| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/03/1997 | EP0809859A1 Multiple tier collimator system for enhanced step coverage and uniformity |
| 12/03/1997 | EP0809857A1 Generator of ribbon-shaped ion beam |
| 12/03/1997 | EP0809855A1 Electronic cyclotron resonance device for generating an ion beam |
| 12/03/1997 | EP0809721A1 Method and apparatus for producing single crystal carbon films |
| 12/03/1997 | EP0809719A1 Apparatus and method for a reliable return current path for sputtering processes |
| 12/03/1997 | EP0809718A1 Mechanically joined sputtering target and adapter therefor |
| 12/03/1997 | EP0809717A1 Gas manifold for an off-axis sputter apparatus |
| 12/03/1997 | EP0708975B1 Particle-optical apparatus comprising a detector for secondary electrons |
| 12/03/1997 | EP0507885B1 A low frequency inductive rf plasma reactor |
| 12/02/1997 | US5693997 Non-tilting plate actuator for use in a micropositioning device |
| 12/02/1997 | US5693950 Projection system for charged particles |
| 12/02/1997 | US5693939 MeV neutral beam ion implanter |
| 12/02/1997 | US5693453 Method of forming micropattern |
| 12/02/1997 | US5693376 Applying pulsed voltage differential to accelerate plasma generated in space between cylindrical electrode and cylindrical target inside it |
| 12/02/1997 | US5693203 Sputtering target assembly having solid-phase bonded interface |
| 12/02/1997 | US5693199 Single chamber sputtering assembly |
| 12/02/1997 | US5693179 Contaminant reduction improvements for plasma etch chambers |
| 12/02/1997 | US5693147 Forming plasma in chamber, introducing water vapor and fluorocarbon to form hydrogen fluoride vapor which cleans chamber |
| 12/02/1997 | CA2074914C Information processing apparatus, and electrode substrate and information recording medium used in the apparatus |
| 11/30/1997 | CA2207773A1 Method and apparatus for ion formation in an ion implanter |
| 11/27/1997 | WO1997044812A1 Method of and apparatus for controlling reactive impedances of a matching network connected between an rf source and an rf plasma processor |
| 11/27/1997 | WO1997044811A1 Correction device for the correction of lens aberrations in particle-optical apparatus |
| 11/27/1997 | WO1997044753A1 Depth enhancement of ion sensitized data |
| 11/27/1997 | WO1997044141A1 Method and apparatus for dual-frequency plasma-enhanced cvd |
| 11/27/1997 | CA2291020A1 Depth enhancement of ion sensitized data |
| 11/26/1997 | EP0809275A1 Treatment method in glow-discharge plasma and apparatus therefor |
| 11/26/1997 | EP0809274A1 Apparatus and method for manufacturing an electronic device |
| 11/26/1997 | EP0808918A2 Plasma processing apparatus and processing method |
| 11/26/1997 | EP0808915A2 Chemical vapor deposition and sputtering method and apparatus |
| 11/26/1997 | EP0808477A1 Fabrication and use of a sub-micron dimensional standard |
| 11/26/1997 | EP0758485A4 Selectively shaped field emission electron beam source, and phosphor array for use therewith |
| 11/25/1997 | US5691642 Method and apparatus for characterizing a plasma using broadband microwave spectroscopic measurements |
| 11/25/1997 | US5691537 Method and apparatus for ion beam transport |
| 11/25/1997 | US5691010 High frequency voltage in vacuum |
| 11/25/1997 | US5690784 Ion milling end point detection method and apparatus |
| 11/25/1997 | US5690781 Plasma processing apparatus for manufacture of semiconductor devices |
| 11/25/1997 | US5690050 Plasma treating apparatus and plasma treating method |
| 11/20/1997 | DE4345403C2 Appts. for cathode sputtering |
| 11/20/1997 | DE19720228A1 Electron beam exposure device with scanning electron microscope |
| 11/20/1997 | DE19619287A1 NANO-structure on substrate formation method for microelectronics |
| 11/19/1997 | EP0807954A1 Coils for generating a plasma and for sputtering |
| 11/19/1997 | EP0807953A1 Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
| 11/19/1997 | EP0807952A2 Plasma reactor with heated source of a polymer-hardening precursor material |
| 11/19/1997 | EP0807951A2 Magnetic neutral line discharged plasma type surface cleaning apparatus |
| 11/19/1997 | EP0807799A1 Probe Scanning Apparatus |
| 11/19/1997 | EP0807315A1 Multi-phase dc plasma processing system |
| 11/19/1997 | CN1165393A Thin-film electron emitter device and application equipment using the same |
| 11/18/1997 | US5689494 Surface atom fabrication method and apparatus |
| 11/18/1997 | US5689215 Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor |
| 11/18/1997 | US5689117 Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus |
| 11/18/1997 | US5689112 Apparatus for detection of surface contaminations on silicon wafers |
| 11/18/1997 | US5688388 Apparatus for coating a substrate |
| 11/18/1997 | US5688383 Method for improving the performance of high temperature superconducting thin film wafers |
| 11/18/1997 | US5688382 Vacuum deposition with microwaves for targets, magnets on targets, ionizing material and sputtering |
| 11/18/1997 | US5688381 Magnetron atomization source and method of use thereof |
| 11/18/1997 | US5688358 R.F. plasma reactor with larger-than-wafer pedestal conductor |
| 11/18/1997 | US5688357 Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor |
| 11/18/1997 | US5688330 Self-cleaning, sputtering |
| 11/13/1997 | WO1997042649A1 Magnet array |
| 11/13/1997 | WO1997042648A1 Recessed coil for generating a plasma |
| 11/13/1997 | WO1997042647A1 Pulsed direct current power supply configurations for generating plasmas |
| 11/13/1997 | WO1997032335A3 Control mechanisms for dosimetry control in ion implantation systems |
| 11/13/1997 | DE19719718A1 Imaging system has scintillator between charged electrodes |
| 11/12/1997 | EP0806126A1 Methods and apparatus for generating plasma |
| 11/12/1997 | EP0806052A1 Plasma reactor |
| 11/12/1997 | EP0805880A1 Rotatable magnetron with curved or segmented end magnets |
| 11/12/1997 | EP0708976B1 Process for operating a time-of-flight secondary ion mass spectrometer |
| 11/12/1997 | EP0701684A4 Apparatus and method of film thickness measurement |
| 11/12/1997 | EP0521045B1 Magnetron sputter ion plating |
| 11/12/1997 | CN1164915A Apparatus and method for sputtering carbon |
| 11/11/1997 | US5686802 Method and apparatus for generating coherent particle beam |
| 11/11/1997 | US5686785 Electron gun having electrically isolated and adjustable cathode |
| 11/11/1997 | US5685959 Cathode assembly having rotating magnetic-field shunt and method of making magnetic recording media |
| 11/11/1997 | US5685949 Plasma treatment apparatus and method |
| 11/11/1997 | US5685942 Plasma processing apparatus and method |
| 11/11/1997 | US5685941 Inductively coupled plasma reactor with top electrode for enhancing plasma ignition |
| 11/11/1997 | US5685914 Focus ring for semiconductor wafer processing in a plasma reactor |
| 11/11/1997 | US5685913 Plasma processing apparatus and method |
| 11/11/1997 | US5685363 Substrate holding device and manufacturing method therefor |
| 11/06/1997 | WO1997041587A1 Sputtering installation with two longitudinally placed magnetrons |
| 11/06/1997 | DE19617057A1 Sputteranlage mit zwei längserstreckten Magnetrons Sputtering system with two elongated magnetron |
| 11/06/1997 | DE19616187A1 Vorrichtung zum Anregen elektrischer Entladungen mittels getakteter Spannungsspitzen Apparatus for stimulating electrical discharges using pulsed voltage peaks |
| 11/05/1997 | EP0805476A2 Plasma enhanced chemical vapour deposition processes and apparatus |
| 11/05/1997 | EP0805475A2 Plasma processing apparatus |
| 11/05/1997 | EP0755461B1 Process and device for ion-supported vacuum coating |
| 11/05/1997 | CN1164122A Plasma processor and its treating method |
| 11/05/1997 | CN1163945A Method for manufacturing thin film, and deposition apparatus |
| 11/04/1997 | US5684856 Stage device and pattern transfer system using the same |
| 11/04/1997 | US5684360 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| 11/04/1997 | US5684300 Ion mobility spectrometer |
| 11/04/1997 | US5683560 Cathode assembly |
| 11/04/1997 | US5683558 Anode structure for magnetron sputtering systems |
| 11/04/1997 | US5683548 Inductively coupled plasma reactor and process |
| 11/04/1997 | US5683547 Etching with a focused energy beam |
| 11/04/1997 | US5683539 Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling |
| 11/04/1997 | US5683538 Control of etch selectivity |
| 11/04/1997 | US5683537 Plasma processing apparatus |
| 11/04/1997 | US5683517 Plasma reactor with programmable reactant gas distribution |
| 11/04/1997 | US5683072 Thin film forming equipment |
| 11/01/1997 | CA2201686A1 Gas injector for plasma enhanced chemical vapor deposition |