| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/07/1997 | US5591970 Charged beam apparatus |
| 01/07/1997 | US5591493 Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber |
| 01/07/1997 | US5591314 Apparatus for affixing a rotating cylindrical magnetron target to a spindle |
| 01/07/1997 | US5591313 Apparatus and method for localized ion sputtering |
| 01/07/1997 | US5591300 Single crystal silicon dry-etch endpoint based on dopant-dependent and thermally-assisted etch rates |
| 01/07/1997 | US5591268 Plasma process with radicals |
| 01/07/1997 | US5591267 Reduced pressure device |
| 01/02/1997 | EP0751552A1 Sample processing apparatus |
| 01/02/1997 | EP0730532A4 Topology induced plasma enhancement for etched uniformity improvement |
| 01/02/1997 | EP0696351B1 In situ tensile testing machine and specimen for a scanning electron microscope |
| 01/02/1997 | DE19625894A1 Lithographic photomask production apparatus for LSI semiconductor manufacture |
| 01/02/1997 | DE19625598A1 Sputter installation and method for exchanging one of its inner chambers |
| 01/02/1997 | DE19617155A1 Sputter coating station esp. for producing data storage discs |
| 01/02/1997 | DE19523529A1 Appts. for high-rate electron-beam vapour coating of wide substrates |
| 12/31/1996 | US5590048 Pattern extracting apparatus |
| 12/31/1996 | US5589737 Plasma processor for large workpieces |
| 12/31/1996 | US5589686 Method of an apparatus for real-time nanometer-scale position measurement of the sensor of a scanning tunneling microscope or other sensor scanning atomic or other undulating surfaces |
| 12/31/1996 | US5589270 Electroconductive polymer, semiconductors |
| 12/31/1996 | US5589042 Using ion beam sputter etching |
| 12/31/1996 | US5589041 Plasma sputter etching system with reduced particle contamination |
| 12/31/1996 | US5589039 In-plane parallel bias magnetic field generator for sputter coating magnetic materials onto substrates |
| 12/31/1996 | US5589002 Gas distribution plate for semiconductor wafer processing apparatus with means for inhibiting arcing |
| 12/27/1996 | WO1996042103A1 System and method for producing superimposed static and time-varying magnetic fields |
| 12/27/1996 | WO1996041900A1 Improved parallel ion optics and apparatus for high current low energy ion beams |
| 12/27/1996 | WO1996041897A2 Durable plasma treatment apparatus and method |
| 12/27/1996 | EP0750332A2 Procedure for controlling the emission current of an electron source and electron source with emission current control |
| 12/27/1996 | EP0737256A4 Microwave plasma reactor |
| 12/27/1996 | EP0700577A4 Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure |
| 12/24/1996 | US5587587 Ion implanting apparatus and ion implanting method |
| 12/24/1996 | US5587586 Particle-optical apparatus comprising an electron source with a needle and a membrane-like extraction electrode |
| 12/24/1996 | US5587207 Apparatus providing homogeneous concentrated plasma column in cylindrical reaction tube in which substrate holders are configured to act as liner confining arc in channel |
| 12/24/1996 | US5587205 Plasma processing method and an apparatus for carrying out the same |
| 12/24/1996 | US5587045 Gettering of particles from an electro-negative plasma with insulating chuck |
| 12/24/1996 | US5587038 Apparatus and process for producing high density axially extending plasmas |
| 12/20/1996 | CA2197978A1 Discharge methods and electrodes for generating plasmas at one atmosphere of pressure, and materials treated therewith |
| 12/19/1996 | WO1996041366A1 Plasma processing system with reduced particle contamination |
| 12/19/1996 | WO1996041365A1 Plasma sputter etching system with reduced particle contamination |
| 12/19/1996 | WO1996041364A1 Beam stop apparatus for an ion implanter |
| 12/19/1996 | WO1996041363A1 Selective cross-link scanning system |
| 12/19/1996 | WO1996041362A1 Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes |
| 12/19/1996 | DE19521337A1 Demonstration and location of magnetic or electromagnetic fields |
| 12/19/1996 | CA2223233A1 Selective cross-link scanning system |
| 12/18/1996 | EP0749149A2 Plasma processing apparatus |
| 12/18/1996 | EP0749148A2 Plasma processing apparatus |
| 12/18/1996 | EP0749147A2 Method and device for controlling the electrical current density over a workpiece during heat treatment by plasma |
| 12/18/1996 | EP0644954B1 Semiconductor wafer processing cvd reactor |
| 12/17/1996 | US5585630 Electron energy filter and transmission electron microscope provided with the same |
| 12/17/1996 | US5585629 Electron beam nano-metrology system |
| 12/17/1996 | US5585211 Fabrication and use of sub-micron dimensional standard |
| 12/17/1996 | US5585012 Self-cleaning polymer-free top electrode for parallel electrode etch operation |
| 12/17/1996 | US5584974 Applying direct current voltage between target and anode in plasma chamber, cyclically sensing voltage, interrupting voltage |
| 12/17/1996 | US5584973 Restricts sputtering directions of sputtered particles from target |
| 12/17/1996 | US5584972 Plasma noise and arcing suppressor apparatus and method for sputter deposition |
| 12/12/1996 | WO1996039794A1 Power supply for multielectrode discharge |
| 12/12/1996 | WO1996026531A3 Filtered cathodic arc source |
| 12/12/1996 | DE19605316C1 Method and appts. for controlling plasma-aided vacuum coating processes |
| 12/12/1996 | DE19605315C1 Method and appts. for controlling a vacuum coating process |
| 12/11/1996 | EP0747928A1 Electrode designs for controlling uniformity profiles in plasma processing reactors |
| 12/11/1996 | EP0747927A2 Apparatus for obtaining dose uniformity in plasma doping (PLAD) ion implantation processing |
| 12/11/1996 | EP0747729A1 Method of controlling in real time the ionization dose intensity and apparatus for carrying out the method |
| 12/11/1996 | EP0746869A1 Method and apparatus for electron beam focusing adjustment in a scanning electron beam computed tomography scanner |
| 12/11/1996 | EP0746857A1 Scanning probe microscope |
| 12/10/1996 | US5583427 Tomographic determination of the power distribution in electron beams |
| 12/10/1996 | US5583393 Selectively shaped field emission electron beam source, and phosphor array for use therewith |
| 12/10/1996 | US5583344 Process method and apparatus using focused ion beam generating means |
| 12/10/1996 | US5583286 Integrated sensor for scanning probe microscope |
| 12/08/1996 | CA2178467A1 Process and device for real time control of ionizing radiation dosage |
| 12/05/1996 | WO1996038857A2 Magnetically enhanced radio frequency reactive ion etching method and apparatus |
| 12/05/1996 | WO1996038311A1 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure |
| 12/05/1996 | DE19520457A1 Sensing element for probe used to measure topography of sample surface in raster scan microscope |
| 12/05/1996 | CA2222620A1 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure |
| 12/04/1996 | EP0745266A1 Chromatically compensated particle-beam column |
| 12/04/1996 | EP0745148A1 Sputtering method and apparatus for depositing a coating onto substrate |
| 12/04/1996 | EP0745147A1 Method and apparatus for coating a substrate |
| 12/03/1996 | US5581193 Multiple source and detection frequencies in detecting threshold phenomena associated with and/or atomic or molecular spectra |
| 12/03/1996 | US5581088 Specimen-holding device for electron microscope |
| 12/03/1996 | US5581082 Combined scanning probe and scanning energy microscope |
| 12/03/1996 | US5580429 Method for the deposition and modification of thin films using a combination of vacuum arcs and plasma immersion ion implantation |
| 12/03/1996 | US5580420 Plasma generating method and apparatus and plasma processing method and apparatus |
| 12/03/1996 | US5580387 Corrugated waveguide for a microwave plasma applicator |
| 12/03/1996 | US5580385 Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber |
| 11/28/1996 | WO1996037910A1 Plasma etch system |
| 11/28/1996 | DE19620821A1 Electron microscope for flaw analysis and inspecting electronic e.g. semiconductor or superconductor components |
| 11/28/1996 | CA2220546A1 Plasma etch system |
| 11/27/1996 | EP0744617A2 Apparatus and method for surface analysis |
| 11/27/1996 | EP0642600B1 Device for producing a plasma polymer protection layer on workpieces, in particular headlamp reflectors |
| 11/26/1996 | US5578831 Method and apparatus for charged particle propagation |
| 11/26/1996 | US5578823 Transmission electron microscope and method of observing element distribution by using the same |
| 11/26/1996 | US5578822 Particle-optical apparatus comprising a detector for secondary electrons |
| 11/26/1996 | US5578821 Electron beam inspection system and method |
| 11/26/1996 | US5578165 Coil configurations for improved uniformity in inductively coupled plasma systems |
| 11/26/1996 | US5578164 Edges of substrate not covered by photoresist, hood arrangement in plasma apparatus protects edges from exposure to plasma etching process |
| 11/26/1996 | US5578161 Method and apparatus for in-situ and on-line monitoring of trench formation process |
| 11/26/1996 | US5578131 Fluoropolymers |
| 11/26/1996 | US5578129 Gas supplying head and load lock chamber of semiconductor processing system |
| 11/26/1996 | CA2070946C Cantilever type displacement element, and scanning tunneling microscope or information processing apparatus using same |
| 11/21/1996 | WO1996036984A1 Electrode clamping assembly and method for assembly and use thereof |
| 11/21/1996 | DE19518319A1 Electron beam gun for material treatment esp. welding |
| 11/21/1996 | CA2220678A1 Electrode clamping assembly and method for assembly and use thereof |
| 11/20/1996 | EP0743671A2 Method and apparatus for plasma processing apparatus |