Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
04/1998
04/01/1998EP0832497A1 System and method for producing superimposed static and time-varying magnetic fields
04/01/1998EP0832309A1 Cathodic arc cathode
04/01/1998EP0753200A4 Improved environmental scanning electron microscope
04/01/1998EP0677595B1 Device for the vacuum-plasma treatment of articles
03/1998
03/31/1998US5734164 Charged particle apparatus having a canted column
03/31/1998US5733820 Dry etching method
03/31/1998US5733708 Multilayer e-beam lithography on nonconducting substrates
03/31/1998US5733610 Atmospheric pressure plasma reaction method of forming a hydrophobic film
03/31/1998US5733511 Power distribution for multiple electrode plasma systems using quarter wavelength transmission lines
03/31/1998US5733419 Electrodes, counterelectrodes, plasma discharge
03/31/1998US5733418 Sputtering method and apparatus
03/31/1998US5733405 Plasma processing apparatus
03/26/1998WO1998012732A1 Correction device for correcting chromatic aberration in particle-optical apparatus
03/26/1998WO1998003988A3 Cathode arc source and graphite target
03/26/1998DE19740235A1 Method for establishing irradiation position in scanning electron microscopy
03/26/1998DE19738347A1 Raster electron microscope with electronic lenses
03/26/1998DE19652634A1 Internal coating of metal workpieces
03/26/1998DE19638977A1 Kraftmikroskopiesonde Force microscopy probe
03/25/1998EP0831680A1 Device and method for plasma treatment
03/25/1998EP0831679A1 Power supply for multielectrode discharge
03/25/1998EP0831516A2 Device and method for processing a plasma to alter the surface of a substrate using neutrals
03/25/1998EP0831155A1 Diffusion-bonded sputtering target assembly and method of manufacturing the same
03/25/1998EP0830708A1 Plasma processing system with reduced particle contamination
03/25/1998EP0830707A1 Plasma sputter etching system with reduced particle contamination
03/25/1998EP0830706A1 Selective cross-link scanning system
03/24/1998US5731593 Ion implantation method and ion implantation system used therefor
03/24/1998US5731592 Exhaust system for an ion implanter
03/24/1998US5731591 Beam exposure system having improved mask unit
03/24/1998US5731587 Hot stage for scanning probe microscope
03/24/1998US5731586 Magnetic-electrostatic compound objective lens
03/24/1998US5731580 Scanning electron microscope
03/24/1998US5731565 Segmented coil for generating plasma in plasma processing equipment
03/24/1998US5730847 Arc ion plating device and arc ion plating system
03/19/1998WO1998011764A1 Radio frequency plasma generator
03/19/1998WO1998011594A1 Thin film electrostatic shield for inductive plasma processing
03/19/1998WO1998011593A1 Energy filter, transmission electron microscope and associated method for filtering energy
03/19/1998WO1998011270A1 Process and device for coating the internal face of metal buildings components
03/19/1998DE19652633A1 Verfahren und Vorrichtung zum Innenbeschichten metallischer Bauteile Method and apparatus for coating the inside of metal components
03/18/1998EP0830052A1 Device and method for plasma treatment
03/18/1998EP0829900A2 Plasma process device
03/18/1998EP0829899A2 A field composable electrostatic lens system
03/18/1998EP0828618A1 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
03/18/1998EP0687380B1 Electron microscope having a goniometer controlled from the image frame of reference
03/18/1998CN1176486A Surface wave plasma processing apparatus
03/17/1998US5729028 Ion accelerator for use in ion implanter
03/17/1998US5729027 Ion implanter
03/17/1998US5729026 For scanning the surface of a sample
03/17/1998US5729022 Composite concentric-gap magnetic lens and deflector with conical pole pieces
03/17/1998US5729015 Position control system for scanning probe microscope
03/17/1998US5728280 Apparatus for coating substrates by cathode sputtering with a hollow target
03/17/1998US5728278 Plasma processing apparatus
03/17/1998US5728276 Treatment apparatus
03/17/1998US5728261 Magnetically enhanced radio frequency reactive ion etching method and apparatus
03/17/1998US5728260 Distributors, conduits, focusing collar, lips, coverings
03/17/1998US5728253 Method and devices for detecting the end point of plasma process
03/12/1998WO1998010114A1 Process and device for coating substrates by gas flow sputtering
03/11/1998EP0828280A2 Method and device for the generation of electron beams
03/11/1998EP0808477A4 Fabrication and use of a sub-micron dimensional standard
03/10/1998US5726919 Method and apparatus for measuring electron beam effective focus
03/10/1998US5726413 Apparatus for generating a plasma for processing substrates
03/10/1998US5726067 Method of and apparatus for monitoring etching by-products
03/10/1998US5725974 Method and apparatus for producing scanning data used to produce a photomask
03/10/1998US5725746 Shielding for arc suppression in rotating magnetron sputtering systems
03/10/1998US5725675 Silicon carbide constant voltage gradient gas feedthrough
03/05/1998WO1998009313A1 Electron optical lens system with a slot-shaped aperture cross section
03/05/1998WO1998008998A1 Plasma cvd system with an array of microwave plasma electrodes and plasma cvd process
03/05/1998DE19634795A1 Plasma-CVD-Anlage mit einem Array von Mikrowellen-Plasmaelektroden und Plasma-CVD-Verfahren Plasma CVD system having an array of microwave plasma electrodes and the plasma CVD method
03/05/1998DE19634456A1 Elektronenoptische Linsenanordnung mit spaltförmigem Öffnungsquerschnitt Electron-optical lens array with a slit-opening cross-section
03/05/1998DE19633320A1 Comminuting mask reproduction on substrate by charged particles
03/05/1998CA2264017A1 Plasma cvd system with an array of microwave plasma electrodes and plasma cvd process
03/04/1998EP0827183A1 HF-transparent vacuum vessel with integral Faraday shield
03/04/1998EP0827182A2 Surface wave plasma processing apparatus
03/04/1998EP0826229A1 Electrode clamping assembly and method for assembly and use thereof
03/04/1998EP0826221A1 Electron bombardment installation
03/04/1998EP0725843B1 Process and system for plasma-activated electron-beam vaporisation
03/04/1998EP0708688A4 Method for the improved microwave deposition of thin films
03/03/1998US5724131 Integrated emission microscope for panchromatic imaging, continuous wavelength spectroscopy and selective area spectroscopic mapping
03/03/1998US5723775 Atomic force microscope under high speed feedback control
03/03/1998US5723386 Method of manufacturing a semiconductor device capable of rapidly forming minute wirings without etching of the minute wirings
03/03/1998US5722668 Protective collar for vacuum seal in a plasma etch reactor
02/1998
02/26/1998WO1998007565A1 Bonding with a conductive adhesive sheet material
02/26/1998DE19734059A1 Charged particle shadow projection lithography system
02/26/1998DE19634121A1 Production of gratings for mounting samples in electron microscope
02/26/1998DE19633496A1 Monochromator for electron microscopy
02/25/1998EP0825712A2 Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
02/25/1998EP0825277A2 Optimized magnetic field sputtering
02/25/1998EP0825276A2 Sputter target for eliminating redeposition on the target sidewall
02/25/1998EP0824760A1 Sputtering apparatus with isolated coolant and sputtering target therefor
02/25/1998EP0824759A1 Ion beam preparation device for electron microscopy
02/25/1998EP0824604A1 Apparatus for reducing arcing during sputtering
02/25/1998EP0707662A4 Ultrasonic enhancement of aluminum step coverage and apparatus
02/25/1998CN1174402A Charged-beam exposure mask and charged-beam exposure method
02/24/1998US5721687 Ultrahigh vacuum focused ion beam micromill and articles therefrom
02/24/1998US5721432 Method of and system for charged particle beam exposure
02/24/1998US5721021 Method of depositing titanium-containing conductive thin film
02/24/1998US5720846 Construction of a chamber casing in a plasma etching system
02/18/1998EP0823944A1 Sputtering device
02/18/1998CN1173550A Plasma treatment appts.
02/18/1998CN1173412A Device for gas excitation
02/17/1998US5719403 MeV scanning ions implanter
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