Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/1996
11/20/1996EP0742994A1 Plasma-generating device
11/19/1996US5576939 Enhanced thin film DC plasma power supply
11/19/1996US5576833 Wafer pattern defect detection method and apparatus therefor
11/19/1996US5576629 Plasma monitoring and control method and system
11/19/1996US5576593 Apparatus for accelerating electrically charged particles
11/19/1996US5576543 Method and apparatus for determining crystallographic characteristics
11/19/1996US5576542 Substrate cross-section observing apparatus
11/19/1996US5576538 Apparatus and method for ion beam neutralization
11/19/1996US5575887 Semiconductors
11/19/1996US5575176 Three-dimensional positioning device
11/14/1996WO1996036065A1 Sputtering apparatus with isolated coolant and sputtering target therefor
11/14/1996WO1996036053A1 Ion beam emitter equipped with secondary particle detector, and secondary particle detection method
11/14/1996WO1996035821A1 Apparatus for reducing arcing during sputtering
11/14/1996DE19516140A1 Steuersystem für rastergebundene Meßdatenerfassung Control system for scanning bound data acquisition
11/14/1996CA2218736A1 Sputtering apparatus with isolated coolant and sputtering target therefor
11/13/1996EP0742577A2 Inductively and multi-capacitively coupled plasma reactor
11/13/1996EP0601151B1 Process for regulating a hot cathode glow discharge
11/13/1996CN1135538A Plasma treatment process and treatment apparatus thereof
11/12/1996US5574410 Impedance matching network
11/12/1996US5574280 Focused ion beam apparatus and method
11/12/1996US5574279 Probe with torsion lever structure, and scanning probe microscope and record/reproducing apparatus utilizing the same
11/12/1996US5574278 For determining properties of a sample surface
11/12/1996US5573597 Plasma processing system with reduced particle contamination
11/12/1996US5573596 Arc suppression in a plasma processing system
11/12/1996US5573595 Methods and apparatus for generating plasma
11/07/1996WO1996035226A1 Ion beam preparation device for electron microscopy
11/07/1996WO1996035225A1 Tapered structure suitable for microthermocouples microelectrodes, field emission tips and micromagnetic sensors with force sensing capabilities
11/07/1996WO1996035154A1 Control system for scanning measurement data detection
11/06/1996EP0741404A1 A method and an electrode system for excitation of a plasma
11/06/1996EP0740710A1 Magnetron sputtering apparatus for compound thin films
11/05/1996US5572170 Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
11/05/1996US5572038 Charge monitor for high potential pulse current dose measurement apparatus and method
11/05/1996US5572026 Method for preparation of transmission electron microscope sample material utilizing sheet mesh
11/05/1996US5571577 Method and apparatus for plasma treatment of a surface
11/05/1996US5571393 Magnet housing for a sputtering cathode
11/05/1996US5571366 Plasma processing apparatus
11/05/1996US5571332 Electron jet vapor deposition system
10/1996
10/31/1996WO1996034125A1 Sputtering device
10/31/1996WO1996034124A1 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
10/31/1996WO1996024947A3 Magnetron sputtering cathode apparatus
10/31/1996DE19608082A1 Sample preparation appts. using ion beam, for electron microscope
10/31/1996DE19515802A1 Reactor for plasma deposition of semiconductor material on substrates with electrodes
10/31/1996DE19515799A1 Process for plasma coating substrates with semiconductor
10/31/1996CA2218279A1 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
10/30/1996EP0740328A2 Method and apparatus for producing plasma uniformity in a magnetic field-enhanced plasma reactor
10/30/1996EP0740327A2 Ion beam processing apparatus
10/30/1996EP0739536A1 Charged particle projector system
10/30/1996EP0739531A1 Particle beam, in particular ionic optic reproduction system
10/30/1996EP0322419B1 Point projection photoelectron microscope with hollow needle
10/30/1996CN2238836Y Device for polymer material plasma surface modified
10/30/1996CN1134469A Cylindrical magnetron shield structure
10/29/1996US5569974 Electron-emitting device and electron beam lithograph machine and image display apparatus making use of it
10/29/1996US5569925 Mechanical shutter for protecting an x-ray detector against high-energy electron or x-ray damage
10/29/1996US5569920 Retractable cathodoluminescence detector with high ellipticity and high backscattered electron rejection performance for large area specimens
10/29/1996US5569918 Probe holder and probe mounting method for a scanning probe microscope
10/29/1996US5569363 Having shade on inner wall covering protected zone of wall opposite inductive coil to prevent accumulation of sputtered material and formation of eddy currents
10/29/1996US5569356 Dry plasma etching
10/24/1996WO1996032846A1 Microwave cvd method for deposition of robust barrier coatings
10/24/1996DE19513566A1 Industrial scale appts. implants tin ions into steel to reduce friction of alloy
10/24/1996CA2218578A1 Microwave cvd method for deposition of robust barrier coatings
10/23/1996EP0739155A1 Device for generating two or more plasma discharges within a single waveguide tube
10/22/1996US5568004 Electromechanical positioning device
10/22/1996US5567949 Charged particle beam transfer apparatus
10/22/1996US5567289 Rotating floating magnetron dark-space shield and cone end
10/22/1996US5567268 Plasma processing apparatus and method for carrying out plasma processing by using such plasma processing apparatus
10/22/1996US5567267 Method of controlling temperature of susceptor
10/22/1996US5567255 Solid annular gas discharge electrode
10/22/1996US5567241 Method and apparatus for the improved microwave deposition of thin films
10/22/1996CA2083112C Device manufacturing involving step-and-scan delineation
10/17/1996WO1996032741A1 Method for water vapor enhanced charged-particle-beam machining
10/16/1996EP0737999A1 A magnetron sputtering system
10/16/1996EP0737998A2 Device for depositing thin layers on a substrate
10/16/1996EP0737997A2 Scanning electron microscope
10/16/1996EP0737858A1 Method and apparatus for adjusting electron-beam device
10/16/1996EP0737256A1 Microwave plasma reactor
10/16/1996EP0685003B1 Method of stabilizing plasma generation by an electron-beam evaporator
10/16/1996EP0538363B1 Device for magnetron sputtering having slotted cylindrical hollow cathode
10/16/1996CN1133484A Device for removing ion from electronic beam
10/15/1996US5566060 E-beam high voltage switching power supply
10/15/1996US5565738 Plasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamber
10/15/1996US5565681 Ion energy analyzer with an electrically controlled geometric filter
10/15/1996US5565114 Method and device for detecting the end point of plasma process
10/15/1996US5565074 Plasma reactor with a segmented balanced electrode for sputtering process materials from a target surface
10/15/1996US5565071 Integrated sputtering target assembly
10/15/1996US5565058 Lid and door for a vacuum chamber and pretreatment therefor
10/15/1996US5565036 Apparatus and method for igniting plasma in a process module
10/12/1996CA2173891A1 Device for applying thin layers to a substrate
10/10/1996WO1996031997A1 Surface treatment apparatus
10/10/1996WO1996031899A1 Adjustable energy quantum thin film plasma processing system
10/10/1996WO1996031898A1 Method and device for controlling the energy of at least one charged species bombarding a body immersed in a plasma
10/10/1996WO1996031897A1 Electron microscope
10/09/1996EP0736893A2 Charged particle beam exposure method and apparatus
10/09/1996EP0736746A1 Method of using scanning probe microscope permitting cleaning of probe microscope or of probe tip in ambient atmosphere
10/09/1996CN1132930A Plasma treating device
10/09/1996CN1132800A Plasma processing method and plasma processing apparatus
10/08/1996US5563857 Disc changer having a single driving motor for both a tray and a roulette
10/08/1996US5563419 Electron beam exposure system capable of correcting proximity effect
10/08/1996US5563418 Broad beam ion implanter
10/08/1996US5563415 Magnetic lens apparatus for a low-voltage high-resolution electron microscope
10/08/1996US5563412 Method of making specimens for an electron microscope
1 ... 373 374 375 376 377 378 379 380 381 382 383 384 385 386 387 388 389 390 391 392 393 ... 469