| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/17/1996 | CN1126771A Seal cartridge for a rotatable magnetron |
| 07/17/1996 | CN1126770A Portable magnetron including a replaceable target structure |
| 07/16/1996 | US5537487 Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure |
| 07/16/1996 | US5537004 Low frequency electron cyclotron resonance plasma processor |
| 07/16/1996 | US5536944 Thermal field emmission electron gun |
| 07/16/1996 | US5536941 Rotatable wide angle camera and prism assembly for electron microscopes |
| 07/16/1996 | US5536940 Energy filtering for electron back-scattered diffraction patterns |
| 07/16/1996 | US5536381 Sputtering device |
| 07/16/1996 | US5536380 Large area sputter cathode having floating target segments |
| 07/16/1996 | US5536359 Semiconductor device manufacturing apparatus and method with optical monitoring of state of processing chamber |
| 07/16/1996 | US5535906 Multi-phase DC plasma processing system |
| 07/16/1996 | US5535508 Method for producing an electrostatic lens |
| 07/11/1996 | WO1996021238A1 Electron beam device with single crystal window and matching anode |
| 07/11/1996 | DE19549022A1 Scanning electron microscope with condenser lens system |
| 07/11/1996 | DE19503205C1 Device for generating a plasma in low pressure container e.g. for hardware items surface treatment by plasma etching and plasma deposition |
| 07/11/1996 | CA2209593A1 Electron beam device with single crystal window and matching anode |
| 07/10/1996 | EP0721202A2 Method and structure for electronically measuring beam parameters |
| 07/10/1996 | EP0721201A1 System for high resolution imaging and measurement of topographic and material features on a specimen |
| 07/10/1996 | CN1126365A Dual vylindrical target magnetron with multiple anodes |
| 07/09/1996 | US5535185 Information recording/reproduction apparatus using probe |
| 07/09/1996 | US5534752 Shutter linkage for an ion implantation apparatus |
| 07/09/1996 | US5534751 Plasma etching apparatus utilizing plasma confinement |
| 07/09/1996 | US5534232 Apparatus for reactions in dense-medium plasmas |
| 07/09/1996 | US5534231 Low frequency inductive RF plasma reactor |
| 07/09/1996 | US5534108 Etching a substrate and generating a rotating magnetic field |
| 07/09/1996 | US5534070 Plasma CVD process using a very-high-frequency and plasma CVD apparatus |
| 07/09/1996 | US5534069 Preventing build-up of dangerous materials in exhaust pumps of vapor deposition apparatus, oxidation of aluminum and alkylaluminum compounds |
| 07/04/1996 | WO1996020495A2 Specimen holder for an electron microscope and device and method for mounting a specimen in an electron microscope |
| 07/03/1996 | EP0720206A1 Plasma processing method and plasma processing apparatus |
| 07/03/1996 | EP0720205A1 Deposited film forming apparatus and electrode for use in it |
| 07/03/1996 | EP0720178A1 Coherent particle beam |
| 07/03/1996 | EP0719447A1 Rf plasma reactor |
| 07/03/1996 | EP0637398B1 Device for the optical scanning of a recording medium, especially a phosphor storage plate |
| 07/03/1996 | CN1125896A Ion beam electron neutralizer |
| 07/02/1996 | US5532496 Proximity effect compensation in scattering-mask lithographic projection systems and apparatus therefore |
| 07/02/1996 | US5532495 Methods and apparatus for altering material using ion beams |
| 07/02/1996 | US5532494 Treatment and observation apparatus using scanning probe |
| 07/02/1996 | US5532446 For controlled magnetic deflection of an electron beam |
| 07/02/1996 | US5531877 Microwave-enhanced sputtering configuration |
| 07/02/1996 | US5531876 Noncracking |
| 07/02/1996 | US5531862 Method of and apparatus for removing foreign particles |
| 07/02/1996 | US5531834 Plasma film forming method and apparatus and plasma processing apparatus |
| 07/02/1996 | US5531420 Ion beam electron neutralizer |
| 07/02/1996 | CA2010604C Fluid flow control method and apparatus for minimizing particle contamination |
| 07/01/1996 | CA2165877A1 Three-dimensional positioning device |
| 06/27/1996 | WO1996019910A1 High frequency induction plasma method and apparatus |
| 06/27/1996 | WO1996013058A3 Apparatus and method for temperature control of workpieces in vacuum |
| 06/27/1996 | DE4446297A1 Heating arrangement for vacuum i.e. plasma process chamber esp. for PVD, CVD or PECVD processes |
| 06/27/1996 | DE4444763A1 Electrode assembly for vaporising material for coating purposes |
| 06/27/1996 | DE4444273C1 Removal of halogen(s) from exhaust gas |
| 06/27/1996 | DE19546780A1 Transmission electron microscope system with energy filter for electron energy analysis |
| 06/27/1996 | DE19546279A1 Micro-positioning system for micro systems positioning technology or measurement purposes |
| 06/27/1996 | DE19521232C1 Sputter deposition of uniformly thick layer |
| 06/27/1996 | CA2207655A1 Plasma treatment apparatus and methods |
| 06/26/1996 | EP0719077A1 Method and apparatus for determining of absolute plasma parameters |
| 06/26/1996 | EP0718868A2 Polysilicon/Polycide etch process for sub-micron gate stacks |
| 06/26/1996 | EP0718863A2 Electron beam source and its manufacturing method, and electron beam source apparatus and electronic beam apparatus using the same |
| 06/26/1996 | EP0625218B1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions |
| 06/26/1996 | EP0396603B1 Procedure and apparatus for the coating of materials by means of a pulsating plasma beam |
| 06/26/1996 | CN1125267A Apparatus for rapid plasma treatments and method |
| 06/25/1996 | US5530253 Sample stage for scanning probe microscope head |
| 06/25/1996 | US5530252 Inductively coupled dual-stage magnetic deflection yoke |
| 06/25/1996 | US5530251 In a charged particle beam system |
| 06/25/1996 | US5530250 Electron beam deflecting apparatus with reduced settling time period |
| 06/25/1996 | US5530201 Shielding for openings in a shielded housing, particularly a monitor shielding |
| 06/25/1996 | US5529674 Cylindrical hollow cathode/magnetron sputtering system and components thereof |
| 06/25/1996 | US5529673 Mechanically joined sputtering target and adapter therefor |
| 06/25/1996 | US5529670 Collimating, heating the integrated circuit for sputtering titanium or titanium nitride |
| 06/25/1996 | US5529657 Plasma processing apparatus |
| 06/25/1996 | US5529632 Microwave plasma processing system |
| 06/25/1996 | US5529627 Coating apparatus |
| 06/25/1996 | US5529197 Polysilicon/polycide etch process for sub-micron gate stacks |
| 06/20/1996 | WO1996019096A1 Method and device for plasma processing |
| 06/20/1996 | DE4444647A1 Detection and impulse spectrometry of sub-microscopic particles |
| 06/20/1996 | DE4444538A1 Electron beam evapn. appts. esp. for wide strip coating |
| 06/19/1996 | EP0717432A1 Apparatus and methods for sputter depositing a film on a substrate |
| 06/19/1996 | EP0717431A1 Reversing orientation of sputtering screen to avoid contamination |
| 06/19/1996 | EP0717127A2 Plasma processing method and apparatus |
| 06/18/1996 | US5528512 Method of obtaining mask data for manufacturing multiple metal-interconnection layers on a substrate |
| 06/18/1996 | US5528164 For monitoring motion of a process chamber of a semiconductor |
| 06/18/1996 | US5528048 Charged particle beam exposure system and method |
| 06/18/1996 | US5528047 Electron beam exposure apparatus with improved drawing precision |
| 06/18/1996 | US5528034 Method of ultra high sensitivity hydrogen detection with slow multiply-charged ions |
| 06/18/1996 | US5527731 Surface treating method and apparatus therefor |
| 06/18/1996 | US5527439 Electrically isolated annular structure surrounding target, for prevention or suppression of arcing in vapor deposition |
| 06/18/1996 | US5527438 Cylindrical sputtering shield |
| 06/18/1996 | US5527394 Apparatus for plasma enhanced processing of substrates |
| 06/18/1996 | US5527391 Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method |
| 06/13/1996 | WO1996018209A1 Cathode sputtering reactor and method of operating the same |
| 06/13/1996 | WO1996018208A1 Plasma processor for large workpieces |
| 06/13/1996 | WO1996018207A1 Plasma reactor and method of operating the same |
| 06/13/1996 | DE4443740A1 Plasma deposition appts., e.g. for hard coating of tools |
| 06/12/1996 | EP0716562A1 Device for implementing a thin film process for the treatment of large area substrates |
| 06/12/1996 | EP0716441A2 Substrate holding device and manufacturing method therefor |
| 06/12/1996 | EP0716440A1 Cooled gas distribution system for a plasma reactor |
| 06/12/1996 | EP0716161A1 Apparatus for coating of optical substrate |
| 06/12/1996 | EP0715767A1 Mechanical shutter for protecting an x-ray detector against high-energy electron or x-ray damage |
| 06/12/1996 | EP0704102A4 Electron beam array for surface treatment |
| 06/12/1996 | EP0666933B1 Device for plasma-supported electron beam high-rate vapour deposition |
| 06/12/1996 | CN1032028C Freezing and dissolving corrosion sample making method for electronic microscope observation of liquid state sample |