| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/09/1998 | WO1998029901A1 Method and device for treating a semiconductor surface |
| 07/08/1998 | EP0852389A2 Magnetically enhanced plasma chamber with non-uniform magnetic field |
| 07/08/1998 | EP0742994B1 Plasma-generating device |
| 07/08/1998 | EP0739531B1 Particle beam optic reproduction system |
| 07/08/1998 | EP0728294B1 Mounting for a probe tip in a scanning force or scanning tunneling microscope |
| 07/07/1998 | US5777438 Apparatus for implanting metal ions in metals and ceramics |
| 07/07/1998 | US5777327 Pattern shape inspection apparatus for forming specimen image on display apparatus |
| 07/07/1998 | US5777289 RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
| 07/07/1998 | US5776553 Method for depositing diamond films by dielectric barrier discharge |
| 07/07/1998 | CA2022251C Electron-detector diode biassing scheme for improved writing by an electron beam lithography machine |
| 07/02/1998 | WO1998028779A1 Device for cathodic sputtering |
| 07/02/1998 | WO1998028778A1 Device for cathodic sputtering |
| 07/02/1998 | WO1998028777A1 Device and method for cathodic sputtering |
| 07/02/1998 | WO1998028776A2 Particle-optical apparatus including a low-temperature specimen holder |
| 07/02/1998 | WO1998028459A1 Precision etching and coating system |
| 07/02/1998 | WO1998016946A3 Conical baffle for reducing charging drift in a particle beam system |
| 07/01/1998 | EP0851460A1 Gun lens for generating a particle beam |
| 07/01/1998 | EP0851453A1 Endcap for indirectly heated cathode of ion source |
| 07/01/1998 | EP0740710A4 Magnetron sputtering apparatus for compound thin films |
| 07/01/1998 | CN1186328A Electron beam exposure of subpatterns of pattern |
| 07/01/1998 | CN1038948C Process and apparatus for plasma CVD coating or handle substrates |
| 06/30/1998 | US5773838 Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus |
| 06/30/1998 | US5773837 Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus |
| 06/30/1998 | US5773836 Method for correcting placement errors in a lithography system |
| 06/30/1998 | US5773824 For determining topographical characteristics of a sample surface |
| 06/30/1998 | US5773784 Electron beam processing apparatus |
| 06/30/1998 | US5772862 Sputtering target, silica and zirconia |
| 06/30/1998 | US5772858 Method and apparatus for cleaning a target in a sputtering source |
| 06/30/1998 | US5772833 Plasma etching apparatus |
| 06/30/1998 | US5772832 Fluorine scavenger ring |
| 06/30/1998 | US5772772 Plasma diffusion control apparatus |
| 06/30/1998 | US5772771 Deposition chamber for improved deposition thickness uniformity |
| 06/30/1998 | US5772770 Substrate processing apparatus |
| 06/25/1998 | WO1998027646A1 Method of and apparatus for matching a load to a source |
| 06/25/1998 | WO1998027577A1 Wafer electrical discharge control by wafer lifter system |
| 06/25/1998 | DE19729600A1 Pattern comparison monitoring system using grey value raster, e.g. for electron beam lithography mask |
| 06/24/1998 | EP0849769A2 Process and device for externally coating lamps |
| 06/24/1998 | EP0849767A2 Boron carbide parts and coatings in a plasma reactor |
| 06/24/1998 | EP0849766A2 Etch process |
| 06/24/1998 | EP0849765A2 Charged particle beam system with optical microscope |
| 06/24/1998 | EP0543844B1 Cantilever mount for rotating cylindrical magnetrons |
| 06/23/1998 | US5770922 Baseband V-I probe |
| 06/23/1998 | US5770863 Charged particle beam projection apparatus |
| 06/23/1998 | US5770862 Charged particle exposure apparatus, and a charged particle exposure method |
| 06/23/1998 | US5770861 Apparatus for working a specimen |
| 06/23/1998 | US5770123 Emitting an energy beam, passing a portion of beam through beam transmission hole of selective shape, irradiating shaped beam onto workpiece, changing positional relationship and machinging a pattern |
| 06/23/1998 | US5770099 Maintaining high temperature of plasma chamber interior walls to prevent deposition of carbon-silicon-fluorine material after plasma shutoff |
| 06/23/1998 | US5770097 Control of etch selectivity |
| 06/23/1998 | US5770026 Semiconductor fabrication apparatus having improved sputtering collimator and wiring method for a semiconductor device using such apparatus |
| 06/23/1998 | US5770025 Magnetron sputtering apparatus |
| 06/18/1998 | WO1998026444A1 Vacuum compatible linear motion device |
| 06/18/1998 | WO1998026108A1 Process and device for forming a coating on a substrate by cathode sputtering |
| 06/18/1998 | DE19754647A1 Raster electron microscope |
| 06/18/1998 | DE19652463A1 Three=dimensional microstructure |
| 06/18/1998 | DE19651811A1 Large area thin film deposition apparatus |
| 06/18/1998 | DE19651636A1 Vibration-free, or damped suspension for appts such as raster tunnel microscope |
| 06/18/1998 | DE19651378A1 Insulating thin film sputter deposition apparatus |
| 06/18/1998 | CA2244994A1 Vacuum compatible linear motion device |
| 06/17/1998 | EP0848247A1 Control of surface potential of insulating specimens in surface analysis |
| 06/17/1998 | EP0848081A2 Method and apparatus for physical vapour deposition |
| 06/17/1998 | EP0848080A1 Diffusion-bonded sputtering target assembly and method of manufacturing the same |
| 06/17/1998 | EP0847591A1 Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
| 06/17/1998 | CN1185030A Plasma processing apparatus |
| 06/17/1998 | CA2224876A1 Process and apparatus for coating an exterior portion of a lamp |
| 06/16/1998 | US5767628 Helicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channel |
| 06/16/1998 | US5767522 Ion-implantation system using split ion beams |
| 06/16/1998 | US5767521 Electron-beam lithography system and method for drawing nanometer-order pattern |
| 06/16/1998 | US5767516 Electron microscope and sample observing method using the same |
| 06/16/1998 | US5767515 Rule based control for charged-particle beam instrument |
| 06/16/1998 | US5767514 Sensing electron flow between a tip and a surface of a sample |
| 06/16/1998 | US5766802 Adjustment writing scan width; accuracy |
| 06/16/1998 | US5766498 Anisotropic etching method and apparatus |
| 06/16/1998 | US5766426 Sputter deposition using target which emits atoms when bombarded by gaseous ions |
| 06/16/1998 | US5766364 Plasma processing apparatus |
| 06/16/1998 | US5766362 Apparatus for depositing barrier film on three-dimensional articles |
| 06/11/1998 | WO1998025293A2 Method of operating a particle-optical apparatus |
| 06/10/1998 | EP0847231A1 Apparatus and method for generation of a plasma torch |
| 06/10/1998 | EP0847075A2 Positron source |
| 06/10/1998 | EP0847073A1 Ion source block cathode with labyrinth conductive path |
| 06/10/1998 | EP0846792A1 Method of synthesizing diamond |
| 06/10/1998 | EP0846786A2 Modified physoical vapor deposition chamber and method of depositing materials at low pressure |
| 06/10/1998 | EP0846191A1 Plasma device and method utilizing azimuthally and axially uniform electric field |
| 06/10/1998 | EP0846190A1 Improved parallel ion optics and apparatus for high current low energy ion beams |
| 06/10/1998 | DE19650680A1 Electron- and positron microscope with magnetic prism beam superimposition |
| 06/10/1998 | CN1184555A Electrode clamping assembly and method for assembly and use thereof |
| 06/10/1998 | CN1184324A Ion source block filament with labyrinth conductive path |
| 06/09/1998 | US5763933 Nanofabricated structures having a region of changeable conductivity |
| 06/09/1998 | US5763895 Source inner shield for eaton NV-10 high current implanter |
| 06/09/1998 | US5763894 Calibration patterns and techniques for charged particle projection lithography systems |
| 06/09/1998 | US5763893 Electron gun and electron-beam transfer apparatus comprising same |
| 06/09/1998 | US5763890 Cathode mounting for ion source with indirectly heated cathode |
| 06/09/1998 | US5763889 Electron beam-generating apparatus |
| 06/09/1998 | US5763880 Vapor deposited metallic nitride protective coatings on tungsten single crystal sharp point; high current density |
| 06/09/1998 | US5763851 Slotted RF coil shield for plasma deposition system |
| 06/09/1998 | US5762814 Plasma processing method and apparatus using plasma produced by microwaves |
| 06/09/1998 | US5762766 Sputtering by magnetron on a substrate |
| 06/09/1998 | US5762750 Magnetic neutral line discharged plasma type surface cleaning apparatus |
| 06/09/1998 | US5762748 Lid and door for a vacuum chamber and pretreatment therefor |
| 06/09/1998 | US5762714 Plasma guard for chamber equipped with electrostatic chuck |
| 06/04/1998 | WO1998023796A1 Method for preparation of metal intercalated fullerene-like metal chalcogenides |