Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/1997
07/08/1997US5645698 Topographically precise thin film coating system
07/08/1997US5645645 Method and apparatus for plasma treatment of a surface
07/08/1997US5645644 Plasma processing apparatus
07/02/1997EP0782173A2 Apparatus for coating a substrate by means of a chemical vapour deposition process
07/02/1997EP0782172A2 Plasma processing systems
07/02/1997EP0782171A2 Glow discharge controlling circuit
07/02/1997EP0782170A2 Phase-contrast electron microscope and phase plate therefor
07/02/1997EP0781977A2 Pattern shape inspection apparatus for forming specimen image on display apparatus
07/02/1997EP0781976A2 Method for measuring critical dimension of pattern on sample
07/02/1997EP0781599A2 Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
07/02/1997EP0729642B1 Method of writing a pattern by an electron beam
07/02/1997CN1153225A Target of sputtering cathode for vacuum coating equipment and mfg. method thereof
07/01/1997US5644220 Process and apparatus for measuring charge quantity flowing in a vacuum
07/01/1997US5644138 Electron beam exposure apparatus and a method for electron beam exposure
07/01/1997US5644137 Stabilizing support mechanism for electron beam apparatus
07/01/1997US5644132 System for high resolution imaging and measurement of topographic and material features on a specimen
07/01/1997US5644128 Fast timing position sensitive detector
07/01/1997US5643639 Plasma treatment method for treatment of a large-area work surface apparatus and methods
07/01/1997US5643428 Multiple tier collimator system for enhanced step coverage and uniformity
07/01/1997US5643427 Magnetron cathode
07/01/1997US5643394 Plasma reactor having gas distribution apparatus including disk surrounded by annular member with gap therebetween comprising elongate thin slit nozzle, spacers between disk and annular so gap is of equal width over circumference
07/01/1997US5643365 Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces
07/01/1997US5643364 Plasma chamber with fixed RF matching
06/1997
06/26/1997WO1997022988A1 Method and device for pre-treatment of substrates
06/25/1997EP0780879A2 Electron beam exposure apparatus
06/25/1997EP0780878A2 Scanning electron microscope
06/25/1997EP0780877A2 Method and apparatus for capturing and removing contaminant particles from an interior region of an ion implanter
06/25/1997EP0780490A1 Methods and apparatus for reducing residues in semiconductor processing chambers
06/25/1997EP0780487A1 Gasketed target assembly
06/25/1997CN1152626A Equipment for making semiconductor device using vacuum system
06/24/1997US5641969 Ion implantation apparatus
06/24/1997US5641897 Scanning apparatus linearization and calibration system
06/24/1997US5641896 Coupled oscillator scanning imager
06/24/1997US5641546 Passivation of electronic modules using high density plasmas
06/24/1997US5641389 Mechanically joined sputtering target and adapter therefor
06/24/1997US5641375 Plasma etching reactor with surface protection means against erosion of walls
06/24/1997US5641359 Process gas delivery system
06/19/1997WO1997022136A1 HF-PLASMA COATING CHAMBER OR PECVD COATING CHAMBER, ITS USE AND METHOD OF PLATING CDs USING THE CHAMBER
06/19/1997DE19548657A1 Large surface plasma generator, using inductive HF coupling
06/19/1997DE19546879A1 Scanning tunnel microscope measurement of surface characteristics
06/19/1997DE19546827A1 Plasma process for coating of substrates
06/18/1997EP0779651A2 Method and apparatus for plasma processing
06/18/1997EP0779645A2 Plasma reactors for processing work pieces
06/18/1997EP0779644A2 Plasma processing apparatus
06/18/1997EP0778902A1 Jet plasma deposition process and apparatus
06/18/1997EP0694207B1 Ion beam blanking apparatus and method
06/17/1997US5640020 Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device
06/17/1997US5640012 For analysis of an energy spectrum
06/17/1997US5639519 Method for igniting low pressure inductively coupled plasma
06/17/1997US5639341 Dry etching with less particles
06/17/1997US5639334 Uniform gas flow arrangements
06/17/1997US5639309 Plasma processing apparatus adjusted for a batch-processing of a plurality of wafers with plasma gases
06/17/1997US5639308 Plasma apparatus
06/17/1997CA2008934C Magnetron sputtering apparatus
06/12/1997WO1997021332A1 A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced
06/12/1997WO1997021331A1 Apparatus for generating plasma
06/12/1997WO1997021330A1 Process depending on plasma discharges sustained by inductive coupling
06/12/1997DE19546114A1 Apparatus for producing thin, in particular, reactive metal layers on substrate
06/11/1997EP0778608A2 Plasma generators and methods of generating plasmas
06/11/1997EP0778607A1 Method and apparatus for cleaning a plasma reactor
06/11/1997EP0778606A2 Charged particle beam multiple-pole deflection control circuitry
06/11/1997EP0778089A1 Device for producing a polymer coating inside hollow plastic articles
06/11/1997EP0777909A1 Electron beam generator
06/10/1997US5637961 Concentric rings with different RF energies applied thereto
06/10/1997US5637951 Electron source for multibeam electron lithography system
06/10/1997US5637880 Method for extracting ion current from space of high vacuum into space of low vacuum
06/10/1997US5637879 Focused ion beam column with electrically variable blanking aperture
06/10/1997US5637867 Device for the optical scanning of a recording medium, especially a phosphor storage plate
06/10/1997US5637538 Method and apparatus for processing a specimen
06/10/1997US5637358 Microwave plasma chemical vapor deposition process using a microwave window and movable, dielectric sheet
06/10/1997US5637237 Method for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability
06/10/1997US5637199 Sputtering shields and method of manufacture
06/10/1997US5637190 First and second plasma purges; limiting contaminant particle deposition upon integrated circuit layers
06/10/1997US5637180 Plasma processing method and plasma generator
06/10/1997US5637150 Device and method for forming a plasma by application of microwaves
06/05/1997DE19649640A1 Vorrichtung und Verfahren zum Erfassen von Partikeln in einer Prozesskammer einer Ionenimplantationsanlage Apparatus and method for detecting particles in a process chamber of an ion implanter
06/05/1997DE19546142A1 Semiconductor X=ray detector for high resolution electron microscopy
06/04/1997EP0777259A1 Apparatus for delivering fluid to a point of use location
06/04/1997EP0777258A2 Self-cleaning plasma processing reactor
06/04/1997EP0777257A1 Microwave excitation plasma processing apparatus
06/04/1997EP0777256A2 Deceleration after mass selection for ion implantation.
06/04/1997EP0776987A1 Vacuum coating apparatus with a crucible located in the vacuum chamber to receive the evaporation material
06/03/1997US5635720 Resolution-enhancement device for an optically-coupled image sensor for an electron microscope
06/03/1997US5635719 Variable curvilinear axis deflection means for particle optical lenses
06/03/1997US5635716 Method for identifying surface atoms of solid sample and apparatus therefor
06/03/1997US5635714 Data reduction system for real time monitoring of radiation machinery
06/03/1997US5635144 Generating plasma within vessel made of material which becomes part of thin film, introducing gas which reacts with vessel to produce reaction product that reacts at surface to form thin film
06/03/1997US5635087 Apparatus for plasma-assisted high rate electron beam vaporization
06/03/1997US5635036 Sputter coating using magnetron sputter source, collimating filter
05/1997
05/29/1997WO1997019343A1 Method of, and apparatus for, analyzing surface impurities of minute area
05/28/1997EP0776026A1 Semiconductor device manufacturing apparatus employing vacuum system
05/28/1997EP0775758A1 Vacuum coating apparatus with a crucible located in the vacuum chamber to receive the evaporation material
05/28/1997EP0465597B1 Raster scan control system for a charged-particle beam
05/28/1997DE19647975A1 Reflection electron microscope
05/28/1997DE19608160C1 Power supply arrangement for electrodes of gas discharge chamber
05/27/1997US5633507 Electron beam lithography system with low brightness
05/27/1997US5633506 Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses
05/27/1997US5633502 Plasma processing system for transmission electron microscopy specimens and specimen holders
05/27/1997US5633495 Process for operating a time-of-flight secondary-ion mass spectrometer
05/27/1997US5632919 Temperature controlled insulation system