| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/08/1996 | US5563411 Scanning photoelectron microscope |
| 10/08/1996 | US5562776 Apparatus for microwave plasma enhanced physical/chemical vapor deposition |
| 10/08/1996 | US5562775 Plasma downstream processing |
| 10/03/1996 | WO1996030929A1 Sputter etching apparatus with plasma source having a dielectric pocket and contoured plasma source |
| 10/03/1996 | WO1996030928A1 Plasma source |
| 10/03/1996 | WO1996030927A1 Combined scanning probe and scanning energy microscope |
| 10/03/1996 | CA2213970A1 Combined scanning probe and scanning energy microscope |
| 10/03/1996 | CA2213771A1 Sputter etching apparatus with plasma source having a dielectric pocket and contoured plasma source |
| 10/02/1996 | EP0735565A1 Method and apparatus for monitoring the dry etching of a dielectric film to a given thickness |
| 10/02/1996 | EP0735564A2 Micro-processing apparatus and method therefor |
| 10/02/1996 | EP0735563A2 Scanning electron microscope |
| 10/02/1996 | EP0584233A4 Methods of fabricating integrated, aligned tunneling tip pairs |
| 10/02/1996 | DE19511946A1 Cathodic sputtering appts. for coating esp. plastic substrates esp. of PMMA |
| 10/02/1996 | CN1132407A Surface treatment method and system |
| 10/01/1996 | US5561299 X-Y stage and charged particle beam exposure apparatus |
| 10/01/1996 | US5561293 Method of analyzing a failure of a sample |
| 10/01/1996 | US5561008 Process for device fabrication using projection lithography and an apparatus therefor |
| 10/01/1996 | US5560776 Plasma discharge generating antenna |
| 09/26/1996 | DE19611779A1 Raster scan microscope with probe holding system for detachable holding of probe |
| 09/26/1996 | DE19510827A1 Appts. for producing reactive gas |
| 09/26/1996 | DE19510736A1 Appts. for preventing arcing in hf sputter installations |
| 09/25/1996 | EP0734048A1 Procedure and device for coating or cleaning a substrate |
| 09/25/1996 | EP0734047A2 Plasma processing method and apparatus |
| 09/25/1996 | EP0734046A2 Process and apparatus for patterning a masked metal layer in a RF plasma, comprising substrate bias amplitude modulation |
| 09/25/1996 | EP0734045A2 Focused ion beam apparatus and method for irradiating focused ion beam |
| 09/25/1996 | EP0734044A2 Ion energy analyzer and electrically controlled geometric filter for same |
| 09/25/1996 | EP0576559B1 Interfacial plasma bars for photovoltaic deposition apparatus |
| 09/24/1996 | US5559391 Three-grid ion-optical system |
| 09/24/1996 | US5559330 Scanning tunneling microscope |
| 09/24/1996 | US5559329 Apparatus for use in measuring properties |
| 09/24/1996 | US5559328 Apparatus for analyzing samples |
| 09/24/1996 | US5558751 Dual cathode sputter coating apparatus |
| 09/24/1996 | US5558750 Rotatable target carrier projects into sputtering chamber; continuous processing |
| 09/24/1996 | US5558749 Magnetron sputtering apparatus and method |
| 09/24/1996 | US5558736 Electron cyclotron resonance apparatus |
| 09/24/1996 | US5558722 Plasma processing apparatus |
| 09/24/1996 | US5558719 Plasma processing apparatus |
| 09/24/1996 | US5558718 Pulsed source ion implantation apparatus and method |
| 09/24/1996 | US5558717 CVD Processing chamber |
| 09/19/1996 | WO1996028838A1 Method of writing a pattern by an electron beam |
| 09/19/1996 | WO1996028837A1 Hybrid control system for scanning probe microscopes |
| 09/19/1996 | WO1996028751A1 Method for particle wave reconstruction in a particle-optical apparatus |
| 09/19/1996 | WO1996028584A1 Target assembly having inner and outer targets |
| 09/19/1996 | DE19609521A1 Photo-induced current detection scanning analyser for LSI pre-testing |
| 09/18/1996 | EP0732729A2 Plasma processing apparatus and plasma processing method |
| 09/18/1996 | EP0732728A2 Plasma reactor and pedestal for supporting semiconductor substrate in a plasma reactor |
| 09/18/1996 | EP0732727A2 Use and method for treatment of surfaces by means of a barrier discharge device producing plasma particles and/or UV-radiation |
| 09/18/1996 | EP0732726A2 Scanning electron microscope |
| 09/18/1996 | EP0732725A2 Method for identifying surface atoms of solid sample and apparatus therefor |
| 09/18/1996 | EP0732720A1 Cathode, electron beam emission apparatus using the same, and method of manufacturing the cathode |
| 09/18/1996 | EP0731981A1 Particle-optical apparatus comprising an electron source with a needle and a membrane-like extraction electrode |
| 09/18/1996 | CN1131204A Deposited film forming apparatus and electrode for use in it |
| 09/17/1996 | US5557314 Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus |
| 09/17/1996 | US5557215 Self-bias measuring method, apparatus thereof and electrostatic chucking apparatus |
| 09/17/1996 | US5557172 Plasma beam generating method and apparatus which can generate a high-power plasma beam |
| 09/17/1996 | US5557110 Aperture for use in electron beam system for pattern writing |
| 09/17/1996 | US5557109 Radiation sterilization unit |
| 09/17/1996 | US5557105 Pattern inspection apparatus and electron beam apparatus |
| 09/17/1996 | US5556549 Power control and delivery in plasma processing equipment |
| 09/17/1996 | US5556521 Sputter etching apparatus with plasma source having a dielectric pocket and contoured plasma source |
| 09/17/1996 | US5556519 Electricity, holders, magnetism and magnetrons |
| 09/17/1996 | US5556506 Plasma ignitor, etching |
| 09/17/1996 | US5556501 Silicon scavenger in an inductively coupled RF plasma reactor |
| 09/17/1996 | US5556500 Vacuum chambers, gases, exhaust systems, counter electrodes, supports, power supply and focus rings |
| 09/17/1996 | US5556475 Microwave plasma reactor |
| 09/17/1996 | US5556474 Plasma processing apparatus |
| 09/17/1996 | CA2025619C Tantalum carbide composite materials |
| 09/12/1996 | WO1996027894A1 A stress cell for a scanning probe microscope |
| 09/11/1996 | EP0730532A1 Topology induced plasma enhancement for etched uniformity improvement |
| 09/11/1996 | EP0712533A4 Probe microscopy |
| 09/11/1996 | EP0616729B1 Semiconductor device and microwave process for its manufacture |
| 09/10/1996 | US5554857 Method and apparatus for ion beam formation in an ion implanter |
| 09/10/1996 | US5554856 Conveyer-type unit for radiation sterilization |
| 09/10/1996 | US5554854 In situ removal of contaminants from the interior surfaces of an ion beam implanter |
| 09/10/1996 | US5554853 Producing ion beams suitable for ion implantation and improved ion implantation apparatus and techniques |
| 09/10/1996 | US5554266 Semiconductor device manufacturing apparatus |
| 09/10/1996 | US5554249 Magnetron plasma processing system |
| 09/10/1996 | US5554223 Plasma processing apparatus with a rotating electromagnetic field |
| 09/06/1996 | WO1996020495A3 Specimen holder for an electron microscope and device and method for mounting a specimen in an electron microscope |
| 09/05/1996 | DE3745015C2 Semiconductor mfr. using source and etching gases |
| 09/04/1996 | EP0729642A1 Method of writing a pattern by an electron beam |
| 09/04/1996 | EP0729640A1 Methods and apparatus for altering material using ion beams |
| 09/04/1996 | EP0636285B1 Stabilizer for switch-mode powered rf plasma processing |
| 09/04/1996 | CN1130215A Method and equipment for plane magnetic control sputtering plating |
| 09/03/1996 | US5552611 Pseudo-random registration masks for projection lithography tool |
| 09/03/1996 | US5552124 Stationary focus ring for plasma reactor |
| 09/03/1996 | US5552017 Plasma etching a single wafer |
| 09/03/1996 | US5552016 Semiconductor plasma etching, monitoring optical emissions with wavelength filter of 700nm |
| 08/29/1996 | WO1996026533A1 Reactive sputtering device |
| 08/29/1996 | WO1996026532A1 Deposition apparatus |
| 08/29/1996 | WO1996026531A2 Filtered cathodic arc source |
| 08/29/1996 | WO1996026530A1 Generator of ribbon-shaped ion beam |
| 08/29/1996 | WO1996026302A1 Reactive sputtering process |
| 08/29/1996 | WO1996014653A3 Method and apparatus for reducing arcing in plasma processing chambers |
| 08/29/1996 | DE19607335A1 Electron microscope for IC inspection |
| 08/29/1996 | DE19506799A1 Sputtering appts. for thin film prodn. |
| 08/29/1996 | DE19506513A1 Einrichtung zur reaktiven Beschichtung Means for reactive coating |
| 08/28/1996 | EP0729173A1 Metal ion implanting apparatus |
| 08/28/1996 | EP0728365A1 Electron radiation dose tailoring by variable beam pulse generation |
| 08/28/1996 | EP0728294A1 Mounting for a probe tip in a scanning force or scanning tunneling microscope |