| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/16/1997 | EP0768701A1 A process for device fabrication in which the plasma etch is controlled by monitoring optical emission |
| 04/16/1997 | EP0768700A1 Electron multiplier for scanning electron microscopes |
| 04/16/1997 | EP0588992B1 Device for processing substrates within a plasma |
| 04/16/1997 | EP0544831B1 Sputtering apparatus and sputtering method of improving ion flux distribution uniformity on a substrate |
| 04/16/1997 | CN1147753A Electron source for multibeam electron lithography system |
| 04/16/1997 | CN1147693A Plasama processing method and apparatus |
| 04/16/1997 | CN1147690A Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
| 04/15/1997 | US5621331 Automatic impedance matching apparatus and method |
| 04/15/1997 | US5621216 Hardware/software implementation for multipass E-beam mask writing |
| 04/15/1997 | US5621211 Scanning tunneling atom-probe microscope |
| 04/15/1997 | US5620577 Spring-loaded mount for a rotatable sputtering cathode |
| 04/15/1997 | US5620523 Apparatus for forming film |
| 04/15/1997 | US5620522 Microwave plasma generator |
| 04/10/1997 | WO1997013270A1 Resolution-enhancement device for an optically-coupled image sensor for an electron microscope |
| 04/10/1997 | WO1997013269A1 Method of reconstructing an image in a particle-optical apparatus |
| 04/10/1997 | WO1997013268A1 Particle-optical apparatus comprising a fixed diaphragm for the monochromator filter |
| 04/10/1997 | WO1997013266A2 Discharge methods and electrodes for generating plasmas at one atmosphere of pressure, and materials treated therewith |
| 04/10/1997 | DE19639240A1 Magnetron sputter source |
| 04/09/1997 | EP0767483A1 Device for coating substrates in vacuum |
| 04/09/1997 | EP0767482A2 Particle-optical apparatus comprising a detector for secondary electrons |
| 04/09/1997 | EP0766869A1 Electron microscope with raman spectroscopy |
| 04/09/1997 | EP0746869A4 Method and apparatus for electron beam focusing adjustment in a scanning electron beam computed tomography scanner |
| 04/09/1997 | EP0570484B1 System for generating a high density plasma |
| 04/09/1997 | CN1147144A In situ removal of contaminants from interior surfaces of ion beam implanter |
| 04/08/1997 | US5619103 Inductively coupled plasma generating devices |
| 04/08/1997 | US5619035 System for analyzing surfaces of samples |
| 04/08/1997 | US5618382 Using inert gas withing plasma reactor for soft etching, cleaning |
| 04/03/1997 | WO1997012502A1 Methods and apparatus for generating plasma |
| 04/03/1997 | WO1997012075A1 Method and apparatus for deposition of diamond-like carbon on drills |
| 04/03/1997 | WO1997003453A3 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| 04/03/1997 | DE19546826C1 Substrate surface treatment prior to vacuum coating |
| 04/02/1997 | EP0766283A1 Transmission electron microscope with camera system |
| 04/01/1997 | US5616921 Method of modifying an integrated circuit specimen |
| 04/01/1997 | US5616920 Apparatus for removing ions from an electron beam |
| 04/01/1997 | US5616916 Configuration measuring method and apparatus for optically detecting a displacement of a probe due to an atomic force |
| 04/01/1997 | US5616373 Electrodepositing by gas discharges |
| 04/01/1997 | US5616226 Cathode assembly |
| 04/01/1997 | US5616225 Use of multiple anodes in a magnetron for improving the uniformity of its plasma |
| 04/01/1997 | US5616224 Apparatus for reducing the intensity and frequency of arcs which occur during a sputtering process |
| 03/27/1997 | WO1997011587A1 Method and device for measuring ion flow in a plasma |
| 03/27/1997 | WO1997011482A2 Removal of halogens and photoresist from wafers |
| 03/27/1997 | DE19638109A1 Electron beam lithography apparatus for LSI, VLSI and ELSI circuit manufacture |
| 03/27/1997 | DE19614524A1 Plasma installation |
| 03/26/1997 | EP0764969A2 Microwave plasma processing apparatus and microwave plasma processing method |
| 03/26/1997 | EP0764968A2 Method for radiofrequency wave etching |
| 03/26/1997 | EP0674805B1 Process for carrying out stable low pressure discharge processes |
| 03/26/1997 | EP0428682B1 Magnetic structure for electron-beam heated evaporation source |
| 03/25/1997 | US5614833 Method of noncontact testing of an electrical device |
| 03/25/1997 | US5614725 Charged particle beam exposure system and method |
| 03/25/1997 | US5614713 Scanning electron microscope |
| 03/25/1997 | US5614712 Method of engaging the scanning probe of a scanning probe microscope with a sample surface |
| 03/25/1997 | US5614663 Cantilever for use with atomic force microscope and process for the production thereof |
| 03/25/1997 | US5614273 Process and apparatus for plasma-activated electron beam vaporization |
| 03/25/1997 | US5614071 Sputtering shield |
| 03/25/1997 | US5614070 Sputtering apparatus for forming metal lines |
| 03/25/1997 | US5614060 Process and apparatus for etching metal in integrated circuit structure with high selectivity to photoresist and good metal etch residue removal |
| 03/25/1997 | US5614055 High density plasma CVD and etching reactor |
| 03/25/1997 | US5614026 Showerhead for uniform distribution of process gas |
| 03/25/1997 | US5614025 Plasma processing apparatus |
| 03/20/1997 | WO1997010688A1 Method and apparatus for plasma cvd |
| 03/20/1997 | WO1997004478A3 Plasma treatment apparatus for large area substrates |
| 03/19/1997 | EP0763847A2 Electron microscope |
| 03/18/1997 | US5612588 Electron beam device with single crystal window and expansion-matched anode |
| 03/18/1997 | US5612535 Spin-split scanning electron microscope |
| 03/18/1997 | US5611942 Method for producing tips for atomic force microscopes |
| 03/18/1997 | US5611899 Device for suppressing flashovers in cathode sputtering installations |
| 03/18/1997 | US5611864 Microwave plasma processing apparatus and processing method using the same |
| 03/18/1997 | US5611863 Semiconductor processing apparatus and cleaning method thereof |
| 03/18/1997 | US5611862 Method and apparatus for manufacturing head drums coated with diamond-like carbon coating film using high-frequency plasma |
| 03/13/1997 | WO1997009735A1 Simultaneous specimen and stage cleaning device for analytical electron microscope |
| 03/13/1997 | DE19533216A1 Sample holder with heating chamber for transmission electron microscope |
| 03/12/1997 | EP0762471A1 Magnetic field generator for magnetron plasma |
| 03/12/1997 | EP0762470A2 Apparatus and method for temperature control in plasma processing |
| 03/12/1997 | EP0762469A1 Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
| 03/12/1997 | EP0762468A1 Scanning electron microscope |
| 03/12/1997 | EP0762467A2 Charged particle guide apparatus and image viewing apparatus for charged particle microscope using the same |
| 03/12/1997 | EP0762466A1 Electron microscope specimen supports |
| 03/11/1997 | US5610452 E-beam high voltage switching power supply |
| 03/11/1997 | US5610406 Charged particle beam exposure method and apparatus |
| 03/11/1997 | US5609774 Apparatus for microwave processing in a magnetic field |
| 03/11/1997 | US5609739 Sputtering apparatus |
| 03/11/1997 | US5609690 Vacuum plasma processing apparatus and method |
| 03/06/1997 | WO1997008739A2 Radial magnetic field enhancement for plasma processing |
| 03/06/1997 | WO1997008738A2 Radial magnetic field enhancement for plasma processing |
| 03/06/1997 | WO1997008734A1 Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
| 03/06/1997 | WO1997008732A1 Precision-controlled slit mechanism for electron microscope |
| 03/06/1997 | WO1997008362A1 Method and apparatus for low energy electron enhanced etching of substrates |
| 03/06/1997 | WO1997004476A3 Method and apparatus for semiconductor etching and stripping |
| 03/06/1997 | DE19532838A1 Non contact scanning force microscope |
| 03/06/1997 | DE19532435A1 Unit generating plasma for surface treatment of substrates by e.g. plasma polymerisation or hard facing |
| 03/06/1997 | DE19532100A1 Magnetic field-assisted plasma treatment appts. |
| 03/05/1997 | EP0760526A1 Device and method for plasma treatment |
| 03/05/1997 | EP0760160A1 Soft plasma ignition in plasma processing chambers |
| 03/05/1997 | EP0760159A1 Fast magnetic scanning of heavy ion beams |
| 03/05/1997 | EP0760109A1 Method for particle wave reconstruction in a particle-optical apparatus |
| 03/04/1997 | US5608226 Electron-beam exposure method and system |
| 03/04/1997 | US5608223 Ion implantation device |
| 03/04/1997 | US5608218 Scanning electron microscope |
| 03/04/1997 | US5607801 Direct patterning method of resist film using electron beam |
| 03/04/1997 | US5607542 Generation of plasma for reactive ion etching |