| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/22/1997 | WO1997018694A1 Plasma jet reactor |
| 05/22/1997 | WO1997013266A3 Discharge methods and electrodes for generating plasmas at one atmosphere of pressure, and materials treated therewith |
| 05/22/1997 | DE19646700A1 Vacuum treatment chamber |
| 05/22/1997 | DE19543375A1 Apparatus for coating substrates by magnetron sputtering |
| 05/21/1997 | EP0774886A1 Method and apparatus for generating a plasma |
| 05/21/1997 | EP0774772A1 Methods for physically etching silicon electrically conducting surfaces |
| 05/21/1997 | CN1150327A System and method for plasma etching |
| 05/21/1997 | CN1150253A 原子力显微镜 AFM |
| 05/20/1997 | USRE35514 Scanning force microscope having aligning and adjusting means |
| 05/20/1997 | US5631615 Free wound electromagnetic deflection yoke |
| 05/20/1997 | US5631463 Cantilever detector having piezoelectric film of zinc oxide or aluminum nitride and platinum or palladium electrodes with controlled crystal orientation, for scanning tunneling microscopes |
| 05/20/1997 | US5631410 Vibrating probe atomic force microscope |
| 05/20/1997 | US5631113 Patterns on semiconductor substrates, compensating for deflection of beam away from optical axis |
| 05/20/1997 | US5630916 Magnetic orienting device for thin film deposition and method of use |
| 05/20/1997 | US5630880 Method and apparatus for a large volume plasma processor that can utilize any feedstock material |
| 05/15/1997 | WO1997017717A1 An ion implanter with post mass selection deceleration |
| 05/15/1997 | WO1997017716A1 An ion implanter with post mass selection deceleration |
| 05/15/1997 | WO1997017715A1 Pulsed electron beam source and use thereof |
| 05/15/1997 | WO1997011482A3 Removal of halogens and photoresist from wafers |
| 05/15/1997 | WO1997001653A3 Sputtering shield |
| 05/15/1997 | DE19541510A1 Gepulste Elektronenstrahlquelle und deren Verwendung Pulsed electron beam source and their use |
| 05/14/1997 | EP0773578A1 Improved mass spectrometer and radical measuring method |
| 05/14/1997 | EP0773576A1 Electron column optics for multibeam electron lithography system |
| 05/14/1997 | EP0773167A1 Carbon film-coated plastic container manufacturing apparatus and method |
| 05/14/1997 | EP0681616A4 Cylindrical magnetron shield structure. |
| 05/14/1997 | EP0672295B1 Ion implantation target charge control system and method |
| 05/13/1997 | US5629653 RF match detector circuit with dual directional coupler |
| 05/13/1997 | US5629528 Charged particle beam system having beam-defining slit formed by rotating cyclinders |
| 05/13/1997 | US5629526 Electro-magnetic lens, charged particle beam transferring apparatus, and method for manufacturing electro-magnetic lens |
| 05/13/1997 | US5629086 Substrate is stainless steel, nickel, aluminum or alloy of ni or al; intermediate layer is mainly composed of carbon, ruthenium, silicon or germanium or is layer of ru, si or ge mixed with carbon, nitrogen and/or oxygen with gradient |
| 05/13/1997 | US5629054 Method for continuously forming a functional deposit film of large area by micro-wave plasma CVD method |
| 05/13/1997 | US5628889 High power capacity magnetron cathode |
| 05/13/1997 | US5628883 Method for generating and activating plasma process of treatment using same, and apparatus therefor |
| 05/13/1997 | US5628870 Method for marking a substrate using ionized gas |
| 05/13/1997 | US5628869 Plasma enhanced chemical vapor reactor with shaped electrodes |
| 05/09/1997 | WO1997016946A2 Uniform plasma generation, filter, and neutralization apparatus and method |
| 05/09/1997 | WO1996041897A3 Durable plasma treatment apparatus and method |
| 05/07/1997 | EP0772225A1 Electronic energy filter |
| 05/07/1997 | EP0772223A2 Device for coating a substrate from an electrically conductive target |
| 05/07/1997 | EP0772222A1 Microwave plasma process apparatus and microwave plasma process method |
| 05/07/1997 | EP0772221A1 Electron source for multibeam electron lithography sytem |
| 05/07/1997 | EP0771469A1 Method of and apparatus for microwave-plasma production |
| 05/07/1997 | EP0615655B1 Corona discharge ionisation source |
| 05/07/1997 | DE19643709A1 Surface treatment apparatus for steel workpiece in gas discharge |
| 05/07/1997 | DE19541079A1 Differential conductivity and/or derivative spectrum determination of material sample |
| 05/07/1997 | DE19541058A1 Tunnel spectroscopy method for electronic condition and density of material |
| 05/07/1997 | DE19540543A1 Apparatus for coating a substrate by means of a chemical vapour deposition process |
| 05/07/1997 | CN1149237A Strike enhancement circuit for plasma generator |
| 05/06/1997 | US5627815 Precision machining method precision machining apparatus and data storage apparatus using the same |
| 05/06/1997 | US5627435 Hollow cathode array and method of cleaning sheet stock therewith |
| 05/06/1997 | US5627373 Automatic electron beam alignment and astigmatism correction in scanning electron microscope |
| 05/06/1997 | US5626963 Cutting tool |
| 05/06/1997 | US5626922 Plasma processing method |
| 05/06/1997 | US5626727 Thin films on substrate, magnets and incline targets |
| 05/06/1997 | US5626714 Method for detecting etching endpoint and etching apparatus and etching system using the method thereof |
| 05/06/1997 | US5626679 Method and apparatus for preparing a silicon oxide film |
| 05/06/1997 | US5626678 Non-conductive alignment member for uniform plasma processing of substrates |
| 05/06/1997 | US5626249 Plasmalysis treatment method for waste matter |
| 05/02/1997 | EP0771020A2 Impurity introduction method using a solid source of impurity, apparatus thereof and method of manufacturing a semiconductor device |
| 05/02/1997 | EP0771017A1 Plasma processing apparatus |
| 05/02/1997 | EP0770701A1 Target for the sputtering cathode of a vacuum coating apparatus and process for its manufacture |
| 05/02/1997 | EP0619872B1 Piezoresistive cantilever for atomic force microscopy |
| 05/01/1997 | WO1997015697A1 Apparatus for affixing a rotating cylindrical magnetron target to a spindle |
| 05/01/1997 | CA2235864A1 Apparatus for affixing a rotating cylindrical magnetron target to a spindle |
| 04/30/1997 | DE19540255A1 Apparatus for film coating a substrate |
| 04/30/1997 | DE19540053A1 Substrate coating device for application of non-conductive layers using magnetron sputtering |
| 04/30/1997 | DE19539986A1 Vakuumbeschichtungsanlage mit einem in der Vakuumkammer angeordneten Tiegel zur Aufnahme von zu verdampfendem Material Vacuum coating plant with a vacuum chamber arranged in the crucible for receiving material to be evaporated |
| 04/30/1997 | DE19539579A1 Electrode system mfg. method using numerical control for ion beam acceleration and focussing |
| 04/29/1997 | US5625195 High-energy implantation process using an ion implanter of the low-or medium-current type and corresponding devices |
| 04/29/1997 | US5624774 Used in lithography for semiconductor integrated circuits |
| 04/29/1997 | US5624536 Processing apparatus with collimator exchange device |
| 04/24/1997 | WO1997015074A1 Method and device for detecting end point of plasma treatment, method and device for manufacturing semiconductor device, and semiconductor device |
| 04/24/1997 | WO1997014528A1 Plasmalysis treatment method for waste matter |
| 04/24/1997 | DE19627497A1 Zündsteigerungsschaltkreis für einen Plasmagenerator Zündsteigerungsschaltkreis for a plasma generator |
| 04/24/1997 | DE19614600C1 Device for masking central and outer areas of substrate to be sputter coated |
| 04/24/1997 | DE19546900C1 Tin@ cathode in magnetron sputtering apparatus |
| 04/24/1997 | DE19538903A1 Method for ion implantation into conductive and semiconductive workpieces |
| 04/23/1997 | EP0769800A2 An apparatus for controlling a charged particle beam and a lithographic process in which the apparatus is used |
| 04/23/1997 | EP0769799A2 Scanning electron microscope |
| 04/23/1997 | EP0769798A1 Method and apparatus for ion beam formation in an ion implanter |
| 04/23/1997 | EP0769202A1 Liquid metal ion source |
| 04/23/1997 | EP0769201A1 Device for generating an ion beam of adjustable energy, particularly for the continuous vacuum processing of large surfaces |
| 04/23/1997 | CN1148436A Ultrahigh vacuum focused ion beam micromill and articles therefrom |
| 04/23/1997 | CN1148105A Plasma etching apparatus utilizing plasma confinement |
| 04/22/1997 | US5623295 Information recording reproducing apparatus using probe |
| 04/22/1997 | US5623183 Diverging beam electron gun for a toxic remediation device with a dome-shaped focusing electrode |
| 04/22/1997 | US5623180 Electron field emitters comprising particles cooled with low voltage emitting material |
| 04/22/1997 | US5623148 Device for the generation of electron beams |
| 04/22/1997 | US5622635 Method for enhanced inductive coupling to plasmas with reduced sputter contamination |
| 04/22/1997 | US5622595 Reducing particulate contamination during semiconductor device processing |
| 04/22/1997 | US5622593 Plasma processing apparatus and method |
| 04/22/1997 | US5622565 Reduction of contaminant buildup in semiconductor apparatus |
| 04/20/1997 | CA2184629A1 Method and apparatus for ion beam formation in an ion implanter |
| 04/17/1997 | WO1997014177A1 Apparatus and method for pulsed plasma processing of a semiconductor substrate |
| 04/17/1997 | WO1997014172A1 Method and apparatus for plasma processing |
| 04/17/1997 | WO1997013886A1 Method for deposition of diamondlike carbon films |
| 04/17/1997 | WO1996038857A3 Magnetically enhanced radio frequency reactive ion etching method and apparatus |
| 04/17/1997 | DE19538110A1 Process for formation of thin diamond-like carbon@ layers on a substrate |
| 04/17/1997 | DE19537842A1 Electron beam unit esp. for hardening or welding |
| 04/16/1997 | EP0768702A1 Gas injection slit nozzle for a plasma process reactor |