| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/17/1998 | US5719402 Method of and system for charged particle beam exposure |
| 02/17/1998 | US5718815 Apparatus for coating a substrate from an electrically conductive target |
| 02/17/1998 | US5718813 Enhanced reactive DC sputtering system |
| 02/17/1998 | US5718796 Vapor phase etching in vessel which also contains an endpoint detector |
| 02/17/1998 | US5718795 Radial magnetic field enhancement for plasma processing |
| 02/17/1998 | US5718769 Plasma processing apparatus |
| 02/12/1998 | WO1998006125A1 Automated adjustment of an energy filtering transmissiion electron microscope |
| 02/11/1998 | EP0823493A1 Apparatus for plasma enhanced chemical vapour deposition of polycrystalline diamond |
| 02/11/1998 | EP0822996A1 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current |
| 02/11/1998 | CN1173107A Method and apparatus for ion formation in ion implanter |
| 02/11/1998 | CN1172973A Electron column optics for multibeam electron lithography system |
| 02/10/1998 | US5717294 For processing a target surface of a substrate |
| 02/10/1998 | US5717293 Strike enhancement circuit for a plasma generator |
| 02/10/1998 | US5717207 Transmission electron microscope with camera system |
| 02/10/1998 | US5717206 Electron multiplier for scanning electron mircroscopes |
| 02/10/1998 | US5717204 Inspecting optical masks with electron beam microscopy |
| 02/10/1998 | US5717190 Transparent heating plate for examination of specimens and transparent heating device for use therewith |
| 02/10/1998 | US5717186 Method and device for controlling the electric current density across a workpiece during heat treatment in a plasma |
| 02/10/1998 | US5717132 Cantilever and process for fabricating it |
| 02/10/1998 | US5716877 Process gas delivery system |
| 02/10/1998 | US5716742 Real time alignment system for a projection electron beam lithographic system |
| 02/10/1998 | US5716534 Plasma processing method and plasma etching method |
| 02/10/1998 | US5716505 Apparatus for coating substrates by cathode sputtering with a hollow target |
| 02/10/1998 | US5716500 Method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode |
| 02/10/1998 | US5716486 Method and apparatus for tuning field for plasma processing using corrected electrode |
| 02/10/1998 | US5716485 Electrode designs for controlling uniformity profiles in plasma processing reactors |
| 02/10/1998 | US5716484 Contaminant reduction improvements for plasma etch chambers |
| 02/10/1998 | US5716451 Plasma processing apparatus |
| 02/10/1998 | CA2049876C Capacitively coupled radiofrequency plasma source |
| 02/05/1998 | WO1998005057A1 Magnetron |
| 02/05/1998 | WO1998004758A1 Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces |
| 02/05/1998 | DE19631333A1 Function layer manufacturing method for electronic component or substrate in vacuum plasma |
| 02/04/1998 | EP0822572A1 Method and apparatus for plasma treatment of a surface |
| 02/04/1998 | EP0822571A2 Method and apparatus for ion beam neutralization |
| 02/03/1998 | US5714757 Surface analyzing method and its apparatus |
| 02/03/1998 | US5714031 Topology induced plasma enhancement for etched uniformity improvement |
| 02/03/1998 | US5714010 Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same |
| 02/03/1998 | US5714009 Apparatus for generating large distributed plasmas by means of plasma-guided microwave power |
| 02/03/1998 | CA2069452C Information recording/reproduction apparatus and method for recording and/or reproducing information onto and/or from recording medium using probe electrodes |
| 02/02/1998 | CA2210383A1 Method and apparatus for ion beam neutralization |
| 01/29/1998 | WO1998003988A2 Cathode arc source and graphite target |
| 01/29/1998 | WO1998003696A1 Target arrangement with a circular disk |
| 01/28/1998 | EP0821397A2 Silicon carbide composite article particularly useful for plasma reactors |
| 01/28/1998 | EP0821396A2 Method and apparatus for measuring etch uniformity of a semiconductor |
| 01/28/1998 | EP0821395A2 Plasma processing apparatus |
| 01/28/1998 | EP0821394A1 Electron beam evaporator |
| 01/28/1998 | EP0821393A1 Detector objective lens |
| 01/28/1998 | EP0821392A1 Deflection system |
| 01/28/1998 | EP0820641A1 Method for water vapor enhanced charged-particle-beam machining |
| 01/28/1998 | EP0745266A4 Chromatically compensated particle-beam column |
| 01/28/1998 | EP0699341B1 Particle-optical instrument comprising a deflection unit for secondary electrons |
| 01/28/1998 | CN1171635A Method for improving performance of high temperature superconducting thin film wafers |
| 01/27/1998 | US5712488 Electron beam performance measurement system and method thereof |
| 01/27/1998 | US5712000 Large-scale, low pressure plasma-ion deposition of diamondlike carbon films |
| 01/27/1998 | US5711860 Method and apparatus for producing a substrate with low secondary electron emissions |
| 01/27/1998 | US5711850 Plasma processing apparatus |
| 01/27/1998 | US5711849 Process optimization in gas phase dry etching |
| 01/27/1998 | US5711843 System for indirectly monitoring and controlling a process with particular application to plasma processes |
| 01/27/1998 | US5711814 Method of and apparatus for forming film with rotary electrode |
| 01/27/1998 | US5711812 Apparatus for obtaining dose uniformity in plasma doping (PLAD) ion implantation processes |
| 01/22/1998 | WO1998002900A1 High current ribbon beam ion implanter |
| 01/22/1998 | WO1998002597A1 Sputtering device and liquid-cooled target assembly therefor |
| 01/22/1998 | DE19653999C1 Cathode sputtering apparatus |
| 01/22/1998 | DE19628954A1 Device for generating plasma in vacuum container |
| 01/22/1998 | DE19628952A1 Plasma generating device with vacuum container |
| 01/22/1998 | DE19628949A1 Plasma generating device for vacuum container |
| 01/21/1998 | EP0820088A2 Non-planar magnet tracking device for magnetron sputtering apparatus |
| 01/21/1998 | EP0820087A2 RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
| 01/21/1998 | EP0820086A1 Plasma uniformity control for an inductive plasma reactor |
| 01/21/1998 | EP0819780A2 Inductively coupled HDP-CVD reactor |
| 01/21/1998 | EP0819314A1 Method and device for controlling the energy of at least one charged species bombarding a body immersed in a plasma |
| 01/20/1998 | US5710486 Inductively and multi-capacitively coupled plasma reactor |
| 01/20/1998 | US5709784 Process and apparatus for workpiece coating |
| 01/15/1998 | WO1998001903A1 Method of manufacturing semiconductor integrated circuit device |
| 01/15/1998 | WO1998001893A1 Apparatus and method for multi-zone high-density inductively-coupled plasma generation |
| 01/15/1998 | WO1998001887A1 Chamber interfacing o-rings and method for implementing same |
| 01/15/1998 | WO1998001601A1 Plasma chamber with separate process gas and cleaning gas injection ports |
| 01/15/1998 | WO1998001599A1 Microwave applicator for an electron cyclotron resonance plasma source |
| 01/15/1998 | DE19627533A1 Target for the sputter cathode of a vacuum coating installation |
| 01/14/1998 | EP0818803A2 Electrically floating shield in a plasma reactor |
| 01/14/1998 | EP0818802A2 Gas injection slit nozzle for a plasma process reactor |
| 01/14/1998 | EP0818801A2 Plasma treating apparatus |
| 01/14/1998 | EP0818560A2 Construction of a film on a semiconductor wafer |
| 01/14/1998 | EP0818559A2 Chamber for constructing a film on a semiconductor wafer |
| 01/14/1998 | EP0818558A1 Components peripheral to the pedestal in the gas flow path within a chemical vapor deposition chamber |
| 01/14/1998 | EP0818556A1 A method for providing full-face high density plasma deposition |
| 01/14/1998 | EP0818053A1 Plasma source |
| 01/14/1998 | EP0818052A1 Combined scanning probe and scanning energy microscope |
| 01/14/1998 | EP0707663A4 Sputtering device |
| 01/13/1998 | US5708371 Scanning photoinduced current analyzer capable of detecting photoinduced current in nonbiased specimen |
| 01/13/1998 | US5708276 Electron-beam exposure device and a method of detecting a mark position for the device |
| 01/13/1998 | US5708274 Curvilinear variable axis lens correction with crossed coils |
| 01/13/1998 | US5708267 Processing method using fast atom beam |
| 01/13/1998 | US5707692 Vapor deposition from plasma, magnetism and supporting |
| 01/13/1998 | US5707498 Avoiding contamination from induction coil in ionized sputtering |
| 01/13/1998 | US5707486 Plasma reactor using UHF/VHF and RF triode source, and process |
| 01/13/1998 | US5707485 Method and apparatus for facilitating removal of material from the backside of wafers via a plasma etch |
| 01/13/1998 | US5707452 Coaxial microwave applicator for an electron cyclotron resonance plasma source |
| 01/13/1998 | US5707451 Method and apparatus for cleaning a throttle valve |
| 01/08/1998 | WO1998001012A1 Plasma etch reactor and method for emerging films |