| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/19/1997 | US5658440 Sputter etching patterned photoresists |
| 08/19/1997 | US5658423 Monitoring and controlling plasma processes via optical emission using principal component analysis |
| 08/19/1997 | US5658418 Apparatus for monitoring the dry etching of a dielectric film to a given thickness in an integrated circuit |
| 08/19/1997 | US5658389 Thin film forming method and apparatus |
| 08/19/1997 | US5658114 Modular vacuum system for the treatment of disk-shaped workpieces |
| 08/19/1997 | CA2057619C Cantilever probe and apparatus using the same |
| 08/19/1997 | CA2045878C Method for forming probe and apparatus therefor |
| 08/14/1997 | DE19605226A1 Verfahren zur Herstellung eines Plasmas sowie Verwendung eines derart hergestellten Plasmas A process for producing a plasma, and using a plasma so produced |
| 08/14/1997 | DE19604454A1 Apparatus with two sputter cathodes for coating planar substrates |
| 08/13/1997 | EP0789506A1 Apparatus for generating and utilizing magnetically neutral line discharge type plasma |
| 08/13/1997 | EP0789280A2 Holding mechanism, and exposure apparatus using the mechanism |
| 08/13/1997 | EP0788654A1 Inductively coupled plasma sputter chamber with conductive material sputtering capabilities |
| 08/13/1997 | EP0788653A1 High temperature specimen stage and detector for an environmental scanning electron microscope |
| 08/12/1997 | US5656820 Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device |
| 08/12/1997 | US5656812 Electron probe microanalyzer and X-ray analysis using same |
| 08/12/1997 | US5656811 Method for making specimen and apparatus thereof |
| 08/12/1997 | US5656809 Atomic force microscope and measuring head thereof with linearly polarized reflected light |
| 08/12/1997 | US5656334 Preventing deposition in interior of container by preheating the container surface |
| 08/12/1997 | US5656141 Apparatus for coating substrates |
| 08/12/1997 | US5656138 Very high vacuum magnetron sputtering method and apparatus for precision optical coatings |
| 08/12/1997 | US5656123 Dual-frequency capacitively-coupled plasma reactor for materials processing |
| 08/12/1997 | US5656092 Apparatus for capturing and removing contaminant particles from an interior region of an ion implanter |
| 08/12/1997 | US5656091 Electric arc vapor deposition apparatus and method |
| 08/07/1997 | WO1997028555A1 Electromagnetic high-frequency or microwave apparatus |
| 08/07/1997 | CA2244956A1 Electromagnetic high-frequency or microwave apparatus |
| 08/06/1997 | EP0788147A2 Plasma process for etching multicomponent alloys |
| 08/06/1997 | EP0788139A1 Cathodic spulter coating method and device using a target heated at high temperature |
| 08/06/1997 | EP0788138A2 Plasma reactors for processing substrates |
| 08/06/1997 | EP0788137A2 Plasma processing equipment |
| 08/06/1997 | CN1156327A Electronic beam unit projection stamp mark system |
| 08/05/1997 | US5654903 Method and apparatus for real time monitoring of wafer attributes in a plasma etch process |
| 08/05/1997 | US5654548 Source for intense coherent electron pulses |
| 08/05/1997 | US5654547 Method for particle wave reconstruction in a particle-optical apparatus |
| 08/05/1997 | US5654546 For examining the surface properties of a sample surface |
| 08/05/1997 | US5654043 Pulsed plate plasma implantation system and method |
| 08/05/1997 | US5653894 Active neural network determination of endpoint in a plasma etch process |
| 08/05/1997 | US5653812 Method and apparatus for deposition of diamond-like carbon coatings on drills |
| 08/05/1997 | US5653811 System for the plasma treatment of large area substrates |
| 08/05/1997 | US5653810 Apparatus for forming metal film and process for forming metal film |
| 08/05/1997 | CA2052882C Cantilever type probe, scanning tunnel microscope and information processing apparatus using the same |
| 07/31/1997 | WO1997027614A1 Method and apparatus for controlling dust particle agglomerates |
| 07/31/1997 | WO1997027613A1 Ion source for an ion beam arrangement |
| 07/31/1997 | DE19703048A1 Control method of scanning electron microscope lens system |
| 07/31/1997 | DE19609804C1 Einrichtung, ihre Verwendung und ihr Betrieb zum Vakuumbeschichten von Schüttgut Organization, its use and operation of vacuum coating of bulk |
| 07/31/1997 | DE19602389A1 Sputter target manufacturing method for surface coating installations |
| 07/30/1997 | EP0786804A2 Apparatus and method for processing substrates |
| 07/30/1997 | EP0786795A2 Method for manufacturing thin film, and deposition apparatus |
| 07/30/1997 | EP0786794A2 Plasma reactors for processing semiconductor wafers |
| 07/30/1997 | EP0786792A1 Ion implantation process in conductive or semi-conductive workpieces by means of Plasma Immersion Ion Implantation and implantation chamber for performing said process |
| 07/30/1997 | EP0786145A1 Field emission environmental scanning electron microscope |
| 07/30/1997 | CN1155748A Apparatus for coating substrates in vacuum |
| 07/29/1997 | US5652428 Method of using scanning probe microscope allowing cleaning of probe tip in ambient atmosphere |
| 07/29/1997 | US5652377 Scanning method with scanning probe microscope |
| 07/29/1997 | US5651867 Plasma processing method and apparatus |
| 07/29/1997 | US5651865 Preferential sputtering of insulators from conductive targets |
| 07/29/1997 | US5651826 Plasma processing apparatus |
| 07/29/1997 | US5651825 Plasma generating apparatus and plasma processing apparatus |
| 07/24/1997 | DE19635669C1 Coating large area substrate by gas flow sputtering |
| 07/24/1997 | DE19631401A1 Mask apparatus for electron beam exposure in manufacture of integrated circuit |
| 07/24/1997 | DE19618734A1 Ion source for implantation of semiconductors or for surface treatment |
| 07/23/1997 | EP0785569A2 Plasma reactor |
| 07/23/1997 | EP0785568A2 Method and apparatus for ion beam transport |
| 07/23/1997 | EP0785567A2 Charged particle beam slit assembly |
| 07/23/1997 | EP0784861A1 Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber |
| 07/23/1997 | EP0500774B1 Rotating cylindrical magnetron structure for large area coating |
| 07/23/1997 | CN1155228A Method for triggering-igniting CVD-plasma, and apparatus thereof |
| 07/22/1997 | US5650631 Electron beam writing system |
| 07/22/1997 | US5650629 Field-symmetric beam detector for semiconductors |
| 07/22/1997 | US5650628 Simultaneous deflections in charged-particle beams |
| 07/22/1997 | US5650621 Electron microscope |
| 07/22/1997 | US5650052 Variable cell size collimator |
| 07/22/1997 | US5650038 Method for dry etching |
| 07/22/1997 | US5650032 Apparatus for producing an inductive plasma for plasma processes |
| 07/17/1997 | WO1997025837A1 Device for the production of plasmas by microwaves |
| 07/17/1997 | WO1997025735A1 Electron beam pattern-writing column |
| 07/17/1997 | WO1997025078A2 Tetracarbon |
| 07/17/1997 | DE19600240A1 Raster scan force microscope with mechanical coarse setting also sensor and evaluator |
| 07/17/1997 | DE19600223A1 Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen A device for generating plasma by means of microwaves |
| 07/16/1997 | EP0784102A1 Process and apparatus for coating a substrate surface |
| 07/16/1997 | EP0729640A4 Methods and apparatus for altering material using ion beams |
| 07/16/1997 | CN1154644A Chamber etching of plasma processing apparatus |
| 07/16/1997 | CN1154569A Method and device for introducing foreign substance, and method for mfg. semiconductor device |
| 07/16/1997 | CN1154421A Arc control and switching element protection for pulsed DC power supply |
| 07/15/1997 | US5648188 Real time alignment system for a projection electron beam lithographic system |
| 07/15/1997 | US5647964 Diamond film synthesizing apparatus and method thereof using direct current glow discharge plasma enhanced chemical vapor deposition |
| 07/15/1997 | US5647944 Microwave plasma treatment apparatus |
| 07/15/1997 | US5647913 Plasma reactors |
| 07/15/1997 | US5647912 Plasma processing apparatus |
| 07/10/1997 | WO1997024751A1 Electron beam lithography |
| 07/10/1997 | WO1997024748A1 Apparatus for controlling matching network of a vacuum plasma processor and memory for same |
| 07/10/1997 | DE19601586C1 Ferroelectric printing form production method |
| 07/09/1997 | EP0783174A2 Apparatus for coating a substrate |
| 07/09/1997 | EP0782763A1 An ion beam apparatus |
| 07/09/1997 | EP0782744A2 Apparatus and method for sputtering carbon |
| 07/09/1997 | EP0408602B1 Focused ion beam imaging and process control |
| 07/09/1997 | CN1154179A Fast magnetic scanning of heavy ion beams |
| 07/08/1997 | US5646489 Plasma generator with mode restricting means |
| 07/08/1997 | US5646403 Scanning electron microscope |
| 07/08/1997 | US5645897 Process and device for surface-modification by physico-chemical reactions of gases or vapors on surfaces, using highly-charged ions |
| 07/08/1997 | US5645699 Dual cylindrical target magnetron with multiple anodes |