| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/18/1997 | WO1997034315A1 Method and apparatus for the coating of workpieces |
| 09/18/1997 | WO1997034024A1 Means for vacuum coating of bulk material |
| 09/18/1997 | DE19618073C1 Ignition unit for a vacuum arc discharge evaporator |
| 09/17/1997 | EP0795890A2 Substrate coating assembly using a sputtering device |
| 09/17/1997 | EP0795889A2 Plasma-etching electrode plate |
| 09/17/1997 | EP0795888A2 Scanning method for an ion implanter and apparatus therefor |
| 09/17/1997 | EP0795623A1 Apparatus for depositing thin layers on a substrate |
| 09/17/1997 | EP0795197A1 Method of reconstructing an image in a particle-optical apparatus |
| 09/17/1997 | EP0795196A1 Particle-optical apparatus comprising a fixed diaphragm for the monochromator filter |
| 09/17/1997 | EP0694208B1 Plasma shaping plug for control of sputter etching |
| 09/17/1997 | EP0686211A4 System for sputtering compositions onto a substrate |
| 09/16/1997 | US5668372 Scanning electron microscope and its analogous device |
| 09/16/1997 | US5668368 Apparatus for suppressing electrification of sample in charged beam irradiation apparatus |
| 09/16/1997 | US5667923 Charged particle beam exposure compensating proximity effect |
| 09/16/1997 | US5667650 High flow gas manifold for high rate, off-axis sputter deposition |
| 09/12/1997 | WO1997033300A1 Icp reactor having a conically-shaped plasma-generating section |
| 09/12/1997 | WO1997033299A1 Device for generating powerful microwave plasmas |
| 09/12/1997 | WO1997025078A3 Tetracarbon |
| 09/11/1997 | DE19608949A1 Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen Device for generating microwave plasmas powerful |
| 09/10/1997 | EP0794554A2 Target for a physical vapor deposition system |
| 09/10/1997 | EP0794553A2 High density plasma CVD and etching reactor |
| 09/10/1997 | EP0794552A2 Electron beam exposure apparatus and method, and device manufacturing method |
| 09/10/1997 | EP0793855A1 Plasma processor for large workpieces |
| 09/10/1997 | EP0569467B1 Target for cathode sputtering |
| 09/10/1997 | CN1159074A Ion implanter and ion implanting method using the same |
| 09/09/1997 | US5666190 Method of performing lithography using cantilever array |
| 09/09/1997 | US5666053 Charged particle beam apparatus for measuring magnetic field |
| 09/09/1997 | US5666023 Device for producing a plasma, enabling microwave propagation and absorption zones to be dissociated having at least two parallel applicators defining a propogation zone and an exciter placed relative to the applicator |
| 09/09/1997 | US5665968 Inspecting optical masks with electron beam microscopy |
| 09/09/1997 | US5665967 Apparatus and method for surface analysis |
| 09/09/1997 | US5665166 Plasma processing apparatus |
| 09/04/1997 | WO1997032335A2 Control mechanisms for dosimetry control in ion implantation systems |
| 09/04/1997 | WO1997008739A3 Radial magnetic field enhancement for plasma processing |
| 09/04/1997 | DE19632846A1 Determining end point of etching process |
| 09/04/1997 | DE19607803A1 Assembly to register target wear at a sputter cathode |
| 09/03/1997 | EP0793254A2 Plasma processing apparatus and plasma processing method |
| 09/03/1997 | EP0792947A2 Process using an inductively coupled plasma reactor |
| 09/03/1997 | EP0792571A1 Method and device for measuring ion flow in a plasma |
| 09/03/1997 | EP0792447A1 Specimen holder and apparatus for two-sided ion milling system |
| 09/03/1997 | EP0792381A1 Process for coating substrates and a device for carrying out said process |
| 09/03/1997 | EP0792203A1 Electromechanical positioning unit |
| 09/03/1997 | CN1158494A Method and apparatus for capturing and removing contaminant particles from interior region of ion implanter |
| 09/02/1997 | US5663568 Apparatus for controlling a charged particle beam and a lithographic process in which the apparatus is used |
| 09/02/1997 | US5662819 Plasma processing method with controlled ion/radical ratio |
| 09/02/1997 | US5662784 Apparatus for applying thin layers to a substrate |
| 09/02/1997 | US5662770 Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks |
| 09/02/1997 | US5662741 Process for the ionization of thermally generated material vapors and a device for conducting the process |
| 08/28/1997 | DE19645912C1 Plasma CVD reactor |
| 08/28/1997 | DE19609248A1 Cathode sputtering apparatus - includes hollow cathode fixed to bottom of target on wall of vacuum chamber, uniform distribution diaphragm shielding bottom of target, and rotary substrate holding plate |
| 08/28/1997 | DE19606478A1 Selective specimen processing device, mainly for semiconductor components |
| 08/28/1997 | DE19606375A1 Microwave plasma source with Whistler or Helicon waves |
| 08/27/1997 | EP0791968A1 Method for improving the performance of high temperature superconducting thin film wafers |
| 08/27/1997 | EP0791949A2 Plasma processing method and apparatus |
| 08/27/1997 | EP0791948A2 Plasma-etching electrode plate |
| 08/27/1997 | EP0791802A1 Scanning type near field interatomic force microscope |
| 08/27/1997 | EP0791668A2 Apparatus and method for depositing diamond film |
| 08/27/1997 | EP0791665A1 Exhaust apparatus in ion implantation system |
| 08/27/1997 | EP0791226A1 Device for coating substrates using a vapour phase material in a reduced pressure or vacuum environment |
| 08/27/1997 | CN1158003A Plasma processing apparatus for dry etching of semiconductor wafers |
| 08/26/1997 | US5661369 Charged particle generation with a resonant electrical circuit |
| 08/26/1997 | US5661308 Method and apparatus for ion formation in an ion implanter |
| 08/26/1997 | US5661307 Electron beam lithography system |
| 08/26/1997 | US5661304 Multi-purpose noninterceptive charged particle beam diagnostic device using diffraction radiation and method for its use |
| 08/26/1997 | US5660744 Plasma generating apparatus and surface processing apparatus |
| 08/26/1997 | US5660696 Method for forming metal lines by sputtering |
| 08/26/1997 | US5660694 Vapor deposition on target material while controlling direct current potential |
| 08/26/1997 | US5660673 Apparatus for dry etching |
| 08/26/1997 | US5660671 Magnetron plasma processing apparatus and processing method |
| 08/26/1997 | US5660639 Method and apparatus for plasma treating an article |
| 08/24/1997 | CA2176423A1 Apparatus and method for depositing diamond film |
| 08/21/1997 | WO1997030570A1 Device for preparing a plasma and use of said device for preparing a plasma |
| 08/21/1997 | WO1997030471A1 System and method for cooling workpieces processed by an ion implantation system |
| 08/21/1997 | WO1997030470A1 Ion implantation system for implanting workpieces |
| 08/21/1997 | WO1997030468A1 Process for control of the energy distribution in bipolar low-pressure glow processes |
| 08/21/1997 | WO1997030467A1 Ion beam shield for implantation systems |
| 08/21/1997 | WO1997030466A1 Large area uniform ion beam formation |
| 08/21/1997 | WO1997030465A1 Loadlock assembly for an ion implantation system |
| 08/21/1997 | WO1997030464A1 Plasma chamber for controlling ion dosage in ion implantation |
| 08/21/1997 | WO1997030186A1 Method and device for control of plasma enhanced vacuum coating processes |
| 08/21/1997 | WO1997030185A1 Method and device for control of a vacuum coating process |
| 08/21/1997 | DE19612344C1 Apparatus for plasma-activated vapour coating at high rates |
| 08/21/1997 | DE19611538C1 Apparatus for coating substrates with use of a filamentless ion source |
| 08/21/1997 | DE19605314A1 Verfahren zur Steuerung der Leistungsverteilung bei bipolaren Niederdruck-Glimmprozessen Method for controlling the power distribution during bipolar low pressure Glimmprozessen |
| 08/21/1997 | DE19603685C1 Mikrowellengerät Microwave |
| 08/20/1997 | EP0790642A2 Method and apparatus for removing contaminant particles from surfaces in semiconductor processing equipment |
| 08/20/1997 | EP0790636A2 Plasma applicators |
| 08/20/1997 | EP0790635A2 Chemical vapor deposition system including dedicated cleaning gas injection |
| 08/20/1997 | EP0790634A1 Electrostatic-magnetic lens arrangement |
| 08/20/1997 | EP0790633A2 Electron source and electron beam-emitting apparatus equipped therewith |
| 08/20/1997 | EP0790481A1 Non-tilting plate actuator for use in a micropositioning device |
| 08/20/1997 | EP0790329A1 Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films |
| 08/20/1997 | EP0789840A1 Current/voltage transformer for the detection of the electron current in a scanning tunnelling-electron microscope |
| 08/20/1997 | EP0640244B1 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window |
| 08/20/1997 | CN1157334A Vacuum coating film equipment for evaporating crucible in vacuum chamber |
| 08/19/1997 | US5659276 Magnetic field generator for magnetron plasma |
| 08/19/1997 | US5659175 Apparatus and method for tomography of microscopic samples |
| 08/19/1997 | US5659174 Scanning electron microscope |
| 08/19/1997 | US5659172 Reliable defect detection using multiple perspective scanning electron microscope images |
| 08/19/1997 | US5658710 Surface treatment by diffusing a gas to nitrogenation and carbonization with silicon substrate |
| 08/19/1997 | US5658442 Target and dark space shield for a physical vapor deposition system |