Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/1996
08/28/1996EP0728224A1 Apparatus for a thin film manufacturing
08/28/1996EP0411043B1 Encapsulated high brightness electron beam source and system therefor
08/27/1996USRE35317 Potentiostatic preparation of molecular adsorbates for scanning probe microscopy
08/27/1996US5549780 Method for plasma processing and apparatus for plasma processing
08/22/1996WO1996025834A1 Plasma processing apparatus
08/22/1996WO1996025757A1 Producing rf electric fields suitable for accelerating atomic and molecular ions in an ion implantation system
08/22/1996WO1996025755A1 Electronic cyclotron resonance device for generating an ion beam
08/22/1996WO1996025537A1 Method and apparatus for producing single crystal carbon films
08/22/1996WO1996025534A1 Apparatus and method for a reliable return current path for sputtering processes
08/22/1996WO1996025533A1 High utilization sputtering target
08/22/1996WO1996025532A1 Mechanically joined sputtering target and adapter therefor
08/22/1996WO1996025531A1 Gas manifold for an off-axis sputter apparatus
08/22/1996CA2213073A1 Mechanically joined sputtering target and adapter therefor
08/22/1996CA2208342A1 Gas manifold for an off-axis sputter apparatus
08/21/1996EP0727923A1 Modifications in or relating to RF plasma reactors and methods of operation thereof
08/21/1996EP0727807A1 Plasma reactor
08/21/1996EP0727639A1 Method of chemically differentiated imaging by means of atomic force microscopy
08/21/1996EP0726967A1 A method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode
08/20/1996US5548183 Magnetic field immersion type electron gun
08/20/1996US5548121 Electronically shielded solid state charged particle detector
08/20/1996US5548117 Probe for a scanning tunneling microscope and method of manufacturing a probe
08/20/1996US5547788 For projecting pattern through lenses onto semiconductor wafer surface
08/20/1996US5547539 Plasma processing apparatus and method
08/16/1996CA2169522A1 Chemically differentiated imaging by scanning atomic force microscopy
08/15/1996WO1996024947A2 Magnetron sputtering cathode apparatus
08/15/1996WO1996024885A1 Fabrication and use of a sub-micron dimensional standard
08/15/1996WO1996024819A1 Cantilever deflection sensor and use thereof
08/15/1996WO1996024703A1 An electron jet vapor deposition system
08/14/1996EP0726593A1 A high power, plasma-based, reactive species generator
08/14/1996EP0726567A2 Semiconductor layer structure as a recording medium
08/14/1996EP0725975A1 Detection system for measuring high aspect ratio
08/14/1996EP0725843A1 Process and system for plasma-activated electron-beam vaporisation
08/14/1996EP0465515B1 Process and device for monitoring ion assisted machining processes on wafers
08/14/1996EP0428527B1 Remote ion source plasma electron gun
08/13/1996US5546375 Method of manufacturing a tip for scanning tunneling microscope using peeling layer
08/13/1996US5546374 Information recording and/or reproducing apparatus using probe
08/13/1996US5546319 Method of and system for charged particle beam exposure
08/13/1996US5545902 Electron beam lithography system
08/13/1996US5545258 Microwave plasma processing system
08/13/1996US5545257 Magnetic filter apparatus and method for generating cold plasma in semicoductor processing
08/13/1996US5544771 Method for manufacturing a collimator
08/08/1996WO1996024155A1 Multiple tier collimator system for enhanced step coverage and uniformity
08/08/1996WO1996024154A1 Plasma noise and arcing suppressor apparatus and method for sputter deposition
08/08/1996WO1996024153A1 Multi-phase dc plasma processing system
08/08/1996WO1996024107A1 Ultrahigh vacuum focused ion beam micromill and articles therefrom
08/08/1996DE19604272A1 Electron gun with laser beam heating, for scanning or transmission electron microscopy or e-beam holography
08/08/1996DE19600993A1 Appts. for high rate anodic evapn. for substrate coating
08/08/1996DE19600861C1 Generation of shaped parts on substrates using metal spray jet
08/08/1996CA2186893A1 Ultrahigh vacuum focused ion beam micromill and articles therefrom
08/07/1996EP0725424A1 Arc-type evaporator
08/07/1996EP0725423A2 A process for device fabrication using projection lithography and an apparatus therefor
08/07/1996EP0725164A2 Method and apparatus for generating plasma, and semiconductor processing methods
08/07/1996EP0725163A2 Line plasma vapor phase deposition apparatus and method
08/07/1996EP0725161A1 Method for plasma treating of worked articles
08/07/1996EP0724652A1 Method and apparatus for sputtering magnetic target materials
08/06/1996US5543689 High frequency power source having corrected power output
08/06/1996US5543688 Plasma generation apparatus with interleaved electrodes and corresponding method
08/06/1996US5543634 Glow-discharging hydrogenated silicon nitride and a metal oxide on surface; solar cells
08/06/1996US5543614 Scanning probe microscope capable of suppressing probe vibration caused by feedback control
08/06/1996US5543605 Microwave fiber coating apparatus
08/06/1996US5543256 Alignment pattern exposed before exposing device pattern; alignment pattern overlap-exposed after exposing device pattern
08/06/1996US5543184 Method of reducing particulates in a plasma tool through steady state flows
08/06/1996US5543017 Applying high-frequency voltage to gas mixture containing water vapor or water vapor and ketone to render plastics or fibers positioned between electrodes hydrophilic
08/06/1996US5542559 Plasma treatment apparatus
08/01/1996WO1996023318A1 Plasma reactor
08/01/1996WO1996023021A1 Polymer surface treatment with pulsed particle beams
08/01/1996WO1996022841A1 Pulsed ion beam assisted deposition
08/01/1996DE19602634A1 Plasma chemical vapour deposition appts.
08/01/1996CA2186102A1 Pulsed ion beam assisted deposition
08/01/1996CA2186101A1 Polymer surface treatment with pulsed particle beams
07/1996
07/31/1996EP0724284A2 A system for scanning wafers through an ion beam
07/31/1996EP0724025A2 Magnetron sputtering apparatus
07/30/1996US5541411 Image-to-image registration focused ion beam system
07/30/1996US5540824 Plasma reactor with multi-section RF coil and isolated conducting lid
07/30/1996US5540823 Magnetron cathode
07/30/1996US5540800 Inductively coupled high density plasma reactor for plasma assisted materials processing
07/30/1996US5540781 Plasma CVD process using a very-high-frequency and plasma CVD apparatus
07/24/1996EP0723386A1 Plasma processing device
07/24/1996EP0723036A1 Apparatus for coating substrates
07/24/1996EP0722651A1 Device and method for forming a microwave plasma
07/24/1996EP0722513A1 Treatment of surfaces by corona discharge
07/24/1996EP0722376A1 Treatment of particulate matter by electrical discharge
07/24/1996CA2165884A1 Cylindrical magnetron shield structure
07/23/1996US5539274 Electron beam excited plasma system
07/23/1996US5539272 Rotating floating magnetron dark-space shield
07/23/1996US5539212 Toxic remediation system and method
07/23/1996US5539211 Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus
07/23/1996US5539203 Single ion implantation system
07/23/1996US5538699 Microwave introducing device provided with an endless circular waveguide and plasma treating apparatus provided with said device
07/23/1996US5538610 Vacuum coating system
07/23/1996US5538609 Cathodic sputtering system
07/23/1996US5538603 Apparatus and process for increasing uniformity of sputtering rate in sputtering apparatus
07/18/1996WO1996021751A1 Apparatus for generating plasma by plasma-guided microwave power
07/18/1996WO1996021750A1 Rotatable magnetron with curved or segmented end magnets
07/18/1996DE19600298A1 Extracting ion stream from high vacuum chamber into low vacuum chamber esp. for analysis of surface of solid
07/18/1996DE19500964A1 Cathode sputtering appts. for coating flat substrates, esp. optical components
07/17/1996EP0722181A1 Ionen implantierungsgerät
07/17/1996EP0722180A2 Ion implantation apparatus, ion implantation method and semiconductor device
07/17/1996EP0722077A2 Information processing apparatus effecting probe position control with electrostatic force
07/17/1996EP0721514A1 Magnetically enhanced multiple capacitive plasma generation apparatus and related method
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