus
05/07/1996US5513765 Plasma generating apparatus and method
05/02/1996WO1996013058A2 Apparatus and method for temperature control of workpieces in vacuum
05/02/1996WO1996013051A1 Inductively coupled plasma sputter chamber with conductive material sputtering capabilities
05/02/1996DE4438960A1 Current-voltage converter to determine tunnel current of a scanning tunnel microscope
05/02/1996DE4438894A1 Simplified appts. for coating a workpiece
05/02/1996DE4438315A1 Gas ion removal device from electron beam in tomography appts.
05/02/1996CA2202530A1 Inductively coupled plasma sputter chamber with conductive material sputtering capabilities
05/01/1996EP0710057A1 Energy beam source and film deposit forming method therewith
05/01/1996EP0710055A1 Plasma reactors for processing semi-conductor wafers
05/01/1996EP0709877A1 Plasma processing method
05/01/1996EP0709875A1 A processing chamber gas distribution manifold
05/01/1996EP0709874A1 Diagnostic wafer
05/01/1996EP0709870A1 Methods and apparatus for making enhanced particulate field emitters and resulting products
05/01/1996EP0708976A1 Process for operating a time-of-flight secondary ion mass spectrometer
05/01/1996EP0708975A1 Particle-optical apparatus comprising a detector for secondary electrons
05/01/1996EP0708688A1 Method for the improved microwave deposition of thin films
04/1996
04/30/1996US5512872 Permanent magnet arrangement for use in magnetron plasma processing
04/30/1996US5512747 Auto focusing apparatus of scanning electron microscopes
04/30/1996US5512746 Micro-pattern measuring apparatus
04/30/1996US5512164 Method for sputtering with low frequency alternating current
04/30/1996US5512156 Sputtering electrode