| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/04/1997 | US5607509 High impedance plasma ion implantation apparatus |
| 02/27/1997 | WO1997007527A1 Method and apparatus for determining crystallographic characteristics |
| 02/27/1997 | WO1997007526A1 High temperature specimen stage and detector for an environmental scanning electron microscope |
| 02/27/1997 | WO1997007525A1 Field emission environmental scanning electron microscope |
| 02/27/1997 | DE3790816C2 Translational manipulation appts. using shape memory alloy blades |
| 02/27/1997 | DE19603037C1 Electron beam multi-chamber unit, e.g. for welding and hardening |
| 02/26/1997 | EP0759632A1 Plasma processing apparatus |
| 02/26/1997 | EP0759536A1 Atomic force microscope and measuring head thereof |
| 02/26/1997 | CN1143690A Spattering filming device |
| 02/25/1997 | US5606261 Retarding field electron-optical apparatus |
| 02/25/1997 | US5606168 In situ tensile testing machine and sample for a scanning electron microscope |
| 02/25/1997 | US5605640 Reactor for the treatment of particulate matter by electrical discharge |
| 02/25/1997 | US5605637 Adjustable dc bias control in a plasma reactor |
| 02/25/1997 | US5605609 Method for forming low refractive index film comprising silicon dioxide |
| 02/25/1997 | US5605599 Method of generating plasma having high ion density for substrate processing operation |
| 02/25/1997 | US5605576 High frequency magnetron plasma apparatus |
| 02/20/1997 | DE19623359A1 Device for coating a substrate by vaporisation of a rotary tubular target |
| 02/19/1997 | EP0758756A1 Transparent heating plate and transparent heating device |
| 02/19/1997 | EP0758688A1 Apparatuses for deposition or etching |
| 02/19/1997 | EP0758485A1 Selectively shaped field emission electron beam source, and phosphor array for use therewith |
| 02/19/1997 | EP0758409A1 Multi-frequency inductive method and apparatus for the processing of material |
| 02/19/1997 | EP0758408A1 Rectangular vacuum-arc plasma source |
| 02/18/1997 | US5604143 Method for producing nonvolatile memory used as read-only storage media |
| 02/18/1997 | US5603816 Sputtering device and target with cover to hold cooling fluid |
| 02/18/1997 | CA1338918C Hollow cathode type magnetron apparatus construction |
| 02/13/1997 | WO1997005644A1 Process and device for ion thinning in a high-resolution transmission electron microscope |
| 02/12/1997 | EP0758140A2 Electron microscope |
| 02/12/1997 | EP0757598A1 Pulsed ion beam assisted deposition |
| 02/12/1997 | EP0724652A4 Method and apparatus for sputtering magnetic target materials |
| 02/11/1997 | US5602390 Electrostatic repulsion ion microscope |
| 02/11/1997 | US5601653 Apparatus for performing plasma process on semiconductor wafers and the like and method of performing plasma process |
| 02/06/1997 | WO1997004478A2 Plasma treatment apparatus for large area substrates |
| 02/06/1997 | WO1997004476A2 Method and apparatus for semiconductor etching and stripping |
| 02/06/1997 | WO1997004475A1 Xy displacement device |
| 02/06/1997 | WO1997004474A1 An ion beam apparatus |
| 02/06/1997 | WO1997004335A1 Transparent position-sensitive particle detector |
| 02/05/1997 | EP0757374A1 Etching electrode and manufacturing process thereof |
| 02/05/1997 | EP0757373A2 In situ removal of contaminants from the interior surfaces of an ion beam implanter |
| 02/05/1997 | EP0757291A2 Processing method and processing apparatus using fast atom beam |
| 02/04/1997 | US5600146 Charged particle beam multiple-pole deflection control circuitry |
| 02/04/1997 | US5600136 Single potential ion source |
| 02/04/1997 | US5599396 High density inductively and capacitively coupled plasma chamber |
| 02/04/1997 | US5598622 Temperature clamping method for anti-contamination and collimating devices for thin film processes |
| 01/30/1997 | WO1997003453A2 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| 01/30/1997 | WO1997003224A1 A plasma enhanced chemical processing reactor and method |
| 01/30/1997 | WO1997003221A1 Magnetron cathode apparatus and method for sputtering |
| 01/30/1997 | WO1997003220A1 Permanent magnet array apparatus and method |
| 01/29/1997 | EP0756309A1 Plasma systems for processing substrates |
| 01/29/1997 | EP0755547A1 Ultrahigh vacuum focused ion beam micromill and articles therefrom |
| 01/29/1997 | EP0755461A1 Process and device for ion-supported vacuum coating |
| 01/29/1997 | EP0605534B1 Apparatus for rapid plasma treatments and method |
| 01/28/1997 | US5598002 Electron beam apparatus |
| 01/28/1997 | US5597624 Optical fibers |
| 01/28/1997 | US5597623 Vapor deposition of films on substrate |
| 01/28/1997 | US5597462 Condensing device for sputtering device |
| 01/28/1997 | US5597459 Compact disks, aluminum on polycarbonate |
| 01/28/1997 | US5597439 Process gas inlet and distribution passages |
| 01/28/1997 | US5597438 Etch chamber having three independently controlled electrodes |
| 01/28/1997 | CA2052543C Ion implantation and surface processing method and apparatus |
| 01/23/1997 | WO1997002593A1 An improved method and apparatus for detecting optimal endpoints in plasma etch processes |
| 01/23/1997 | WO1997002590A1 Sample analyzer |
| 01/23/1997 | WO1997002589A1 Power segmented electrode |
| 01/23/1997 | WO1997002588A1 Low inductance large area coil for an inductively coupled plasma source |
| 01/22/1997 | EP0755064A2 Cathode having a reservoir and method of manufacturing the same |
| 01/22/1997 | EP0754289A1 Cantilever deflection sensor and use thereof |
| 01/22/1997 | EP0722376A4 Treatment of particulate matter by electrical discharge |
| 01/21/1997 | US5596195 Method and apparatus for measuring the distribution of elements contained in sample |
| 01/21/1997 | US5595942 Method of fabricating cantilever for atomic force microscope having piezoresistive deflection detector |
| 01/21/1997 | US5595337 Sputtering device and target with cover to hold cooling fluid |
| 01/18/1997 | CA2177872A1 In situ removal of contaminants from the interior surfaces of an ion beam implanter |
| 01/16/1997 | WO1997001862A1 Electron microscope and electron microscopy |
| 01/16/1997 | WO1997001655A1 A scalable helicon wave plasma processing device with a non-cylindrical source chamber |
| 01/16/1997 | WO1997001653A2 Sputtering shield |
| 01/15/1997 | EP0753882A1 Cathode assembly for a target sputtering device |
| 01/15/1997 | EP0753881A1 Plasma etching apparatus utilising plasma confinement |
| 01/15/1997 | EP0753880A1 A scanning microscope and a method of operating such a scanning microscope |
| 01/15/1997 | EP0753601A2 Coating apparatus |
| 01/15/1997 | EP0753201A1 Sputtering target erosion profile control for collimated deposition |
| 01/15/1997 | EP0753200A1 Improved environmental scanning electron microscope |
| 01/15/1997 | EP0753081A1 An electron jet vapor deposition system |
| 01/15/1997 | EP0721514A4 Magnetically enhanced multiple capacitive plasma generation apparatus and related method |
| 01/15/1997 | EP0700578A4 Intraoperative electron beam therapy system and facility |
| 01/15/1997 | CN1140206A Apparatus for deposition of film on substrate |
| 01/14/1997 | US5594246 Method and apparatus for x-ray analyses |
| 01/14/1997 | US5594245 Scanning electron microscope and method for dimension measuring by using the same |
| 01/14/1997 | US5594243 For measuring the mass of organic molecules |
| 01/14/1997 | US5594166 Cantilever for use with atomic force microscope and process for the production thereof |
| 01/14/1997 | US5593761 Electron beam shaping mask for an electron beam system with pattern writing capability |
| 01/14/1997 | US5593551 Magnetron sputtering source for low pressure operation |
| 01/14/1997 | US5593541 Semiconductors |
| 01/14/1997 | US5593540 Gas flow through small holes in a shower electrode |
| 01/14/1997 | US5593539 Plasma source for etching |
| 01/14/1997 | US5593123 Vacuum system components |
| 01/14/1997 | CA2052080C Plasma source arrangement for ion implantation |
| 01/08/1997 | EP0752757A1 Rf match detector circuit with dual directional coupler |
| 01/08/1997 | EP0752715A1 Charged particle beam apparatus |
| 01/08/1997 | EP0752482A2 Method and equipment for the application of wear resistant coatings by high vacuum physical vapour deposition |
| 01/08/1997 | EP0751972A1 Polymer surface treatment with pulsed particle beams |
| 01/07/1997 | US5591980 Bi-axial-tilting specimen fine motion device and method of correcting image shifting |
| 01/07/1997 | US5591971 Shielding device for improving measurement accuracy and speed in scanning electron microscopy |