Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
09/1998
09/17/1998WO1998040906A1 Scanning electron microscope detection system
09/17/1998WO1998040905A1 Ultra-high tilt specimen cryotransfer holder for electron microscope
09/17/1998WO1998040532A1 A method and apparatus for magnetically enhanced sputtering
09/17/1998WO1998028776A3 Particle-optical apparatus including a low-temperature specimen holder
09/16/1998EP0865070A1 Method and apparatus for sputter etch conditioning a ceramic body
09/16/1998EP0715767B1 Mechanical shutter for protecting an x-ray detector against high-energy electron or x-ray damage
09/16/1998CN1193183A Mask for exposure of part of primary electron beam and method thereof
09/16/1998CN1193129A Electron beam exposure system and using method thereof
09/15/1998US5808892 Line edge and size definition in e-beam exposure
09/15/1998US5808425 Method for controlling the emission current of an electron source and an electron source having a control circuit for controlling the emission current
09/15/1998US5808313 Charged particle beam exposure method and charged particle beam exposure apparatus
09/15/1998US5808311 Method for detecting displacement of atoms on material surface and method for local supply of heteroatoms
09/15/1998US5808310 Electron beam cell projection lithography method for correcting coulomb interaction effects
09/15/1998US5808309 Apparatus for generating an electron beam
09/15/1998US5807470 Apparatus for coating substrates in a vacuum
09/15/1998US5807467 In situ preclean in a PVD chamber with a biased substrate configuration
09/15/1998US5806193 Tilt and movement apparatus using flexure and air cylinder
09/11/1998WO1998039770A1 Thin-film magnetic recording head manufacture
09/11/1998WO1998039500A1 Plasma etching device
09/11/1998WO1998039495A1 Multipurpose processing chamber for chemical vapor deposition processes
09/09/1998EP0863536A2 Method and apparatus for substrate processing
09/09/1998EP0796505B1 Plasma reactor and method of operating the same
09/09/1998CN1192788A System for plasma treatment of large area substrates
09/09/1998CN1192575A Cathode mounting for ion source with indirectly heated cathode
09/09/1998CN1192484A Plasma CVD device
09/09/1998CN1192483A Film growth method and film growth apparatus capable of forming magnesium oxide film with increased film growth speed
09/08/1998US5805448 Hybrid control system for scanning probe microscopes
09/08/1998US5804923 Plasma processing apparatus having a protected microwave transmission window
09/08/1998US5804709 For measuring a force used in atomic force microscopy
09/08/1998US5804258 Electrostatic charge from electron beam flows off via anode; prevention of pinholes and other defects in plastic film;
09/08/1998US5804046 Collimator comprising slitted particle getter metal sheets in lattice pattern
09/08/1998US5804027 Apparatus for generating and utilizing magnetically neutral line discharge type plasma
09/08/1998US5803975 Microwave plasma processing apparatus and method therefor
09/08/1998US5803973 Apparatus for coating a substrate by chemical vapor deposition
09/03/1998WO1998038669A1 Atomic focusers in electron microscopy
09/03/1998WO1998038501A1 Scanning probe microscope providing unobstructed top down and bottom up views
09/03/1998DE19724996C1 Plasma-activated electron beam vapour deposition
09/03/1998DE19708344A1 Sputtering cathode
09/02/1998EP0862045A2 Atomic force microscope with optional replaceable fluid cell.
09/02/1998EP0419461B1 Wafer handling system with bernoulli pick-up
09/01/1998USRE35884 Flexible lead assembly for microchannel plate-based detector
09/01/1998US5801971 Form simulation device and its simulating method by the use of the Monte Carlo method
09/01/1998US5801388 Particle beam, in particular ionic optic imaging system
09/01/1998US5801387 Method of and apparatus for the electron beam treatment of powders and aggregates in pneumatic transfer
09/01/1998US5801386 Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same
09/01/1998US5801382 Method of analyzing foreign materials
09/01/1998US5801381 Between a microscope probe tip and a sample surface
09/01/1998US5800688 Apparatus for ionized sputtering
09/01/1998US5800687 Device for masking or covering substrates
09/01/1998US5800621 Plasma source for HDP-CVD chamber
09/01/1998US5800620 Plasma treatment apparatus
09/01/1998US5800619 Vacuum plasma processor having coil with minimum magnetic field in its center
09/01/1998US5800618 Plasma-generating electrode device, an electrode-embedded article, and a method of manufacturing thereof
08/1998
08/27/1998WO1998037739A2 Induction plasma source including convex dome-shaped induction coil
08/27/1998WO1998037569A1 Magnetic circuit for magnetron sputtering
08/27/1998WO1998037568A1 Internally cooled target assembly for magnetron sputtering
08/27/1998WO1998037257A1 Power supply unit for sputtering device
08/27/1998WO1998037256A1 Power supply device for sputtering and sputtering device using the same
08/27/1998WO1998021744A9 Gas panel
08/27/1998DE19807911A1 Coarse probe adjustment for raster microscope
08/27/1998DE19708749A1 Distance sensor for dynamic raster microscope
08/26/1998EP0860856A1 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
08/26/1998EP0860855A1 Antenna for generating a plasma and HDP-CVD processing chamber having such antenna
08/26/1998EP0860854A1 Plasma immersion ion implantation method and apparatus with pulsed anode
08/26/1998EP0860514A2 Reactive sputtering apparatus and process for forming thin film using same
08/26/1998EP0860513A2 Thin film forming apparatus and process for forming thin film using same
08/26/1998EP0860019A1 Pulsed electron beam source and use thereof
08/26/1998EP0792203B1 Electromechanical positioning unit
08/26/1998EP0766869B1 Electron microscope with raman spectroscopy
08/26/1998CN1191463A Plasma etching apparatus and its etching method
08/25/1998US5798529 Focused ion beam metrology
08/25/1998US5798528 Correction of pattern dependent position errors in electron beam lithography
08/25/1998US5798525 X-ray enhanced SEM critical dimension measurement
08/25/1998US5798524 Automated adjustment of an energy filtering transmission electron microscope
08/25/1998US5798196 Pattern transfer method utilizing distribution condition evaluation by charged particle beam
08/25/1998US5798139 Apparatus for and method of manufacturing plastic container coated with carbon film
08/25/1998US5798029 Allows good step coverage
08/25/1998US5798016 Using protective coating selected from scandinium oxide, alumina or yttria, etchants used are fluorohydrocarbons
08/20/1998WO1998036268A1 Charged particle analysis
08/20/1998WO1998036105A1 Film deposition apparatus or artificial lattice multi-layered film
08/20/1998DE19705884A1 Plasma ignition system
08/19/1998EP0859070A1 Coating of inside of vacuum chambers
08/19/1998EP0652920B1 Antistatic agent and method for suppressing electrification
08/18/1998US5796408 Charged particle beam drawing data production apparatus and charged particle beam drawing system
08/18/1998US5795832 Controlling pumping speed of vacuum and gas flow rate
08/18/1998US5795452 Dry process system
08/18/1998US5795451 Sputtering apparatus with a rotating magnet array
08/18/1998US5795429 Plasma processing apparatus
08/18/1998CA2107451C Electron lithography using photocathode
08/13/1998WO1998035379A1 Atmospheric-pressure plasma jet
08/13/1998WO1998035070A1 Apparatus and method for sputtering a magnetron target
08/13/1998DE19706556C1 Plasma etching or cutting arrangement
08/12/1998EP0858095A2 Methods and apparatus for linear scan magnetron sputtering
08/12/1998EP0858080A1 Charged particle irradiation apparatus and operating method thereof
08/12/1998EP0857224A2 Durable plasma treatment apparatus and method
08/12/1998CN1190246A Electronic gun
08/11/1998US5793162 Apparatus for controlling matching network of a vacuum plasma processor and memory for same
08/11/1998US5793050 Ion implantation system for implanting workpieces
08/11/1998US5793048 Curvilinear variable axis lens correction with shifted dipoles
08/11/1998US5793041 Method for correcting astigmatism and focusing in charged particle optical lens-barrel
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