| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/11/1998 | US5793040 Information processing aparatus effecting probe position control with electrostatic force |
| 08/11/1998 | US5792519 Method for the plasma assisted high vacuum physical vapor coating of parts with wear resistant coatings and equipment for carrying out the method |
| 08/11/1998 | US5792376 Plasma processing apparatus and plasma processing method |
| 08/11/1998 | US5792272 Plasma enhanced chemical processing reactor and method |
| 08/11/1998 | CA2107048C Sample carriage for scanning probe microscope |
| 08/11/1998 | CA2094656C Device manufacture involving lithographic process |
| 08/06/1998 | WO1998034270A1 Double window exhaust arrangement for wafer plasma processor |
| 08/06/1998 | WO1998034267A1 Automatic control of glow discharges with pulsed electrical supply |
| 08/06/1998 | WO1998034266A1 Digital direct write electron beam lithography |
| 08/06/1998 | WO1998025293A3 Method of operating a particle-optical apparatus |
| 08/06/1998 | DE19703791A1 Verfahren zur Regelung von Glimmentladungen mit pulsförmiger Energieversorgung The method for controlling glow discharges with pulsed power supply |
| 08/05/1998 | EP0856872A2 Charged-particle-beam exposure apparatus |
| 08/05/1998 | EP0856593A1 A method and apparatus for enhancing sidewall coverage during sputtering in a chamber having an inductively coupled plasma |
| 08/05/1998 | EP0856070A1 Plasma chamber with separate process gas and cleaning gas injection ports |
| 08/05/1998 | EP0704102B1 Electron beam array for surface treatment |
| 08/05/1998 | EP0600070B1 Improved planar magnetron sputtering magnet assembly |
| 08/05/1998 | CN1189859A Plasma enhanced chemical processing reactor and method |
| 08/04/1998 | US5789867 Apparatus and method for igniting plasma in a process module |
| 08/04/1998 | US5789748 Low voltage electron beam system |
| 08/04/1998 | US5789324 Uniform gas flow arrangements |
| 08/04/1998 | US5789322 Focusing collar; patterned apertured gas conduit |
| 08/04/1998 | US5789086 Chromium oxide and iron oxide layers; ultrahigh vacuum, ultraclean reduced pressure semiconductors; corrosion resistance |
| 08/04/1998 | US5789040 Generation of plasma and transportation of substrate |
| 08/04/1998 | US5788869 Methodology for in situ etch stop detection and control of plasma etching process and device design to minimize process chamber contamination |
| 08/04/1998 | US5788825 Vacuum pumping system for a sputtering device |
| 08/04/1998 | US5788799 Apparatus and method for cleaning of semiconductor process chamber surfaces |
| 08/04/1998 | US5788798 Plasma processing apparatus |
| 08/04/1998 | CA2099685C Focused ion beam implantation apparatus |
| 07/30/1998 | WO1998033362A1 Plasma device |
| 07/30/1998 | WO1998033201A1 Process and system for operating magnetron discharges |
| 07/30/1998 | WO1998033200A1 Modulator for plasma-immersion ion implantation |
| 07/30/1998 | WO1998033199A2 Ion accelerator for use in ion implanter |
| 07/30/1998 | WO1998033198A1 Raster shaped beam writing strategy system and method for pattern generation |
| 07/30/1998 | WO1998033197A1 Method and apparatus for run-time correction of proximity effects in pattern generation |
| 07/30/1998 | WO1998032892A1 Method of multifunctional surface treatment, and device for implementing same |
| 07/30/1998 | DE19702928A1 Electric-arc evaporator |
| 07/30/1998 | DE19702294A1 Modulator für die Plasmaimmersions-Ionenimplantation Modulator for plasma immersion ion implantation |
| 07/30/1998 | DE19702187A1 Verfahren und Einrichtung zum Betreiben von Magnetronentladungen Method and apparatus for operating magnetron discharges |
| 07/30/1998 | DE19701575A1 Magnetron sputtering for forming uniform thickness |
| 07/30/1998 | CA2278478A1 Method of multifunctional surface treatment, and device for implementing same |
| 07/30/1998 | CA2250210A1 Raster shaped beam writing strategy system and method for pattern generation |
| 07/30/1998 | CA2249573A1 Method and apparatus for run-time correction of proximity effects in pattern generation |
| 07/29/1998 | EP0855735A2 A high temperature, high flow rate chemical vapor deposition apparatus and related methods |
| 07/29/1998 | EP0855453A1 Methods and apparatus for cleaning using a chlorine containing gas plasma |
| 07/29/1998 | EP0855452A1 Process and apparatus for depositing titanium layers |
| 07/29/1998 | CN1189240A Low Inductance large area coil for inductively coupled plasma source |
| 07/29/1998 | CN1188816A Magnetron sputtering method |
| 07/28/1998 | US5786886 Interference removal |
| 07/28/1998 | US5786601 Electron beam lithography machine |
| 07/28/1998 | US5785878 RF antenna having high temperature, oxidation resistant coating |
| 07/28/1998 | US5785807 Microwave plasma processing method and apparatus |
| 07/28/1998 | US5785797 Method and apparatus for monitoring etching by products |
| 07/28/1998 | US5785763 Electron-gun evaporation system having evaporation-source stream regulator |
| 07/28/1998 | US5784925 Vacuum compatible linear motion device |
| 07/23/1998 | WO1998032154A1 Capacitively coupled rf-plasma reactor |
| 07/23/1998 | WO1998032153A2 Electron beam dose control for scanning electron microscopy andcritical dimension measurement instruments |
| 07/23/1998 | WO1998031845A1 Vapor deposition components and corresponding methods |
| 07/23/1998 | WO1998022971A3 Scanning electron microscope |
| 07/23/1998 | DE3448572C2 Vacuum equipment esp. for IC prodn. |
| 07/22/1998 | EP0854495A1 Method and apparatus related to the use of a spectrometer with energy resolution and angular resolution |
| 07/22/1998 | EP0854494A2 Dose control for use in an ion implanter |
| 07/22/1998 | EP0854350A1 Probe array for a scanning probe microscope |
| 07/22/1998 | EP0853813A1 Resolution-enhancement device for an optically-coupled image sensor for an electron microscope |
| 07/22/1998 | EP0853686A1 Method and apparatus for deposition of diamond-like carbon on drills |
| 07/22/1998 | EP0801811B1 Electron beam lithography machine |
| 07/22/1998 | EP0745148A4 Sputtering method and apparatus for depositing a coating onto substrate |
| 07/22/1998 | EP0719447B1 Rf plasma reactor |
| 07/22/1998 | EP0577667B1 Arc source macroparticle filter |
| 07/22/1998 | CN1188322A Cantilever and method of manufacturing the same |
| 07/21/1998 | US5784150 Electron-beam cell projection lithography system |
| 07/21/1998 | US5783830 Sample evaluation/process observation system and method |
| 07/21/1998 | US5783795 Bonding of sputtering target by variable polarity plasma arc welding |
| 07/21/1998 | US5783251 Method for suppressing electrification and for observing or inspecting an article |
| 07/21/1998 | US5783102 Negative ion deductive source for etching high aspect ratio structures |
| 07/21/1998 | US5783101 High etch rate residue free metal etch process with low frequency high power inductive coupled plasma |
| 07/21/1998 | US5783099 Etch-ending point measuring method for vapor etch process |
| 07/21/1998 | US5783048 Thin film on substrate; using magnet |
| 07/21/1998 | US5783023 Gas injector for use in semiconductor etching process |
| 07/16/1998 | WO1998031041A1 Vapour deposition coating apparatus |
| 07/16/1998 | DE19700747A1 Raster probe microscope for determining parameters of object in liquid |
| 07/15/1998 | EP0853331A2 Back sputtering shield |
| 07/15/1998 | EP0853330A2 Ionized PVD source to produce uniform low-particle deposition |
| 07/15/1998 | EP0853243A2 Method and apparatus for detecting defects in wafers |
| 07/15/1998 | CN1187688A Simulation method in lithographic process |
| 07/15/1998 | CN1187626A High-energy electronic detector |
| 07/14/1998 | US5780943 For controlling a position of an object |
| 07/14/1998 | US5780863 Accelerator-decelerator electrostatic lens for variably focusing and mass resolving an ion beam in an ion implanter |
| 07/14/1998 | US5780859 Electrostatic-magnetic lens arrangement |
| 07/14/1998 | US5780853 Scanning electron microscope |
| 07/14/1998 | US5780803 Process for the stabilization of plasma generation by means of electron beam vaporizer |
| 07/14/1998 | US5780315 Dry etch endpoint method |
| 07/14/1998 | US5780313 Method of fabricating semiconductor device |
| 07/14/1998 | US5780188 Multiple exposure of photoresist through mask patterns having complementary partial images in conjunction with stepping target at alternating distances between exposures to provide whole image pattern with accurate alignment |
| 07/14/1998 | US5779926 Plasma process for etching multicomponent alloys |
| 07/14/1998 | US5779849 Plasma reactors and method of cleaning a plasma reactor |
| 07/14/1998 | US5779807 Electrically isolating the wafer-supporting grounded electrode in a vapor deposition enclosure and applying a bias voltage to launch electrostatically the particles into a suspension of gas flow |
| 07/14/1998 | US5779803 Plasma processing apparatus |
| 07/14/1998 | US5779802 Useful for deposition and oxidation of metal oxides, reduction of indium tin oxide using oxygen and nitrogen plasma |
| 07/14/1998 | US5778682 Reactive PVD with NEG pump |
| 07/14/1998 | CA2089240C Method and apparatus for fabrication of thin film semiconductor devices using non-planar, exposure beam lithography |