| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/08/1998 | WO1998000859A1 Method and apparatus for etching a semiconductor wafer |
| 01/08/1998 | WO1998000858A1 Plasma etch reactor and method |
| 01/08/1998 | WO1998000853A1 Detector devices |
| 01/08/1998 | WO1998000577A1 Method and apparatus for flowing gases into a manifold at high potential |
| 01/08/1998 | WO1998000576A1 Apparatus and method for high density plasma chemical vapor deposition |
| 01/08/1998 | DE19641584C1 Vacuum coating device for application of substrate thin-film layers |
| 01/08/1998 | DE19627170A1 Masked ion beam lithography arrangement |
| 01/08/1998 | CA2259976A1 Plasma etch reactor and method |
| 01/08/1998 | CA2259973A1 Plasma etch reactor and method for emerging films |
| 01/08/1998 | CA2259972A1 Method and apparatus for etching a semiconductor wafer |
| 01/07/1998 | EP0817237A2 Methods and apparatus for treating workpieces with plasmas |
| 01/07/1998 | EP0817236A2 Plasma etching electrode and process for production thereof |
| 01/07/1998 | EP0817235A1 A scanning electron microscope |
| 01/07/1998 | EP0815936A2 Device for gas excitation |
| 01/07/1998 | EP0815583A1 A stress cell for a scanning probe microscope |
| 01/07/1998 | EP0688469B1 Method of triggering gas discharges |
| 01/06/1998 | US5705931 Method for determining absolute plasma parameters |
| 01/06/1998 | US5705080 Plasma-inert cover and plasma cleaning process |
| 01/06/1998 | US5705042 Sputter coating |
| 01/06/1998 | US5705019 Plasma processing apparatus |
| 12/31/1997 | CN1169094A Plasma source |
| 12/30/1997 | US5703376 Multi-level resolution lithography |
| 12/30/1997 | US5703375 Method and apparatus for ion beam neutralization |
| 12/30/1997 | US5703373 Alignment fiducial for improving patterning placement accuracy in e-beam masks for x-ray lithography |
| 12/30/1997 | US5703372 For use in an ion implanter |
| 12/30/1997 | US5703361 Circuit scanning device and method |
| 12/30/1997 | US5702621 Filling the inter-electrode space with inorganic pellets, supplying a pulse current to form a glass |
| 12/30/1997 | US5702573 Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films |
| 12/30/1997 | US5702562 Monitoring simultaneously plasma emission wavelengths and emission intensities; calculating etching rate and selectivity ratio of etched film and base film |
| 12/30/1997 | US5702530 Distributed microwave plasma reactor for semiconductor processing |
| 12/29/1997 | EP0814495A2 Adjusting DC bias voltage in plasma chamber |
| 12/29/1997 | EP0814494A2 Ion beam machining method and device thereof |
| 12/29/1997 | EP0814176A2 Method and apparatus for depositing diamond film |
| 12/29/1997 | EP0813745A1 Electron beam pattern-writing column |
| 12/29/1997 | EP0725975A4 Detection system for measuring high aspect ratio |
| 12/29/1997 | EP0680384A4 Microwave energized process for the preparation of high quality semiconductor material. |
| 12/29/1997 | EP0667921A4 Microwave apparatus for depositing thin films. |
| 12/29/1997 | EP0555339B1 Magnetron sputter coating method and apparatus with rotating magnet cathode |
| 12/24/1997 | WO1997049268A1 Circuit for reversing polarity on electrodes |
| 12/24/1997 | WO1997049267A1 A.c. plasma processing system |
| 12/24/1997 | WO1997049116A1 Gas delivery systems for particle beam processing |
| 12/24/1997 | WO1997049111A1 Method and apparatus for ion and charged particle focusing |
| 12/24/1997 | CN1168422A Microwave plasma processing apparatus and method therefor |
| 12/24/1997 | CA2258649A1 Gas delivery systems for particle beam processing |
| 12/23/1997 | US5701381 Mounting arrangement for a probe tip of a scanning force or tunneling microscope |
| 12/23/1997 | US5701014 Projection lithography apparatus |
| 12/23/1997 | US5701013 Wafer metrology pattern integrating both overlay and critical dimension features for SEM or AFM measurements |
| 12/23/1997 | US5700741 Plasma purge method for plasma process particle control |
| 12/23/1997 | US5700604 For transferring images or patterns onto a radiation sensitive substrate, for printing integrated circuits, accuracy |
| 12/23/1997 | US5700326 Microwave plasma processing apparatus |
| 12/18/1997 | WO1997047781A1 Reactive magnetron sputtering apparatus and method |
| 12/18/1997 | DE19725156A1 Electron microscopy system for sample appraisal and process observation using common sample table |
| 12/18/1997 | DE19646120A1 Micromechanical sensor for atomic force or scanning tunnelling microscope |
| 12/18/1997 | CA2254354A1 Reactive magnetron sputtering apparatus and method |
| 12/17/1997 | EP0813231A1 Electron beam lithography |
| 12/17/1997 | EP0813227A2 RF plasma processors |
| 12/17/1997 | EP0813226A2 Device and method for electron beam evaporation |
| 12/17/1997 | EP0812368A1 Reactive sputtering process |
| 12/16/1997 | US5699266 Method and apparatus for automatically recognizing repeated shapes for data compaction |
| 12/16/1997 | US5698859 Method and device for proximity-effect correction |
| 12/16/1997 | US5698856 Specimen holder for electron microscope |
| 12/16/1997 | US5698082 Method and apparatus for coating substrates in a vacuum chamber, with a system for the detection and suppression of undesirable arcing |
| 12/16/1997 | US5698062 Plasma treatment apparatus and method |
| 12/16/1997 | US5698039 Process for cleaning a substrate using a barrier discharge |
| 12/16/1997 | US5698036 Plasma processing apparatus |
| 12/16/1997 | US5698035 Corrosion/shock and electrical resistance; improve thermoconductivity; consists of atleast one of zrconium bromide and titanium bromide, boron nitride and aluminum nitride |
| 12/16/1997 | US5697751 Wafer transfer apparatus and method |
| 12/16/1997 | CA2103770C Plasma-enhanced magnetron-sputtered deposition of materials |
| 12/11/1997 | WO1997047028A1 High flown vacuum chamber including equipment modules such as plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support |
| 12/11/1997 | WO1997047023A1 Spin-split scanning electron microscope |
| 12/11/1997 | WO1997047022A1 Universal vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support |
| 12/11/1997 | WO1997046730A1 Temperature controlling method and apparatus for a plasma processing chamber |
| 12/11/1997 | DE19622607A1 Sputter cathode |
| 12/11/1997 | DE19622606A1 Sputter cathode |
| 12/11/1997 | DE19622605A1 Sputter cathode |
| 12/10/1997 | EP0812001A2 Cathodic sputtering device |
| 12/10/1997 | EP0812000A2 Dose modification proximity effect compensation (PEC) technique for electron beam lithography |
| 12/10/1997 | EP0811999A2 Scanning microscope |
| 12/10/1997 | EP0811238A1 Reactive sputtering device |
| 12/10/1997 | EP0811237A1 Deposition apparatus |
| 12/10/1997 | EP0811236A2 Filtered cathodic arc source |
| 12/10/1997 | EP0799557A4 High frequency induction plasma method and apparatus |
| 12/10/1997 | CA2207154A1 Inductively coupled source for deriving substantially uniform plasma flux |
| 12/09/1997 | US5696428 Apparatus and method using optical energy for specifying and quantitatively controlling chemically-reactive components of semiconductor processing plasma etching gas |
| 12/09/1997 | US5696382 Ion-implanter having variable ion beam angle control |
| 12/09/1997 | US5695832 Vacuum deposition; forming plasma |
| 12/09/1997 | US5695660 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 12/09/1997 | US5695597 Plasma reaction apparatus |
| 12/07/1997 | CA2206232A1 Method and apparatus for depositing diamond film |
| 12/04/1997 | WO1997046057A1 Plasma treatment apparatus and plasma treatment method |
| 12/04/1997 | WO1997045857A1 Apparatus for plasma jet treatment of substrates |
| 12/04/1997 | WO1997045856A1 Method for treating articles with a plasma jet |
| 12/04/1997 | WO1997045855A1 Highly tetrahedral amorphous carbon films and methods for their production |
| 12/04/1997 | WO1997045834A1 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production |
| 12/03/1997 | EP0810816A1 Balanced source for plasma system |
| 12/03/1997 | EP0810641A2 Process for etching defective zones on the circumference of semiconductor substrate and etching apparatus |
| 12/03/1997 | EP0810630A2 Low volume gas distribution assembly for a chemical downstream etch tool |
| 12/03/1997 | EP0810629A1 Electron beam apparatus |
| 12/03/1997 | EP0810628A2 Source for generating large surface pulsed ion and electron beams |
| 12/03/1997 | EP0810624A1 Method and apparatus for ion formation in an ion implanter |