| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/05/1998 | US5747819 Charged particle beam transfer device exhibiting low aberration |
| 05/05/1998 | US5747818 Thermoelectric cooling in gas-assisted FIB system |
| 05/05/1998 | US5747816 Charged particle beam apparatus |
| 05/05/1998 | US5747814 Method for centering a lens in a charged-particle system |
| 05/05/1998 | US5747803 Method for preventing charging effect and thermal damage in charged-particle microscopy |
| 05/05/1998 | US5746897 High magnetic flux permanent magnet array apparatus and method for high productivity physical vapor deposition |
| 05/05/1998 | US5746875 Gas injection slit nozzle for a plasma process reactor |
| 05/05/1998 | US5746434 Chamber interfacing O-rings and method for implementing same |
| 05/05/1998 | CA2089645C Method of enhancing the performance of a magnetron sputtering target |
| 04/30/1998 | WO1998018150A1 Ion gun |
| 04/30/1998 | DE19644154A1 Surface treatment process for interior of workpiece |
| 04/29/1998 | EP0838843A2 Parallel-plate electrode plasma reactor having inductive antenna and adjustable radial distribution of plasma ion density |
| 04/29/1998 | EP0838842A2 Plasma reactor with heated source of a polymer-hardening precursor material |
| 04/29/1998 | EP0838841A2 Inductively coupled parallel-plate plasma reactor with a conical dome |
| 04/29/1998 | EP0838840A2 Pulsed plate plasma implantation method and apparatus |
| 04/29/1998 | EP0838839A2 Plasma processing apparatus |
| 04/29/1998 | EP0838838A2 Apparatus and method of producing an electronic device |
| 04/29/1998 | EP0838837A2 Electron beam exposure apparatus and method |
| 04/29/1998 | EP0838836A2 Thermoelectric cooling in gas-assisted focused ion beam (FIB) system |
| 04/29/1998 | EP0838835A2 Holder driving unit |
| 04/29/1998 | EP0838080A1 Sample analyzer |
| 04/29/1998 | EP0722651B1 Device and method for forming a microwave plasma |
| 04/29/1998 | CN2280349Y Powder or dust receiving means of scanning electric lenses telescopic table |
| 04/28/1998 | US5744812 Faraday cup assembly for a semiconductor ion-implanting apparatus |
| 04/28/1998 | US5744810 Method and system for exposing pattern on object by charged particle beam |
| 04/28/1998 | US5744800 Defect observing electron microscope |
| 04/28/1998 | US5744796 Mass spectrometer and radical measuring method |
| 04/28/1998 | US5744049 Radio frequency, semiconductor etching |
| 04/28/1998 | US5744017 Vacuum arc deposition apparatus |
| 04/28/1998 | US5744016 Sputtering apparatus |
| 04/28/1998 | US5744012 Plasma dry etching of a film |
| 04/28/1998 | US5744011 Using electric field and magnetic field |
| 04/23/1998 | WO1998016948A1 Method to determine depth profiles in an area of thin coating |
| 04/23/1998 | WO1998016947A1 Method for structured energy transmission using electron beams |
| 04/23/1998 | WO1998016946A2 Conical baffle for reducing charging drift in a particle beam system |
| 04/23/1998 | DE19746425A1 Insulator etching method for semiconductor manufacture |
| 04/23/1998 | CA2240531A1 Conical baffle for reducing charging drift in a particle beam system |
| 04/22/1998 | EP0837622A1 Plasma generator |
| 04/22/1998 | EP0837491A2 Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly |
| 04/22/1998 | EP0837490A2 A method to eliminate coil sputtering in an inductively coupled plasma (ICP) source |
| 04/22/1998 | EP0837489A2 Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
| 04/22/1998 | EP0837488A2 Electon microscope for specimen composition and strain analysis and observation method thereof |
| 04/22/1998 | EP0837305A1 Method and assembly for controlling the coating process in thermal coating apparatus |
| 04/22/1998 | EP0836745A1 An improved method and apparatus for detecting optimal endpoints in plasma etch processes |
| 04/22/1998 | EP0627121B1 Charged particle generation |
| 04/21/1998 | US5742377 Cantilever for scanning probe microscope including piezoelectric element and method of using the same |
| 04/21/1998 | US5742172 Scanning probe microscope and method for obtaining topographic image, surface potential image, and electrostatic capacitance distribution image |
| 04/21/1998 | US5742065 Heater for membrane mask in an electron-beam lithography system |
| 04/21/1998 | US5742062 Arrangement for masked beam lithography by means of electrically charged particles |
| 04/21/1998 | US5741404 Multi-planar angulated sputtering target and method of use for filling openings |
| 04/21/1998 | CA2218604A1 Apparatus and method for monitoring the coating process of a thermal coating apparatus |
| 04/16/1998 | WO1998015669A1 Method and apparatus for plasma deposition of a thin film onto the interior surface of a container |
| 04/16/1998 | DE19642116A1 Verfahren zur strukturierten Energieübertragung mit Elektronenstrahlen Method for structured energy transmission with electron |
| 04/16/1998 | DE19641981A1 Verfahren zur Bestimmung von Tiefenprofilen im Dünnschichtbereich Method for the determination of depth profiles in thin-film |
| 04/15/1998 | EP0836219A2 Active shield for generating a plasma for sputtering |
| 04/15/1998 | EP0836218A2 Active shield for generating a plasma for sputtering |
| 04/15/1998 | EP0835518A1 Low inductance large area coil for an inductively coupled plasma source |
| 04/15/1998 | CN1179003A Ion beam neutralizing method and apparatus |
| 04/15/1998 | CN1178843A Sputter method and sputter equipment |
| 04/14/1998 | US5740313 Light beam heating apparatus |
| 04/14/1998 | US5740101 Time-stable labeling of individual atoms or groups of atoms in the surface of a solid, and the storage of information units in the atomic range |
| 04/14/1998 | US5739069 Plasma process with radicals |
| 04/14/1998 | US5739051 Method and device for detecting the end point of plasma process |
| 04/14/1998 | US5738770 Vacuum chamber comprising coupler bolts inserted through apertures |
| 04/14/1998 | US5738768 Process for reducing particle defects in arc vapor deposition coatings |
| 04/14/1998 | US5738756 Sampling signals produced by photosensitive equipment, digitally filtering and cross-correlating data, normalizing data |
| 04/14/1998 | US5738752 System and method for plasma etching |
| 04/14/1998 | US5738731 Solar cells |
| 04/09/1998 | WO1998014980A1 Particle controlling method and plasma processing chamber |
| 04/09/1998 | WO1998014979A1 Mounting a solid state particle detector within a magnetic deflection field |
| 04/09/1998 | WO1998014977A1 An arc chamber for an ion implantation system |
| 04/09/1998 | WO1998014636A1 Apparatus for reducing polymer deposition on substrate support |
| 04/09/1998 | WO1998014631A1 Methods and apparatus for sputtering with rotating magnet sputter sources |
| 04/09/1998 | CA2267082A1 An arc chamber for an ion implantation system |
| 04/09/1998 | CA2238359A1 Mounting a solid state particle detector within a magnetic deflection field |
| 04/08/1998 | EP0834896A1 Apparatus for generating an electron beam |
| 04/08/1998 | EP0834186A1 Precision-controlled slit mechanism for electron microscope |
| 04/08/1998 | EP0760159A4 Fast magnetic scanning of heavy ion beams |
| 04/07/1998 | US5737496 Active neural network control of wafer attributes in a plasma etch process |
| 04/07/1998 | US5736818 Resonant radiofrequency wave plasma generating apparatus with improved stage |
| 04/07/1998 | US5736743 Method and apparatus for ion beam formation in an ion implanter |
| 04/07/1998 | US5736742 Objective lens and charged particle beam system |
| 04/07/1998 | US5736281 Dose modification proximity effect compensation (PEC) technique for electron beam lithography |
| 04/07/1998 | US5736021 Electrically floating shield in a plasma reactor |
| 04/07/1998 | US5736019 Sputtering cathode |
| 04/07/1998 | US5735993 Plasma processing apparatus for dry etching of semiconductor wafers |
| 04/07/1998 | US5735129 Specimen-cooling system for electron microscope or the like |
| 04/02/1998 | WO1998014036A1 Fluorine assisted stripping and residue removal in sapphire downstream plasma asher |
| 04/02/1998 | WO1998013856A1 Plasma processing apparatus |
| 04/02/1998 | WO1998013855A1 Composite concentric-gap magnetic lens and deflector with conical pole pieces |
| 04/02/1998 | WO1998013854A1 Charged particle beam emitting device |
| 04/02/1998 | WO1998013851A1 Ion source for generating ions of a gas or vapour |
| 04/02/1998 | WO1998013663A1 Atomic force microscope probe |
| 04/02/1998 | WO1998013532A1 A multiple target arrangement for decreasing the intensity and severity of arcing in dc sputtering |
| 04/02/1998 | DE19706532A1 Sputtering device for semiconductor component manufacture |
| 04/02/1998 | DE19639637A1 Equipment for the surface treatment of flat substrates |
| 04/02/1998 | DE19638925A1 Electron band emitter |
| 04/02/1998 | CA2238357A1 Composite concentric-gap magnetic lens and deflector with conical pole pieces |
| 04/01/1998 | EP0833367A2 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
| 04/01/1998 | EP0833366A2 Apparatus for depositing barrier film on three-dimensional articles |