Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/1997
10/30/1997WO1997040515A1 Generation of electrical discharges with transient voltage pulses
10/30/1997WO1997040493A1 Thin-film magnetic recording heads and systems and methods for manufacturing the same
10/30/1997DE19711501A1 Electron beam generator for electron microscope
10/30/1997DE19654000C1 Apparatus for cathode sputtering
10/30/1997DE19643098C1 Apparatus for cathode sputtering
10/30/1997DE19605136A1 Plasma processing apparatus for high or ultra-high vacuum operation
10/30/1997CA2252979A1 Thin-film magnetic recording heads and systems and methods for manufacturing the same
10/29/1997EP0803897A2 Electrode for plasma etching
10/29/1997EP0803896A2 Plasma processing system and protective member used for the same
10/29/1997EP0803895A2 Electrode for plasma etching
10/29/1997EP0803894A1 Combined ion beam and microwave irradiation means and method
10/29/1997EP0803893A2 Vacuum evaporator
10/29/1997EP0803587A1 Method and apparatus for sputter coating
10/29/1997CN1163585A Electromechanical positioning unit
10/28/1997US5682104 Electron beam tester and testing method using the same
10/28/1997US5682067 Circuit for reversing polarity on electrodes
10/28/1997US5681424 Plasma processing method
10/28/1997US5681418 Plasma processing with inductive coupling
10/28/1997US5681393 Plasma processing apparatus
10/23/1997WO1997039607A1 Plasma treatment device
10/23/1997WO1997039472A1 Use of a cleaning process, a cleaning process, a connecting process and work piece pair
10/23/1997WO1997039161A1 Cathodic sputtering device
10/23/1997CA2251602A1 Cathodic sputtering device
10/22/1997EP0802560A1 Process and electromagnetically coupled plasma apparatus for etching oxides
10/22/1997EP0801811A1 Electron beam lithography machine
10/22/1997EP0801810A2 Specimen holder for an electron microscope and device and method for mounting a specimen in an electron microscope
10/22/1997EP0801809A2 Discharge methods and electrodes for generating plasmas at one atmosphere of pressure, and materials treated therewith
10/22/1997EP0728224A4 Apparatus for a thin film manufacturing
10/21/1997US5680013 Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method of protecting such heated metal surfaces
10/21/1997US5679952 Scanning probe microscope
10/21/1997US5679214 Removing polymer form inside surface of window by injecting oxygen
10/21/1997US5679204 Chemical reactor and gas supply pipes having aluminum alloy with magnesium, free of surface coatings; corrosion resistance, chemical resistance
10/16/1997WO1997038149A1 Cathodic arc cathode
10/16/1997DE19614599A1 Apparatus for cathode sputtering in substrate coating installations
10/16/1997DE19614598A1 Vorrichtung zur Kathodenzerstäubung Apparatus for sputtering
10/16/1997DE19614595A1 Apparatus for cathode sputtering in substrate coating
10/16/1997DE19614487A1 Sputtering cathode used in substrate coating
10/15/1997EP0801416A1 Plasma processing chamber with epicyclic magnet source assembly
10/15/1997EP0801415A2 A magnetron for low pressure, full face erosion
10/15/1997EP0801414A2 Gas-controlled arc vapor deposition apparatus and process
10/15/1997EP0801413A1 Inductively coupled plasma reactor with faraday-sputter shield
10/15/1997EP0801143A1 Apparatus for masking or covering of substrates
10/14/1997US5677597 Electron flow accelerating method and apparatus which can generate a high-power beam
10/14/1997US5677542 A stimulable phosphor sheet can emit light when scanning with rays
10/14/1997US5677531 Scanning electron microscope
10/14/1997US5677530 Scanning electron microscope
10/14/1997US5677109 Method for E-beam writing
10/14/1997US5677012 Plasma processing method and plasma processing apparatus
10/14/1997US5677010 Method for producing a polymer coating inside hollow plastic articles
10/14/1997US5676810 Target mounting-demounting arrangement
10/14/1997US5676803 Vacuum chamber comprising a magnetron and a insulating barrier positioning between magnetron and backing of target
10/14/1997US5676758 CVD apparatus
10/14/1997CA2069708C Probe-driving mechanism, production thereof, and apparatus and piezoelectric actuator employing the same
10/12/1997CA2201810A1 Gas-controlled arc apparatus and process
10/09/1997WO1997037518A1 Methods and apparatuses for controlling phase difference in plasma processing systems
10/09/1997WO1997037371A1 Magnet array for magnetrons
10/09/1997WO1997037059A1 Showerhead for uniform distribution of process gas
10/09/1997WO1997037055A1 Plasma device and method utilizing azimuthally and axially uniform electric field
10/09/1997DE19610253A1 Sputtering apparatus for coating glass, packaging material, tools etc.
10/08/1997EP0800200A2 Plasma applicators
10/08/1997EP0800199A2 Electrode for supporting a sample in a scanning electron microscope
10/08/1997EP0799557A1 High frequency induction plasma method and apparatus
10/08/1997CN1161563A Method and apparatus for ion beam transport
10/08/1997CN1036079C Apparatus for rapid plasma treatments
10/07/1997US5675154 Scanning probe microscope
10/07/1997US5675148 Scanning reflection electron diffraction microscope
10/07/1997US5674573 Irradiation of hydrocarbon gas plasma generated in first vacuum vessel onto substrate within second vessel at lower pressure due to gas flow resistance between vessels
10/07/1997US5674367 Sputtering target having a shrink fit mounting ring
10/07/1997US5674321 Method and apparatus for producing plasma uniformity in a magnetic field-enhanced plasma reactor
10/02/1997WO1997036462A1 Device and method for plasma treatment
10/02/1997WO1997036461A1 Device and method for plasma treatment
10/02/1997WO1997036022A1 Plasma producing method and apparatus including an inductively-coupled plasma source
10/02/1997DE19709761A1 Electron beam exposure apparatus for semiconductor circuit manufacture
10/02/1997DE19700856A1 Ion source for ion beam system, e.g. for doping semiconductors
10/02/1997DE19610492A1 Elektronenstrahlanlage Electron-beam system
10/01/1997EP0797838A1 Method and apparatus for plasma processing
10/01/1997EP0797688A1 Method for deposition of diamondlike carbon films
09/1997
09/30/1997US5672882 Ion implantation device with a closed-loop process chamber pressure control system
09/30/1997US5672879 System and method for producing superimposed static and time-varying magnetic fields
09/30/1997US5672255 Sputtering device
09/30/1997CA2107795C Processes for electron lithography
09/25/1997WO1997035325A1 Electron bombardment installation
09/25/1997WO1997035235A1 Improved photomask
09/25/1997WO1997035044A1 Method and apparatus for rf diode sputtering
09/25/1997WO1997035043A1 Target, magnetron source with said target, and process for producing said target
09/24/1997EP0797236A2 A charged particle beam exposure method and an apparatus therefor
09/24/1997EP0797233A2 Thin-film electron emitter device and application equipment using the same
09/24/1997EP0796505A1 Plasma reactor and method of operating the same
09/24/1997EP0796355A1 Apparatus for generating plasma by plasma-guided microwave power
09/24/1997CN1160333A Ion-implanter having variable ion angle control
09/24/1997CN1160287A Method and apparatus for ion beam formation in ion implanter
09/23/1997US5670785 Charge converter provided in an ion implantation apparatus
09/23/1997US5670782 Scanning electron microscope and speciman observation method thereby
09/23/1997US5670415 Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment
09/23/1997US5670224 Modified silicon oxide barrier coatings produced by microwave CVD deposition on polymeric substrates
09/23/1997US5670217 Method for capturing and removing contaminant particles from an interior region of an ion implanter
09/23/1997US5669975 Plasma producing method and apparatus including an inductively-coupled plasma source
09/23/1997US5669583 Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof
09/18/1997WO1997034450A1 Particulate contamination removal from wafers using plasmas and mechanical agitation
09/18/1997WO1997034319A1 Manufacture of semiconductor device