| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/03/1998 | EP0845800A1 Plasma processing apparatus |
| 06/03/1998 | EP0845799A2 Semiconductor processing apparatus |
| 06/03/1998 | EP0845545A1 Coated deposition chamber equipment |
| 06/03/1998 | EP0845151A1 Recessed coil for generating a plasma |
| 06/03/1998 | EP0788654B1 Inductively coupled plasma sputter chamber with conductive material sputtering capabilities |
| 06/03/1998 | EP0705149B1 Method for producing a polymer coating inside hollow plastic articles |
| 06/03/1998 | CN1183853A Plasma processor for large workpieces |
| 06/02/1998 | US5760410 For drawing an exposure pattern on a sample |
| 06/02/1998 | US5760409 Dose control for use in an ion implanter |
| 06/02/1998 | US5760405 Plasma chamber for controlling ion dosage in ion implantation |
| 06/02/1998 | US5760396 Scanning probe microscope |
| 06/02/1998 | US5759722 Electron beam aperture structure and method for fabricating the same |
| 06/02/1998 | US5759424 Plasma processing apparatus and processing method |
| 06/02/1998 | US5759423 Electron beam writing method and apparatus for carrying out the same |
| 06/02/1998 | US5759280 Inductively coupled source for deriving substantially uniform plasma flux |
| 05/28/1998 | WO1998022977A1 Plasma treating device |
| 05/28/1998 | WO1998022971A2 Scanning electron microscope |
| 05/28/1998 | WO1998022970A1 Electronic cyclotron resonance source for the production of ions with multiple charge in a hostile medium |
| 05/28/1998 | WO1998022150A1 Method and apparatus for inactivating contaminants in biological fluid |
| 05/28/1998 | DE19648390A1 Target for the sputter cathode of a vacuum coating plant |
| 05/27/1998 | EP0844644A2 Apparatus and method for analyzing microscopic area |
| 05/27/1998 | EP0844533A2 Correction of exposure data, particularly in manufacturing of semiconductor devices |
| 05/26/1998 | US5757409 Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus |
| 05/26/1998 | US5757019 Pattern drawing apparatus |
| 05/26/1998 | US5757018 Zero deflection magnetically-suppressed Faraday for ion implanters |
| 05/26/1998 | US5757015 Charged-particle-beam exposure device and charged-particle-beam exposure method |
| 05/26/1998 | US5757010 Curvilinear variable axis lens correction with centered dipoles |
| 05/26/1998 | US5757009 Charged particle beam expander |
| 05/26/1998 | US5756222 Corrosion-resistant aluminum article for semiconductor processing equipment |
| 05/26/1998 | US5755936 Temperature clamped anti-contamination and collimating devices for thin film processes |
| 05/22/1998 | WO1998021746A1 Method of plasma treatment |
| 05/22/1998 | WO1998021744A2 Gas panel |
| 05/20/1998 | EP0843336A2 Plasma etching method and apparatus |
| 05/20/1998 | EP0843335A1 Electrostatic arrangement for influencing a particle beam |
| 05/20/1998 | EP0843175A1 Scanning probe microscope and signal processing apparatus |
| 05/20/1998 | EP0843151A1 Probe scanning apparatus for probe microscope |
| 05/20/1998 | EP0842307A2 System for the plasma treatment of large area substrates |
| 05/20/1998 | EP0822996A4 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current |
| 05/20/1998 | DE19749690A1 Sputter electrode for magnetron sputter unit |
| 05/20/1998 | CN1182280A Pattern drawing method using charged particle beams and apparatus therefor |
| 05/20/1998 | CN1182216A Probe scanning apparatus for probe microscope |
| 05/19/1998 | US5754443 Exposure data processing method and device |
| 05/19/1998 | US5754297 Method and apparatus for monitoring the deposition rate of films during physical vapor deposition |
| 05/19/1998 | US5754008 Device for creating a beam of adjustable-energy ions particularly for sequential vacuum treatment of surfaces with large dimensions |
| 05/19/1998 | US5753924 Ultra-high tilt specimen cryotransfer holder for electron microscope |
| 05/19/1998 | US5753923 Ion injection device and method therefor |
| 05/19/1998 | US5753922 Electromagnetic deflector |
| 05/19/1998 | US5753913 Method of reconstructing an image in a particle-optical apparatus |
| 05/19/1998 | US5753912 Cantilever chip |
| 05/19/1998 | US5753886 Plasma treatment apparatus and method |
| 05/19/1998 | US5753089 Sputter coating station |
| 05/19/1998 | US5753066 Plasma source for etching |
| 05/19/1998 | US5753044 RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
| 05/14/1998 | WO1998020518A1 Electron multiplier |
| 05/14/1998 | WO1998020517A1 Micromachining using high energy light ions |
| 05/14/1998 | WO1998020513A1 Charged particle source |
| 05/14/1998 | WO1998020329A1 X-ray analysis apparatus provided with a double collimator mask |
| 05/14/1998 | WO1998019965A1 Microwave plasma chemical synthesis of ultrafine powders |
| 05/14/1998 | CA2271688A1 Charged particle source |
| 05/13/1998 | EP0841838A1 Plasma treatment apparatus and plasma treatment method |
| 05/13/1998 | EP0841683A2 Active shield for generating a plasma for sputtering |
| 05/13/1998 | EP0841682A2 Method of detecting end point of plasma processing and apparatus for the same |
| 05/13/1998 | EP0841681A2 Exposure apparatus and exposure method |
| 05/13/1998 | EP0840941A2 Method of and apparatus for controlling reactive impedances of a matching network connected between an rf source and an rf plasma processor |
| 05/13/1998 | EP0840940A1 Process and device for ion thinning in a high-resolution transmission electron microscope |
| 05/13/1998 | EP0840939A1 Correction device for the correction of lens aberrations in particle-optical apparatus |
| 05/13/1998 | EP0840551A1 Microwave cvd method for deposition of robust barrier coatings |
| 05/12/1998 | US5751004 Projection reticle transmission control for coulomb interaction analysis |
| 05/12/1998 | US5751003 Loadlock assembly for an ion implantation system |
| 05/12/1998 | US5751002 Ion implantation apparatus |
| 05/12/1998 | US5750990 Method for measuring critical dimension of pattern on sample |
| 05/12/1998 | US5750987 Ion beam processing apparatus |
| 05/12/1998 | US5750208 Method for plasma downstream processing |
| 05/12/1998 | US5750207 System and method for depositing coating of modulated composition |
| 05/12/1998 | US5750185 Method for electron beam deposition of multicomponent evaporants |
| 05/12/1998 | US5749966 Process for depositing diamond and refractory materials |
| 05/07/1998 | DE19748278A1 Apparatus for a plasma CVD process |
| 05/06/1998 | EP0840365A2 High pressure plasma oxide etch process |
| 05/06/1998 | EP0840356A2 Ion implantation system and method adapted for serial wafer processing |
| 05/06/1998 | EP0840355A1 Apparatus and method for processing substrate |
| 05/06/1998 | EP0840351A2 Method of reducing generation of particulate matter in a sputtering chamber |
| 05/06/1998 | EP0840350A2 Plasma apparatus and process with filtering of plasma sheath-generated harmonics |
| 05/06/1998 | EP0840349A2 RF tuning method for an RF plasma reactor using frequency servoing power, voltage, current or dI/dt control |
| 05/06/1998 | EP0840348A1 Etch chamber having three independently controlled electrodes |
| 05/06/1998 | EP0840346A1 Cathode mounting for ion source with indirectly heated cathode |
| 05/06/1998 | EP0839930A1 Apparatus for vacuum line cleaning in substrate processing equipment |
| 05/06/1998 | EP0839929A1 Method and apparatus for minimizing deposition in an exhaust line |
| 05/06/1998 | EP0839928A1 Remote plasma CVD method |
| 05/06/1998 | EP0839383A1 Tapered structure suitable for microthermocouples microelectrodes, field emission tips and micromagnetic sensors with force sensing capabilities |
| 05/06/1998 | EP0839327A1 Transparent position-sensitive particle detector |
| 05/06/1998 | EP0839217A1 A plasma enhanced chemical processing reactor and method |
| 05/06/1998 | EP0805880A4 Rotatable magnetron with curved or segmented end magnets |
| 05/06/1998 | CN1181172A Plasma processing device and method |
| 05/06/1998 | CN1181115A Mechanically joined sputtering target and adapter therefor |
| 05/06/1998 | CN1038262C Surface-treatment method for material by use of impulse high energy-density plasma |
| 05/05/1998 | US5748360 Decelerating and focusing ion beam device |
| 05/05/1998 | US5747936 Ion implantation apparatus with improved post mass selection deceleration |
| 05/05/1998 | US5747935 Method and apparatus for stabilizing switch-mode powered RF plasma processing |
| 05/05/1998 | US5747917 Double-walled mircrowave plasma based applicator |
| 05/05/1998 | US5747862 Spin-polarized electron emitter having semiconductor opto-electronic layer with split valence band and reflecting mirror |