Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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07/08/1997 | US5645698 Topographically precise thin film coating system |
07/08/1997 | US5645645 Method and apparatus for plasma treatment of a surface |
07/08/1997 | US5645644 Plasma processing apparatus |
07/02/1997 | EP0782173A2 Apparatus for coating a substrate by means of a chemical vapour deposition process |
07/02/1997 | EP0782172A2 Plasma processing systems |
07/02/1997 | EP0782171A2 Glow discharge controlling circuit |
07/02/1997 | EP0782170A2 Phase-contrast electron microscope and phase plate therefor |
07/02/1997 | EP0781977A2 Pattern shape inspection apparatus for forming specimen image on display apparatus |
07/02/1997 | EP0781976A2 Method for measuring critical dimension of pattern on sample |
07/02/1997 | EP0781599A2 Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
07/02/1997 | EP0729642B1 Method of writing a pattern by an electron beam |
07/02/1997 | CN1153225A Target of sputtering cathode for vacuum coating equipment and mfg. method thereof |
07/01/1997 | US5644220 Process and apparatus for measuring charge quantity flowing in a vacuum |
07/01/1997 | US5644138 Electron beam exposure apparatus and a method for electron beam exposure |
07/01/1997 | US5644137 Stabilizing support mechanism for electron beam apparatus |
07/01/1997 | US5644132 System for high resolution imaging and measurement of topographic and material features on a specimen |
07/01/1997 | US5644128 Fast timing position sensitive detector |
07/01/1997 | US5643639 Plasma treatment method for treatment of a large-area work surface apparatus and methods |
07/01/1997 | US5643428 Multiple tier collimator system for enhanced step coverage and uniformity |
07/01/1997 | US5643427 Magnetron cathode |
07/01/1997 | US5643394 Plasma reactor having gas distribution apparatus including disk surrounded by annular member with gap therebetween comprising elongate thin slit nozzle, spacers between disk and annular so gap is of equal width over circumference |
07/01/1997 | US5643365 Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces |
07/01/1997 | US5643364 Plasma chamber with fixed RF matching |
06/26/1997 | WO1997022988A1 Method and device for pre-treatment of substrates |
06/25/1997 | EP0780879A2 Electron beam exposure apparatus |
06/25/1997 | EP0780878A2 Scanning electron microscope |
06/25/1997 | EP0780877A2 Method and apparatus for capturing and removing contaminant particles from an interior region of an ion implanter |
06/25/1997 | EP0780490A1 Methods and apparatus for reducing residues in semiconductor processing chambers |
06/25/1997 | EP0780487A1 Gasketed target assembly |
06/25/1997 | CN1152626A Equipment for making semiconductor device using vacuum system |
06/24/1997 | US5641969 Ion implantation apparatus |
06/24/1997 | US5641897 Scanning apparatus linearization and calibration system |
06/24/1997 | US5641896 Coupled oscillator scanning imager |
06/24/1997 | US5641546 Passivation of electronic modules using high density plasmas |
06/24/1997 | US5641389 Mechanically joined sputtering target and adapter therefor |
06/24/1997 | US5641375 Plasma etching reactor with surface protection means against erosion of walls |
06/24/1997 | US5641359 Process gas delivery system |
06/19/1997 | WO1997022136A1 HF-PLASMA COATING CHAMBER OR PECVD COATING CHAMBER, ITS USE AND METHOD OF PLATING CDs USING THE CHAMBER |
06/19/1997 | DE19548657A1 Large surface plasma generator, using inductive HF coupling |
06/19/1997 | DE19546879A1 Scanning tunnel microscope measurement of surface characteristics |
06/19/1997 | DE19546827A1 Plasma process for coating of substrates |
06/18/1997 | EP0779651A2 Method and apparatus for plasma processing |
06/18/1997 | EP0779645A2 Plasma reactors for processing work pieces |
06/18/1997 | EP0779644A2 Plasma processing apparatus |
06/18/1997 | EP0778902A1 Jet plasma deposition process and apparatus |
06/18/1997 | EP0694207B1 Ion beam blanking apparatus and method |
06/17/1997 | US5640020 Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device |
06/17/1997 | US5640012 For analysis of an energy spectrum |
06/17/1997 | US5639519 Method for igniting low pressure inductively coupled plasma |
06/17/1997 | US5639341 Dry etching with less particles |
06/17/1997 | US5639334 Uniform gas flow arrangements |
06/17/1997 | US5639309 Plasma processing apparatus adjusted for a batch-processing of a plurality of wafers with plasma gases |
06/17/1997 | US5639308 Plasma apparatus |
06/17/1997 | CA2008934C Magnetron sputtering apparatus |
06/12/1997 | WO1997021332A1 A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced |
06/12/1997 | WO1997021331A1 Apparatus for generating plasma |
06/12/1997 | WO1997021330A1 Process depending on plasma discharges sustained by inductive coupling |
06/12/1997 | DE19546114A1 Apparatus for producing thin, in particular, reactive metal layers on substrate |
06/11/1997 | EP0778608A2 Plasma generators and methods of generating plasmas |
06/11/1997 | EP0778607A1 Method and apparatus for cleaning a plasma reactor |
06/11/1997 | EP0778606A2 Charged particle beam multiple-pole deflection control circuitry |
06/11/1997 | EP0778089A1 Device for producing a polymer coating inside hollow plastic articles |
06/11/1997 | EP0777909A1 Electron beam generator |
06/10/1997 | US5637961 Concentric rings with different RF energies applied thereto |
06/10/1997 | US5637951 Electron source for multibeam electron lithography system |
06/10/1997 | US5637880 Method for extracting ion current from space of high vacuum into space of low vacuum |
06/10/1997 | US5637879 Focused ion beam column with electrically variable blanking aperture |
06/10/1997 | US5637867 Device for the optical scanning of a recording medium, especially a phosphor storage plate |
06/10/1997 | US5637538 Method and apparatus for processing a specimen |
06/10/1997 | US5637358 Microwave plasma chemical vapor deposition process using a microwave window and movable, dielectric sheet |
06/10/1997 | US5637237 Method for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability |
06/10/1997 | US5637199 Sputtering shields and method of manufacture |
06/10/1997 | US5637190 First and second plasma purges; limiting contaminant particle deposition upon integrated circuit layers |
06/10/1997 | US5637180 Plasma processing method and plasma generator |
06/10/1997 | US5637150 Device and method for forming a plasma by application of microwaves |
06/05/1997 | DE19649640A1 Vorrichtung und Verfahren zum Erfassen von Partikeln in einer Prozesskammer einer Ionenimplantationsanlage Apparatus and method for detecting particles in a process chamber of an ion implanter |
06/05/1997 | DE19546142A1 Semiconductor X=ray detector for high resolution electron microscopy |
06/04/1997 | EP0777259A1 Apparatus for delivering fluid to a point of use location |
06/04/1997 | EP0777258A2 Self-cleaning plasma processing reactor |
06/04/1997 | EP0777257A1 Microwave excitation plasma processing apparatus |
06/04/1997 | EP0777256A2 Deceleration after mass selection for ion implantation. |
06/04/1997 | EP0776987A1 Vacuum coating apparatus with a crucible located in the vacuum chamber to receive the evaporation material |
06/03/1997 | US5635720 Resolution-enhancement device for an optically-coupled image sensor for an electron microscope |
06/03/1997 | US5635719 Variable curvilinear axis deflection means for particle optical lenses |
06/03/1997 | US5635716 Method for identifying surface atoms of solid sample and apparatus therefor |
06/03/1997 | US5635714 Data reduction system for real time monitoring of radiation machinery |
06/03/1997 | US5635144 Generating plasma within vessel made of material which becomes part of thin film, introducing gas which reacts with vessel to produce reaction product that reacts at surface to form thin film |
06/03/1997 | US5635087 Apparatus for plasma-assisted high rate electron beam vaporization |
06/03/1997 | US5635036 Sputter coating using magnetron sputter source, collimating filter |
05/29/1997 | WO1997019343A1 Method of, and apparatus for, analyzing surface impurities of minute area |
05/28/1997 | EP0776026A1 Semiconductor device manufacturing apparatus employing vacuum system |
05/28/1997 | EP0775758A1 Vacuum coating apparatus with a crucible located in the vacuum chamber to receive the evaporation material |
05/28/1997 | EP0465597B1 Raster scan control system for a charged-particle beam |
05/28/1997 | DE19647975A1 Reflection electron microscope |
05/28/1997 | DE19608160C1 Power supply arrangement for electrodes of gas discharge chamber |
05/27/1997 | US5633507 Electron beam lithography system with low brightness |
05/27/1997 | US5633506 Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
05/27/1997 | US5633502 Plasma processing system for transmission electron microscopy specimens and specimen holders |
05/27/1997 | US5633495 Process for operating a time-of-flight secondary-ion mass spectrometer |
05/27/1997 | US5632919 Temperature controlled insulation system |