Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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06/12/1996 | CN1032021C Method and apparatus for continuously forming functional deposited films with large area by microwave plasma CVD method |
06/11/1996 | US5525807 Ion implantation device |
06/11/1996 | US5525806 Focused charged beam apparatus, and its processing and observation method |
06/11/1996 | US5525805 Pulsed ion beam source |
06/11/1996 | US5525199 Low pressure reactive magnetron sputtering apparatus and method |
06/11/1996 | US5525158 Thin film deposition apparatus |
06/05/1996 | EP0715336A2 Method and apparatus for planar magnetron sputtering |
06/05/1996 | EP0715335A1 System for processing a workpiece in a plasma |
06/05/1996 | EP0715334A2 Plasma reactors for processing semiconductor wafers |
06/05/1996 | EP0714998A2 CVD processing chamber |
06/05/1996 | DE4435635A1 Microfabrication of cantilever stylus for atomic force microscopy |
06/05/1996 | DE19544753A1 Electron beam lithographic appts. for semiconductor integrated circuit mfr. |
06/05/1996 | DE19544123A1 Process for plasma coating articles |
06/04/1996 | US5523955 System for characterizing AC properties of a processing plasma |
06/04/1996 | US5523652 Microwave energized ion source for ion implantation |
06/04/1996 | US5523580 Reticle having a number of subfields |
06/04/1996 | US5523576 Charged beam drawing apparatus |
06/04/1996 | US5523568 Image signal processing method in scanning electron microscope and device thereof |
06/04/1996 | US5523567 Scanning electron microscope and image forming method therewith |
06/04/1996 | US5523261 Method of cleaning high density inductively coupled plasma chamber using capacitive coupling |
06/04/1996 | US5522957 Method for leak detection in etching chambers |
06/04/1996 | US5522936 Thin film deposition apparatus |
06/04/1996 | US5522934 Plasma processing apparatus using vertical gas inlets one on top of another |
06/04/1996 | US5522932 Corrosion-resistant apparatus |
05/30/1996 | WO1996016426A1 Chromatically compensated particle-beam column |
05/30/1996 | WO1996016197A1 Process for coating substrates and a device for carrying out said process |
05/30/1996 | WO1996009622A3 Apparatus and method for sputtering carbon |
05/30/1996 | DE4441748A1 Continuous working appts. for workpieces, esp. in electron beam welding |
05/29/1996 | EP0442939B1 Improved magnetron sputtering cathode |
05/28/1996 | US5521517 Method and apparatus for detecting an IC defect using a charged particle beam |
05/28/1996 | US5521390 Nanodisplacement producing apparatus |
05/28/1996 | US5521388 Selective crosslink scanning system |
05/28/1996 | US5521351 Method and apparatus for plasma surface treatment of the interior of hollow forms |
05/28/1996 | US5520784 Ultrasonic enhancement of aluminum step coverage and apparatus |
05/28/1996 | US5520771 Microwave plasma processing apparatus |
05/28/1996 | US5520741 Apparatus for producing a plasma polymer protective layer on workpieces, in particular headlamp reflectors |
05/28/1996 | US5520740 Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same |
05/28/1996 | US5520002 High speed pump for a processing vacuum chamber |
05/23/1996 | WO1996015545A1 Inductive plasma reactor |
05/23/1996 | WO1996015544A1 Device for coating substrates using a vapour phase material in a reduced pressure or vacuum environment |
05/23/1996 | WO1996015436A1 Specimen holder and apparatus for two-sided ion milling system |
05/23/1996 | WO1996014959A1 Electromechanical positioning unit |
05/23/1996 | DE4440758A1 Elektromechanische Positioniereinheit Electromechanical positioning |
05/23/1996 | DE19515279C1 HV constant current power supply e.g. for ion source in accelerator equipment |
05/22/1996 | EP0713242A2 Device for suppressing arcing in cathode sputtering installations |
05/22/1996 | EP0713239A1 Ion generating source for use in an ion implanter |
05/22/1996 | EP0712533A1 Probe microscopy |
05/21/1996 | US5519373 Dipole ring magnet for use in magnetron sputtering or magnetron etching |
05/21/1996 | US5519314 High density harp or wire scanner for particle beam diagnostics |
05/21/1996 | US5519216 Electron-optical imaging system having controllable elements |
05/21/1996 | US5519183 Plasma spray gun head |
05/21/1996 | US5518596 Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating |
05/21/1996 | US5518595 Focused ion beam etching apparatus |
05/21/1996 | US5518593 Shield configuration for vacuum chamber |
05/21/1996 | US5518592 Seal cartridge for a rotatable magnetron |
05/21/1996 | US5518572 Plasma processing system and method |
05/21/1996 | US5518547 Method and apparatus for reducing particulates in a plasma tool through steady state flows |
05/17/1996 | WO1996014653A2 Method and apparatus for reducing arcing in plasma processing chambers |
05/15/1996 | EP0712136A2 Nonvolatile memory producing apparatus and method |
05/15/1996 | EP0711847A1 Arc assisted CVD method and apparatus |
05/15/1996 | DE4447538A1 Meßwertverstärker (Strom-Spannungswandler) zur Erfassung kleiner, transienter Ströme Measuring amplifier (current-voltage converter) to detect small, transient currents |
05/14/1996 | US5517085 Apparatus including ring-shaped resonators for producing microwave plasmas |
05/14/1996 | US5517033 Apparatus for improved image resolution in electron microscopy |
05/14/1996 | US5517028 Electron beam apparatus for measuring a voltage of a sample |
05/14/1996 | US5516403 Reversing orientation of sputtering screen to avoid contamination |
05/14/1996 | US5515986 Plasma treatment apparatus and method for operating same |
05/09/1996 | WO1996013964A1 Process and circuit for the bipolar pulsed supply of power in low-pressure plasmas |
05/09/1996 | WO1996013714A1 Current/voltage transformer for the detection of the electron current in a scanning tunnelling-electron microscope |
05/09/1996 | WO1996013621A1 An ecr plasma source |
05/08/1996 | EP0711100A1 Plasma production device, allowing a dissociation between microwave propagation and absorption zones |
05/08/1996 | EP0710977A1 Surface treatment method and system |
05/08/1996 | EP0710429A1 Method for matching the generator in dipolar low-pressure glow processes |
05/08/1996 | EP0710299A1 Stationary aperture plate for reactive sputter deposition |
05/07/1996 | US5514937 Apparatus and method for compensating electron emission in a field emission device |
05/07/1996 | US5514847 Electron beam radiator with cold cathode integral with focusing grid member and process of fabrication thereof |
05/07/1996 | US5514259 Sputtering apparatus |
05/07/1996 | US5514257 Method for forming Ti-tin laminates |
05/07/1996 | US5514246 Plasma reactors and method of cleaning a plasma reactor |
05/07/1996 | US5514243 Dry etching apparatus |
05/07/1996 | US5513765 Plasma generating apparatus and method |
05/02/1996 | WO1996013058A2 Apparatus and method for temperature control of workpieces in vacuum |
05/02/1996 | WO1996013051A1 Inductively coupled plasma sputter chamber with conductive material sputtering capabilities |
05/02/1996 | DE4438960A1 Current-voltage converter to determine tunnel current of a scanning tunnel microscope |
05/02/1996 | DE4438894A1 Simplified appts. for coating a workpiece |
05/02/1996 | DE4438315A1 Gas ion removal device from electron beam in tomography appts. |
05/02/1996 | CA2202530A1 Inductively coupled plasma sputter chamber with conductive material sputtering capabilities |
05/01/1996 | EP0710057A1 Energy beam source and film deposit forming method therewith |
05/01/1996 | EP0710055A1 Plasma reactors for processing semi-conductor wafers |
05/01/1996 | EP0709877A1 Plasma processing method |
05/01/1996 | EP0709875A1 A processing chamber gas distribution manifold |
05/01/1996 | EP0709874A1 Diagnostic wafer |
05/01/1996 | EP0709870A1 Methods and apparatus for making enhanced particulate field emitters and resulting products |
05/01/1996 | EP0708976A1 Process for operating a time-of-flight secondary ion mass spectrometer |
05/01/1996 | EP0708975A1 Particle-optical apparatus comprising a detector for secondary electrons |
05/01/1996 | EP0708688A1 Method for the improved microwave deposition of thin films |
04/30/1996 | US5512872 Permanent magnet arrangement for use in magnetron plasma processing |
04/30/1996 | US5512747 Auto focusing apparatus of scanning electron microscopes |
04/30/1996 | US5512746 Micro-pattern measuring apparatus |
04/30/1996 | US5512164 Method for sputtering with low frequency alternating current |
04/30/1996 | US5512156 Sputtering electrode |